26th week of 2015 patent applcation highlights part 63 |
Patent application number | Title | Published |
20150179499 | Air-Gap Forming Techniques for Interconnect Structures - An interconnect structure includes a first low-k dielectric layer formed over a substrate. A first metal line is disposed in the first low-k dielectric layer. The first metal line includes a first conductive body with a first width and an up landing pad with a second width. The first width is smaller than the second width. The interconnect structure further includes a first air-gap adjacent to sidewalls of the first conductive body. The interconnect structure also includes a second low-k dielectric layer formed over the first low-k dielectric layer and a first via in the second low-k dielectric layer and disposed on the up landing pad. | 2015-06-25 |
20150179500 | Formation of a Masking Layer on a Dielectric Region to Facilitate Formation of a Capping Layer on Electrically Conductive Regions Separated by the Dielectric Region - A masking layer is formed on a dielectric region of an electronic device so that, during subsequent formation of a capping layer on electrically conductive regions of the electronic device that are separated by the dielectric region, the masking layer inhibits formation of capping layer material on or in the dielectric region. The capping layer can be formed selectively on the electrically conductive regions or non-selectively; in either case, capping layer material formed over the dielectric region can subsequently be removed, thus ensuring that capping layer material is formed only on the electrically conductive regions. Silane-based materials, can be used to form the masking layer. The capping layer can be formed of an conductive material, a semiconductor material, or an insulative material, and can be formed using any appropriate process, including conventional deposition processes such as electroless deposition, chemical vapor deposition, physical vapor deposition or atomic layer deposition. | 2015-06-25 |
20150179501 | TECHNIQUES FOR TRENCH ISOLATION USING FLOWABLE DIELECTRIC MATERIALS - Techniques are disclosed for providing trench isolation of semiconductive fins using flowable dielectric materials. In accordance with some embodiments, a flowable dielectric can be deposited over a fin-patterned semiconductive substrate, for example, using a flowable chemical vapor deposition (FCVD) process. The flowable dielectric may be flowed into the trenches between neighboring fins, where it can be cured in situ, thereby forming a dielectric layer over the substrate, in accordance with some embodiments. Through curing, the flowable dielectric can be converted, for example, to an oxide, a nitride, and/or a carbide, as desired for a given target application or end-use. In some embodiments, the resultant dielectric layer may be substantially defect-free, exhibiting no or an otherwise reduced quantity of seams/voids. After curing, the resultant dielectric layer can undergo wet chemical, thermal, and/or plasma treatment, for instance, to modify at least one of its dielectric properties, density, and/or etch rate. | 2015-06-25 |
20150179502 | Two-Step Shallow Trench Isolation (STI) Process - Methods of making an integrated circuit are disclosed. An embodiment method includes etching a trench in a silicon substrate, depositing a first layer of isolation material in the trench, the first layer of isolation material projecting above surface of the silicon substrate, capping the first layer of isolation material by depositing a second layer of isolation material, the second layer of isolation material extending along at least a portion of sidewalls of the first layer of isolation material, epitaxially-growing a silicon layer upon the silicon substrate, the silicon layer horizontally adjacent to the second layer of isolation material, and forming a gate structure on the silicon layer, the gate structure defining a channel. | 2015-06-25 |
20150179503 | Mechanism for FinFET Well Doping - The embodiments of mechanisms for doping wells of finFET devices described in this disclosure utilize depositing doped films to dope well regions. The mechanisms enable maintaining low dopant concentration in the channel regions next to the doped well regions. As a result, transistor performance can be greatly improved. The mechanisms involve depositing doped films prior to forming isolation structures for transistors. The dopants in the doped films are used to dope the well regions near fins. The isolation structures are filled with a flowable dielectric material, which is converted to silicon oxide with the usage of microwave anneal. The microwave anneal enables conversion of the flowable dielectric material to silicon oxide without causing dopant diffusion. Additional well implants may be performed to form deep wells. Microwave anneal(s) may be used to anneal defects in the substrate and fins. | 2015-06-25 |
20150179504 | Handle Substrates of Composite Substrates for Semiconductors - A handle substrate | 2015-06-25 |
