Entries |
Document | Title | Date |
20080219408 | METHODS AND SYSTEMS FOR THE DIRECTING AND ENERGY FILTERING OF X-RAYS FOR NON-INTRUSIVE INSPECTION - Systems and methods are disclosed herein for lenses based on crystal X-ray diffraction and reflection to be used to direct and energy filter X-ray beams. | 09-11-2008 |
20090003526 | Measurement system and method for the noninvasive determination of properties of an object to be examined and contrast medium for X-ray phase-contrast measurement - A method and a measurement system are disclosed for the noninvasive determination of properties of an object to be examined and to the use of a contrast medium for X-ray phase-contrast measurement. in at least one embodiment of the invention, a mixture (suspension) consisting of a base liquid and a multiplicity of particles contained therein is used, the refractive index of the base liquid being different to the refractive index of the particles. | 01-01-2009 |
20090168963 | Method, a processor, and a system for identifying a substance - A method, a processor, and a system for identifying a substance are described. The method includes identifying a substance based on a plurality of integrated intensities of a plurality of X-ray diffraction profiles. | 07-02-2009 |
20090252294 | Scanning von hamos type x-ray spectrometer - An X-ray spectrometer that collects a very large solid angle of emitted X-rays from a sample but “views” only a narrow portion of the X-rays at a time. The invention uses a moving detector, which moves along the optical axis, to count or collect X-rays from within narrow wavelength regions. | 10-08-2009 |
20090274274 | HANDHELD TWO-DIMENSIONAL X-RAY DIFFRACTOMETER - A handheld X-ray diffractometer comprises a miniaturized X-ray source and multiple area detectors to allow the diffractometer to obtain two-dimensional X-ray diffraction images in a large diffraction space without rotating the sample. The source and detectors are located inside of a radio opaque enclosure that protects the operator during use. The handheld diffractometer also comprises a sample monitoring and alignment system that allows an operator to observe the measuring area and to align the diffractometer to the sample from outside of the housing. A specially designed mouthpiece, which mates the diffractometer to the sample area, prevents x-ray leakage and triggers off the data collection. The detectors can be positioned to perform measurements necessary to calculate a mechanical stress in the sample. Linear detectors may also be used in place of the area detectors. | 11-05-2009 |
20100061512 | X-RAY SOURCE AND DETECTOR CONFIGURATION FOR A NON-TRANSLATIONAL X-RAY DIFFRACTION SYSTEM - A system and method for scanning objects using a non-translational x-ray diffraction (XRD) system is disclosed. The system includes a scanning area through which an object to be scanned traverses and a distributed x-ray source having a plurality of focal spot locations. The distributed x-ray source is affixed on the scanning area and is configured to emit x-rays towards the object as a series of parallel x-ray beams. A stationary detector arrangement is affixed on another side of the scanning area generally opposite the distributed x-ray source and is configured to measure a coherent scatter spectra of the x-rays after passing through the object. A data acquisition system (DAS) is connected to the detector arrangement and is configured to measure the coherent scatter spectra, which is utilized to generate XRD data and determine a material composition of at least a portion of the object from the XRD data. | 03-11-2010 |
20100086104 | X-ray analysis instrument with adjustable aperture window - An X-ray analysis instrument, in particular, an X-ray diffractometer ( | 04-08-2010 |
20100111253 | SYSTEM AND METHOD TO ACCOUNT FOR CROSS-TALK AMONG COHERENT SCATTER DETECTORS - A method to account for cross-talk among a plurality of coherent scatter detectors of a multi-detector inverse fan beam x-ray diffraction imaging (MD-IFB XDI) system. The MD-IFB XDI system includes a multi-focus x-ray source (MFXS) that emits radiation sequentially from a plurality of focus points denoted by F | 05-06-2010 |
20100135460 | X-ray optical element and diffractometer with a soller slit - An X-ray optical element ( | 06-03-2010 |
20100329424 | X-RAY DIFFRACTION IMAGING SYSTEM AND METHOD FOR OPERATING THE SAME - A method for operating an X-ray diffraction imaging (XDI) system to scan an object includes generating an X-ray beam from at least one source focus at a first focus location, and receiving first scatter radiation at a first scatter angle at a scatter detector. The first scatter radiation is produced when the X-ray beam interacts with the object. The method further includes displacing the at least one source focus from the first focus location to a second focus location, generating a displaced X-ray beam from the at least one source focus at the second focus location, and receiving second scatter radiation at a second scatter angle at the scatter detector. The second scatter radiation is produced when the displaced X-ray beam interacts with the object. An identification of the object based on one of the first scatter radiation and the second scatter radiation is output. | 12-30-2010 |
