Entries |
Document | Title | Date |
20080201094 | METHODS AND SYSTEMS FOR CERTIFYING PROVENANCE OF ALCOHOLIC BEVERAGES - A system for certifying provenance of an alcoholic beverage includes a radio-frequency identification tag and a server. The radio-frequency identification tag, associated with a bottle containing an alcoholic beverage, periodically measures a plurality of values of an environmental condition of the bottle. The radio-frequency identification tag stores the plurality of measured values. The server receives the plurality of measured values for analysis. The server provides, via a user interface, a description of a provenance of the alcoholic beverage, the description generated responsive to an analysis of the plurality of measured values. | 08-21-2008 |
20080208498 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND COMPUTER PROGRAM PRODUCT - An information processing apparatus processes information generated by an exposure apparatus. The information processing apparatus includes a collecting unit and a converting unit. The collecting unit collects first apparatus information obtained by the exposure apparatus via an operation thereof with respect to each of a plurality of first regions which form a first array defined on a substrate. The converting unit converts at least a part of the first apparatus information collected with respect to each of the plurality of first regions by the collecting unit into second apparatus information with respect to each of a plurality of second regions which form a second array. | 08-28-2008 |
20080208499 | Optical characteristics measurement method, exposure method and device manufacturing method, and inspection apparatus and measurement method - For a plurality of divided areas on a wafer that is exposed by generating measurement pattern images, a predetermined statistic that includes the deviation of the luminance value of each pixel included in imaging data obtained by the imaging with respect to a predetermined reference value is computed, for example, the variance is computed, and optical characteristics of a projection optical system are obtained based on a computation result of the computed statistic of each of the divided areas (steps | 08-28-2008 |
20080208500 | MODEL BASED DETECTION AND COMPENSATION OF GLITCHES IN COLOR MEASUREMENT SYSTEMS - A color sensor monitors the output of a color producing process and produces a signal representative of a color produced by the color producing process. The signal can be used as feedback signal to control the process. Occasionally, the color sensor signal includes a component representing a transient error. A system model of the color producing process is used to predict reasonable sensor signals. A comparison of the sensor signal with the predicted sensor signals is used to determine if the sensor signal is reasonable. If the sensor signal is unreasonable, a substitute signal is used as the feedback signal to the control process. The substitute signal can be a predicted sensor signal or a signal based on historical system performance data. | 08-28-2008 |
20080215273 | Authentication Method Secured By Chemical Marking Or Tracing Of An Object Or Substance - The invention concerns a method comprising an identification and an authentication phase including a theoretical identification of an object, a spectrophotometric analysis of the object, determining a marker used as standard, comparing data concerning said standard marker obtained during the spectrophotometric analysis with said specific data previously stored, calculating the correction to be brought to the analysis, detecting the presence, absence, intensity of the markers, determining the code authenticating the object and emitting a validation or alarm signal as the case may be. | 09-04-2008 |
20080215274 | Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication - Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM. | 09-04-2008 |
20080221816 | DATA VERIFICATION METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM WITH PROGRAM - A charged particle beam writing apparatus includes an input unit configured to input writing data for writing a plurality of cell patterns including at least one cell pattern in which an identifier is added to each of data defining the at least one cell pattern extending over at least two small regions in a plurality of small regions obtained by virtually dividing a writing region, an extraction unit configured to extract the at least one cell pattern to which the identifier is added from the plurality of cell patterns, an output unit configured to output an error result when only one cell pattern is extracted, and a writing unit configured to write the plurality of cell patterns by irradiating a target workpiece with a charged particle beam, based on the writing data for which the error result is not output. | 09-11-2008 |
20080228420 | Web Marking Systems and Methods - Apparatus for and a method of marking a web | 09-18-2008 |
20080234961 | TEST APPARATUS AND MEASUREMENT CIRCUIT - There is provided a test apparatus for testing a device under test. The test apparatus includes a gradient adjusting section that separately adjusts a gradient of a rising edge of a signal under measurement which is output from the device under test and a gradient of a falling edge of the signal under measurement, a sampling section that samples the signal under measurement whose edge gradients are adjusted by the gradient adjusting section, and a judging section that judges whether the device under test passes or fails the test based on a result of the sampling performed by the sampling section. | 09-25-2008 |
20080243411 | Method for monitoring the optical transmissibility through an observation window and device for cleaning an observation window - The invention relates to a method and a device for monitoring the optical transmissibility of an observation window ( | 10-02-2008 |
20080243412 | Apparatus for Inspecting Defect and Method of Inspecting Defect - In a defect inspection apparatus, a first lighting part applies polarized light to an inspection region on a substrate, reflected light reflected on the inspection region is received by a first spectrometer in a first light receiving part, and a phase difference spectrum representing a reflection property of the reflected light is transmitted to an inspection part of a control part. In the control part, an inspection wavelength and a threshold value determined based on theoretical calculation according to a type of defects to be detected are stored in a memory in advance, and a group of defects in a plurality of recessed portions formed in the inspection region are detected based on the threshold value and a phase difference in an inspection wavelength obtained from the phase difference spectrum. Thus, it is possible to detect a defect in a small recessed portion on the substrate with high accuracy. | 10-02-2008 |
20080249728 | METHOD FOR DETECTING DEFECTS ON THE BACK SIDE OF A SEMICONDUCTOR WAFER - The invention relates to a method for detecting defects on the back side of a semiconductor wafer. The brightness distribution of the color values is essentially a normal distribution. An average value and surroundings can be defined using the determined normal distribution, which are criteria for the occurrence of a defect. | 10-09-2008 |
20080262769 | USING MULTIVARIATE HEALTH METRICS TO DETERMINE MARKET SEGMENT AND TESTING REQUIREMENTS - A method includes receiving a first set of parameters associated with a particular die. A health metric for a particular die is determined using a multivariate analysis of the first set of parameters. The health metric incorporates at least one performance metric. At least one of a market segment designator or a testing plan associated with the particular die is determined based on the health metric. | 10-23-2008 |
20080262770 | INFORMATION RECORDING MEDIUM, AND PROCESS MANAGEMENT APPARATUS AND PROCESS MANAGEMENT SYSTEM USING THE INFORMATION RECORDING MEDIUM - Apparatuses and method capable of reliably tracking processes through which products have passed without calling for expensive setup are necessary in production and distribution processes of the products. A process management apparatus including a data transmission/reception unit to and from an RFID tag of an information recording medium and a data generation unit comprises a process data generation unit for representing a process, a process pass certificate data generation unit for generating process data pass certificate data and a transmission/reception unit for the process data with the information recording medium and the process pass certificate data can track the processes through which the object products have passed. | 10-23-2008 |
20080262771 | Statistic Analysis of Fault Detection and Classification in Semiconductor Manufacturing - A method of fault detection and classification in semiconductor manufacturing is provided. In the method, delicate variations of actual data of parameters for which normal values of a manufacturing condition change according to time are detected very precisely and sensitively, and accordingly major variation components for a step which has a high occurrence occupancy are acquired to achieve a very precise and effective fault detection and classification (FDC). In the method, continuous steps in a process are regarded as separate processes which are not related to each other and covariance and covariance inverse matrixes acquired for each step are set as references to decrease values of variance or covariance compared with those for a case where references are calculated based on total steps. Accordingly, Hotelling's T-square values for a small variation are increased, so that a delicate variation can be sensitively detected. | 10-23-2008 |