20150179505 | SEMICONDUCTOR STRUCTURE WITH TRL AND HANDLE WAFER CAVITIES - A method is disclosed. The method comprises fabricating a device layer on a top portion of a semiconductor wafer that comprises a substrate. The device layer comprises an active device. The method also comprises forming a trap rich layer at a top portion of a handle wafer. The forming comprises etching the top portion of the handle wafer to form a structure in the top portion of the handle wafer that configures the trap rich layer. The method also comprises bonding a top surface of the handle wafer to a top surface of the semiconductor wafer. The method also comprises removing a bottom substrate portion of the semiconductor wafer. | 2015-06-25 |
20150179506 | METHOD FOR PRODUCING SOS SUBSTRATES, AND SOS SUBSTRATE - A method for producing SOS substrates which can be incorporated into a semiconductor production line, and is capable of producing SOS substrates which have few defects and no variation in defects, and in a highly reproducible manner, or in other words, a method for producing SOS substrates by: forming an ion-injection region ( | 2015-06-25 |
20150179507 | METHODS FOR PROCESSING A SEMICONDUCTOR DEVICE - According to one embodiment, a method for processing a semiconductor device is provided including forming a final metal layer forming a passivation layer over the final metal layer and structuring the passivation layer and the final metal layer to form a patterned metal layer and a patterned passivation layer, wherein the patterned metal layer includes a pad region covered by the patterned passivation layer. | 2015-06-25 |
20150179508 | Tantalum-Based Copper Barriers and Methods for Forming the Same - Embodiments described herein provide tantalum-based copper barriers and methods for forming such barriers. A dielectric body is provided. A first layer is formed above the dielectric body. The first layer includes tantalum. A second layer is formed above the first layer. The second layer includes manganese. A third layer is formed above the second layer. The third layer includes copper. | 2015-06-25 |
20150179509 | Plasma Treatment of Low-K Surface to Improve Barrier Deposition - Methods and apparatus for processing using a remote plasma source are disclosed. The apparatus includes an outer chamber enclosing a substrate support, a remote plasma source, and a showerhead. A substrate heater can be mounted in the substrate support. A transport system moves the substrate support and is capable of positioning the substrate. The plasma system may be used to generate activated species. The activated species can be used to treat the surfaces of low-k and/or ultra low-k dielectric materials to facilitate improved deposition of diffusion barrier materials. | 2015-06-25 |
20150179510 | TECHNOLOGY FOR SELECTIVELY ETCHING TITANIUM AND TITANIUM NITRIDE IN THE PRESENCE OF OTHER MATERIALS - Methods for selectively etching titanium and titanium nitride are disclosed. In some embodiments the method involve exposing a workpiece to a first solution to remove titanium nitride, exposing the workpiece to a second solution to remove titanium, and exposing the workpiece to a third solution to remove residual titanium nitride, if any. The solutions are formulated such that they may selectively remove titanium and/or titanium nitride, while not etching or not substantially etching certain other materials such as dielectric materials, oxides, and metals other than titanium. | 2015-06-25 |
20150179511 | Curing Photo Resist for Improving Etching Selectivity - A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask. | 2015-06-25 |
20150179512 | Method of Integrated Circuit Fabrication - A method of fabricating an integrated circuit (IC) is disclosed. The method includes providing a substrate having a conductive feature. A dielectric layer is formed over the substrate, having an opening to expose the conductive feature. A tungsten (W) capping layer is formed over the conductive feature in the opening without using fluorine-containing gases. A bulk W layer is formed over the W capping layer. | 2015-06-25 |
20150179513 | DIAGONAL HARDMASKS FOR IMPROVED OVERLAY IN FABRICATING BACK END OF LINE (BEOL) INTERCONNECTS - Self-aligned via and plug patterning using diagonal hardmasks for improved overlay in fabricating back end of line (BEOL) interconnects is described. In an example, a method of fabricating an interconnect structure for an integrated circuit involves forming a first hardmask layer above an interlayer dielectric layer disposed above a substrate. The first hardmask layer includes a plurality of first hardmask lines having a first grating in a first direction and comprising one or more sacrificial materials interleaved with the first grating. The method also involves forming a second hardmask layer above the first hardmask layer. The second hardmask layer includes a plurality of second hardmask lines having a second grating in a second direction, diagonal to the first direction. The method also involves, using the second hardmask layer as a mask, etching the first hardmask layer to form a patterned first hardmask layer. The etching involves removing a portion of the one or more sacrificial materials. | 2015-06-25 |
