18th week of 2017 patent applcation highlights part 64 |
Patent application number | Title | Published |
20170125213 | ISOTOPE TAGGING FOR WORKPIECE AUTHENTICATION | 2017-05-04 |
20170125214 | ION IMPLANTATION TOOL AND ION IMPLANTATION METHOD | 2017-05-04 |
20170125215 | METHODS FOR THIN FILM MATERIAL DEPOSITION USING REACTIVE PLASMA-FREE PHYSICAL VAPOR DEPOSITION | 2017-05-04 |
20170125216 | Methods and Systems for Independent Control of Radical Density, Ion Density, and Ion Energy in Pulsed Plasma Semiconductor Device Fabrication | 2017-05-04 |
20170125217 | LOW ELECTRON TEMPERATURE ETCH CHAMBER WITH INDEPENDENT CONTROL OVER PLASMA DENSITY, RADICAL COMPOSITION AND ION ENERGY FOR ATOMIC PRECISION ETCHING | 2017-05-04 |
20170125218 | SYSTEMS AND METHODS FOR CALIBRATING CONVERSION MODELS AND PERFORMING POSITION CONVERSIONS OF VARIABLE CAPACITORS IN MATCH NETWORKS OF PLASMA PROCESSING SYSTEMS | 2017-05-04 |
20170125219 | GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IMPEDANCE SHIFTING BY IRISES IN A POWER-SUPPLYING WAVEGUIDE | 2017-05-04 |
20170125220 | RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING | 2017-05-04 |
20170125221 | APPARATUS FOR INDIRECT ATMOSPHERIC PRESSURE PLASMA PROCESSING | 2017-05-04 |
20170125222 | Self-Calibration of Spectra Using Differences in Molecular Weight from Known Charge States | 2017-05-04 |
20170125223 | Intelligent Target-Based Acquisition | 2017-05-04 |
20170125224 | Method of Identifying Precursor Ions | 2017-05-04 |
20170125225 | Method of Generating Ions of High Mass to Charge Ratio by Charge Reduction | 2017-05-04 |
20170125226 | Time of Flight Detection System | 2017-05-04 |
20170125227 | MALDI SUPPORT WITH MAGNETICALLY HELD SPRING STEEL PLATE | 2017-05-04 |
20170125228 | Method of improved paper based mass spectrometry and novel wick support structures | 2017-05-04 |
20170125229 | Ion Entry/Exit Device | 2017-05-04 |
20170125230 | MASS SPECTROMETER | 2017-05-04 |
20170125231 | A Method of Compressing an Ion Beam | 2017-05-04 |
20170125232 | Secondary Electrospray Ionization at Reduced Pressure | 2017-05-04 |
20170125233 | MASS SPECTROMETRY METHOD AND MASS SPECTROMETER | 2017-05-04 |
20170125234 | SPATIAL ZOOM MODE FOR ACCUMULATIVE TRAPPED ION MOBILITY SPECTROMETRY | 2017-05-04 |
20170125235 | Ion Profiling with a Scanning Quadrupole Mass Filter | 2017-05-04 |
20170125236 | Light Source | 2017-05-04 |
20170125237 | WAFER BACK-SIDE POLISHING SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE MANUFACTURING PROCESSES | 2017-05-04 |
20170125238 | NITRIDE FILM FORMING METHOD | 2017-05-04 |
20170125239 | SELECTIVELY LATERAL GROWTH OF SILICON OXIDE THIN FILM | 2017-05-04 |
20170125240 | METHOD FOR MANUFACTURING SEMICONDUCTOR AND METHOD FOR CLEANING WAFER SUBSTRATE | 2017-05-04 |
20170125241 | LOW TEMP SINGLE PRECURSOR ARC HARD MASK FOR MULTILAYER PATTERNING APPLICATION | 2017-05-04 |
20170125242 | METHODS OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN SEMICONDUCTOR MANUFACTURING | 2017-05-04 |
20170125243 | NOVEL AMINO-SILYL AMINE COMPOUND AND THE MANUFACTURING METHOD OF DIELECTRIC FILM CONTAINING Si-N BOND BY USING ATOMIC LAYER DEPOSITION | 2017-05-04 |
