19th week of 2011 patent applcation highlights part 15 |
Patent application number | Title | Published |
20110108891 | Semiconductor Device with Dynamic Array Sections Defined and Placed According to Manufacturing Assurance Halos - An integrated circuit device includes a plurality of dynamic array sections, each of which includes three or more linear conductive segments formed within its gate electrode level in a parallel manner to extend lengthwise in a first direction. An adjoining pair of dynamic array sections are positioned to have co-located portions of outer peripheral boundary segments extending in the first direction. At least one of the linear conductive segments within the gate electrode level of a given dynamic array section is a non-gate linear conductive segment that does not form a gate electrode of a transistor. The non-gate linear conductive segment of either of the adjoining pair of dynamic array sections spans the co-located portion of outer peripheral boundary segment toward the other of the adjoining pair of dynamic array sections, and is contained within gate electrode level manufacturing assurance halo portions of the adjoining pair of dynamic array sections. | 2011-05-12 |
20110108892 | DETECTOR OF BIOLOGICAL OR CHEMICAL MATERIAL AND CORRESPONDING ARRAY OF DETECTORS - A detector of biological or chemical material, including a MOS transistor having its channel region inserted between upper and lower insulated gates, the upper insulated gate including a detection layer capable of generating a charge at the interface of the upper insulated gate and of its gate insulator, the thickness of the upper gate insulator being smaller than the thickness of the lower gate insulator. | 2011-05-12 |
20110108893 | INTEGRATION SCHEME FOR CHANGING CRYSTAL ORIENTATION IN HYBRID ORIENTATION TECHNOLOGY (HOT) USING DIRECT SILICON BONDED (DSB) SUBSTRATES - Optimizing carrier mobilities in MOS transistors in CMOS ICs requires forming (100)-oriented silicon regions for NMOS and ( | 2011-05-12 |
20110108894 | METHOD OF FORMING STRAINED STRUCTURES IN SEMICONDUCTOR DEVICES - The present disclosure provides a method of fabricating that includes providing a semiconductor substrate; forming a gate structure on the substrate; performing an implantation process to form a doped region in the substrate; forming spacers on sidewalls of the gate structure; performing an first etching to form a recess in the substrate, where the first etching removes a portion of the doped region; performing a second etching to expand the recess in the substrate, where the second etching includes an etchant and a catalyst that enhances an etching rate at a remaining portion of the doped region; and filling the recess with a semiconductor material. | 2011-05-12 |
20110108895 | METHOD OF FORMING ASYMMETRIC SPACERS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICE USING ASYMMETRIC SPACERS - A method of fabricating asymmetrical spacers, structures fabricated using asymmetrical spacers and an apparatus for fabricating asymmetrical spacers. The method includes: forming on a substrate, a structure having a top surface and opposite first and second sidewalls and having a longitudinal axis parallel to the sidewalls; forming a conformal layer on the top surface of the substrate, the top surface of the structure and the sidewalls of the structure; tilting the substrate about a longitudinal axis relative to a flux of reactive ions, the flux of reactive ions striking the conformal layer at acute angle; and exposing the conformal layer to the flux of reactive ions until the conformal layer is removed from the top surface of the structure and the top surface of the substrate leaving a first spacer on the first sidewall and a second spacer on the second sidewall, the first spacer thinner than the second spacer. | 2011-05-12 |
20110108896 | WAFER LEVEL CHIP SCALE PACKAGE AND PROCESS OF MANUFACTURE - Power wafer level chip scale package (CSP) and process of manufacture are enclosed. The power wafer level chip scale package includes all source, gate and drain electrodes located on one side of the device, which is convenient for mounting to a printed circuit board (PCB) with solder paste. | 2011-05-12 |
20110108897 | IMAGE SENSOR - An image sensor includes an active region including a photoelectric conversion region and a floating diffusion region, which are separated from each other, defined by a device isolation region on a semiconductor substrate, and a transfer transistor including a first sub-gate provided on an upper surface of the semiconductor substrate and a second sub-gate extending within a recessed portion of the semiconductor substrate on the active region between the photoelectric conversion region and the floating diffusion region, wherein the photoelectric conversion region includes a plurality of photoelectric conversion elements, which vertically overlap each other within the semiconductor substrate and are spaced apart from the recessed portion. | 2011-05-12 |
20110108898 | SPIN MEMORY AND SPIN FET - A spin memory includes a magneto-resistance element having a first ferromagnetic layer in which a magnetization direction is pinned, a second ferromagnetic layer in which a magnetization direction changes, and a first nonmagnetic layer between the first and second ferromagnetic layers, a lower electrode and an upper electrode extending in a direction between 45 degrees and 90 degrees relative to an axis of hard magnetization of the second ferromagnetic layer, and sandwiching the magneto-resistance element at one end in a longitudinal direction, a switching element connected to another end in a longitudinal direction of the lower electrode, and a bit line connected to another end in a longitudinal direction of the upper electrode, wherein writing is carried out by supplying spin-polarized electrons to the second ferromagnetic layer and applying a magnetic field from the lower electrode and the upper electrode to the second ferromagnetic layer. | 2011-05-12 |
20110108899 | FERROELECTRIC ORGANIC MEMORIES WITH ULTRA-LOW VOLTAGE OPERATION - A method of manufacturing a patterned ferroelectric polymer memory medium is disclosed, which includes forming an electrode on a substrate; forming a ferroelectric polymer thin film on the electrode; and patterning and orienting the polymer thin film into a plurality of nanostructures by embossing techniques. Also disclosed are two methods which include forming nanofeatures in an interlayer dielectric (ILD) layer deposited on a substrate; forming a ferroelectric polymer thin film on the ILD layer in the nanofeatures; and patterning and orienting the polymer thin film into a plurality of nanostructures by pressing. The patterning process followed by an annealing process promotes specific crystal orientation, which significantly reduces the operation voltage, and increases the signal-to-noise ratio. The invention also covers devices made of a ferroelectric polymer layer oriented by such an embossing method and the use of such devices at a coercive field of 10 MV/m or less. | 2011-05-12 |
20110108900 | BI-DIRECTIONAL SELF-ALIGNED FET CAPACITOR - A method of forming a field effect transistor (FET) capacitor includes forming a channel region; forming a gate stack over the channel region; forming a first extension region on a first side of the gate stack, the first extension region being formed by implanting a first doping material at a first angle such that a shadow region exists on a second side of the gate stack; and forming a second extension region on the second side of the gate stack, the second extension region being formed by implanting a second doping material at a second angle such that a shadow region exists on the first side of the gate stack. | 2011-05-12 |
20110108901 | SEMICONDUCTOR STORAGE DEVICE - Device isolation/insulation films each have a first height within a first area and a second height higher than the first height within a second area. At least the device isolation/insulation films adjacent to a contact diffusion region exist in the second area, and the device isolation/insulation films adjacent to memory transistors exist in the first area. The device isolation/insulation films are implanted with an impurity of a first conductivity type, and device formation regions each have a diffusion region of the first conductivity type, the diffusion region being formed by diffusion of the impurity of the first conductivity type from the device isolation/insulation films. | 2011-05-12 |
