Class / Patent application number | Description | Number of patent applications / Date published |
204192380 | Vacuum arc discharge coating | 32 |
20090026067 | Droplet Removing Device and Method in Plasma Generator - There is provided a device for removing droplets in a plasma generator by which droplets can be surely separated from a plasma traveling from an arc discharge section and can be certainly removed, so that it can be prevented for the droplets to reach an article being processed. A tubular traveling passage ( | 01-29-2009 |
20090127102 | PLASMA DEPOSITION APPARATUS AND METHOD - A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable anode holder, a substrate mounted on the anode holder to serve as an anode, and a substrate holder mounting and supporting the substrate, and a reactor for applying a potential difference between opposing surfaces of the cathode assembly and the anode assembly under a vacuum state to form plasma of a raw gas. The cathode disk comes into thermal contact with the cathode holder using at least one of a self weight and a vacuum absorption force so as to permit thermal expansion of the cathode disk. | 05-21-2009 |
20090294281 | PLASMA FILM FORMING APPARATUS AND FILM MANUFACTURING METHOD - A plasma film forming apparatus having a plasma gun which emits a plasma beam and a magnet which applies a magnetic field to the plasma beam emitted from the plasma gun to deform the beam section of the plasma beam into an almost rectangular or elliptic shape includes a plurality of magnet units which deflect the plasma beam the beam section of which is deformed, to irradiate an irradiation target with the deflected plasma beam. A first magnet to be arranged on a lower backside to a surface of the irradiation target and a second magnet having magnetic poles which are the same as those of the first magnet are arranged in each magnet unit. The first magnet and the second magnet line up to be spaced apart from each other. | 12-03-2009 |
20100230276 | DEVICE AND METHOD FOR THIN FILM DEPOSITION USING A VACUUM ARC IN AN ENCLOSED CATHODE-ANODE ASSEMBLY - A vacuum-arc device including: a consumable cathode including a first material having a defined active surface, a refractory anode including a second material, an inter-electrode volume, bounded partially by at least a portion of an inner wall of the cathode and by at least a portion of an inner wall of the anode, wherein at least a portion of the inner walls form a first chamber surrounding the inter-electrode volume, the chamber having at least one opening fluidly communicating between the inter-electrode volume and an a volume outside the chamber; a vacuum chamber, disposed around and communicating with the first chamber; an evacuation mechanism for evacuating the vacuum chamber; wherein the cathode is adapted, and the cathode and the anode are disposed, such that upon evacuating the vacuum chamber using the evacuation mechanism, ignition of an arc discharge between the cathode and the anode, and activation of a high-current power supply, a portion of the first material is liberated from the cathode, transported through the inter-electrode volume, and discharged from the first chamber through the opening, wherein: a total opening area of the at least one opening, Aopenings, is defined by a sum of a minimum cross-sectional area for each the opening, the cross-sectional area being normal to a path of the opening between the inter-electrode volume and the volume outside the chamber; a surface area of the anode, Aanode, is defined by a geometrical surface area of the portion of the anode that bounds the inter-electrode volume; and wherein a ratio of the surface area of the anode to the total opening area, A | 09-16-2010 |
20110198214 | MESOPOROUS SILICA FILM AND PROCESS FOR PRODUCTION THEREOF - In a mesoporous silica film formed on a non-single-crystalline carbon film having structural anisotropy on a substrate in-plane arrangement of the pores is controlled in one direction, which is defined by the structural anisotropy of the carbon film. | 08-18-2011 |
20110278157 | METHOD FOR PRETREATING SUBSTRATES FOR PVD METHODS - The invention relates to a method for surface treatment of work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source; by means of the first electrode, an arc is operated with an arc current and vaporizes material from the target that is deposited at least partially and intermittently onto the work pieces and having a second electrode that is embodied as a work piece holder and, together with the work pieces, constitutes a bias electrode; by means of a voltage supply, a bias voltage is applied to the bias electrode, with the bias voltage applied so that it is matched to the arc current such that essentially, no net material buildup on the surface occurs. | 11-17-2011 |