20110164729 | X-RAY TOPOGRAPHY APPARATUS - An x-ray topography apparatus in which x-rays diffracted from a sample which is scanned with a linear x-ray are detected by an x-ray detector to obtain a planar diffraction image. In this x-ray topography apparatus, the x-ray detector is an imaging plate shaped as a cylinder and provided with a surface area that is larger than the sample, and the imaging plate is made to undergo α-rotation about the center axis of the cylindrical shape in coordination with scanning movement of the linear x-rays. The center axis of the cylindrical shape extends in a direction at a right angle with respect to the direction of the scanning movement of the linear x-rays. | 07-07-2011 |
20110268251 | METHOD AND APPARATUS FOR USING AN AREA X-RAY DETECTOR AS A POINT DETECTOR IN AN X-RAY DIFFRACTOMETER - An area detector used in a two-dimensional system is used as a point detector in Bragg-Brentano and other geometries by providing the area detector with a mask the limits the area through which X-rays can enter the detector. Secondary X-ray optics and a monochromator that are part of the diffractometer geometry are attached to the area detector mask to allow a fast and easy switch between the two-dimensional detector mode and the point detector mode. A concave detector mask is used with a spherical detector in order to reduce the secondary beam path and increase detector efficiency and the opening in the detector mask can be offset from the mask center to achieve high 2θ angle measurements. Single channel bypath electronics are used to disregard the dimensional position of each X-ray count to increase the efficiency and speed of the system. | 11-03-2011 |
20120014508 | ENHANCING ACCURACY OF FAST HIGH-RESOLUTION X-RAY DIFFRACTOMETRY - A method for analysis includes directing a converging beam of X-rays toward a surface of a sample and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum of the sample. The diffraction spectrum is corrected to compensate for a non-uniform property of the converging beam. | 01-19-2012 |
20120106706 | Method for X-ray diffractometry analysis at differing wavelengths without exchanging the X-ray source - A method for performing an X-ray diffractometry analysis of a crystalline and/or amorphous sample, by means of an optical X-ray apparatus having an X-ray source with an X-ray anode constructed from a mixed configuration of at least two metals is characterized in that an energy-dispersive semi-conductor is used for acquiring detector events from the X-rays emanating from the sample, and that X-rays diffracted or scattered by the sample with different characteristic energy lines belonging to the metals of the mixed configuration of the X-ray anode used, are acquired simultaneously during an angle scan. With this method, X-ray diffractometry analyses with multiple characteristic energy lines are possible without any need for conversion or switchover. | 05-03-2012 |
20120128128 | DIFFRACTOMETER - A compact powder diffractometer has one or more detectors arranged no more than 300 mm, in an example 55 mm, from a sample stage for mounting a powder sample. High resolution is nevertheless obtained in spite of the small dimensions using a geometry that achieves a suitable divergence of X-rays incident on the sample and a small spot size using a grazing exit condition on a monochromator crystal. | 05-24-2012 |
20120140888 | X-RAY DIFFRACTION INSTRUMENT - It is an objective of the present invention to provide an X-ray diffraction instrument which does not require any actuator for adjusting a position and/or an orientation of a measurement object and/or an X-ray emitter used in the instrument and that has no particular limitation on a size and a shape of the measurement object. There is provided an X-ray diffraction instrument including: a two-dimensional plate-like X-ray detector; an X-ray emitter integrated with the X-ray detector in such a manner that the X-ray emitter penetrates the plate of the X-ray detector; and a cylinder-like shield for defining an orientation of the X-ray emitter and preventing X-ray leakage, the X-ray detector being attached to an end of the cylinder-like shield in such a manner that a perimeter of the end of the shield abuts a perimeter of the plate of the X-ray detector. | 06-07-2012 |