20150179514 | CLUSTER SYSTEM FOR ELIMINATING BARRIER OVERHANG - A cluster tool is disclosed that can increase throughput of a wafer fabrication process by facilitating removal of barrier overhang in contact holes of contact film stacks. Individual chambers of the cluster tool provide for deposition of barrier material onto a semiconductor structure, depositing over with an amorphous carbon film (ACF), etching back the ACF, and etching a corner region of the contact hole. Removal of the barrier overhang improves the quality of metal fill-in of the contact hole. An expectedly ensuing feature entails a technique in which filling-in of the contact hole with a metal such as tungsten can be achieved with attenuated or eliminated adverse consequence. | 2015-06-25 |
20150179515 | METHOD OF FORMING HIGH DENSITY, HIGH SHORTING MARGIN, AND LOW CAPACITANCE INTERCONNECTS BY ALTERNATING RECESSED TRENCHES - Embodiments of the invention describe low capacitance interconnect structures for semiconductor devices and methods for manufacturing such devices. According to an embodiment of the invention, a low capacitance interconnect structure comprises an interlayer dielectric (ILD). First and second interconnect lines are disposed in the ILD in an alternating pattern. The top surfaces of the first interconnect lines may be recessed below the top surfaces of the second interconnect lines. Increases in the recess of the first interconnect lines decreases the line-to-line capacitance between neighboring interconnects. Further embodiments include utilizing different dielectric materials as etching caps above the first and second interconnect lines. The different materials may have a high selectivity over each other during an etching process. Accordingly, the alignment budget for contacts to individual interconnect lines is increased. | 2015-06-25 |
20150179516 | INTEGRATED STRUCTURE AND METHOD FOR FABRICATING THE SAME - A method for fabricating integrated structure is disclosed. The method includes the steps of: providing a substrate; forming a through-silicon hole in the substrate; forming a patterned resist on the substrate, wherein the patterned resist comprises at least one opening corresponding to a redistribution layer (RDL) pattern and exposing the through-silicon hole and at least another opening corresponding to another redistribution layer (RDL) pattern and connecting to the at least one opening; and forming a conductive layer to fill the through-silicon hole, the at least one opening and the at least another opening in the patterned resist so as to form a through-silicon via, a through-silicon via RDL pattern and another RDL pattern in one structure. | 2015-06-25 |
20150179517 | SEMICONDUCTOR SUBSTRATE AND FABRICATION METHOD THEREOF - A method for fabricating a semiconductor substrate is disclosed, which includes: forming a first dielectric layer on a substrate body; forming a plurality of first vias penetrating the first dielectric layer to expose portions of the substrate body; forming a second dielectric layer on the first dielectric layer and the exposed portions of the substrate body, wherein the second dielectric layer extends on walls of the first vias; etching the second dielectric layer to form a plurality of openings communicating with the first vias and form a plurality of second vias penetrating the second dielectric layer in the first vias so as to expose portions of the substrate body, leaving the second dielectric layer on the walls of the first vias; and forming a circuit layer in the openings, and forming a plurality of conductive vias in the second vias for electrically connecting the circuit layer and the substrate body. | 2015-06-25 |
20150179518 | METHOD OF FORMING CONTACT LAYER - A method of forming a contact layer on a substrate having a contact hole to make a contact between the substrate and a buried metal material, includes disposing the substrate in a chamber, introducing a Ti source gas, a reducing gas and an Si source gas into the chamber, and converting the Ti source gas, the reducing gas and the Si source gas into plasma to form a TiSi | 2015-06-25 |
20150179519 | INTERCONNECTION STRUCTURES IN A SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURING THE SAME - Methods of fabricating interconnection structures of a semiconductor device are provided. The method includes, inter alia: forming a first insulation layer on a semiconductor substrate, forming a mold layer having trenches on the first insulation layer, forming a sidewall protection layer including a first metal silicide layer on sidewalls of the trenches, forming second metal lines that fill the trenches, forming upper protection layers on the second metal lines, removing the mold layer after formation of the upper protection layers to provide gaps between second metal lines, and forming a second insulation layer in the gaps and on the upper protection layers. The second insulation layer is formed to include air gaps between the second metal lines. Related interconnection structures are also provided. | 2015-06-25 |