20110315544 | ARC EVAPORATOR AND METHOD FOR OPERATING THE EVAPORATOR - The invention relates to an arc evaporator which comprises at least one anode ( | 12-29-2011 |
20120037493 | ARC EVAPORATION SOURCE AND FILM FORMING METHOD USING THE SAME - Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet ( | 02-16-2012 |
20120160664 | CATHODIC ARC VAPOR DEPOSITION COATINGS FOR DIMENSIONAL RESTORATION OF SURFACES - A process for repairing a workpiece includes the steps of: providing a workpiece having at least one interior surface requiring restoration; providing a source of repair material; and depositing the repair material onto the at least one interior surface using a technique which is a near non-line of sight technique. | 06-28-2012 |
20120160665 | METHOD FOR PRODUCING COATINGS WITH A SINGLE COMPOSITE TARGET - The invention pertains to a method for the production of coatings by physical vapor deposition (PVD), wherein a binary target or a target with more than two constituents is evaporated in a curvilinear cathodic arc discharge, causing the ions with different masses (elements) to be splitted and the ion splitting results in variations for the ratio of the different masses (elements) at different positions in the deposition chamber. | 06-28-2012 |
20130032469 | ARC PVD PLASMA SOURCE AND METHOD OF DEPOSITION OF NANOIMPLANTED COATINGS - The invention relates to a method and an apparatus for applying metallic, ceramic or composite thin film coatings onto parts, components and tools (e.g. gas turbine engine compressor blades or cutting tools) by a cathodic arc deposition technique. The method and the apparatus allows for a continually changing structure of the applied film by nanoimplanting atoms, molecules, compounds or other chemical species and structures of different materials thus coating a substrate during a single process. Furthermore, during the same process it allows for creating a coating with specific parameters as required. For instance: hardness, smoothness, corrosion resistance, erosion resistance. | 02-07-2013 |
20130048490 | SYNTHESIS OF METAL OXIDES BY REACTIVE CATHODIC ARC EVAPORATION - In these investigations, an attempt has been made to correlate the deposition parameters of the reactive cathodic arc evaporation with processes at the surface of the composite Al—Cr targets and the nucleation and phase formation of the synthesized Al—Cr—O layers. The oxygen partial pressure and the pulsed operation of the arc current influence the formation of intermetallic phases and solid solutions at the target surface. The nucleation of the ternary oxides at the substrate site appears to be, to some extent, controllable by the intermetallics or solid solutions formed at the target surface. A specific nucleation process at substrate site can therefore be induced by the free choice of target composition in combination with the partial pressure of the oxygen reactive gas. It also allows the control over the oxide island growth at the target surface which occurs occasionally at higher oxygen partial pressure. This hypothesis is supported by the X-ray diffraction analysis of the layers as well as of the target surface. | 02-28-2013 |
20130062195 | PROCESS FOR PREPARATION OF CARBON NANOTUBES FROM VEIN GRAPHITE - A catalyst free process for manufacturing carbon nanotubes by inducing an arc discharge from a vein graphite anode and a vein graphite cathode in an inert gas atmosphere contained in a closed vessel. The process is carried out at atmospheric pressure in the absence of external cooling mechanism for the carbon cathode or the carbon anode. | 03-14-2013 |
20130146445 | PROCESS FOR COATING A SUBSTRATE BY MEANS OF AN ARC - The invention relates to a process and an evaporator for coating a substrate by means of an arc in a vacuum chamber ( | 06-13-2013 |
20130180845 | FILTER FOR REMOVING MACRO-PARTICLES FROM A PLASMA BEAM - A filter for filtering macro-particles from a plasma beam, having a bended duct for carriage of the plasma beam, the bended duct comprising an intermediate portion connected at one end to an inlet portion having a longitudinal axis disposed on an inlet plane and at another opposite end to an outlet portion having a longitudinal axis disposed on an outlet plane. The inlet portion allows the plasma beam containing macro-particles to travel toward the intermediate portion in an incident direction and the outlet portion allows the plasma beam to travel from the intermediate portion in an emergent direction. The intermediate portion is configured to deviate the incident direction to the emergent direction at an angle of more than 90° and thereby remove macro-particles from the plasma beam as it passes through the intermediate portion. The inlet plane and outlet plane are disposed at an offset angle from each other. | 07-18-2013 |