20120213335 | METHOD FOR IDENTIFYING NANO TEXTILE - A method for identifying a nano textile, including: (1) determining whether a textile belongs to a woven fabric or a non-woven fabric by appearance; and (2) when the textile is a woven fabric, determining whether the woven fabric is a nano textile according to the surface grains of the woven fabric and a finishing material for the woven fabric; or when the textile is a non-woven fabric, determining whether the non-woven fabric is a nano textile according to the fiber diameter and a fused material of the non-woven fabric. | 08-23-2012 |
20120236994 | Method of characterizing integrated memory structures - A method of determining the deviation of measured pattern vs. computed pattern is disclosed. Other methods are also disclosed herein. | 09-20-2012 |
20120263275 | SYSTEM AND METHOD FOR CORRECTING X-RAY DIFFRACTION PROFILES - A method for correcting an X-ray diffraction (XRD) profile measured by an X-ray diffraction imaging (XDi) system is provided. The XDi system includes an anode, a detector, and a control system. The method includes obtaining an emission spectrum of the anode using the control system. The emission spectrum includes spectral structures. The method further includes calculating a piecewise spectral-correction function using the spectral structures in the emission spectrum, obtaining a measured spectrum of an object, and applying the spectral-correction function to the measured spectrum to generate a spectrally-corrected measured spectrum. | 10-18-2012 |
20120269322 | WAVELENGTH-CLASSIFYING TYPE X-RAY DIFFRACTION DEVICE - A wavelength-classifying type X-ray diffraction device bombards a sample with characteristic X-rays generated from an X-ray generation source, and detects characteristic X-rays diffracted by the sample using an X-ray detector. The X-ray generation source is composed of several metals of different atomic number, respective metals generating several characteristic X-rays of different wavelengths. An X-ray detector is composed of several pixels for receiving X-rays and outputting pulse signals corresponding to X-ray wavelengths. Pixels are respectively furnished with classification circuits. The classification circuits classify and output pixel output signals based on each of characteristic X-ray wavelengths. X-ray intensity is detected on a per-wavelength basis in individual pixels | 10-25-2012 |
20130044864 | X-Ray Diffraction Instrument - There is provided an X-ray diffraction instrument including: a two-dimensional plate-like X-ray detector; an X-ray emitter integrated with the X-ray detector so as to penetrate the plate of the X-ray detector; a cylinder-like shield to define an orientation of the X-ray emitter and to prevent X-ray leakage, the X-ray detector being attached to one open end of the cylinder-like shield; and a standard powder attachment device to attach a standard powder for X-ray diffraction measurement to a surface of an object to be measured. The X-ray diffraction instrument can perform an X-ray diffraction measurement to an object larger than the X-ray detector thereof. The invented X-ray diffraction instrument is small in size, and can perform accurate X-ray diffraction measurement of stationary immovable objects without limitation on an orientation of the measurement surface. In addition, X-ray leakage is prevented for operator safety. | 02-21-2013 |
20130070899 | POLARIZING FILM, DISPLAY DEVICE AND PRODUCTION PROCESS THEREOF - A polarizing film comprising a substrate, and a photo alignment film and a light absorption anisotropic film laminated on the substrate in this order, wherein the light absorption anisotropic film has a content ratio of 30% by mass or less of a liquid crystalline non-colorable low molecular weight compound and is obtained by fixing the alignment of a dichroic dye composition comprising at least one nematic liquid crystalline azo dichroic dye; in X-ray diffraction measurement thereof, diffraction peaks derived from periodic structure along a vertical direction to the alignment axis are present, the period indicated by at least one of the diffraction peaks is 3.0 to 15.0A and an intensity of the diffraction peak does not show a maximum value in the range of ±70° of the film normal line direction in a plane vertical to the alignment axis. | 03-21-2013 |
20130077753 | Biometric Diagnosis - The invention provides a method of detecting neoplastic or neurological disorders comprising exposing skin or nails to X-ray diffraction and detecting changes in the ultrastructure of the skin or nails, and also provides an instrument when used in the method of detection. | 03-28-2013 |