20150179520 | METHODS FOR FABRICATION OF SEMICONDUCTOR STRUCTURES USING LASER LIFT-OFF PROCESS, AND RELATED SEMICONDUCTOR STRUCTURES - Methods of fabricating a semiconductor structure include bonding a carrier wafer over a substrate, removing at least a portion of the substrate, transmitting laser radiation through the carrier wafer and weakening a bond between the substrate and the carrier wafer, and separating the carrier wafer from the substrate. Other methods include forming circuits over a substrate, forming trenches in the substrate to define unsingulated semiconductor dies, bonding a carrier substrate over the unsingulated semiconductor dies, transmitting laser radiation through the carrier substrate and weakening a bond between the unsingulated semiconductor dies and the carrier substrate, and separating the carrier substrate from the unsingulated semiconductor dies. Some methods include thinning at least a portion of the substrate, leaving the plurality of unsingulated semiconductor dies bonded to the carrier substrate. | 2015-06-25 |
20150179521 | DEVICE WAFER PROCESSING METHOD - A device wafer processing method includes: a groove forming step in which grooves with a predetermined depth are formed in the front side of a device wafer; a plate attaching step in which a plate is attached to the front side of the wafer through an adhesive; a grinding step in which the wafer is held by a holding table through the plate so as to expose the back side of the wafer, and the back side is ground to expose the grooves at the back side of the wafer, thereby dividing the wafer to form a plurality of chips. The method further includes: a film attaching step in which a film is attached to the back side of the wafer; and a dicing step in which the film is diced along division lines from the side of the back side of the wafer. | 2015-06-25 |
20150179522 | Methods and Apparatus for Wafer Level Packaging - A semiconductor device includes a substrate, a bond pad above the substrate, a guard ring above the substrate, and an alignment mark above the substrate, between the bond pad and the guard ring. The device may include a passivation layer on the substrate, a polymer layer, a post-passivation interconnect (PPI) layer in contact with the bond pad, and a connector on the PPI layer, wherein the connector is between the bond pad and the guard ring, and the alignment mark is between the connector and the guard ring. The alignment mark may be at the PPI layer. There may be multiple alignment marks at different layers. There may be multiple alignment marks for the device around the corners or at the edges of an area surrounded by the guard ring. | 2015-06-25 |
20150179523 | LASER LIFT OFF SYSTEMS AND METHODS - Laser lift off systems and methods may be used to provide monolithic laser lift off with minimal cracking by reducing the size of one or more beam spots in one or more dimensions to reduce plume pressure while maintaining sufficient energy to provide separation. By irradiating irradiation zones with various shapes and in various patterns, the laser lift off systems and methods use laser energy more efficiently, reduce cracking when separating layers, and improve productivity. Some laser lift off systems and methods described herein separate layers of material by irradiating non-contiguous irradiation zones with laser lift off zones (LOZs) that extend beyond the irradiation zones. Other laser lift off systems and methods described herein separate layers of material by shaping the irradiation zones and by controlling the overlap of the irradiation zones in a way that avoids uneven exposure of the workpiece. Consistent with at least one embodiment, a laser lift off system and method may be used to provide monolithic lift off of one or more epitaxial layers on a substrate of a semiconductor wafer. | 2015-06-25 |
20150179524 | Fin-Like Field Effect Transistor (FINFET) Based, Metal-Semiconductor Alloy Fuse Device And Method Of Manufacturing Same - A fuse device and method for fabricating the fuse device is disclosed. An exemplary fuse device includes a first contact and a second contact coupled with a metal-semiconductor alloy layer, wherein the metal-semiconductor alloy layer extends continuously between the first contact and the second contact. The metal-semiconductor alloy layer is disposed over an epitaxial layer that is disposed over a fin structure of a substrate. | 2015-06-25 |
20150179525 | HIGH VOLTAGE THREE-DIMENSIONAL DEVICES HAVING DIELECTRIC LINERS - High voltage three-dimensional devices having dielectric liners and methods of forming high voltage three-dimensional devices having dielectric liners are described. For example, a semiconductor structure includes a first fin active region and a second fin active region disposed above a substrate. A first gate structure is disposed above a top surface of, and along sidewalls of, the first fin active region. The first gate structure includes a first gate dielectric, a first gate electrode, and first spacers. The first gate dielectric is composed of a first dielectric layer disposed on the first fin active region and along sidewalls of the first spacers, and a second, different, dielectric layer disposed on the first dielectric layer and along sidewalls of the first spacers. The semiconductor structure also includes a second gate structure disposed above a top surface of, and along sidewalls of, the second fin active region. The second gate structure includes a second gate dielectric, a second gate electrode, and second spacers. The second gate dielectric is composed of the second dielectric layer disposed on the second fin active region and along sidewalls of the second spacers. | 2015-06-25 |