20170125244 | PROCESS OF SELECTIVE EPITAXIAL GROWTH FOR VOID FREE GAP FILL | 2017-05-04 |
20170125245 | FABRICATION OF SEMI-POLAR CRYSTAL STRUCTURES | 2017-05-04 |
20170125246 | LASER CRYSTALLIZATION METHOD | 2017-05-04 |
20170125247 | METHOD OF FORMING PATTERN OF SEMICONDUCTOR DEVICE | 2017-05-04 |
20170125248 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME | 2017-05-04 |
20170125249 | Semiconductor Electronic Devices And Methods Of Manufacture Thereof | 2017-05-04 |
20170125250 | METHOD FOR MANUFACTURING ARRAY SUBSTRATE, ARRAY SUBSTRATE AND MASK | 2017-05-04 |
20170125251 | METHOD FOR MANUFACTURING SELECTIVE SURFACE DEPOSITION USING A PULSED RADIATION TREATMENT | 2017-05-04 |
20170125252 | SPLIT-GATE LATERAL EXTENDED DRAIN MOS TRANSISTOR STRUCTURE AND PROCESS | 2017-05-04 |
20170125253 | Methods and Systems for Plasma Etching Using Bi-Modal Process Gas Composition Responsive to Plasma Power Level | 2017-05-04 |
20170125254 | METHOD OF TREATING A LAYER | 2017-05-04 |
20170125255 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | 2017-05-04 |
20170125256 | Methods of Forming Patterns with Multiple Layers for Semiconductor Devices | 2017-05-04 |
20170125257 | METHOD OF FORMING PHOTORESIST PATTERN AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | 2017-05-04 |
20170125258 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND SUBSTRATE HOLDING MEMBER | 2017-05-04 |
20170125259 | METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES WITH IMPROVED METAL GATE FILL-IN FOR VERTICAL MEMORY CELL AND DEVICES THEREOF | 2017-05-04 |
20170125260 | Methods and Systems for Advanced Ion Control for Etching Processes | 2017-05-04 |
20170125261 | METHOD OF ETCHING TRANSITION METAL FILM AND SUBSTRATE PROCESSING APPARATUS | 2017-05-04 |
20170125262 | PATTERN FORMING METHOD | 2017-05-04 |
20170125263 | METHOD OF DOPING 2-DIMENSIONAL SEMICONDUCTOR | 2017-05-04 |
20170125264 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | 2017-05-04 |
20170125265 | FLOW CONTROLLED LINER HAVING SPATIALLY DISTRIBUTED GAS PASSAGES | 2017-05-04 |
20170125266 | APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES | 2017-05-04 |
20170125267 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS | 2017-05-04 |
20170125268 | WAFER DEBONDING USING MID-WAVELENGTH INFRARED RADIATION ABLATION | 2017-05-04 |
20170125269 | TRANSFER MODULE FOR A MULTI-MODULE APPARATUS | 2017-05-04 |
20170125270 | APPARATUS FOR TRANSFERRING SUBSTRATE AND APPARATUS FOR PROCESSING SUBSTRATE INCLUDING THE SAME | 2017-05-04 |
20170125271 | POSITION DETECTION APPARATUS, POSITION DETECTION METHOD, INFORMATION PROCESSING PROGRAM, AND STORAGE MEDIUM | 2017-05-04 |
20170125272 | WAFER TRANSFER MICROCLIMATE TECHNIQUES AND APPARATUSES, INCLUDING HORIZONTAL SLOT IMPLEMENTATIONS AND/OR TRAVELLING SHOWERHEADS | 2017-05-04 |
20170125273 | WAFER STORAGE AND TRANSPORT DEVICE | 2017-05-04 |
20170125274 | BIASABLE ROTATABLE ELECTROSTATIC CHUCK | 2017-05-04 |
20170125275 | DEVICES FOR METHODOLOGIES RELATED TO WAFER CARRIERS | 2017-05-04 |
20170125276 | SEMICONDUCTOR DEVICE CARRIER TAPE WITH IMAGE SENSOR DETECTABLE DIMPLES | 2017-05-04 |