20130077754 | ANALYSIS METHOD FOR X-RAY DIFFRACTION MEASUREMENT DATA - Peak positions and integrated intensities of diffraction X-ray are determined on the basis of X-ray diffraction measurement data output from an X-ray diffractometer, the number of determined peaks of the diffraction X-ray is counted, and analysis processing is started when the counted number of peaks reaches a preset peak number. The analysis processing is repetitively executed on the basis of X-ray diffraction measurement data. The peak positions and the integrated intensities of the diffraction X-ray are determined from the X-ray diffraction measurement data obtained from the start of the measurement till the analysis processing concerned, and qualitative analysis of collating the determined peak positions and integrated intensities with standard peak card data whose data base is made in advance and searching materials contained in a measurement sample, and quantitative analysis of determining the quantities of the materials contained in the measurement sample are executed. | 03-28-2013 |
20130108021 | MULTIPLY-SAMPLED CMOS SENSOR FOR X-RAY DIFFRACTION MEASUREMENTS WITH CORRECTIONS FOR NON-IDEAL SENSOR BEHAVIOR | 05-02-2013 |
20130129051 | X-RAY DIFFRACTION METHOD AND PORTABLE X-RAY DIFFRACTION APPARATUS USING SAME - A portable X-ray diffraction apparatus is provided which can be held by a person and on which an image of a spot to be measured can be viewed. The portable X-ray diffraction apparatus includes: X-ray irradiation means that irradiates a sample with collimated X-rays; diffracted X-ray detection means that detects a collimated portion of diffracted X-rays among X-rays diffracted from the sample by the irradiation of the X-rays with the X-ray irradiation means; and signal processing means that processes a signal outputted from the diffracted X-ray detection means. An X-ray diffraction method is used which includes: irradiating a sample with collimated continuous-wavelength X-rays; extracting a collimated portion of diffracted X-rays diffracted from the sample irradiated with the X-rays and condensing the extracted collimated portion of the diffracted X-rays; detecting, using an energy dispersive detection element, the condensed diffracted X-rays; and processing a signal detected by the detection element. | 05-23-2013 |
20130129052 | METHOD AND ITS APPARATUS FOR X-RAY DIFFRACTION - In order to realize a compact and lightweight X-ray diffraction apparatus not requiring a goniometer, an apparatus for X-ray diffraction includes a first X-ray irradiating unit and a second X-ray irradiating unit that irradiate shaped X-rays on a same region of the surface of the sample from respective directions; an X-ray detecting unit that detects a first diffracted X-ray emanated from the region of the sample where the X-ray is irradiated by the first X-ray irradiating unit and a second diffracted X-ray emanated from the region of the sample where the X-ray is irradiated from the second X-ray irradiating unit; and an X-ray diffraction signal processing unit that processes a signal acquired by detecting the first diffracted X-ray and the second diffracted X-ray emanated from the same region of the sample with the X-ray detecting unit. | 05-23-2013 |
20130315375 | X-ray analysis apparatus with single crystal X-ray aperture and method for manufacturing a single crystal X-ray aperture - An X-ray analysis apparatus has at least one X-ray aperture ( | 11-28-2013 |
20130343524 | METHOD FOR PRODUCING STRUCTURE - A method for producing a structure includes the steps of etching a first substrate of an integrated member including, in sequence, the first substrate, an etching stop layer, and a seed layer, from a surface of the first substrate opposite the surface adjacent to the etching stop layer to form a hole or a plurality of gaps in the first substrate in such a manner that part of a surface of the etching stop layer is exposed, partially etching the etching stop layer from the surface of the etching stop layer exposed to expose part of a surface of the seed layer, and forming a metal member by plating using the seed layer as a seed to charge a metal into at least part of the hole or the gaps. | 12-26-2013 |
20140064452 | METHOD FOR MEASUREMENT OF WEIGHT CONCENTRATION OF CLAY IN A SAMPLE OF A POROUS MATERIAL - A solution of a clay material is pumped through a sample of a porous material. After completion of pumping, at least a part of the sample is crushed into powder and a clay fraction is elutriated from the prepared powder. X-ray diffraction analysis of the elutriated clay fraction is performed and weight concentration of clay material in the sample of the porous material is determined. | 03-06-2014 |
20140119511 | Methods of Identifying Original and Counterfeit Articles using Micro X-Ray Diffraction Mapping - The present invention provides relatively fast, automated and non-destructive methods to screen and identify articles. The methods may be used to identify counterfeit articles, such as, for example, medications including those in the form of tablets, pills or capsules. The methods may use a micro-X ray diffraction method to scan marks as small as, for instance, 300 μm made of X-ray visible compounds. The methods may provide 2-D or 3-D maps of these marks using selected peaks from the collected X-ray diffraction patterns and may be used to certify the authenticity of drug tablets, for instance by mapping hidden marks printed under tablet coatings and on packages. | 05-01-2014 |