20150179526 | ANTI-FUSE ARRAY OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME - An anti-fuse array of a semiconductor device and a method for forming the same are disclosed. The anti-fuse array for a semiconductor device includes a first-type semiconductor substrate formed to define an active region by a device isolation region, a second-type impurity implantation region formed in the active region, a first-type channel region isolated from the semiconductor substrate by the second-type impurity implantation region, a gate electrode formed over the channel region, and a first metal contact formed over the second-type impurity implantation region. | 2015-06-25 |
20150179527 | SEMICONDUCTOR DEVICE HAVING VARYING P-TOP AND N-GRADE REGIONS - An improved semiconductor is provided whereby n-grade and the p-top layers are defined by a series of discretely placed n-type and p-type diffusion segments. Also provided are methods for fabricating such a semiconductor. | 2015-06-25 |
20150179528 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device may include forming a gate structure that includes a dummy gate member on a substrate. The method may further include forming two first-type spacers such that the dummy gate member is positioned between the first-type spacers. The method may further include forming two second-type spacers such that the first-type spacers are positioned between the second-type spacers. The method may further include forming two third-type spacers such that the second-type spacers are positioned between the third-type spacers. The method may further include performing etch to remove the third-type spacers and to at least partially remove the second-type spacers. The method may further include removing at least a portion of the dummy gate member to form a space between remaining portions of the first-type spacers. The method may further include providing a metal material in the space for forming a metal gate member. | 2015-06-25 |
20150179529 | THERMAL ANALYSIS FOR TIERED SEMICONDUCTOR STRUCTURE - Among other things, one or more systems and techniques for analyzing a tiered semiconductor structure are provided. One or more segments are defined for the tiered semiconductor structure. The one or more segments are iteratively evaluated during electrical simulation while taking into account thermal properties to determine power metrics for the segments. The power metrics are used to determine temperatures generated by integrated circuitry within the segments. Responsive to a segment having a temperature above a temperature threshold, a temperature action plan, such as providing an alert or inserting one or more thermal release structures into the segment, is implemented. In this way, the one or more segments are iteratively evaluated to identify and resolve thermal and reliability issues. | 2015-06-25 |
20150179530 | WAFER ALIGNMENT WITH RESTRICTED VISUAL ACCESS - Wafer alignment with restricted visual access has been disclosed. In an example, a method of processing a substrate for fabricating a solar cell involves supporting the substrate over a stage. The method involves forming a substantially opaque layer over the substrate. The substantially opaque layer at least partially covers edges of the substrate. The method involves performing fit-up of the substantially opaque layer to the substrate. The method involves illuminating the covered edges of the substrate with light transmitted through the stage, and capturing a first image of the covered edges of the substrate based on the light transmitted through the stage. The method further includes determining a first position of the substrate relative to the stage based on the first image of the covered edges. The substrate may be further processed based on the determined first position of the substrate under the substantially opaque layer. | 2015-06-25 |
20150179531 | Uniformity in Wafer Patterning using Feedback Control - A method for patterning a wafer includes performing a first patterning on a wafer, and after performing the first patterning, calculating a simulated dose mapper (DoMa) map predicting a change in critical dimensions of the wafer due to performing a second patterning on the wafer. The method further includes performing the second patterning on the wafer. Performing the second patterning includes adjusting one or more etching parameters of the second patterning in accordance with differences between the simulated DoMa map and desired critical dimensions of the wafer. | 2015-06-25 |