20110108902 | MEMORY WITH A READ-ONLY EEPROM-TYPE STRUCTURE - A non-volatile memory including at least first and second memory cells each including a storage MOS transistor with dual gates and an insulation layer provided between the two gates. The insulation layer of the storage transistor of the second memory cell includes at least one portion that is less insulating than the insulation layer of the storage transistor of the first memory cell. | 2011-05-12 |
20110108903 | Method for fabricating a flash memory cell utilizing a high-K metal gate process and related structure - According to one exemplary embodiment, a method for fabricating a flash memory cell in a semiconductor die includes forming a control gate stack overlying a floating gate stack in a memory region of a substrate, where the floating gate stack includes a floating gate overlying a portion of a dielectric one layer. The floating gate includes a portion of a metal one layer and the dielectric one layer includes a first high-k dielectric material. The control gate stack can include a control gate including a portion of a metal two layer, where the metal one layer can include a different metal than the metal two layer. | 2011-05-12 |
20110108904 | DUAL CONDUCTING FLOATING SPACER METAL OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR (DCFS MOSFET) AND METHOD TO FABRICATE THE SAME - Dual Conducting Floating Spacer Metal Oxide Semiconductor Field Effect Transistors (DCFS MOSFETs) and methods for fabricate them using a process that is compatible with forming conventional MOSFETs are disclosed. A DCFS MOSFET can provide multi-bit storage in a single Non-Volatile Memory (NVM) memory cell. Like a typical MOSFET, a DCFS MOSFET includes a control gate electrode on top of a gate dielectric-silicon substrate, thereby forming a main channel of the device. Two electrically isolated conductor spacers are provided on both sides of the control gate and partially overlap two source/drain diffusion areas, which are doped to an opposite type to the conductivity type of the substrate semiconductor. The DCFS MOSFET becomes conducting when a voltage that exceeds a threshold is applied at the control gate and is coupled through the corresponding conducting floating spacer to generate an electrical field strong enough to invert the carriers near the source junction. By storing charge in the two independent conducting floating spacers, DCFS MOSFET can have two independent sets of threshold voltages associated with the source junctions. | 2011-05-12 |
20110108905 | NONVOLATILE SEMICONDUCTOR MEMORY - A nonvolatile semiconductor memory includes first and second memory cells having a floating gate and a control gate. The floating gate of the first and second memory cells is comprised a first part, and a second part arranged on the first part, and a width of the second part in an extending direction of the control gate is narrower than that of the first part. A first space between the first parts of the first and second memory cells is filled with one kind of an insulator. The control gate is arranged at a second space between the second parts of the first and second memory cells. | 2011-05-12 |
20110108906 | NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND ITS MANUFACTURING METHOD - In a non-volatile semiconductor memory device and a method for manufacturing the device, each memory cell and its select Tr have the same gate insulating film as a Vcc Tr. Further, the gate electrodes of a Vpp Tr and Vcc Tr are realized by the use of a first polysilicon layer. A material such as salicide or a metal, which differs from second polysilicon (which forms a control gate layer), may be provided on the first polysilicon layer. With the above features, a non-volatile semiconductor memory device can be manufactured by reduced steps and be operated at high speed in a reliable manner. | 2011-05-12 |
20110108907 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME - According to one embodiment, a semiconductor device includes a substrate, a foundation layer, a lower layer side stacked body, an upper layer side stacked body, an inter-layer insulating layer, and a plurality of contact electrodes. The foundation layer is provided in the second contact region to form a difference in levels between the second contact region and the first contact region. The lower layer side stacked body includes a plurality of conductive layers stacked alternately with a plurality of insulating layers. An upper level portion of the lower layer side stacked body stacked on the foundation layer is patterned into a stairstep configuration. The upper layer side stacked body is provided on a lower level portion of the lower layer side stacked body stacked in the first contact region. The upper layer side stacked body includes a plurality of conductive layers stacked alternately with a plurality of insulating layers. | 2011-05-12 |
20110108908 | MULTILAYERED BOX IN FDSOI MOSFETS - A fully depleted MOSFET has a semiconductor-on-insulator substrate that includes a substrate material, a BOX positioned on the substrate material, and an active layer positioned on the BOX. The BOX includes a first layer of material with a first dielectric constant and a first thickness and a second layer of material having a second dielectric constant different than the first dielectric constant and a second thickness different than the first thickness. The first layer of material is positioned adjacent the substrate material and the second layer of material is positioned adjacent the active layer. Drain and source regions are formed in the active layer so as to be fully depleted. The drain and source regions are separated by a channel region in the active layer. A gate insulating layer overlies the channel region and a gate stack is positioned on the gate insulating region. It is anticipated that the structure is most useful for channel regions less than 90 nm long. | 2011-05-12 |
20110108909 | VERTICAL THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE INCLUDING THE VERTICAL THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME - A vertical thin film transistor and a method for manufacturing the same and a display device including the vertical thin film transistor and a method for manufacturing the same are disclosed. The vertical thin film transistor is applied to a substrate. In the present invention, a gate layer of the vertical thin film transistor is formed to have a plurality of concentric annular structures and the adjacent concentric annular structures are linked. By the concentric annular structures of the gate electrode layer, resistance to stress and an on-state current of the vertical thin film transistor can be increased. | 2011-05-12 |
20110108910 | SEMICONDUCTOR DEVICE - A semiconductor device may include, but is not limited to: a semiconductor structure extending upwardly; a first insulating film covering at least a side surface of the semiconductor structure; a gate electrode extending upwardly, the gate electrode being adjacent to the first insulating film; and an insulating structure extending upwardly, the insulating structure being adjacent to the gate electrode. | 2011-05-12 |
20110108911 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - According to one embodiment, a semiconductor device includes a first and a second semiconductor layer of a first conductivity type, a third semiconductor layer of a second conductivity type, a source region of the first conductivity type, a first and a second main electrode, trench gates, a first and a second contact region. The third semiconductor layer is provided on the second semiconductor layer provided on the first semiconductor layer. The first main electrode is electrically connected to the first semiconductor layer. The second main electrode is electrically connected to the source region provided on the third semiconductor layer. The trench gates are provided from the third semiconductor layer to the second semiconductor layer. The first and second contact regions electrically connect the second main electrode and the third semiconductor layer. An opening area of the second contact hole is smaller than that of the first contact hole. | 2011-05-12 |