20140185767 | METHOD OF DETECTING POLYMORPHS USING SYNCHROTRON RADIATION - A method of detecting polymorphs using X-ray produced by a synchrotron source is described. In particular, the method allows to detect particular polymorphs present in small amounts in mixtures of polymorphic compounds present in a prevailing amount. The method offers a powerful resolution of mixtures of polymorph and finds application particularly in the pharmaceutical field. | 07-03-2014 |
20140270079 | X-ray analyzing system for x-ray scattering analysis - An X-ray analyzing system for x-ray scattering analysis having an x-ray source for generating a beam of x-rays propagating along a transmission axis ( | 09-18-2014 |
20140314206 | X-RAY DIFFRACTION APPARATUS, X-RAY DIFFRACTION MEASURING METHOD, AND CONTROL PROGRAM - The X-ray diffraction apparatus irradiates a sample with an X-ray and performs frame photographing in each X-ray diffraction angle, and includes a control section ( | 10-23-2014 |
20140376694 | SUBSTRATE MEASUREMENT APPARATUS AND SUBSTRATE MEASUREMENT METHOD - In accordance with an embodiment, a substrate measurement apparatus circuit includes a light source, a detector, a data calculation unit, a mirror unit, a mirror drive unit, and a mirror drive calculation unit. The light source applies the electromagnetic waves to a measurement target substrate. The detector detects the electromagnetic waves diffracted or scattered by the application of the electromagnetic waves to the substrate. The data calculation unit processes a signal from the detector to acquire substrate information. The mirror unit includes a deflecting mirror which is adjusted to an optical condition where incident electromagnetic waves are totally reflected to control the track of the electromagnetic waves. The mirror drive unit drives the deflecting mirror in at least one of vertical, horizontal, and rotational directions. The mirror drive calculation unit calculates a drive amount to drive the deflecting mirror in at least one of the vertical, horizontal, and rotational directions. | 12-25-2014 |
20150055756 | METHOD OF MEASURING THICKNESS OF Fe-Zn ALLOY PHASE OF GALVANNEALED STEEL SHEET AND APPARATUS FOR MEASURING THE SAME - A method of measuring a thickness of a Fe—Zn alloy phase included in the Fe—Zn alloy coating of the galvannealed steel sheet includes: an X-ray irradiation process of irradiating the galvannealed steel sheet with the incident X-rays; and an X-ray detection process of detecting the diffracted X-rays obtained in the X-ray irradiation process, derived from a Γ·Γ | 02-26-2015 |
20150078526 | X-ray Diffraction (XRD) Characterization Methods for Sigma=3 Twin Defects in Cubic Semiconductor (100) Wafers - An X-ray defraction (XRD) characterization method for sigma=3 twin defects in cubic semiconductor (100) wafers includes a concentration measurement method and a wafer mapping method for any cubic tetrahedral semiconductor wafers including GaAs (100) wafers and Si (100) wafers. The methods use the cubic semiconductor's (004) pole figure in order to detect sigma=3/{111} twin defects. The XRD methods are applicable to any (100) wafers of tetrahedral cubic semiconductors in the diamond structure (Si, Ge, C) and cubic zinc-blende structure (InP, InGaAs, CdTe, ZnSe, and so on) with various growth methods such as Liquid Encapsulated Czochralski (LEC) growth, Molecular Beam Epitaxy (MBE), Organometallic Vapor Phase Epitaxy (OMVPE), Czochralski growth and Metal Organic Chemical Vapor Deposition (MOCVD) growth. | 03-19-2015 |
20150117610 | METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY USING X-RAY METROLOGY - Disclosed are apparatus and methods for determining overlay error in a semiconductor target. For illumination x-rays having at least one angle of incidence (AOI), a correlation model is obtained, and the correlation model correlates overlay error of a target with a modulation intensity parameter for each of one or more diffraction orders (or a continuous diffraction intensity distribution) for x-rays scattered from the target in response to the illumination x-rays. A first target is illuminated with illumination x-rays having the at least one AOI and x-rays that are scattered from the first target in response to the illumination x-rays are collected. An overlay error of the first target is determined based on the modulation intensity parameter of the x-rays collected from the first target for each of the one or more diffraction orders (or the continuous diffraction intensity distribution) and the correlation model. | 04-30-2015 |
20190145916 | Compact, Low Cost Apparatus for Testing of Production and Counterfeit Pharmaceuticals and Other Crystalline Materials | 05-16-2019 |