20170125277 | Method of Forming a Flexible Semiconductor Layer and Devices on a Flexible Carrier | 2017-05-04 |
20170125278 | Substrate Retaining Carrier, Method for Retaining and Separating Substrate and Method for Evaporation | 2017-05-04 |
20170125279 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS | 2017-05-04 |
20170125280 | ENHANCED LIFT PIN DESIGN TO ELIMINATE LOCAL THICKNESS NON-UNIFORMITY IN TEOS OXIDE FILMS | 2017-05-04 |
20170125281 | APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES | 2017-05-04 |
20170125282 | FILM FORMING APPARATUS | 2017-05-04 |
20170125283 | SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME | 2017-05-04 |
20170125284 | ETCH STOP FOR AIRGAP PROTECTION | 2017-05-04 |
20170125285 | SEMICONDUCTOR DEVICE | 2017-05-04 |
20170125286 | UNIFORM DIELECTRIC RECESS DEPTH DURING FIN REVEAL | 2017-05-04 |
20170125287 | SUBSTRATE HAVING TWO SEMICONDUCTOR MATERIALS ON INSULATOR | 2017-05-04 |
20170125288 | ANISOTROPIC MATERIAL DAMAGE PROCESS FOR ETCHING LOW-K DIELECTRIC MATERIALS | 2017-05-04 |
20170125289 | DUAL SILICIDE LINER FLOW FOR ENABLING LOW CONTACT RESISTANCE | 2017-05-04 |
20170125290 | Semiconductor Device Metallization Systems and Methods | 2017-05-04 |
20170125291 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | 2017-05-04 |
20170125292 | TRENCH SILICIDE CONTACTS WITH HIGH SELECTIVITY PROCESS | 2017-05-04 |
20170125293 | SUBSTRATE ARRAY FOR PACKAGING INTEGRATED CIRCUITS | 2017-05-04 |
20170125294 | METHOD OF SEPARATING ELECTRONIC DEVICES HAVING A BACK LAYER AND APPARATUS | 2017-05-04 |
20170125295 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | 2017-05-04 |
20170125296 | HYBRID SEMICONDUCTOR STRUCTURE ON A COMMON SUBSTRATE | 2017-05-04 |
20170125297 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | 2017-05-04 |
20170125298 | FINFET GATE STRUCTURE AND METHOD FOR FABRICATING THE SAME | 2017-05-04 |
20170125299 | SOURCE AND DRAIN EPITAXIAL SEMICONDUCTOR MATERIAL INTEGRATION FOR HIGH VOLTAGE SEMICONDUCTOR DEVICES | 2017-05-04 |
20170125300 | METHOD OF FABRICATING SEMICONDUCTOR | 2017-05-04 |
20170125301 | METAL GATE STRUCTURE AND MANUFACTURING METHOD THEREOF | 2017-05-04 |
20170125302 | UNIFORM DIELECTRIC RECESS DEPTH DURING FIN REVEAL | 2017-05-04 |
20170125303 | P-FET WITH STRAINED SILICON-GERMANIUM CHANNEL | 2017-05-04 |
20170125304 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | 2017-05-04 |
20170125305 | SEMICONDUCTOR STRUCTURES AND FABRICATION METHODS THEREOF | 2017-05-04 |
20170125306 | DUAL SILICIDE LINER FLOW FOR ENABLING LOW CONTACT RESISTANCE | 2017-05-04 |
20170125307 | FINFET DEVICES WITH UNIQUE FIN SHAPE AND THE FABRICATION THEREOF | 2017-05-04 |
20170125308 | MOVING PYROMETER FOR USE WITH A SUBSTRATE CHAMBER | 2017-05-04 |
20170125309 | TEST LINE STRUCTURE AND METHOD FOR PERFORMING WAFER ACCEPTANCE TEST | 2017-05-04 |
20170125310 | SEMICONDUCTOR PROCESS | 2017-05-04 |
20170125311 | ON-BONDER AUTOMATIC OVERHANG DIE OPTIMIZATION TOOL FOR WIRE BONDING AND RELATED METHODS | 2017-05-04 |
20170125312 | THERMAL PROCESSING METHOD AND THERMAL PROCESSING APPARATUS THROUGH LIGHT IRRADIATION | 2017-05-04 |