20110108912 | METHODS FOR FABRICATING TRENCH METAL OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTORS - A method for fabricating a cellular trench metal oxide semiconductor field effect transistor (MOSFET) includes depositing a first photoresist atop a first epitaxial (epi) layer to pattern a trench area, depositing a second photoresist atop a first gate conductor layer to pattern a mesa area, etching away part of the first gate conductor layer in the mesa area to form a second gate conductor layer with a hump, and titanizing crystally the second gate conductor layer to form a Ti-gate conductor layer. Edges of the mesa area are aligned to edges of the trench area. Hence, approximately more than half of polysilicon in the second gate conductor layer is titanized crystally. A spacer can be formed to protect corners of the first gate conductor layer and to make the gate conductor structure more robust for mechanical support. | 2011-05-12 |
20110108913 | LDMOS WITH DOUBLE LDD AND TRENCHED DRAIN - A LDMOS with double LDD and trenched drain is disclosed. According to some preferred embodiment of the present invention, the structure contains a double LDD region, including a high energy implantation to form lightly doped region and a low energy implantation thereon to provide a low resistance path for current flow without degrading breakdown voltage. At the same time, a P+ junction made by source mask is provided underneath source region to avoid latch-up effect from happening. | 2011-05-12 |
20110108914 | MOS TRANSISTOR WITH GATE TRENCH ADJACENT TO DRAIN EXTENSION FIELD INSULATION - An integrated circuit containing an MOS transistor with a trenched gate abutting an isolation dielectric layer over a drift region. The body well and source diffused region overlap the bottom surface of the gate trench. An integrated circuit containing an MOS transistor with a first trenched gate abutting an isolation dielectric layer over a drift region, and a second trenched gate located over a heavily doped buried layer. The buried layer is the same conductivity type as the drift region. A process of forming an integrated circuit containing an MOS transistor, which includes an isolation dielectric layer over a drift region of a drain of the transistor, and a gate formed in a gate trench which abuts the isolation dielectric layer. The gate trench is formed by removing substrate material adjacent to the isolation dielectric layer. | 2011-05-12 |
20110108915 | SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor device includes a semiconductor substrate of a first conductivity type, an element isolation insulator, a source layer of a second conductivity type, a drain layer of the second conductivity type, a contact layer of the first conductivity type and a gate electrode. The element isolation insulator is formed on the semiconductor substrate. The source layer is formed on the semiconductor substrate and is in contact with a side surface of the element isolation insulator. The drain layer is formed on the semiconductor substrate, is in contact with the side surface, and is spaced from the source layer. The contact layer is formed between the source layer and the drain layer. The gate electrode is provided on the element isolation insulator along the side surface. | 2011-05-12 |
20110108916 | Semiconductor Devices and Methods - Disclosed herein are Lateral Diffused Metal Oxide Semiconductor (LDMOS) device and trench isolation related devices, methods, and techniques. | 2011-05-12 |
20110108917 | SEMICONDUCTOR DEVICE WITH HIGH VOLTAGE TRANSISTOR - A semiconductor device includes: a p-type active region; a gate electrode traversing the active region; an n-type LDD region having a first impurity concentration and formed from a drain side region to a region under the gate electrode; a p-type channel region having a second impurity concentration and formed from a source side region to a region under the gate electrode to form an overlap region with the LDD region under the gate electrode, the channel region being shallower than the LDD region; an n-type source region formed outside the gate electrode; and an n | 2011-05-12 |
20110108918 | ASYMMETRIC EPITAXY AND APPLICATION THEREOF - The present invention provides a method of forming asymmetric field-effect-transistors. The method includes forming a gate structure on top of a semiconductor substrate, the gate structure including a gate stack and spacers adjacent to sidewalls of the gate stack, and having a first side and a second side opposite to the first side; performing angled ion-implantation from the first side of the gate structure in the substrate, thereby forming an ion-implanted region adjacent to the first side, wherein the gate structure prevents the angled ion-implantation from reaching the substrate adjacent to the second side of the gate structure; and performing epitaxial growth on the substrate at the first and second sides of the gate structure. As a result, epitaxial growth on the ion-implanted region is much slower than a region experiencing no ion-implantation. A source region formed to the second side of the gate structure by the epitaxial growth has a height higher than a drain region formed to the first side of the gate structure by the epitaxial growth. A semiconductor structure formed thereby is also provided. | 2011-05-12 |
20110108919 | METHOD OF FABRICATING A PRECISION BURIED RESISTOR - The present invention provides a semiconductor structure including a buried resistor with improved control, in which the resistor is fabricated in a region of a semiconductor substrate beneath a well region that is also present in the substrate. In accordance with the present invention, the inventive structure includes a semiconductor substrate containing at least a well region; and a buried resistor located in a region of the semiconductor substrate that is beneath said well region. The present invention also provides a method of fabricating such a structure in which a deep ion implantation process is used to form the buried resistor and a shallower ion implantation process is used in forming the well region. | 2011-05-12 |
20110108920 | HIGH-K/METAL GATE CMOS FINFET WITH IMPROVED PFET THRESHOLD VOLTAGE - A device and method for fabrication of fin devices for an integrated circuit includes forming fin structures in a semiconductor material of a semiconductor device wherein the semiconductor material is exposed on sidewalls of the fin structures. A donor material is epitaxially deposited on the exposed sidewalls of the fin structures. A condensation process is applied to move the donor material through the sidewalls into the semiconductor material such that accommodation of the donor material causes a strain in the semiconductor material of the fin structures. The donor material is removed, and a field effect transistor is formed from the fin structure. | 2011-05-12 |
20110108921 | SINGLE METAL GATE CMOS INTEGRATION BY INTERMIXING POLARITY SPECIFIC CAPPING LAYERS - A method for forming a complementary metal oxide semiconductor device includes forming a first capping layer on a dielectric layer, blocking portions in the capping layer in regions where the capping layer is to be preserved using a block mask. Exposed portions of the first capping layer are intermixed with the dielectric layer to form a first intermixed layer. The block mask is removed. The first capping layer and the first intermixed layer are etched such that the first capping layer is removed to re-expose the dielectric layer in regions without removing the first intermixed layer. | 2011-05-12 |
20110108922 | INTEGRATED CIRCUITS INCLUDING METAL GATES AND FABRICATION METHODS THEREOF - A method of forming an integrated circuit is provided. The method includes forming a gate electrode of an NMOS transistor over a substrate by a gate-first process. A gate electrode of a PMOS transistor is formed over the substrate by a gate-last process. | 2011-05-12 |
20110108923 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device has a conventional NMOS transistor and an NMOS transistor functioning as an anti-fuse element and having an n type channel region. The conventional NMOS transistor is equipped with an n type extension region and a p type pocket region, while the anti-fuse element is not equipped with an extension region and a pocket region. This makes it possible to improve the performance of the transistor and at the same time improve the characteristics of the anti-fuse element after breakdown of its gate dielectric film. | 2011-05-12 |
20110108924 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE DEVICE - A semiconductor device includes a semiconductor substrate; an n-channel MOS transistor including a first gate insulating film provided on a p-type layer, a first gate electrode made of TiN, and a first upper gate electrode made of semiconductor doped with impurities; and a p-channel MOS transistor including a second gate insulating film provided on an n-type layer, a second gate electrode including at least as a part, a TiN layer made of TiN crystal in which a ratio of (111) orientation/(200) orientation is about 1.5 or more, and a second upper gate electrode made of semiconductor doped with impurities. | 2011-05-12 |