20150179532 | SYSTEM AND METHOD FOR DARK FIELD INSPECTION - The present disclosure provides a method for fabricating a semiconductor structure. The method comprises providing a substrate and a patterned layer formed on the substrate, one or more overlay marks being formed on the patterned layer; performing a pre-film-formation overlay inspection using a bright field (BF) inspection tool to receive a pre-film-formation data on the one or more overlay marks on the patterned layer; forming one or more layers on the patterned layer; performing a post-film-formation overlay inspection using a dark field (DF) inspection tool to receive a post-film-formation data on the one or more overlay marks underlying the one or more layers; and determining whether the pre-film-formation data matches the post-film-formation data. | 2015-06-25 |
20150179533 | Semiconductor Manufacturing Apparatus and Method of Manufacturing Semiconductor Device - In one embodiment, a semiconductor manufacturing apparatus includes a support module configured to support a wafer which includes a substrate and a workpiece layer provided on the substrate and has a first face on a side of the workpiece layer and a second face on a side of the substrate, a chamber configured to contain the support module, and a microwave generator configured to generate a microwave. The apparatus further includes a waveguide provided on an upper face side or a lower face side of the chamber, and configured to irradiate the second face of the wafer with the microwave. The apparatus further includes a thermometer provided on the same side where the waveguide is provided selected from the upper face side and the lower face side of the chamber, and configured to measure a temperature on a side of the second face of the wafer. | 2015-06-25 |
20150179534 | Testing of Semiconductor Components and Circuit Layouts Therefor - In one embodiment of the present invention, a method of forming a semiconductor device includes performing a test during the forming of the semiconductor device within and/or over a substrate. A first voltage is applied to a first node coupled to a component to be tested in the substrate and a test voltage at a pad coupled to the component to be tested through a second node. The test voltage has a peak voltage higher than the first voltage. The component to be tested is coupled between the first node and the second node. A leakage current is measured through the component to be tested in response to the test voltage. After performing the test, the second node is connected to a functional block in the substrate. The first node is coupled to a third node coupled to the functional block. | 2015-06-25 |
20150179535 | SEMICONDUCTOR WAFERS EMPLOYING A FIXED-COORDINATE METROLOGY SCHEME AND METHODS FOR FABRICATING INTEGRATED CIRCUITS USING THE SAME - Semiconductor wafers employing a fixed coordinate metrology scheme and methods for fabricating integrated circuits using the same are disclosed. In an exemplary embodiment, a semiconductor wafer employing a fixed-coordinate metrology scheme includes an external scribe region in the form of a first rectangular ring, the first rectangular ring defining a first interior space inward from the external scribe region and an interior scribe region in the form of a second rectangular ring, disposed within the first interior space and immediately adjacent to the external scribe region at all points along its exterior perimeter, the second rectangular ring defining a second interior space inward from the interior scribe region, the second interior space being wholly within the first interior space. The semiconductor wafer further includes a technology-specific tile region disposed within the second interior space and immediately adjacent to the interior scribe region and an electrical testable scribe line measurement (ETSLM) region disposed within the second interior space and immediately adjacent to both the technology-specific tile region and the interior scribe region. Still further, the semiconductor wafer includes a free floorplan area disposed within the second interior space and immediately adjacent to both the ETSLM region and the interior scribe region. | 2015-06-25 |
20150179536 | CIRCUIT TECHNIQUE TO ELECTRICALLY CHARACTERIZE BLOCK MASK SHIFTS - A physical test integrated circuit has a plurality of repeating circuit portions corresponding to an integrated circuit design. A first of the portions is fabricated with a nominal block mask location, and additional ones of the portions are deliberately fabricated with predetermined progressive increased offset of the block mask location from the nominal block mask location. For each of the portions, the difference in threshold voltage between a first field effect transistor and a second field effect transistor is determined. The predetermined progressive increased offset of the block mask location is in a direction from the first field effect transistor to the second field effect transistor. The block mask overlay tolerance is determined at a value of the progressive increased offset corresponding to an inflection of the difference in threshold voltage from a zero difference. A method for on-chip monitoring, and corresponding circuits, are also disclosed. | 2015-06-25 |