20080270057 | INCREASE PRODUCTIVITY AT WAFER TEST USING PROBE RETEST DATA ANALYSIS - Disclosed is a method and system for wafer/probe testing of integrated circuit devices after manufacture. The invention begins by testing an initial group of devices (e.g., integrated circuit chips) to produce an initial failing group of devices that failed the testing. The devices in the initial failing group are identified by type of failure. Then, the invention retests the devices in the initial failing group to identify a retested passing group of devices that passed the retesting. Next, the invention analyzes the devices in the retested passing group which allows the invention to produce statistics regarding the likelihood that a failing device that failed the initial testing will pass the retesting according to the type of failure. Then, the invention evaluates these statistics to determine which types of failures have retest passing rates above a predetermined threshold. From this, the invention produces a database comprising an optimized retest table listing the types of defects that are approved for retesting. | 10-30-2008 |
20090006018 | Quality management system - A quality management system is provided, having a first workstation including a first graphical user interface configured to display information regarding at least one process and a second workstation located remote from the first workstation and including a second graphical user interface configured to display information regarding the at least one process. The system may also include a computer-readable medium having stored thereon instructions for collecting and storing data from the at least one process. The computer-readable medium may also include instructions for displaying, on the first graphical user interface, information derived from the collected data in real-time with respect to the collection of the data. Further, computer-readable medium may include instructions for transferring the collected data, or the information derived from the collected data, to the second workstation and displaying, on the second graphical user interface, the information derived from the collected data. | 01-01-2009 |
20090006019 | Method and device for inspection of drugs concealed in liquid articles - Disclosed are a method and a device for inspection of drugs concealed in liquid articles without opening the outer packages. The method comprises the steps of: emitting radiation beams to transmit through the liquid article; receiving the radiation beams transmitted through the liquid article to get multi-angle projection data; inversely operating the multi-angle projection data based on the uniformity of the liquid article to obtain an attribute value of the inspected liquid article; retrieving a reference attribute value in a pre-created database by using the identification information of the liquid article as an index, and calculating a difference between the calculated attribute value and the reference attribute value; and determining whether the difference is larger than a predefined threshold value; wherein it is concluded that there are drugs concealed in the liquid article when the difference is determined to be larger than the predefined threshold value. | 01-01-2009 |
20090012729 | LIGHT RECEIVING APPARATUS, TESTING APPARATUS, LIGHT RECEIVING METHOD, TESTING METHOD, TEST MODULE AND SEMICONDUCTOR CHIP - An optical receiving apparatus that receives an optical signal and outputs a data value of digital data transmitted by the optical signal is provided, including a light receiving element that receives the optical signal and outputs a photocurrent according to a strength of the optical signal, a present cycle integrator that integrates the photocurrent corresponding to a present cycle of the digital data over a prescribed period within the cycle, a previous cycle integrator that integrates the photocurrent corresponding to a cycle prior to the present cycle over a period that is substantially equal to the prescribed period in the cycle, and a data value identifying circuit that outputs a data value of the present cycle of the digital data based on a difference between a charge amount obtained through integration by the present cycle integrator and a charge amount obtained through integration by the previous cycle integrator. | 01-08-2009 |
20090055116 | Method For Inspecting Appearance Of Pellet Type Medicines And System Employing Thereof - A method for inspecting appearance of pellet type medicines and a system employing thereof are provided, in which after the pellet type medicines are arranged into a row, they are sequentially slid down via an oriented sliding channel and then collected after dropping, wherein when the pellet type medicines move on the oriented sliding channel, an image processing device classifies the pellet type medicines according to records of detecting signals and gathered images, and controls the operation of a classification controlling device related to the appearance defective pellet type medicines, so as to depart the appearance defective pellet type medicines from the dropping pathway. | 02-26-2009 |
20090063075 | DETERMINING PROFILE PARAMETERS OF A STRUCTURE USING APPROXIMATION AND FINE DIFFRACTION MODELS IN OPTICAL METROLOGY - Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters and used to generate a library of difference diffraction signals. A measured diffraction signal adjusted by the simulated approximation diffraction signal is matched against the library to determine at least one profile parameter of the structure. | 03-05-2009 |
20090063076 | Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology - Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A measured diffraction signal adjusted by the simulated approximation diffraction signal is input into the trained machine learning system and generates the corresponding profile parameters. | 03-05-2009 |
20090063077 | AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED WITH APPROXIMATION AND FINE DIFFRACTION MODELS - Provided is a method of controlling a fabrication cluster using a machine learning system, the machine learning system trained developed using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signal is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A first machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A library of simulated fine diffraction signals and profile parameters is generated using the trained first machine learning system and using ranges and corresponding resolutions of the profile parameters. The library is used to train a second machine learning system. A measured diffraction signal is input into the trained second machine learning system to determine at least one profile parameter. The at least one profile parameter is used to adjust at least one process parameter or equipment setting of the fabrication cluster. | 03-05-2009 |
20090063078 | ENVIRONMENTAL SENSOR, PARTICLE COUNTING SYSTEM HAVING AN ENVIRONMENTAL SENSOR, AND METHODS OF OPERATING THE SAME - An environmental sensor including an inlet and an outlet such that a flow of fluid moves from the inlet to the outlet, a particle detection portion to detect particles in the fluid, and a controller connected to the particle detection portion. The environmental sensor can be in communication with a data acquisition system (e.g., via a wireless access point) to form a particle counting system. Also disclosed are methods of operating the environmental sensor and methods of operating the particle detection system. | 03-05-2009 |
20090119045 | METHOD OF INSPECTING PHOTOMASK DEFECT - A method of inspecting defect of a mask is provided. In this method, a database for storing a plurality of virtual simulation models is created. The virtual simulation models are determined by a plurality of factors including an optical effect and a chemical effect during the transferring the pattern of a mask to the photoresist layer on a wafer. A mask defect image is acquired. A simulation contour of the mask defect image is generated from at least one virtual simulation model in the database. Next, the acceptability of the mask is determined. | 05-07-2009 |
20090119046 | DATA LOGGER WITH PASS/FAIL ANALYSIS - A data logger analyzes temperature data associated with a product passing through a conveyor oven and provides a visual pass or fail indication indicating whether the product's temperature profile is within acceptable limits. Thus, an operator need not download captured temperature data to a computer in order to determine whether the oven settings produce a product profile that is within acceptable limits. In one embodiment, the data logger stores criteria for an acceptable product profile. The data logger then collects the temperature data and analyzes whether the temperature profile data is within the acceptable limits of the criteria. In another embodiment, a button and a pass/fail indicator are located on the exterior housing of the data logger. An operator depresses the button in order to request whether the product profile passed or failed the criteria for an acceptable product profile. In response to depressing the button, the pass/fail indicator provides visual indication of whether the current oven settings produce an acceptable product profile. | 05-07-2009 |
20090119047 | QUALITY ASSURANCE SYSTEM AND METHOD FOR POINT-OF-CARE TESTING - An improved quality assurance system and method for point-of-care testing are disclosed. The present invention provides quality assurance for laboratory quality tests performed by a blood analysis system or the like at the point of patient care without the need for running liquid-based quality control materials on the analysis system. Quality assurance of a quantitative physiological sample test system is performed without using a quality control sample by monitoring the thermal and temporal stress of a component used with the test system. Alert information is generated that indicates that the component has failed quality assurance when the thermal and temporal stress exceeds a predetermined thermal-temporal stress threshold. Alternatively, the present invention provides quality assurance for laboratory quality tests performed by a blood analysis system or the like at the point of patient care by minimizing the need for running liquid-based quality control materials on the analysis system. | 05-07-2009 |