20110108925 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - The semiconductor device includes a first MIS transistor including a gate insulating film | 2011-05-12 |
20110108926 | Gated anti-fuse in CMOS process - In a gated anti-fuse, an anode is separated from a cathode by an oxide layer and the anode or cathode voltage is controlled by the control gate of a transistor like structure connected to the anode or cathode. | 2011-05-12 |
20110108927 | DAMASCENE GATE HAVING PROTECTED SHORTING REGIONS - The present invention relates generally to semiconductor devices and, more specifically, to damascene gates having protected shorting regions and related methods for their manufacture. A first aspect of the invention provides a method of forming a damascene gate with protected shorting regions, the method comprising: forming a damascene gate having: a gate dielectric atop a substrate; a gate conductor atop the gate dielectric; a conductive liner laterally adjacent the gate conductor; a spacer between the conductive liner and the substrate; and a first dielectric atop the gate conductor; removing a portion of the conductive liner; and depositing a second dielectric atop a remaining portion of the conductive liner, such that the second dielectric is laterally adjacent both the first dielectric and the gate. | 2011-05-12 |
20110108928 | METHOD FOR FORMING HIGH-K METAL GATE DEVICE - The present disclosure provides a method of fabricating a semiconductor device that includes providing a semiconductor substrate, forming a metal gate on the substrate, the metal gate having a first gate resistance, removing a portion of the metal gate thereby forming a trench; and forming a conductive structure within the trench such that a second gate resistance of the conductive structure and remaining portion of the metal gate is lower than the first gate resistance. | 2011-05-12 |
20110108929 | ENHANCED ATOMIC LAYER DEPOSITION - Atomic layer deposition is enhanced using plasma. Plasma begins prior to flowing a second precursor into a chamber. The second precursor reacts with a first precursor to deposit a layer on a substrate. The layer may include at least one element from each of the first and second precursors. The layer may be TaN, and the precursors may be TaF | 2011-05-12 |
20110108930 | Borderless Contacts For Semiconductor Devices - In one exemplary embodiment of the invention, a method (e.g., to fabricate a semiconductor device having a borderless contact) including: forming a first gate structure on a substrate; depositing an interlevel dielectric over the first gate structure; planarizing the interlevel dielectric to expose a top surface of the first gate structure; removing at least a portion of the first gate structure; forming a second gate structure in place of the first gate structure; forming a contact area for the borderless contact by removing a portion of the interlevel dielectric; and forming the borderless contact by filling the contact area with a metal-containing material. | 2011-05-12 |
20110108931 | ANODIC BONDABLE PORCELAIN AND COMPOSITION FOR THE PORCELAIN - An anodic bondable low-temperature fired porcelain having high-strength and low-thermal-expansion, wherein a conductive ion during anodic bonding is an Li ion, containing a complex oxide having a composition represented by the following formula: | 2011-05-12 |
20110108932 | Micromechanical Capacitive Sensor Element - A manufacturing method for producing a micromechanical sensor element which may be produced in a monolithically integrable design and has capacitive detection of a physical quantity is described. In addition to the manufacturing method, a micromechanical device containing such. a sensor element, e.g., a pressure sensor or an acceleration sensor, is described. | 2011-05-12 |
20110108933 | MEMS DEVICE - A MEMS device according to the present invention includes a movable member, a supporting member supporting the movable member, an opposing member opposed to the movable member, and a wall member formed to an annular shape surrounding the movable member and connected to the supporting member and the opposing member. | 2011-05-12 |
20110108934 | MICRO-ELECTRO-MECHANICAL-SYSTEM DEVICE WITH PARTICLES BLOCKING FUNCTION AND METHOD FOR MAKING SAME - The present invention discloses a MEMS device with particles blocking function, and a method for making the MEMS device. The MEMS device comprises: a substrate on which is formed a MEMS device region; and a particles blocking layer deposited on the substrate. | 2011-05-12 |
20110108935 | SILICON TAB EDGE MOUNT FOR A WAFER LEVEL PACKAGE - A Micro-ElectroMechanical Systems (MEMS) device having electrical connections (a metallization pattern) available at an edge of the MEMS die. The metallization pattern on the edge of the die allows the die to be mounted on edge with no further packaging, if desired. | 2011-05-12 |
20110108936 | PRESSURE DETECTOR AND PRESSURE DETECTOR ARRAY - A pressure detector is disclosed having an organic transistor, a pressure-detecting layer and a first electrode. The organic transistor includes an emitter, an organic layer, a grid formed with holes, and a collector, the organic layer being sandwiched between the emitter and the collector. The pressure-detecting layer is formed on the organic transistor such that the collector is sandwiched between the organic layer and the pressure-detecting layer. The first electrode is formed on the pressure-detecting layer such that the pressure-detecting layer is sandwiched between the collector and the first electrode. The area of the active region of the pressure detector is determined by the overlapped area of the electrodes, thereby reducing the pitch of the electrodes and thus the size of the pressure detector. | 2011-05-12 |
20110108937 | Magnetic Tunnel Junction Structure - Disclosed herein is a thermally-assisted magnetic tunnel junction structure including a thermal barrier. The thermal barrier is composed of a cermet material in a disordered form such that the thermal barrier has a low thermal conductivity and a high electric conductivity. Compared to conventional magnetic tunnel junction structures, the disclosed structure can be switched faster and has improved compatibility with standard semiconductor fabrication processes. | 2011-05-12 |
20110108938 | IMAGE SENSOR HAVING WAVEGUIDES FORMED IN COLOR FILTERS - An image sensor having an array of pixels disposed in a substrate. Each pixel includes a photosensitive element, a color filter, and waveguide walls. The waveguide walls are disposed in the color filter and surround portions of the color filter to form waveguides through the color filter. The refractive index of the waveguide walls is less than the refractive index of the color filter. The image sensor may be back side illuminated (BSI) or front side illuminated (FSI). In some embodiments, metal walls may be coupled to the waveguide walls. | 2011-05-12 |
20110108939 | METHOD FOR FORMING A BACK-SIDE ILLUMINATED IMAGE SENSOR - A method for manufacturing a back-side illuminated image sensor, including the steps of: forming, inside and on top of an SOI-type silicon layer, components for trapping and transferring photogenerated carriers and isolation regions; forming a stack of interconnection levels on the silicon layer and attaching, on the interconnect stack, a semiconductor handle; removing the semiconductor support; forming, in the insulating layer and the silicon layer, trenches reaching the isolation regions; depositing a doped amorphous silicon layer, more heavily doped than the silicon layer, at least on the walls and the bottom of the trenches and having the amorphous silicon layer crystallize; and filling the trenches with a reflective material. | 2011-05-12 |
20110108940 | METHOD OF FABRICATING BACKSIDE-ILLUMINATED IMAGE SENSOR - Provided is a method of fabricating a backside illuminated image sensor that includes providing a device substrate having a frontside and a backside, where pixels are formed at the frontside and an interconnect structure is formed over pixels, forming a re-distribution layer (RDL) over the interconnect structure, bonding a first glass substrate to the RDL, thinning and processing the device substrate from the backside, bonding a second glass substrate to the backside, removing the first glass substrate, and reusing the first glass substrate for fabricating another backside-illuminated image sensor. | 2011-05-12 |