20150179537 | SEMICONDUCTOR ELEMENT, SEMICONDUCTOR DEVICE INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT - To provide a semiconductor element that can have the high adhesion between a substrate made of an oxide or the like and a metal film, a semiconductor element includes a substrate made of an oxide, a semiconductor element structure provided on an upper surface of the substrate, and a metal film provided on a lower surface of the substrate, in which the metal film contains nanoparticles made of an oxide. | 2015-06-25 |
20150179538 | PROTECTIVE FILM MATERIAL FOR LASER PROCESSING AND WAFER PROCESSING METHOD USING THE PROTECTIVE FILM MATERIAL - A protective film material for protecting a surface of a wafer during a laser processing treatment contains a water soluble poly-N-vinyl acetamide. The protective film material is applied to the surface of the wafer which is then irradiated with a laser beam through the protective film material to perform a laser processing treatment. After the laser processing treatment, the protective film material is removed by washing with water. | 2015-06-25 |
20150179539 | LASER WELDING METHOD, LASER WELDING JIG, AND SEMICONDUCTOR DEVICE - In a laser welding method, a gap between first and second members to be welded is made at most 300 μm by pressing the second member against the first member with claws that are pressing parts of a laser welding jig, and the second member to be welded at a place between the claws is irradiated by laser light to laser-weld the first member and the second member. In a semiconductor device, the gap between the first member and the second member at the portion of laser-welding is at most 300 μm. | 2015-06-25 |
20150179540 | SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate having a first surface and a second surface. A semiconductor chip is disposed on the first surface of the substrate. A first metal pattern is disposed on a central portion of the second surface. A second metal pattern is disposed on the second surface and spaced from the first metal pattern. A thermal conducting material is affixed to the first and second metal patterns. The first metal pattern has no two outer edges that meet to form an angle that is 90° or less, and the second metal pattern is between the first metal pattern and an outer edge of the substrate. | 2015-06-25 |
20150179541 | SEMICONDUCTOR DEVICE STRUCTURE AND METHOD OF MANUFACTURING THE SAME - Embodiments of mechanisms for forming a semiconductor device structure are provided. The semiconductor device structure includes a semiconductor substrate having a first device region and a second device region. The semiconductor device structure further includes first devices in the first device region and second devices in the second device region. The semiconductor device structure also includes a first annular structure continuously surrounding the first device region and a second annular structure continuously surrounding the second device region. The first annular structure has a first thermal diffusion coefficient less than a second thermal diffusion coefficient of the second annular structure. | 2015-06-25 |
20150179542 | EMBEDDED HEAT SPREADER WITH ELECTRICAL PROPERTIES - Embodiments of the invention relate to incorporating one or more antennas or inductor coils into a semi-conductor package. A heat spreader or metal sheet is embedded in the package and stamped or otherwise patterned into a spiral or serpentine form. The pattern enables the spreader to function as an inductor or antenna when connected to a semiconductor chip in communication with a printed circuit board. | 2015-06-25 |
20150179543 | THREE-DIMENSIONAL INTEGRATED CIRCUIT STRUCTURES PROVIDING THERMOELECTRIC COOLING AND METHODS FOR COOLING SUCH INTEGRATED CIRCUIT STRUCTURES - Three-dimensional integrated circuit structures providing thermoelectric cooling and methods for cooling such integrated circuit structures are disclosed. In one exemplary embodiment, a three-dimensional integrated circuit structure includes a plurality of integrated circuit chips stacked one on top of another to form a three-dimensional chip stack, a thermoelectric cooling daisy chain comprising a plurality of vias electrically connected in series with one another formed surrounding the three-dimensional chip stack, a thermoelectric cooling plate electrically connected in series with the thermoelectric cooling daisy chain, and a heat sink physically connected with the thermoelectric cooling plate. | 2015-06-25 |