20090157339 | ELECTRODE MATERIAL FOR LITHIUM SECONDARY BATTERY, ELECTRODE STRUCTURE AND LITHIUM SECONDARY BATTERY - An electrode material for a lithium secondary battery which includes particles each having a central portion and a surface portion covering the surface of the central portion. The central portion occupies 80 to 99% of a distance from a center to an outermost surface of the particle and the surface portion occupies 20 to 1% of the distance. The central portion includes LiM | 06-18-2009 |
20090171606 | SEMICONDUCTOR MANUFACTURE PERFORMANCE ANALYSIS - A software architecture, design and implementation that enables efficient transistor performance analysis across multiple levels of parameter granularity with interactive drill-down, drill-across capability, for use during semiconductor technology development. The software may include several features, such as highly modular, robust architecture to enable analysis across the multiple granularity of transistor performance data, i.e., per die, material group, and aggregate, GUI-based template configuration to specify the analysis across the multiple levels in a uniform set of operations, subsystems to execute the template specified with the GUI, integration of pass-fail analysis analytics, interactive drill-down on particular data points of user interest in automatically generated charts, and drill-across capability allowing linking of data points highlighted on a single chart to those that are correlated in all other charts. Other embodiments are described. | 07-02-2009 |
20090187364 | AUTHENTICATION OF PHARMACEUTICALS USING MOLECULAR COMPUTATIONAL IDENTIFICATION - A method, apparatus and computer program product for authenticating a pharmaceutical product is provided. The method includes receiving an identifier and a quantity for the pharmaceutical product and receiving a photonic signal from the pharmaceutical product, wherein the photonic signal includes a frequency and amplitude. The method can further include searching for the identifier and quantity that was received in a predefined list comprising identifier-quantity pairs, wherein a frequency and amplitude corresponds to each identifier-quantity pair. The method can further include matching the identifier and quantity that was received to a first identifier-quantity pair in the list. The method can further include storing a record indicating that the pharmaceutical product is counterfeit if the frequency and amplitude of the photonic signal does not match the frequency and amplitude corresponding to the first identifier-quantity pair. | 07-23-2009 |
20090198464 | System and method for assembly inspection - A method for assembly inspection is disclosed. The system may include obtaining a digital image of an assembled product, extracting images of one or more objects from the digital image of the assembled product, and recognizing each of the one or more objects as a component based on its extracted image and a library of standard components. The method may further include identifying one or more features of each recognized component, comparing each of the one or more identified features with a corresponding standard feature of the corresponding standard component, and determining an assembly fault if at least one of the one or more identified features does not match the corresponding standard feature. | 08-06-2009 |
20090248339 | DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA - Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to the one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. | 10-01-2009 |
20090248340 | APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA - Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. | 10-01-2009 |
20090248341 | PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA - Provided is system and method for controlling a fabrication cluster using at least one parameter of a structure measured with an optical metrology system designed and configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for standalone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a signal measured using the optical metrology system is transmitted to a fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster. | 10-01-2009 |
20090248342 | METHOD AND SYSTEM FOR MONITORING CHANGES IN A SAMPLE FOR A PROCESS OR AN ENVIRONMENT - Systems and methods for monitoring a sample or a sample flow associated with a process or an environment. The systems and methods detect one or more chemical or biological agents present in a sample or for detecting changes in the chemical/biological composition of a sample flow. The systems and methods transmit light at the sample, receive a resulting spectral response, perform a spectral analysis, and display a result or choose a course of action. The analysis compares the sample's response to known spectrums to determine composition or to determine if the composition of the sample flow has deviated from “normal”. In one embodiment, the systems and methods uses deep ultraviolet light to produce both a Raman and a fluorescence response, separated in frequency, which are simultaneously discerned and analyzed. In this embodiment the analysis is used to determine sample composition. In other embodiments, the analysis is used to discern or warn of changes, or to choose a course of action. | 10-01-2009 |
20090248343 | APPARATUS, METHOD AND PROGRAM FOR DESIGN VALIDITY VERIFICATION OF ELECTRONIC CIRCUIT BOARD WITH REGARD TO POWER SUPPLY NOISE SUPPRESSION - Disclosed is a method for design validity verification of an electronic circuit board with regard to power supply noise, wherein with regard to an i-th LSI (i=1 to n) on the electronic circuit board, an input voltage Vin[i] to the LSI from the printed circuit board is given by Vin[i]=VDD−Zlsi[i]×VDD/(Zlsi[i]+Zl1[i]),where Zlsi[i] is an input impedance characteristic and Zl1[i] is a reflected impedance characteristic viewed from a position at which the i-th LSI is mounted, being a characteristic with the i-th LSI omitted from the whole of the electronic circuit board and a judgment is made as to whether or not a reflected voltage Vr[i]=Vin[i]×(Zlsi[i]+Zl1[i])/(Zlsi[i]−Zl1[i]) satisfies |Vr[i]|≦ΔV (power supply variation tolerance range). | 10-01-2009 |
20090265127 | PREFERENTIAL DEFECT MARKING ON A WEB - A system for preferentially marking defects on a web is described. The system includes a web of material to be converted into individual sheets of a plurality of different grade levels, a database storing anomaly data of anomalies on the web, wherein an anomaly is a potential defect in at least one of the plurality of different grade levels, a marker that associates a unique mark with at least one of the grade levels, and a controller to retrieve the anomaly data from the database and to signal the marker as to where to make a mark, wherein the marker applies the mark associated with at least one of the grade levels for which the anomaly may cause a defect. The system may provide advantages, such as that a converter of various products from a single web roll may determine which regions of the web satisfy each grade level. | 10-22-2009 |
20090276175 | AUTOMATIC SELECTIVE RETEST FOR MULTI-SITE TESTERS - A method of multi-site testing a batch of semiconductor units using a multi-site automated tester ( | 11-05-2009 |
20090281754 | METHOD AND APPARATUS FOR TESTING A SUBSTRATE FOR DISPLAY DEVICE - Disclosed is a test method an apparatus in which an area for test and an area for analysis are specified based on the design information of the display device having a non-rectangular display area. To carry out testing, parasitic capacitances are found using the design information, and operations for weighting are performed on test data or threshold values based on which a decision on pass/fail is to be made (FIG. | 11-12-2009 |
20090287439 | Out-Of-Round Container Detection System And Method - An improved system and method for automatically inspecting the quality of newly-manufactured containers is disclosed that detects containers that are out-of-round by more than a predetermined amount so that they may be rejected to ensure that containers that are passed are of acceptable quality. One or more ultrasonic sensors are located at fixed positions with reference to a container that is rotated. If any sensor detects that the distance between the sensor and the container falls outside of an acceptable range, the container is rejected. | 11-19-2009 |
20090287440 | SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER AND GENERATING INSPECTION RESULTS FOR THE WAFER - Systems and methods for detecting defects on a wafer and generating inspection results for the wafer are provided. One method includes detecting defects on a wafer by comparing output generated by scanning of the wafer performed by an inspection system to one or more defect detection thresholds. The method also includes sampling outliers in the output by selecting the output having the highest values from bins defined based on one or more predetermined criteria. In addition, the method includes selecting a portion of the sampled outliers based on wafer-level analysis of the sampled outliers. The method further includes generating inspection results for the wafer by combining information about the selected portion of the sampled outliers with information about the defects detected using the one or more defect detection thresholds. | 11-19-2009 |
20090306921 | SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS - The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion. | 12-10-2009 |
20090312972 | METHOD AND SYSTEM OF TESTING DEVICE SENSITIVITY - Method and system that test device sensitivity according to whether the device passes or fails when subjected to a test signal. The device may be repeatedly subjected to test signal at varying operating parameters in order to assess pass-fail threshold at which the device transitions from operating properly/improperly to operating improperly/properly. | 12-17-2009 |