20110108941 | FAST RECOVERY DIODE - A fast recovery diode includes a base layer of a first conductivity type. The base layer has a cathode side and an anode side opposite the cathode side. An anode buffer layer of a second conductivity type having a first depth and a first maximum doping concentration is arranged on the anode side. An anode contact layer of the second conductivity type having a second depth, which is lower than the first depth, and a second maximum doping concentration, which is higher than the first maximum doping concentration, is also arranged on the anode side. A space charge region of the anode junction at a breakdown voltage is located in a third depth between the first and second depths. A defect layer with a defect peak is arranged between the second and third depths. | 2011-05-12 |
20110108942 | METHOD FOR PRODUCING FIELD EFFECT TRANSISTORS WITH A BACK GATE AND SEMICONDUCTOR DEVICE - The method for producing a field effect transistor on a substrate comprising a support layer, a sacrificial layer and a semi-conducting layer comprises forming an active area in the semi-conducting layer. The active area is delineated by a closed peripheral insulation pattern and comprises an additional pattern made from insulating material. The method also comprises etching the insulating material of the additional pattern to access the sacrificial layer, etching the sacrificial layer resulting in formation of a first cavity, forming a dielectric layer on a top wall of the first cavity, and depositing an electrically conducting layer in the first cavity. The closed peripheral insulation pattern is formed through the semi-conducting layer and the sacrificial layer. | 2011-05-12 |
20110108943 | HYBRID DOUBLE BOX BACK GATE SILICON-ON-INSULATOR WAFERS WITH ENHANCED MOBILITY CHANNELS - A semiconductor wafer structure for integrated circuit devices includes a bulk substrate; a lower insulating layer formed on the bulk substrate; an electrically conductive back gate layer formed on the lower insulating layer; an upper insulating layer formed on the back gate layer; and a hybrid semiconductor-on-insulator layer formed on the upper insulating layer, the hybrid semiconductor-on-insulator layer comprising a first portion having a first crystal orientation and a second portion having a second crystal orientation. | 2011-05-12 |
20110108944 | Nitride semiconductor free-standing substrate, method of manufacturing the same and nitride semiconductor device - A nitride semiconductor free-standing substrate includes a diameter of not less than 40 mm, a thickness of not less than 100 μm, a dislocation density of not more than 5×10 | 2011-05-12 |
20110108945 | Seal Ring Structures with Reduced Moisture-Induced Reliability Degradation - A semiconductor chip includes a seal ring adjacent to edges of the semiconductor chip; an opening extending from a top surface to a bottom surface of the seal ring, wherein the opening has a first end on an outer side of the seal ring and a second end on an inner side of the seal ring; and a moisture barrier having a sidewall parallel to a nearest side of the seal ring, wherein the moisture barrier is adjacent the seal ring and has a portion facing the opening. | 2011-05-12 |
20110108946 | FUSE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME - A fuse of a semiconductor device includes a fuse pattern separated by a blowing region formed on an interlayer insulating film, and a recess formed by removing a portion of the upper portion of a plurality of contacts disposed in the lower portion of the blowing region. After the fuse pattern is blown, the fuse pattern moves in the reliable environment, thereby preventing the electric short to improve yield of the semiconductor device. | 2011-05-12 |
20110108947 | Microelectronic device and method of manufacturing same - A microelectronic device comprises a first substrate ( | 2011-05-12 |
20110108948 | INTEGRATED DECOUPLING CAPACITOR EMPLOYING CONDUCTIVE THROUGH-SUBSTRATE VIAS - A capacitor in a semiconductor substrate employs a conductive through-substrate via (TSV) as an inner electrode and a columnar doped semiconductor region as an outer electrode. The capacitor provides a large decoupling capacitance in a small area, and does not impact circuit density or a Si3D structural design. Additional conductive TSV's can be provided in the semiconductor substrate to provide electrical connection for power supplies and signal transmission therethrough. The capacitor has a lower inductance than a conventional array of capacitors having comparable capacitance, thereby enabling reduction of high frequency noise in the power supply system of stacked semiconductor chips. | 2011-05-12 |
20110108949 | METAL CAPACITOR DESIGN FOR IMPROVED RELIABILITY AND GOOD ELECTRICAL CONNECTION - A metal capacitor is formed with good conductivity for both nodes of the capacitor and improved reliability. An embodiment includes a first layer of alternating first and second metal lines, a second layer of alternating third and fourth metal lines, a dielectric layer between the first and second layers, and vias in the dielectric layer connecting the first and second metal lines with the third and fourth metal lines, respectively, wherein each metal line comprises alternating first segments having a first width and second segments having a second width, the first width being greater than the second width, each first segment lying adjacent to a second segment of an adjacent metal line, and only first segments of the metal lines overlapping the vias. The design enables the spacing between metal lines to be maintained, the spacing between via to metal to be increased, and via connection to be maintained for both nets, thereby improving the conductivity and reliability of the capacitor and maintaining capacitance density. | 2011-05-12 |
20110108950 | VERTICAL METAL INSULATOR METAL CAPACITOR - A capacitor includes a first electrode. The first electrode includes a bottom conductive plane and a plurality of first vertical conductive structures. The bottom conductive plane is disposed over a substrate. The capacitor includes a second electrode. The second electrode includes a top conductive plane and a plurality of second vertical conductive structures. The capacitor includes an insulating structure between the first electrode and the second electrode. The first vertical conductive structures and the second vertical conductive structures are interlaced with each other thereby providing higher capacitance density. | 2011-05-12 |
20110108951 | SEMICONDUCTOR DEVICE WITH MIM CAPACITOR AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a lower electrode formed on a substrate, a dielectric layer including an etched dielectric region and an as-grown dielectric region formed on the lower electrode, an upper electrode formed on the as-grown dielectric region, a hardmask formed on the upper electrode, a spacer formed at a side surface of the hardmask and the upper electrode and over a surface of the etched dielectric region, and a buffer insulation layer formed on the hardmask and the spacer. | 2011-05-12 |
20110108952 | MEMORY CAPACITOR MADE FROM FIELD CONFIGURABLE ION-DOPED MATERIALS - A memory capacitor based on a field configurable ion-doped polymer is reported. The device can be dynamically and reversibly programmed to analog capacitances with low-voltage (<5 V) pulses. After the device is programmed to a specific value, its capacitance remains nonvolatile. The field configurable capacitance is attributed to the modification of ionic dopant concentrations in the polymer. The ion and dipole concentrations in the ion conductive layer can be modified when the voltage biases applied to the electrodes exceeds a threshold value and can operate as a conventional capacitor when a voltage less than the threshold value is applied. The ion conductive layer will remain at a stable value after the device is modified without applying external voltage. The device has a nonvolatile memory function even when the external voltage is turned off. The memory capacitors may be used for analog memory, nonlinear analog and neuromorphic circuits. | 2011-05-12 |
20110108953 | FAST RECOVERY DIODE - A fast recovery diode includes an n-doped base layer having a cathode side and an anode side opposite the cathode side. A p-doped anode layer is arranged on the anode side. The anode layer has a doping profile and includes at least two sublayers. A first one of the sublayers has a first maximum doping concentration, which is between 2*10 | 2011-05-12 |