20130206584 | SUBSTRATE COATING ON ONE OR MORE SIDES - A method for coating a substrate on one or more sides having catalytically active material producible by material deposition under vacuum in a vacuum chamber, using the following steps: loading a substrate in the chamber evacuating the chamber, cleaning the substrate by introducing a gaseous reducing agent, removing the gaseous reducing agent, applying an intermediate layer by means of vacuum arc evaporation, wherein a substrate comprising the same or similar material is introduced into the vacuum chamber, controlling the chamber temperature, coating by vacuum arc evaporation, a metal taken from the group ruthenium, iridium, titanium and mixtures thereof while oxygen is supplied, in a last step the coated substrate is removed from the chamber, wherein at least 99% of the substrate coating is free of constituents originally contained in the substrate itself, and at least 99% of the coating applied on the intermediate layer is kept free of non-oxidized metals. | 08-15-2013 |
20130206585 | COMPACT, FILTERED ION SOURCE - The present invention relates to a filtered cathodic-arc ion source that reduces, or even eliminates, macroparticles while minimally compromising the compact size, simplicity, and high flux ion production benefits of unfiltered cathodic-arc sources. Magnetic and electrostatic forces are implemented in a compact way to guide ions along curved trajectories between the cathode source and the workpiece area such that macroparticles, which are minimally affected by these forces and travel in straight lines, are inhibited from reaching the workpieces. The present invention implements this filtering technique in a device that is compact, symmetrical and easy to manufacture and operate and which does not substantially compromise coating deposition rate, area, or uniformity. | 08-15-2013 |
20130220800 | METHOD FOR SPARK DEPOSITION USING CERAMIC TARGETS - The present invention relates to an arc deposition source, comprising an electrically conductive ceramic target plate ( | 08-29-2013 |
20130264194 | METHOD FOR MANUFACTURING CARBON FILM AND PLASMA CVD METHOD - The present invention provides a method of manufacturing a carbon film and a plasma CVD method capable of performing film formation while controlling the temperature of a substrate as well as film properties. A process chamber according to one embodiment of the present invention includes a holder configured to hold a substrate, magnetic-field producing means configured to produce magnetic fields inside the process chamber, shields configured to suppress film deposition on the magnetic-field producing means, heat dissipating sheets configured to suppress heating of the magnetic-field producing means, and moving means configured to move the magnetic-field producing means. The magnetic-field producing means is characterized in being moved in such a direction as to increase or decrease the volume of a space between the magnetic-field producing means and the holder. | 10-10-2013 |
20130327637 | SYSTEM AND METHOD FOR MASS PRODUCTION OF GRAPHENE PLATELETS IN ARC PLASMA - A system and method for producing graphene includes a heating block, substrate, motor and collection device. The substrate is arranged about the heating block and is configured to receive heat from the heating block. A motor is connected to the substrate to rotate the substrate about the heating block. A cathode and anode are configured to direct a flux stream for deposit onto the rotating substrate. A collection device removes the deposited material from the rotating substrate. A heating element is embedded in the heating block and imparts heat to the heating block. The heating block is made of cement or other material that uniformly disperses the heat from the heating element throughout the heating block. The flux stream can be a carbon vapor, with the deposited flux being graphene. | 12-12-2013 |
20140034484 | DEVICE FOR THE ELIMINATION OF LIQUID DROPLETS FROM A CATHODIC ARC PLASMA SOURCE - A method and apparatus for depositing a metal onto a substrate using a cathodic arc plasma source as a source of metal ions. A plasma deposition apparatus has a vacuum chamber; and a conduit within the vacuum chamber having an input end and an output end. A substrate is within the vacuum chamber, positioned to receive a plasma at the output end of the conduit. A cathodic arc plasma source within the vacuum chamber is positioned to inject a composition comprising a mixture of a plasma and electrons into the input end of the conduit toward the output end of the conduit. A magnetic field generator establishes a magnetic field within the conduit a plurality of electrodes located within the magnetic field and an electric field generator establishes an electric field within the conduit. The apparatus reduces or eliminates liquid metal droplets emitted from such a plasma source. | 02-06-2014 |