20090319214 | OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS - Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet two or more design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set two or more design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. | 12-24-2009 |
20100082278 | APPARATUS AND METHOD FOR EVALUATING THE PERFORMANCE OF SYSTEMS HAVING TIME-VARYING OUTPUT CHARACTERISTICS - An apparatus for evaluating a system. The apparatus can include a storage element for receiving at least one time-varying output characteristic of the system, the time-varying output characteristic comprising a plurality of raw data points representing a plurality of measurements at a plurality of times; and a processing element communicatively coupled to the storage element. The processing element can be configured for partitioning the plurality of raw data points into a plurality of segments, calculating a plurality of estimated data points based on a plurality of mathematical expressions, and characterizing the system based on at least one figure of merit (FOM) computed from the plurality of estimated data points. In the apparatus, at least one of the plurality of mathematical expressions is associated with each of the plurality of segments. | 04-01-2010 |
20100114514 | DETECTING CHEMICAL AND BIOLOGICAL IMPURITIES BY NANO-STRUCTURE BASED SPECTRAL SENSING - A method is disclosed for providing quality assurance in an industrial process. The method includes obtaining a manufacturing material from the industrial process, allowing the manufacturing material to contact with a nano-scale surface, which allows the harmful substance to adsorb to the nano-scale surface. The method also includes obtaining a Raman spectrum from the manufacturing material and the nano-scale surface using a spectrometer, searching for, using a spectral analyzer, a spectral signature of a harmful substance in a predetermined spectral region in the Raman spectrum to determine the existence of the harmful substance in the manufacturing material, determining the concentration of the manufacturing material if the spectral signature is found in the Raman spectrum, and rejecting the manufacturing material from the industrial process if the concentration of the manufacturing material is determined to be above a predetermined tolerance level. | 05-06-2010 |
20100153046 | Devices and Methods for Improving LCD Device Testing - Devices and methods are disclosed which relate to an LCD device responding to an AT command which solely activates the backlight of the LCD device. An LCD device is programmed to respond to two distinct backlight AT commands. One command turns the backlight on, and another command turns the backlight off. These backlight AT commands are programmed into LCD device testing equipment so that accurate photographs are taken of the LCD device, and results are improved. The backlight AT commands are also used as part of the programming for user-end applications. | 06-17-2010 |
20100161264 | SEMICONDUCTOR TEST APPARATUS AND TEST METHOD - In a semiconductor test apparatus, a voltage source generates a power supply voltage to be supplied to a DUT. A decision processor makes the DUT execute a predetermined test sequence. A noise generator superimposes a periodic pulse-like noise voltage on the power supply voltage to be supplied to the DUT, while the test sequence is being executed. The noise generator superimposes a noise voltage synchronized with a clock signal to be supplied to the DUT. | 06-24-2010 |
20100198541 | MANAGEMENT APPARATUS, MANAGEMENT SYSTEM, MANAGEMENT METHOD AND COMPUTER-READABLE MEDIUM - A management apparatus includes: a managing unit that manages production information corresponding to each of a plurality of information processing devices; a specifying unit that specifies, based on a defect notice for at least one component and the production information on the managed information processing devices, at least one of the information processing devices using the component; a state judging unit that judges whether each information processing device is in an operable state where a processing function of each information processing device is operable in an environment in which the processing function of each information proceeding device is provided; and a operation restricting unit that performs operation restriction for the processing function of each information proceeding device according to the defect notice if the state judging unit judges that each information processing device is in the operable state. | 08-05-2010 |
20100204940 | METHOD AND SYSTEM OF COMMONALITY ANALYSIS FOR LOTS WITH SCRAPPED WAFER - According to an embodiment of the present invention is to provide methods to evaluate the impact of scrapped wafers on the remaining wafers in a lot by using scrap codes and statistical models. An embodiment of the present invention provides a method to obtain a baseline lot population by using cluster analysis model and functional limited yields. The functional limited yields may be for example chain limited yield, dc limited yield, or ac abist limited yield. By utilizing statistical modeling it is possible to determine which failures have an impact on the lot yield and require rework for the lot. In addition by monitoring the impact of failures, it is possible to determine if corrective actions need to be taken for lots that passed through a process prior to correction of the fault. | 08-12-2010 |
20100228511 | Method for managing metamerism of color merchandise - The present invention relates to a method for minimizing the effects of metamerism between a set of color standards (e.g., nitrocellulose lacquers) and inkjet printed color merchandise (e.g., paint chips) under a plurality of illuminants, including a balanced illuminant that emulates lighting conditions between cool (6500 K) and warm (2856 K) color temperatures. For each color standard, one selects an ink combination that best produces color merchandise having a minimal degree of metamerism. Innovatively, a combination of instrumental and visual tests is used to evaluate color difference for a set of color standards-color merchandise pairs under a plurality of illuminants. If a color standard-color merchandise pair fails either test then the ink combination may be adjusted. | 09-09-2010 |
20100235125 | ELECTRIC DEVICE AND DIAGNOSTIC APPARATUS - An electric device includes a plurality of circuits that operate in synchronization with a clock signal, a plurality of flip-flops each of which acquires a data value of a signal from a corresponding one of the plurality of circuits in synchronization with the clock signal and stores the acquired data value therein until receiving a next clock signal, where each flip-flop enters into a clock-disabled state, when receiving a signal at a disable terminal thereof, in which the acquired data value continues to be stored in the flip-flop, a timing controller that outputs a hold signal to the disable terminal of each flip-flop at a timing at which a corresponding circuit is desired to be diagnosed, and a plurality of diagnosis lines that are respectively provided in correspondence with the plurality of flip-flops, each diagnosis line outputting as diagnosis data a data value stored in a corresponding flip-flop. | 09-16-2010 |
20100250172 | SYSTEM AND METHOD FOR IMPLEMENTING WAFER ACCEPTANCE TEST ("WAT") ADVANCED PROCESS CONTROL ("APC") WITH ROUTING MODEL - System and method for implementing wafer acceptance test (“WAT”) advanced process control (“APC”) are described. In one embodiment, the method comprises performing an inter-metal (“IM”) WAT on a plurality of processed wafer lots; selecting a subset of the plurality of wafer lots using a lot sampling process; and selecting a sample wafer group using the wafer lot subset, wherein IM WAT is performed on wafers of the sample wafer group to obtain IM WAT data therefore. The method further comprises estimating final WAT data for all wafers in the processed wafer lots from IM WAT data obtained for the sample wafer group and providing the estimated final WAT data to a WAT APC process for controlling processes. | 09-30-2010 |
20100250173 | METHOD AND DEVICE FOR EVALUATING GRADUATED REFRACTION POWER LENS AND METHOD FOR MANUFACTURING GRADUATED REFRACTION POWER LENS - The present invention is to provide a method for easily evaluating whether or not a relative positional shift generated between both surfaces of a bi-aspherical type lens is within an allowance during the manufacturing process of the bi-aspherical type lens. According to the evaluation method of the progressive-addition lens of the present invention, first, powers of the progressive-addition lens at a plurality of are measured to obtain an actually measured power distribution. Next, a comparison power distribution created based on the actually measured power distribution and a defective power distribution prepared in advance are compared with each other to perform similarity search between the both. Thereafter, whether or not the comparison power distribution and the similar to each other is determined based on the result of the similarity search step, and if it is determined that the comparison power distribution and the defective power distribution are similar to each other, then the progressive-addition lens is evaluated as defective. | 09-30-2010 |
20100268502 | DOWNWARD PROPAGATION OF RESULTS FOR TEST CASES IN APPLICATION TESTING - A test case for the application under test is determined for the quality assurance application where results for a test case can be received from a user. An interface is displayed to allow the user to enter a pass or fail indication for a manual test that has been performed for the test case. If a pass indication is received for the test case, the test case is marked as passed. Also, in response to receiving the pass indication for the test case, a plurality of steps for the test case are automatically marked as passed. If a fail indication is received for the test case, a request for the user to identify a step that failed the manual test is output. When the response indicating which step failed is received, that step is marked as failed. | 10-21-2010 |