20110108954 | Growth of Planar Non-Polar M-Plane Gallium Nitride With Hydride Vapor Phase Epitaxy (HVPE) - A method of growing planar non-polar m-plane III-Nitride material, such as an m-plane gallium nitride (GaN) epitaxial layer, wherein the III-Nitride material is grown on a suitable substrate, such as an m-plane Sapphire substrate, using hydride vapor phase epitaxy (HVPE). The method includes in-situ pretreatment of the substrate at elevated temperatures in the ambient of ammonia and argon, growing an intermediate layer such as an aluminum nitride (AlN) or aluminum-gallium nitride (AlGaN) on the annealed substrate, and growing the non-polar m-plane III-Nitride epitaxial layer on the intermediate layer using HVPE. Various alternative methods are disclosed. | 2011-05-12 |
20110108955 | Semiconductor device and manufacturing method - The present invention relates to a device ( | 2011-05-12 |
20110108956 | ETCHING PROCESS FOR SEMICONDUCTORS - A process for etching semiconductors, such as II-VI or III-V semiconductors is provided. The method includes sputter etching the semiconductor through an etching mask using a nonreactive gas, removing the semiconductor and cleaning the chamber with a reactive gas. The etching mask includes a photoresist. Using this method, light-emitting diodes with light extracting elements or nano/micro-structures etched into the semiconductor material can be fabricated. | 2011-05-12 |
20110108957 | Semiconductor substrate, semiconductor device and method of manufacturing the same - A semiconductor substrate ( | 2011-05-12 |
20110108958 | Metal Oxide Semiconductor (MOS)-Compatible High-Aspect Ratio Through-Wafer Vias and Low-Stress Configuration Thereof - A structure includes a wafer having a top wafer surface. The wafer defines an opening. The top wafer surface defines a first reference direction perpendicular to the top wafer surface. The wafer has a thickness in the first reference direction. The structure also includes a through-wafer via formed in the opening. The through-wafer via has a shape, when viewed in a plane perpendicular to the first reference direction and parallel to the top wafer surface, of at least one of a spiral and a C-shape. The through-wafer via has a height in the first reference direction essentially equal to the thickness of the wafer in the first reference direction. Manufacturing techniques are also disclosed. | 2011-05-12 |
20110108959 | Semiconductor Component Having Through Wire Interconnect With Compressed Bump - A method for fabricating a semiconductor component with a through wire interconnect includes the step of providing a substrate having a circuit side, a back side, and a through via. The method also includes the steps of: threading a wire through the via, forming a contact on the wire on the back side, forming a bonded contact on the wire on the circuit side, and then severing the wire from the bonded contact. The through wire interconnect includes the wire in the via, the contact on the back side and the bonded contact on the circuit side. The contact on the back side, and the bonded contact on the circuit side, permit multiple components to be stacked with electrical connections between adjacent components. A system for performing the method includes the substrate with the via, and a wire bonder having a bonding capillary configured to thread the wire through the via, and form the contact and the bonded contact. The semiconductor component can be used to form chip scale components, wafer scale components, stacked components, or interconnect components for electrically engaging or testing other semiconductor components. | 2011-05-12 |
20110108960 | SUB-LITHOGRAPHIC PRINTING METHOD - A trench structure and an integrated circuit comprising sub-lithographic trench structures in a substrate. In one embodiment the trench structure is created by forming sets of trenches with a lithographic mask and filling the sets of trenches with sets of step spacer blocks comprising two alternating spacer materials which are separately removable from each other. In one embodiment, the trench structures formed are one-nth the thickness of the lithographic mask's feature size. The size of the trench structures being dependent on the thickness and number of spacer material layers used to form the set of step spacer blocks. The number of spacer material layers being n/2 and the thickness of each spacer material layer being one-nth of the lithographic mask's feature size. | 2011-05-12 |
20110108961 | DEVICE HAVING AND METHOD FOR FORMING FINS WITH MULTIPLE WIDTHS - A method for fabrication of features for an integrated circuit includes patterning a mandrel layer to include structures having at least one width on a surface of an integrated circuit device. Exposed sidewalls of the structures are reacted to integrally form a new compound in the sidewalls such that the new compound extends into the exposed sidewalls by a controlled amount to form pillars. One or more layers below the pillars are etched using the pillars as an etch mask to form features for an integrated circuit device. | 2011-05-12 |
20110108962 | SEMICONDUCTOR DEVICE HAVING A DEVICE ISOLATION STRUCTURE - An example semiconductor device includes a trench formed in a semiconductor substrate to define an active region, a filling dielectric layer provided within the trench, an oxide layer provided between the filling dielectric layer and the trench, a nitride layer provided between the oxide layer and the filling dielectric layer, and a barrier layer provided between the oxide layer and the nitride layer. | 2011-05-12 |
20110108963 | Package for a power semiconductor device - A package for a semiconductor die includes a die attach pad that provides an attachment surface area for the semiconductor die, and tie bars connected to the die attach pad. The die attach pad is disposed in a first general plane and the tie bars are disposed in a second general plane offset with respect to the first general plane. A molding compound encapsulates the semiconductor die in a form having first, second, third and fourth lateral sides, a top and a bottom. The tie bars are exposed substantially coincident with at least one of the lateral sides. The form includes a discontinuity that extends along the at least one of the lateral sides, the discontinuity increasing a creepage distance measured from the tie bars to the bottom of the package. | 2011-05-12 |
20110108964 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A portion of a frame body is fixed on a surface of a heat-radiating plate, and on frame body, a semiconductor chip is die-bonded. Next, a prescribed electrode of semiconductor chip and corresponding lead terminal and the like are electrically connected by a prescribed wire. Next, the lead frame is set in a metal mold such that the semiconductor chip is covered with resin from above the semiconductor chip. Thermoplastic resin is introduced into the metal mold, and semiconductor chip and the like are sealed. By taking out the resulting body from the metal mold, a semiconductor is formed. Thus, a semiconductor device can be provided with reduced manufacturing cost. | 2011-05-12 |
20110108965 | SEMICONDUCTOR DEVICE PACKAGE - A method for forming a semiconductor device package includes providing a lead frame array having a plurality of leads. Each of the plurality of leads includes an opening extending through the lead from a first surface of the lead to a second surface of the lead, opposite the first surface, and each of the openings is at least partially filled with a solder wettable material. A plurality of semiconductor devices are attached to the lead frame array. The plurality of semiconductor devices are encapsulated, and, after encapsulating, the plurality of semiconductor devices are separated along separation lines which intersect the openings | 2011-05-12 |
20110108966 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH CONCAVE TRENCHES AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a conductive layer having a first surface and a second surface; forming first concave trenches in the first surface of the conductive layer and the first concave trenches are connected by a first flat region of the first surface; connecting an integrated circuit to the first flat region with a conductive interconnect; encapsulating the integrated circuit with an encapsulation that fills the first concave trenches; and forming second concave trenches having a similar size in the second surface of the conductive layer with the second concave trenches connected by a second flat region that is larger than the first flat region, and the second concave trenches are formed through the conductive layer to expose the encapsulation. | 2011-05-12 |