20140054165 | CARBON SPARK EVAPORATION - The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again. | 02-27-2014 |
20140061034 | METHOD FOR PRETREATING SUBSTRATES FOR PVD METHODS - The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system. | 03-06-2014 |
20140076718 | Remote Arc Discharge Plasma Assisted Processes - A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode. | 03-20-2014 |
20140251791 | CATHODIC ARC DEPOSITION STINGER - A stinger for a cathodic arc vapor deposition system includes a head with a reduced area contact interface. | 09-11-2014 |
20150034478 | CATHODIC ARC DEPOSITION - The present invention provides a method for depositing a wear resistant coating on a cutting tool substrate. Cathodic arc deposition is performed using one or more plate-shaped targets and a high arc current of at least 200 A, preferably at least 400 A, whereby a high total ion current of at least 5 A is provided in front of the substrates. A comparatively low bias voltage may be used in order to avoid negative effects of ions impinging on the substrates with high kinetic energy. Thanks to the method of the invention it is possible to deposit thick wear resistant coatings on cutting tool substrates in order to improve cutting performance and tool life. | 02-05-2015 |
20150101925 | SYSTEMS AND METHOD OF COATING AN INTERIOR SURFACE OF AN OBJECT - A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior configured to receive the object, and a cathode coupled to the vacuum chamber enclosure. The cathode is fabricated from a coating material and has an outer surface. The cathode is configured such that when a current is applied to the cathode, an arc is formed on the outer surface and the coating material is removed from the cathode to form a cloud of coating material. The system also includes a collimator configured to be positioned between the cathode and the object configured to focus the cloud into a beam of coating material and to direct the beam towards the object, and a magnet configured to alter a path of the beam such that the beam is directed towards the interior surface of the object. | 04-16-2015 |
20150114828 | SYSTEMS AND METHOD OF COATING AN INTERIOR SURFACE OF AN OBJECT - A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior cavity configured to receive the object, an anode positioned within the interior cavity of the vacuum chamber enclosure, and a cathode positioned within the interior cavity of said vacuum chamber enclosure such that a space between the anode and the cathode is at least partially defined by the interior surface of the object. At least a portion of the cathode vaporizes when current is supplied thereto such that vaporized cathode material coats the interior surface of the object. | 04-30-2015 |
20150368786 | METALLIC COATING FIXED STATOR TIP TREATMENT - A tip region of an airfoil has a wear coating that is deposited using physical vapor deposition in conjunction with a mechanical mask. The mask is positioned with respect to the region portion of the tip to expose only a portion of the tip region to be coated. A physical vapor deposition coating source such as cathode arc (CAT ARC) is used to coat the exposed portion of the tip region with the wear coating. | 12-24-2015 |
20160053364 | ARC VAPORIZATION OF METALLIC, INTERMETALLIC, AND CERAMIC TARGET MATERIALS IN ORDER TO PRODUCE Al-Cr-N COATINGS - Arc vaporization of targets produced by means of powder metallurgy in Which the components are in the form of intermetallic compounds. The target is produced using a powder that contains a first and second intermetaallic compound and/or a first and second ceramic compound. | 02-25-2016 |
20160060749 | Bioresorbable medical devices and method of manufacturing the same using vapor deposition - A method for manufacturing a bioresorbable device, said method comprising: providing an anodic material; providing a cathodic material, said anodic and cathodic materials forming a galvanic couple; vapor depositing simultaneously said anodic and cathodic materials on a substrate to obtain a bioresorbable material; and processing said bioresorbable material to form said bioresorbable device. Said vapor deposition of said anodic and cathodic materials is performed under conditions such that bioresorption of said device is promoted by galvanic corrosion between said anodic and cathodic materials. | 03-03-2016 |
20160251753 | Systems and Methods for Optimal Source Material Deposition Along Hole Edges | 09-01-2016 |