20110015887 | METHOD FOR MANUFACTURING AND TESTING THE FUNCTIONALITY IN MANUFACTURING - A method is proposed for manufacturing and testing of complex products, in particular motor vehicles in series production, wherein all the data for the individual manufacturing stations in the manufacturing line is stored in a central computer. In this case, different models are manufactured on the manufacturing line, such that the correspondingly configured data is provided at each manufacturing and test station for this model, after identification of the model. A technical test is carried out in conjunction with the manufacturing installation by monitoring the vehicle functions or else the equipment for their function. An attributive test is carried out by the worker at the manufacturing stations, with all the recorded test data being supplied to the central computer for central evaluation, and with the data being stored on the basis of individual categories in the central computer, such that it is possible to evaluate the manufacturing process with respect to the individual manufacturing steps. | 01-20-2011 |
20110040510 | FILM THICKNESS MEASUREMENT APPARATUS - A film thickness measurement apparatus may include a spectrum acquisition unit that irradiates a light onto a film and acquires a spectrum of a reflection light or a transmission light, a power spectrum calculating unit that calculates a power spectrum, a film thickness calculating unit that detects a peak position of the power spectrum and calculates a thickness of the film, a measurement quality calculating unit that calculates a measurement quality of the thickness, a measurement quality determining unit that determines whether the thickness is valid or invalid, and a film thickness output unit that outputs the thickness if the measurement quality determining unit determines that the thickness is valid. | 02-17-2011 |
20110071782 | SEMICONDUCTOR OUTLIER IDENTIFICATION USING SERIALLY-COMBINED DATA TRANSFORM PROCESSING METHODOLOGIES - A method for identifying outlier semiconductor devices from a plurality of semiconductor devices includes performing at least one electrical test to obtain electrical test data including at least one test parameter, applying at least a first data transform processing methodology to the electrical test data to generate processed test data, and applying a second data transform processing methodology that is different from the first data transform processing methodology to process the processed test data. The second data transform processing methodology applies an outlier test limit to identify non-outlier devices that comprise semiconductor devices from the semiconductor devices that conform to the outlier test limit and outlier devices that do not conform to the outlier test limit. The semiconductor devices are dispositioned using the outlier identification results. At least one of the data transform processing methodologies can include statistics. | 03-24-2011 |
20110093226 | FAULT DETECTION AND CLASSIFICATION METHOD FOR WAFER ACCEPTANCE TEST PARAMETERS - A fault detection and classification (FDC) method for wafer acceptance test (WAT) parameters includes the following steps. A plurality of fault detection and classification parameters is collected. A plurality of wafer acceptance test parameters that are corresponded by the fault detection and classification parameters is collected. The fault detection and classification parameters are grouped. A contingency table of the wafer acceptance test parameters corresponding to the fault detection and classification parameters is built. A probability model of the contingency table is built. Finally, a safety range of the probability model is determined. | 04-21-2011 |
20110119010 | METHOD OF DETERMINING CHARACTERISTICS OF DEVICE UNDER TEST, PROGRAM, AND STORAGE MEDIUM STORING PROGRAM - A method of determining characteristics of a DUT, in which test results indicating at least a pass/fail state of the DUT are used on a matrix in which plots defined by a combination of a first test parameter and a second test parameter for testing the DUT are arranged two-dimensionally, includes the steps of: (a) specifying at least one plot pair constituted by adjacent plots but indicating different test results on the matrix; (b) specifying test results of a plot pair constituted by adjacent plots and located next to both plots of the plot pair specified in the step (a); (c) selecting a plot pair constituted by adjacent plots but indicating different test results in a region including the plot pair specified in the step (a) and the step (b); and (d) specifying test results of a plot pair constituted by adjacent plots and located next to both plots of the plot pair selected in the step (c). | 05-19-2011 |
20110184682 | TERMINAL INSERTION DEFECT DETERMINING METHOD - A terminal insertion defect determining method includes a step of determining the defect state by judging whether the preset condition is satisfied or not in an insulation-displacement period where an insulation-displacement part is insulation-displaced to a wire, a step of determining the defect state by judging whether the preset condition is satisfied or not in an intermediate period between the insulation-displacement period and a press-fitting period where a press-fitting part is press-fitted to a press-fitted part, and a step of determining the defect state by judging whether the preset condition is satisfied or not in the press-fitting period. | 07-28-2011 |
20110191049 | SYSTEM AND METHOD FOR VERIFYING MANUFACTURING ACCURACY - In a method for verifying manufacturing accuracy, a point cloud of a workpiece is read. A first determined point is determined according to the first point of the point cloud and a second determined point is determined according to the final point of the point cloud. A first line, a second line, and a third line are all located by respectively connecting the first point and the first determined point, the final point and the second determined point, and the first determined point and the second determined point. Qualification of the workpiece is determined by measuring a first angle of the first line and the third line, a second angle of the second line and the third line, a first distance between the first determined point and the second line, and a second distance between the second determined point and the first line. | 08-04-2011 |
20110191050 | METHOD OF INSPECTING A THREE DIMENSIONAL SHAPE - In order to inspect a three dimensional shape, a predetermined inspection target component formed on a board is selected as the measurement target, a shape of the inspection target component is acquired, a reference point of the inspection target component is detected, relative location information of a polarity mark formed on the inspection target component with respect to the reference point is acquired, and it is judged whether the inspection target component is good or bad by checking whether the polarity mark exists or not by using the relative location information with respect to the reference point. Thus, the location of the polarity mark may be accurately known, and polarity inspection may be more easily and accurately performed. | 08-04-2011 |
20110202297 | PRODUCT SORTING METHOD BASED ON QUANTITATIVE EVALUATION OF POTENTIAL FAILURE - Provided is a product sorting method based on the quantitative evaluation of a potential failure. The product sorting method manufactures a plurality of independent products with a manufacture device. The product sorting method obtains test records for the respective products by testing the products with a test device. The product sorting method determines whether the products are good products or fail products by analyzing the test records with a failure determination device. The product sorting method calculates a quality index which defines the possibility of potential failure of a population comprising the tested products as one value, by analyzing the test records with a quality index calculation device. The product sorting method determines whether to perform a subsequent operation for products which are determined as the good products by analyzing the quality index with a product sorting device. | 08-18-2011 |
20110218752 | TEST APPARATUS AND MANUFACTURING METHOD - Provided is a test apparatus that tests a plurality of devices under test formed on a wafer under test. The test apparatus comprises a test substrate that faces the wafer under test and is electrically connected to the devices under test; a programmable device that is provided on the test substrate and changes a logic relationship of output logic data with respect to input logic data, according to program data supplied thereto; a plurality of input/output circuits that are provided on the test substrate to correspond to the devices under test and that each supply the corresponding device under test with a test signal corresponding to the output logic data of the programmable device; and a judging section that judges pass/fail of each device under test, based on operation results of each device under test according to the test signal. | 09-08-2011 |
20110224934 | EVALUATING APPARATUS, EVALUATING METHOD, AND COMPUTER PROGRAM PRODUCT - According to one embodiment, an evaluating apparatus includes a resist-pattern-data acquiring unit and an evaluating unit. The resist-pattern-data acquiring unit acquires resist pattern data having a plurality of feature values including at least two among a hole diameter measured concerning a pattern for hole formation in the resist pattern, an aspect ratio of the hole diameter, and a difference of hole diameters at a plurality of signal thresholds. The evaluating unit calculates an evaluation value using an evaluation function for evaluating whether a hole pattern formed on a processing target by using the pattern for hole formation is unopened and the resist pattern data and evaluates presence or absence of a risk that the hole pattern is unopened. | 09-15-2011 |