20110108967 | SEMICONDUCTOR CHIP GRID ARRAY PACKAGE AND METHOD FOR FABRICATING SAME - A semiconductor chip grid array package includes a die attach pad and a plurality of connector pads. A semiconductor die is mounted on the die attach pad, the semiconductor die having external connection terminals electrically connected respectively to the connector pads. An encapsulating material encapsulates the die and connector pads. A stud protrudes from each of the connector pads for providing an external electrical contact for the semiconductor chip grid array package. Each of the connector pads and respective studs are formed from an electrically conductive sheet. The connector pads have a thickness of at least 60% of the thickness of the conductive sheet and the respective studs have a thickness of no more than 40% of the thickness of the conductive sheet. | 2011-05-12 |
20110108968 | Semiconductor package with metal straps - A copper strap for a semiconductor device package having a contact electrically connected to a die electrode, a leg portion electrically connected to a lead frame, a web portion positioned between the contact and the leg portion and connected to the leg portion and a connection region connecting the web portion to the contact. The contact includes a body having a plurality of formations, each of the plurality of formations having a concavity and an opposing convexity positioned to generally face the die electrode. | 2011-05-12 |
20110108969 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH LEADS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a die paddle, having paddle projections along a paddle peripheral side; forming a lead terminal having a lead extension with the lead extension extending towards the paddle peripheral side and between the paddle projections; mounting an integrated circuit over the die paddle; connecting the integrated circuit and the lead extension; and forming an encapsulation over the die paddle and covering the integrated circuit and lead extension. | 2011-05-12 |
20110108970 | SEMICONDUCTOR FLIP CHIP PACKAGE HAVING SUBSTANTIALLY NON-COLLAPSIBLE SPACER AND METHOD OF MANUFACTURE THEREOF - A flip chip lead frame package includes a die and a lead frame having a die paddle and leads, and has a spacer to maintain a separation between the die and the die paddle. Also, methods for making the package are disclosed. | 2011-05-12 |
20110108971 | LAMINATE ELECTRONIC DEVICE - A laminate electronic device comprises a first semiconductor chip, the first semiconductor chip defining a first main face and a second main face opposite to the first main face, and having at least one electrode pad on the first main face. The laminate electronic device further comprises a carrier having a first structured metal layer arranged at a first main surface of the carrier. The first structured metal layer is bonded to the electrode pad via a first bond layer of a conductive material, wherein the first bond layer has a thickness of less than 10 μm. A first insulating layer overlies the first main surface of the carrier and the first semiconductor chip. | 2011-05-12 |
20110108972 | Integrated Circuit Die Stacks With Translationally Compatible Vias - An integrated circuit die stack including a first integrated circuit die mounted upon a substrate, the first die including pass-through vias (‘PTVs’) composed of conductive pathways through the first die with no connection to any circuitry on the first die; and a second integrated circuit die, identical to the first die, shifted in position with respect to the first die and mounted upon the first die, with the PTVs in the first die connecting signal lines from the substrate through the first die to through silicon vias (‘TSVs’) in the second die composed of conductive pathways through the second die connected to electronic circuitry on the second die; with the TSVs and PTVs disposed upon each identical die so that the positions of the TSVs and PTVs on each identical die are translationally compatible with respect to the TSVs and PTVs on the other identical die. | 2011-05-12 |
20110108973 | CHIP PACKAGE STRUCTURE AND METHOD FOR FABRICATING THE SAME - The disclosure provides a chip package structure and method for fabricating the same. The chip package structure includes at least one chip having at least one through via. At least one stress buffering structure is disposed in the through via. The stress buffering structure includes a first gasket and a second gasket. A supporting pillar has two terminals respectively connected to the first gasket and the second gasket. The cross-sectional area of the supporting pillar is smaller than areas of the first gasket and the second gasket. A buffering layer is sandwiched between the first gasket and the second gasket, surrounding a sidewall of the supporting pillar. An insulating layer is disposed on the through via, surrounding a sidewall of the stress buffering structure. | 2011-05-12 |
20110108974 | POWER AND SIGNAL DISTRIBUTION OF INTEGRATED CIRCUITS - A packaged integrated circuit is provided comprising a first semiconductor die, a second semiconductor die, and a bonding wire. The first semiconductor die has a first internal bonding pad electrically connected to the package. The second semiconductor die has a second internal bonding pad located in an internal portion of the second semiconductor die. The second internal bonding pad is electrically connected to the first internal bonding pad through the first bonding wire. | 2011-05-12 |
20110108975 | Semiconductor package and system - Even when only one of semiconductor packages mounted by carrying out infrared reflow is defective, it is required to carry out infrared reflow again to dismount this defective semiconductor package from a mounting board. At this time, stress of heat is also applied to the other non-defective semiconductor packages. For this reason, if infrared reflow is carried out beyond a number of times of infrared reflow specified for non-defective semiconductor packages, the operation of each non-defective semiconductor package cannot be assured. In this case, it is inevitable to discard the semiconductor packages together with the mounting board. To solve this problem, a magnetic material is passed through a hole penetrating a protection member and a package board and the relevant semiconductor package is fixed over a mounting board by this magnetic material. To supply power to the semiconductor package, electromagnetic induction by coils provided in the package board and the mounting board is used. | 2011-05-12 |
20110108976 | STACKED INTEGRATED CIRCUIT AND PACKAGE SYSTEM AND METHOD FOR MANUFACTURING THEREOF - A method for manufacturing a stacked integrated circuit and package system includes: attaching a high temperature resistant layer on a top substrate; mounting a first top integrated circuit on the high temperature resistant layer; mounting a second top integrated circuit on the first top integrated circuit; molding an encapsulant over the first top integrated circuit, the second top integrated circuit and the top substrate; mounting a third top integrated circuit over the first top integrated circuit on a surface opposite the second top integrated circuit; mounting a fourth top integrated circuit on the third top integrated circuit; molding an encapsulant over the third top integrated circuit, the fourth top integrated circuit and the top substrate; forming top electrical connectors on a lower surface of the top substrate; and mounting a bottom package to the top electrical connectors. | 2011-05-12 |
20110108977 | PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF - The present invention discloses a semiconductor device package structure with redistribution layer (RDL) and through silicon via (TSV) techniques. The package structure comprises an electronic element which includes a dielectric layer on a backside surface of the electronic element, a plurality of first conductive through vias across through the electronic element and the dielectric layer, and a plurality of conductive pads accompanying the first conductive through vias on an active surface of the electronic element; a filler material disposed adjacent to the electronic element; a first redistribution layer disposed over the dielectric layer and the filler material, and connected to the first conductive through vias; a first protective layer disposed over the active surface of the electronic element, the conductive pads, and the filler material; and a second protective layer disposed over the redistribution layer, the dielectric layer, and the filler material. | 2011-05-12 |
