SOULBRAIN CO., LTD Patent applications |
Patent application number | Title | Published |
20160017224 | COMPOSITION FOR ETCHING - The disclosure is related to a composition for etching, a method for manufacturing the composition, and a method for fabricating a semiconductor using the same. The composition may include a first inorganic acid, at least one of silane inorganic acid salts produced by reaction between a second inorganic acid and a silane compound, and a solvent. The second inorganic acid may be at least one selected from the group consisting of a sulfuric acid, a fuming sulfuric acid, a nitric acid, a phosphoric acid, and a combination thereof. | 01-21-2016 |
20130180947 | ETCHING COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - An etching composition that includes, based on the total weight of the etching composition, from about 0.05% to about 15% by weight of a halogen-containing compound, from about 0.1% to about 20% by weight of a nitrate compound, from about 0.1% to about 10% by weight of an acetate compound, from about 0.1% to about 10% by weight of a cyclic amine compound, from about 0% to about 50% by weight of a polyhydric alcohol, and a remainder of water. | 07-18-2013 |
20130171734 | Method of Measuring Moisture Content in Lithium Secondary Battery Electrolyte and Analytical Reagent Composition Used in the Same - Provided is a reagent composition for measuring moisture content in a lithium secondary battery electrolyte, more particularly, a reagent composition for measuring moisture content in a lithium secondary battery electrolyte, containing imidazole, iodine, sulfur dioxide, and an amide based solvent, so that the reagent composition can suppress side reactions to thereby accurately measure a small amount of moisture content. | 07-04-2013 |
20130168264 | Method for Measuring HF Content in Lithium Secondary Battery Electrolyte and Analytical Reagent Composition Used in the Same - Provided are a method for measuring hydrofluoric acid content in a lithium secondary battery electrolyte and an analytical reagent composition used in the same. | 07-04-2013 |
20130157427 | ETCHING COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - The present invention provides an etching composition, comprising a silyl phosphate compound, phosphoric acid and deionized water, and a method for fabricating a semiconductor, which includes an etching process employing the etching composition. The etching composition of the invention shows a high etching selectivity for a nitride film with respect to an oxide film. Thus, when the etching composition of the present invention is used to remove a nitride film, the effective field oxide height (EEH) may be easily controlled by controlling the etch rate of the oxide film. In addition, the deterioration in electrical characteristics caused by damage to an oxide film or etching of the oxide film may be prevented, and particle generation may be prevented, thereby ensuring the stability and reliability of the etching process. | 06-20-2013 |
20130122377 | ELECTROLYTE SOLUTION FOR A LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME - Provided are an electrolyte solution for lithium secondary battery, which includes dipentaerythritol hexaacrylate and a (meth)acrylate compound having a C | 05-16-2013 |
20130092872 | COMPOSITIONS FOR ETCHING AND METHODS OF FORMING A SEMICONDUCTOR DEVICE USING THE SAME - Etching compositions are provided. The etching composition includes a phosphoric acid, ammonium ions and a silicon compound. The silicon compound includes a silicon atom, an atomic group having an amino group combined with the silicon atom, and at least two oxygen atoms combined with the silicon atom. Methods utilizing the etching compositions are also provided. | 04-18-2013 |
20120156874 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME - A slurry composition for chemical mechanical polishing, including 0.1% to 20% by weight of an aminosilane-surface treated polishing agent; 0.001% to 5% by weight of an additive selected from amino acids, amino acid derivatives, salts thereof, and combinations thereof; 0.0001% to 0.5% by weight of a corrosion inhibitor; and 0.01% to 5% by weight of an oxidizing agent, with the balance being a solvent, is provided. The slurry composition for chemical mechanical polishing has a conspicuously high polishing rate for silicon oxide films, is capable of selectively preventing the removal of silicon nitride films, does not cause an imbalance in polishing, gives an excellent degree of planarization, has excellent stability over time and dispersion stability, causes less generation of particles and scratches, and produces very satisfactory polished surfaces of barrier metal films and oxide films. | 06-21-2012 |
20120135314 | ELECTROLYTE ADDITIVE, ELECTROLYTE INCLUDING THE SAME AND LITHIUMSECONDARY BATTERY INCLUDING THE ELECTROLYTE. - Provided are an electrolyte additive represented by the following formula (1), an electrolyte solution containing the electrolyte additive, and a lithium secondary battery including the electrolyte solution: | 05-31-2012 |