20110231130 | TESTING APPARATUS AND METHOD FOR TESTING LIGHT EMITTING DIODE LAMP - Disclosed is an apparatus for testing an LED lamp which includes: a secured seat on which the LED lamp is seated; an up and down shifter which, when the LED lamp is seated on the secured seat, shifts from an initial position spaced upward from the LED lamp to a measurement position in which the up and down shifter contacts with a socket of the LED lamp, and which supplies electric power to the LED lamp when the up and down shifter is placed in the measurement position, and a sensor sensing that the up and down shifter is placed in the measurement position; and a quality determining means determining a quality of the LED lamp based on light emitted from the LED lamp, and comprising an illuminometer or a luminance meter. | 09-22-2011 |
20110251812 | SYSTEM AND METHODS FOR PARAMETRIC TESTING - Methods, systems, computer program products and program storage devices for determining whether or not to perform an action based at least partly on an estimated maximum test range. One of the methods comprises: attaining results generated from a parametric test performed on semiconductor devices included in a control set comprising a subset of a population of semiconductor devices; selecting from among the semiconductor devices at least one extreme subset including at least one of a high-scoring subset including all devices whose results exceed a high cut-off point and a low-scoring subset including all devices whose results fall below a low cut-off point; plotting at least results of the at least one extreme subset as a normal probability plot located between a zero probability axis and a one probability axis; fitting a plurality of curves to a plurality of subsets of the results of the at least one extreme subset respectively; extending each of the plurality of curves to the zero probability axis for the low-scoring subset or to the one probability axis for the high scoring subset thereby to define a corresponding plurality of intersection points along the zero or one probability axis; defining an estimated maximum test range based on at least one of the intersection points; and determining whether or not to perform an action based at least partly on the estimated maximum test range. | 10-13-2011 |
20110270561 | SELF-CALIBRATING TEST SYSTEM - A test system may include multiple test stations. Electronic devices may be tested using the test system. Each test station may include a test unit such as a radio-frequency tester that can make wireless and wired radio-frequency signal measurements on devices under test. The test stations may be configured to perform pass-fail testing on devices under test during manufacturing. One or more selected devices under test that have passed the pass-fail tests may be retested using the test stations. Multiple tests may be performed at a given test station using the same selected device under test. Gathered test data may be analyzed to determine whether the test stations have sufficient accuracy and precision or need to be recalibrated or taken offline. | 11-03-2011 |
20120059614 | APPARATUS, METHOD AND PROGRAM FOR DESIGN VALIDITY VERIFICATION OF ELECTRONIC CIRCUIT BOARD WITH REGARD TO POWER SUPPLY NOISE SUPPRESSION - Disclosed is a method for design validity verification of an electronic circuit board with regard to power supply noise, wherein with regard to an i-th LSI (i=1 to n) on the electronic circuit board, an input voltage Vin[i] to the LSI from the printed circuit board is given by Vin[i]=VDD−Z | 03-08-2012 |
20120059615 | AUTOMATIC TEST METHOD FOR AN INSPECTION DEVICE - The invention relates to a test method for examining an inspection device, which is associated with a functional unit of a master unit, comprising at least the following steps: producing a specified number of faulty and/or correct containers or test containers by means of the functional unit itself in that a control signal for producing a distinctive element is fed to the functional unit; leading the faulty containers or test containers past the inspection device, which detects the faulty containers or test containers and produces a signal to discharge the faulty containers or test containers, or indicates a value regarding the expected and the measured faulty and/or correct containers. The test method is automatically started or performed and is suitable, for example, for examining a label position checking device, the filling amount checking unit, and the closure seating checking unit in order to be able to determine the fault-free functioning thereof or optionally the faulty functioning thereof. The test method is characterized in that operation is not required. The test method is characterized in that the test method allows clear and documented rules for the procedure and the test results, which ensure quality control in terms of product liability. | 03-08-2012 |
20120072154 | METHOD, APPARATUS, AND ARTICLE TO FACILITATE EVALUATION OF OBJECTS USING ELECTROMAGNETIC ENERGY - Spectral information may be employed in process control and/or quality control of goods and articles. Spectral information may be employed in process control and/or quality control of media, for example financial instruments, identity documents, legal documents, medical documents, financial transaction cards, and/or other media, fluids for example lubricants, fuels, coolants, or other materials that flow, and in machinery, for example vehicles, motors, generators, compressors, presses, drills and/or supply systems. Spectral information may be employed in identifying biological tissue and/or facilitating diagnosis based on biological tissue. | 03-22-2012 |
20120109561 | WAFER TEST APPARATUS, WAFER TEST METHOD, AND PROGRAM - A wafer test apparatus, comprises: a storage unit that stores a first test program including a plurality of first operation test programs and a second test program including a plurality of second operation test programs; and a calculation unit that executes the first test program on at least one of wafers in a lot and outputs accumulated information about a defective memory cell(s) included in the wafer to the outside thereof when each operation test of the plurality of first operation tests is completed, and executes the second test program on remaining wafers in the lot and outputs accumulated information about a defective memory cell(s) included in the wafer to the outside thereof when all the operation tests in the plurality of second operation tests are completed. | 05-03-2012 |
20120253722 | ELECTRONIC DEVICE AND METHOD FOR MEASUREMENT OF FLATNESS OF OBJECTS USING THE ELECTRONIC DEVICE - In a method for measurement of flatness of objects on a measuring machine, at least two objects are fixed on a worktable of the measuring machine. The method establishes a first coordinate system for the worktable location, sets two groups of horizontal scanning points for each object, and sets two groups of vertical scanning points for each object. By controlling at least two laser heads of the measuring machine, the objects are measured and coordinate values for each of the points scanned are obtained. The method calibrates a first coordinate system and establishes a second coordinate system based on the first coordinate system. In the second coordinate system, the at least two laser heads measure the objects and obtain data, and an indication of the flatness of each object is calculated and displayed on a display device. | 10-04-2012 |
20120265467 | SYSTEM FOR TESTING ILLUMINATING ELEMENTS AND METHOD FOR TESTING ILLUMINATING ELEMENTS - The present invention discloses a system for testing illuminating elements and a method for testing illuminating elements, wherein the method includes the following steps. Firstly, an illuminating element and an unilluminated area on a circuit board are covered respectively. A reference voltage is obtained according to a brightness of the unilluminated area and a testing voltage is obtained according to a brightness of the illuminating element being driven. Afterwards, whether the illuminating element passes a testing process or not is judged from the reference voltage and the testing voltage. | 10-18-2012 |
20120271581 | PROCESS MONITORING FOR HIGH-SPEED JOINING - A process monitoring method for a joining operation of a joining element at a speed of at least 5 m/s, in particular placing a bolt at least 10 m/s into at least one component with the aid of a placing device which has the following features: A plunger for placing the joining element, a buffer which limits a maximum deflection of the plunger in the joining direction, and a distance measurement with which the deflection of the plunger can be detected, wherein the process monitoring comprises the following steps: Detecting the travel of the plunger during the joining operation as a function of time in the form of a distance-time curve, detecting a placement of the plunger on the buffer, evaluating the distance-time curve such that, in the presence of at least one maximum followed by at least one minimum in the distance-time curve and without the plunger contacting the buffer, a joint connection is judged to be OK. | 10-25-2012 |
20120310575 | Inspection Method for Pixel Array and Inspection Apparatus Thereof - The present invention provides an inspection method for a pixel array and an inspection apparatus thereof. The inspection method firstly charges a sample pixel area containing a flawed pixel unit and normal pixel units with different testing voltages, then creates a lookup table of brightness threshold value according to the brightness values of the pixel units under those testing voltages ; and then charges a pixel area under test when inspecting the pixel area under test, selects a suitable brightness threshold value from the lookup table according to the current voltage value and the brightness value thereof, and then determines if pixel units of the pixel area under test have any defect according to the brightness threshold value. Therefore, the present invention reduces defect-identifying error and enhances inspection accuracy. | 12-06-2012 |