20110108978 | GRAPHENE NANOPLATELET METAL MATRIX - A metal matrix composite is disclosed that includes graphene nanoplatelets dispersed in a metal matrix. The composite provides for improved thermal conductivity. The composite may be formed into heat spreaders or other thermal management devices to provide improved cooling to electronic and electrical equipment and semiconductor devices. | 2011-05-12 |
20110108979 | SEMICONDUCTOR DEVICE AND DISPLAY APPARATUS - In a COF of an embodiment of the present invention, the smaller distance to edges of a heat-releasing member an area of the heat-releasing member has, the larger openings the area has. Accordingly, a volume per area (an area per length) of the heat-releasing member decreases toward the edges. The arrangement improves flexibility of the COF. This prevents a stress caused by bending the COF from concentrating at the edges. This makes it possible to prevent a line on an insulating film from being broken. Also, it becomes possible to prevent an anisotropic conductive resin from coming off which is used to bond the COF with a display panel in providing the COF in a display apparatus. | 2011-05-12 |
20110108980 | STABLE GOLD BUMP SOLDER CONNECTIONS - A metallic interconnect structure ( | 2011-05-12 |
20110108981 | REDISTRIBUTION LAYER ENHANCEMENT TO IMPROVE RELIABILITY OF WAFER LEVEL PACKAGING - An enhanced redistribution layer is provided that geometrically expands redistribution layer (RDL) pads associated with a ball grid array of a wafer level package (WLP) to provide tensile stress relief during temperature cycle and/or drop testing of the WLP. | 2011-05-12 |
20110108982 | PRINTED CIRCUIT BOARD - A printed circuit board includes a body part formed with connection pads on a first surface thereof; and a warpage compensating part formed over the first surface of the body part and having a height that increases from edges toward a center of the warpage compensating part so that an upper surface of the warpage compensating part facing away from the first surface of the body part is convex upward. The warpage compensating part comprises conductive layer patterns formed over the first surface of the body part to be electrically connected to the connection pads; and a solder resist formed over the first surface of the body part so as to expose the conductive layer patterns. The height of the solder resist gradually increases from both edges toward a center of the solder resist. | 2011-05-12 |
20110108983 | Integrated Circuit - An integrated circuit includes a die including contacts formed thereon. A first dielectric layer is formed on the die. The first dielectric layer includes apertures defined therein corresponding to the contacts. A second dielectric layer is formed on the second dielectric layer. The second dielectric layer includes apertures defined therein corresponding to the apertures of the first dielectric layer. Redistribution layers are located in the apertures of the first and second dielectric layers and connected to the contacts. A passivation layer is located on the second dielectric layer and the redistribution layers. The passivation layer includes apertures corresponding to the redistribution layers. A solder ball is located in each of the apertures of the passivation layer and connected to a related one of the redistribution layers. | 2011-05-12 |
20110108984 | CIRCUIT BOARD AND CHIP PACKAGE STRUCTURE - A circuit board includes a substrate that has a top surface and a base surface opposite to each other, at least a top pad disposed on the top surface, a top solder resist layer disposed on the top surface and covering a portion of the top pad, and a pre-bump disposed on the top pad. The top solder resist layer has a first opening exposing a portion of the top pad. The pre-bump is located in the first opening and has a protrusion protruding from the top solder resist layer. A maximum width of the protrusion is less than or equal to a width of the top pad. A chip package structure having the circuit board is also provided. | 2011-05-12 |
20110108985 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A method for manufacturing a semiconductor device comprises: etching a semiconductor substrate to form a plurality of pillar patterns; depositing an insulating layer on the surface of the pillar pattern; removing a portion of the insulating layer located at one side of the pillar pattern to form a contact hole that exposes the pillar pattern; forming a barrier film in the contact hole; and forming a junction in the pillar pattern that contacts with the contact hole. In the method, when a buried bit line is formed, a diffusion barrier is formed in the contact hole and a junction is formed in the lower portion of the pillar pattern, thereby improving characteristics of the device. | 2011-05-12 |
20110108986 | THROUGH-SILICON VIA STRUCTURE AND A PROCESS FOR FORMING THE SAME - A semiconductor substrate has a front surface and a back surface, and a TSV structure is formed to extend through the semiconductor substrate. The TSV structure includes a metal layer, a metal seed layer surrounding the metal layer, a barrier layer surrounding the metal seed layer, and a block layer formed in a portion sandwiched between the metal layer and the metal seed layer. The block layer includes magnesium (Mg), iron (Fe), cobalt (Co), nickel (Ni), titanium (Ti), chromium (Cr), tantalum (Ta), tungsten (W), cadmium (Cd), or combinations thereof. | 2011-05-12 |
20110108987 | SEMICONDUCTOR DEVICE - A semiconductor device, may include a first insulating layer formed on a semiconductor substrate, a contact provided in the first insulating layer, a second dielectric layer formed on the first insulating layer, the second insulating layer having lower dielectric constant than the first dielectric layer, a wiring formed in the second insulating layer and being electrically connected to the contact, a first barrier metal formed on a bottom of the contact and on a side surface of the wiring, and a second barrier metal formed on a side surface of the bottom and on the first barrier metal. | 2011-05-12 |
20110108988 | VIA STRUCTURES AND SEMICONDUCTOR DEVICES HAVING THE VIA STRUCTURES - A via structure may include a first conductive pattern, a buffer pattern, and a second conductive pattern. The first conductive pattern may be on an inner wall of a first substrate and the inner wall may define a via hole passing at least partially through the first substrate. The buffer pattern may be on the first conductive pattern and the buffer pattern may partially fill the via hole. The second conductive pattern may be on a top surface of the buffer pattern in the via hole. | 2011-05-12 |
20110108989 | PROCESS FOR REVERSING TONE OF PATTERNS ON INTEGERATED CIRCUIT AND STRUCTURAL PROCESS FOR NANOSCALE FABRICATION - A process to produce an airgap on a substrate having a dielectric layer comprises defining lines by lithography where airgaps are required. The lines' dimensions are shrunk by a trimming process (isotropic etching). The tone of the patterns is reversed by applying a planarizing layer which is etched down to the top of the patterns. The photoresist is removed, leading to sub-lithographic trenches which are transferred into a cap layer and eventually into the dielectric between two metal lines. The exposed dielectric is eventually damaged, and is etched out, leading to airgaps between metal lines. The gap is sealed by the pinch-off occurring during the deposition of the subsequent dielectric. | 2011-05-12 |
20110108990 | Capping of Copper Interconnect Lines in Integrated Circuit Devices - A method for capping lines includes forming a metal film layer on a copper line by a selective deposition process, the copper line disposed in a dielectric substrate, wherein the depositing also results in the deposition of stray metal material on the surface of the dielectric substrate, and etching with an isotropic etching process to remove a portion of the metal film layer and the stray metal material on the surface of the dielectric substrate, wherein the metal film layer is deposited at an initial thickness sufficient to leave a metal film layer cap remaining on the copper line following the removal of the stray metal material. | 2011-05-12 |