20120316818 | SYSTEM FOR MONITORING MULTI-ORDERABLE MEASUREMENT DATA - A computer-based measurement monitoring system and method for monitoring multi-stage processes capable of producing multi-orderable data and identifying, at any stage in the monitored process, unacceptable deviations from an expected value at particular stages of the process, and communicating same detected deviation to facilitate corrective action in the process. The system and method consolidate data obtained at various stages of the process, arrange the measurement data in a multi-orderable data framework, compare the multi-orderable framework data with expected parameter values corresponding to the various stages, and detects-unacceptable deviations from the expected values. The unacceptable deviations are communicated to responsible personnel, and the system and method provides same personnel with supplemental information useful in diagnosing the root cause of the problem leading to the detected deviations. | 12-13-2012 |
20130006565 | METHOD AND APPARATUS FOR DETERMINING ACCEPTANCE/REJECTION OF FINE DIAMETER WIRE BONDING - Disclosed are a method and apparatus for determining acceptance/rejection of fine diameter wire bonding of semiconductor devices, LED devices, and the like, which has been impossible with conventional methods, such as the method by image processing, with high accuracy and with no contact. The apparatus includes a heating laser device | 01-03-2013 |
20130013240 | SEMICONDUCTOR MANUFACTURING SYSTEM - A semiconductor manufacturing system includes a program for inspecting a device of the system executing: displaying a screen for selecting an inspection set including inspection items having a manipulation item and/or a check item; retrieving the inspection items, arranging the inspection items in the order of workflow, and displaying each inspection item on a screen with an execution attribute indicating whether each inspection item is “automatic” or “manual” execution; receiving an inspection start command and reading the first inspection item from a storage unit. The program also executes steps corresponding to the following cases (a) to (d) until there are no more inspection items: (a) the read-out inspection item being the manipulation item and “automatic”; (b) the read-out inspection item being the manipulation item and “manual”; (c) the read-out inspection item being the check item and “automatic”; and (d) the read-out inspection item being the check item and “manual”. | 01-10-2013 |
20130054170 | TEST SYSTEMS WITH NETWORK-BASED TEST STATION CONFIGURATION - A test system for testing a device under test (DUT) is provided. The test system may include multiple test stations that are coupled to a network server. A master test station configuration file associated with each of the test stations may be stored on the network server. Each of the test stations may intermittently obtain updated test station configuration information from the network server to synchronize testing. A test station may be configured to check whether the DUT has successfully passed testing at preceding test stations. The test station may be given permission to write its test results into storage circuitry in the DUT. If test results are satisfactory, the DUT may be tested using a subsequent test station. If test results do not satisfy design criteria, the DUT may be sent to a corresponding repair station for rework. | 02-28-2013 |
20130103336 | MULTI-MODAL DATA ANALYSIS FOR DEFECT IDENTIFICATION - A technique for identifying a defect in an object produced by a controllable process is disclosed. A first type of data generated as a result of production of the object by the controllable process is obtained. A second type of data generated as a result of production of the object by the controllable process is obtained. The first type of data and the second type of data are jointly analyzed. A defect is identified in the object based on the joint analysis of the first type of data and the second type of data. | 04-25-2013 |
20130158925 | COMPUTING DEVICE AND METHOD FOR CHECKING DIFFERENTIAL PAIR - A computer-based method and a computing device for checking differential pairs of a printed circuit board layout are provided. The computing device determines the via pitch between switching vias of a differential pair according to the coordinates of the centers of the switching vias, determines the via gap between the switching vias of adjacent two differential pairs according to the radius and the coordinates of the centers of the switching vias, and determines that the switching vias does not satisfy design standards if the via pitch does not fall in an input via pitch range, or the via gap does not fall in an input via gap range. | 06-20-2013 |
20130197842 | STREAMLINED PARTS APPROVAL PROCESS - A method for streamlining a production parts approval process is disclosed. The method includes receiving a master file. The master file includes nominals and tolerances of a production part for a plurality of dimensions of the production part. The method further includes receiving a measurement results file containing results of measurements taken on the production part. The method also includes creating a verification report. The verification report includes a summary of a comparison of the measurement results file with the master file. | 08-01-2013 |
20130204563 | PRINTING INSPECTION APPARATUS, PRINTING INSPECTION SYSTEM, STATISTICAL METHOD FOR INSPECTION DATA, PROGRAM, AND SUBSTRATE MANUFACTURING METHOD - A printing inspection apparatus includes a measurement unit and a controller. The measurement unit is configured to measure solder that is printed on a substrate with a squeegee of a screen printing apparatus, the screen printing apparatus including a plurality of squeegees that slide on a screen in different slide directions to print solder on different substrates. The controller is configured to determine a slide direction of the squeegee that prints the solder based on measured data of the solder, the measured data being obtained by the measurement unit, and execute statistical processing of inspection data of the solder based on the measured data of the solder for each of the slide directions of the squeegees. | 08-08-2013 |
20130245978 | SYSTEMS AND METHODS OF CONTROLLING SEMICONDUCTOR WAFER FABRICATION PROCESSES - A system and method of controlling a semiconductor wafer fabrication process. The method includes positioning a semiconductor wafer on a wafer support assembly in a wafer processing module. A signal is transmitted from a signal emitter positioned at a predetermined transmission angle relative to an axis normal to the wafer support assembly to check leveling of the wafer in the module, so that the signal is reflected from the wafer. The embodiment includes monitoring for the reflected signal at a predetermined reflectance angle relative to the axis normal to the wafer support assembly at a signal receiver. A warning indication is generated if the reflected signal is not received at the signal receiver. | 09-19-2013 |
20130262007 | METHOD AND SYSTEM TO COMPUTE EFFICIENCY OF AN AUTOMATION INFRASTRUCTURE OF A PLANT - The method and systems of the embodiments proposes to calculate Effectiveness of the Automation infrastructure of the plant by monitoring the control loop information using 3 primary data perspectives like availability, conformity and efficiency, by acquiring all data from the Distributed Control Systems (DCS)/Process Control Systems (PCS). | 10-03-2013 |
20130297245 | FULL-AUTOMATIC DETECTING SYSTEM AND METHOD FOR TRANSFORMER - A full-automatic detecting system and method for a transformer. The system comprises a material delivery line; a feed device; a detection delivery line; insulating test devices; error detecting devices; a laser marking device; a discharge device; and a detection management system. The insulating test devices, the error detecting devices, and the laser marking device are sequentially arranged beside the detection delivery line. The material delivery line, the detection delivery line, and the devices work in coordination, to realize full-automatic detection of the transformer, avoid manual detection errors and improve the sorting accuracy. | 11-07-2013 |
20140012527 | DIAGNOSTIC METHOD FOR DETERMINING WHETHER MACHINE ELEMENT IS REUSABLE - The present invention makes it possible to determine whether a mechanical component can be reused, without consulting a specialist, by: attaching to the mechanical component an IC tag that records identification information that includes at least one among the type, manufacturing time, manufacturing lot, and manufacturing history of the mechanical component, and that enables the identification information to be externally read by an electromagnetic method; recording, in the memory unit of an inspection device that can read the IC tag, inspection items corresponding to the identification information and the evaluation criteria of the inspection items; displaying an inspection item corresponding to the mechanical component on a display unit; obtaining result information from an input unit; and comparing the result information to the evaluation criteria and displaying, on the display unit, whether the part can be reused. | 01-09-2014 |
20140095097 | SYSTEM AND METHOD FOR DETERMINING LINE EDGE ROUGHNESS - A method and system for determining line edge roughness is disclosed. The method involves computing a first length for a plurality of points based on a first line size, computing a second length for the plurality of points based on a second line size, and determining a fractal dimension line edge roughness parameter based on a difference between the first length and the second length. | 04-03-2014 |
20140100806 | METHOD AND APPARATUS FOR MATCHING TOOLS BASED ON TIME TRACE DATA - A method includes receiving tool trace data from a group of tools of the same type in a computing device. A tool fingerprint is generated for each tool using the tool trace data for the tools in group other than the tool for which the tool fingerprint is generated in the computing device. A tool score is generated for each tool based on its tool trace data and its associated fingerprint in the computing device. A fault condition with at least a selected tool is identified based on the tool scores in the computing device. | 04-10-2014 |
20140100807 | CHIP AUTHENTICATION USING MULTI-DOMAIN INTRINSIC IDENTIFIERS - Embodiments of the present invention provide a chip authentication system using multi-domain intrinsic identifiers. Multiple intrinsic identifiers taken from multiple domains (areas or sections of the chip) are compared against the intrinsic identifiers collected during the manufacture of the chip. If at least one intrinsic identifier matches those collected during manufacture, the chip may be designated as authentic. | 04-10-2014 |
20140122005 | SYSTEM AND METHOD FOR GENERATING A YIELD FORECAST BASED ON WAFER ACCEPTANCE TESTS - A wafer acceptance test (WAT) system and method that, in one embodiment, includes: ( | 05-01-2014 |
20140207400 | Method and Apparatus for Providing Data Processing and Control in a Medical Communication System - Methods and apparatus for providing data processing and control for use in a medical communication system are provided. | 07-24-2014 |
20140249767 | REJECT BIN INTERLOCK SYSTEM AND METHOD OF SECURING OBJECTS REJECTED BY AN INSPECTION DEVICE - A combination of a hardware-secured reject bin and a programmed controller that together function to create an interlock that limits access to a reject bin to only those users with specific access rights. Access is gained by entering a user ID or some other authorized reject bin user access information into the user interface of a checkweigher controller or another controller in communication with a checkweigher controller. Access attempts and events may be tracked and the removal of objects from an interlocked bin may be recorded to provide for improved object traceability. | 09-04-2014 |
20140303920 | SYSTEM AND METHOD FOR ELECTROSTATIC DISCHARGE TESTING - A system and a method for ESD testing are contained in an ESD testing system which is running on an electronic device. A storage unit of the electronic device pre-stores a layout file which includes a layout pattern having electrical traces, an ESD entry point, and mounted positions of multiple electronic elements. The ESD testing method obtains the layout file from the storage unit; displays the layout pattern on a display unit of the electronic device, simulates ESD in the ESD entry point of the displayed layout pattern, tests electrical characteristics of the electrical traces between the ESD entry point and the mounted positions of multiple electronic elements to determine whether the electrical characteristics of the electrical traces pass or fail the ESD test, and marks the electrical traces which fail the ESD test on the displayed layout pattern. | 10-09-2014 |
20140303921 | DYNAMIC DESIGN ATTRIBUTES FOR WAFER INSPECTION - Methods and systems for dynamic design attributes for wafer inspection are provided. One method includes, at run time of a wafer inspection recipe, prompting a user of a wafer inspection tool on which the wafer inspection recipe is performed for information for a design based binning (DBB) process. The information includes one or more formulae for calculating design attributes from a design for a wafer. The design attributes are used to bin the defects in the DBB process. The method also includes performing inspection of a wafer according to an updated wafer inspection recipe. Performing the inspection includes binning defects detected on the wafer according to the DBB process in the updated wafer inspection recipe. | 10-09-2014 |
20140309957 | Multi-Phone Programming Application - Automated provisioning of radiotelephone handsets | 10-16-2014 |
20140316731 | CONTINUOUS VOLTAGE PRODUCT BINNING - A binning process uses curve fitting to create and assign one or more bins based on testing data of operating voltage versus leakage current for test integrated circuits. Each bin is created by assigning an initial operating voltage to the bin and fitting a curve to the testing data population. An equation is generated describing the fitted curve. Integrated circuits are binned by measuring the leakage current at a selected operating voltage and testing the integrated circuit at one or more operating voltages determined based on the fitted curves. The integrated circuits are assigned a maximum operating voltage that corresponds to the lowest tested operating voltage at which the integrated circuit passes the test. | 10-23-2014 |
20140343884 | METHOD AND SYSTEM FOR INTELLIGENT WEAK PATTERN DIAGNOSIS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM - Disclosure herein is related to a method and a system for intelligent weak pattern diagnosis for semiconductor product, and a related non-transitory computer-readable storage medium. In the method, a weak pattern layout is firstly retrieved from a defect pattern library and a frequent failure defect pattern library; defect data is retrieved from fab defect inspection tool; a design layout is then received and weak defect pattern screen is performed to extract known and unknown weak defect patterns. In addition to updating the weak pattern library, the weak pattern contour can be made upon SEM image data, and then the true systematic weak pattern can be justified. | 11-20-2014 |
20140358465 | YIELD ANALYSIS SYSTEM AND METHOD USING SENSOR DATA OF FABRICATION EQUIPMENT - A system and method for analyzing a product fabrication process are disclosed. A product yield analysis system according to an exemplary embodiment of the present disclosure includes a data extraction unit that extracts sensor data from a plurality of sensors arranged in equipment for fabricating a product, a reference signal generation unit that generates a reference signal for each of the plurality of sensors from the sensor data, and a sensor detection unit that detects one or more sensors having a correlation with a yield of the product using the sensor data and the reference signal. | 12-04-2014 |
20150051860 | AUTOMATIC OPTICAL APPEARANCE INSPECTION BY LINE SCAN APPARATUS - A method of inspecting a structure of a device and a system for doing the same is described. The method includes generating a sample image of a device having a structure to be inspected; identifying a plurality of features of the sample image; comparing the plurality of features to a corresponding plurality of features of a reference image; and locating features in the sample image that deviate from corresponding features of the reference image. The generating step includes moving the device, a detector array or both, relative to one another, wherein the detector array is configured to generate a line of data representing light reflected from the device, and assembling lines of data from the detector array to generate a sample image. | 02-19-2015 |
20150066411 | IDENTIFICATION OF DAMAGED TOOLS - Identifying a damaged tool, including capturing, by an optical scanner, images of a manufactured part machined by the damaged tool; determining, from the captured images by a data processor operatively coupled to the scanner, measurements of the part; and determining, by the data processor based upon the measurements, that the tool is damaged. | 03-05-2015 |
20150134286 | METHOD FOR QUANTIFICATION OF PROCESS NON-UNIFORMITY USING MODEL-BASED METROLOGY - Embodiments of the present invention provide an improved method and system for assessing non-uniformity of features in the measurement area (within the beam spot) on a semiconductor structure, (e.g. wafer), such as a non-uniform film thickness. The scattering from non-uniform features is modeled. Post-processing the residual of theoretical and collected spectra is performed to assess a measure of non-uniformity from within an incident spot beam of a spectrum acquisition tool. | 05-14-2015 |
20150345941 | CARTRIDGE AND DETECTION METHOD FOR THE SAME - The present invention discloses a cartridge and a detection method for the same. The cartridge comprises an outer frame and barriers located inside the outer frame. The cartridge further comprises a detection device. The detection device comprises a sensing device configured to sense the barriers so as to acquire sensed information, and a first information processing device configured to judge whether the positions of the barriers are correct according to the sensed information. For the cartridge provided by the present invention, whether barriers are located at correct positions and thus whether the loading size of the cartridge is matched with the size of a substrate to be loaded can be effectively detected, so that the damage to the substrate during loading of the substrate is effectively avoided and it is ensured that the substrate can be safely loaded into the cartridge. | 12-03-2015 |
20150357421 | WAFER STRENGTH BY CONTROL OF UNIFORMITY OF EDGE BULK MICRO DEFECTS - Some embodiments relate to a silicon wafer having a disc-like silicon body. The wafer includes a central portion circumscribed by a circumferential edge region. A plurality of sampling locations, which are arranged in the circumferential edge region, have a plurality of wafer property values, respectively, which correspond to a wafer property. The plurality of wafer property values differ from one another according to a pre-determined statistical edge region profile. | 12-10-2015 |
20160054231 | METHOD FOR THE QUALITY ASSESSMENT OF A COMPONENT PRODUCED BY MEANS OF AN ADDITIVE MANUFACTURING METHOD - The invention relates to a method for the quality assessment of a component produced by means of an additive manufacturing method. In the course of the method, it is checked first of all whether the component violates predetermined absolute limits in order to rule out the existence of serious malfunctions in the additive manufacturing process. Subsequently, a component-dependent targeting process is determined. On the basis of this targeting process, the limits for deviations are established and deviating actual values of the component are isolated and assessed by means of various parameters. | 02-25-2016 |