20150179544 | Semiconductor Device and Method of Wafer Thinning Involving Edge Trimming and CMP - A semiconductor device has a substrate including a plurality of conductive vias formed vertically and partially through the substrate. An encapsulant is deposited over a first surface of the substrate and around a peripheral region of the substrate. A portion of the encapsulant around the peripheral region is removed by a cutting or laser operation to form a notch extending laterally through the encapsulant to a second surface of the substrate opposite the first surface of the substrate. A first portion of the substrate outside the notch is removed by chemical mechanical polishing to expose the conductive vias. A second portion of the substrate is removed by backgrinding prior to or after forming the notch. The encapsulant is coplanar with the substrate after revealing the conductive vias. The absence of an encapsulant/base material interface and coplanarity of the molded substrate results in less over-etching or under-etching and fewer defects. | 2015-06-25 |
20150179545 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME - A semiconductor device includes a through electrode penetrating a substrate such that a first end portion of the through electrode protrudes from a first surface of the substrate, a passivation layer covering the first surface of the substrate and a sidewall of the first end portion of the through electrode, a bump having a lower portion penetrating the passivation layer and coupled to the first end portion of the through electrode, and a lower metal layer disposed between the bump and the first end portion of the through electrode. The lower metal layer extends onto a sidewall of the bump and has a concave shape. | 2015-06-25 |
20150179546 | SEMICONDUCTOR DEVICE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE - There is provided a semiconductor device including a first semiconductor base substrate, a second semiconductor base substrate that is bonded onto a first surface side of the first semiconductor base substrate, a through electrode that is formed to penetrate from a second surface side of the first semiconductor base substrate to a wiring layer on the second semiconductor base substrate, and an insulation layer that surrounds a circumference of the through electrode formed inside the first semiconductor base substrate. | 2015-06-25 |
20150179547 | HYBRID TSV AND METHOD FOR FORMING THE SAME - A semiconductor chip includes a substrate and a semiconductor layer positioned above the substrate. A hybrid through-silicon via (“TSV”) extends continuously through at least the semiconductor layer and the substrate and includes a first TSV portion and a second TSV portion. A bottom plug portion of the first TSV portion is positioned in the substrate and has a lower surface adjacent to a back side of the substrate and an upper surface below the semiconductor layer. Upper sidewall portions of the first TSV portion extend from the upper surface through at least the semiconductor layer. A depth of the bottom plug portion is greater than a thickness of the upper sidewall portions. The second TSV portion is conductively coupled to the first TSV portion, is laterally surrounded by the upper sidewall portions, and extends continuously from the upper surface through at least the semiconductor layer. | 2015-06-25 |
20150179548 | THROUGH SILICON VIA IN N+ EPITAXY WAFERS WITH REDUCED PARASITIC CAPACITANCE - A semiconductor device includes an epitaxy layer formed on semiconductor substrate, a device layer formed on the epitaxy layer, a trench formed within the semiconductor substrate and including a dielectric layer forming a liner within the trench and a conductive core forming a through-silicon via conductor, and a deep trench isolation structure formed within the substrate and surrounding the through-silicon via conductor. A region of the epitaxy layer formed between the through-silicon via conductor and the deep trench isolation structure is electrically isolated from any signals applied to the semiconductor device, thereby decreasing parasitic capacitance. | 2015-06-25 |
20150179549 | SEMICONDUCTOR DEVICE - A method for bypassing a defective through silicon via x in a group of n adjacent through silicon vias, includes receiving a plurality of relief signals to identify the defective through silicon via x, activating x−1 switch circuits to connect x−1 data circuits to through silicon vias 1 to x−1 in the group of n adjacent through silicon vias, activating n−x switch circuits to connect n−x data circuits to through silicon vias x+1 to n in the group of n adjacent through silicon vias, and activating a switch circuit to connect a data circuit to an auxiliary through silicon via which is adjacent through silicon via n in the group of n adjacent through silicon vias. | 2015-06-25 |
20150179550 | Wiring Layout Having Differently Shaped Vias - A method of forming photo masks having rectangular patterns and a method for forming a semiconductor structure using the photo masks is provided. The method for forming the photo masks includes determining a minimum spacing and identifying vertical conductive feature patterns having a spacing less than the minimum spacing value. The method further includes determining a first direction to expand and a second direction to shrink, and checking against design rules to see if the design rules are violated for each of the vertical conductive feature patterns identified. If designed rules are not violated, the identified vertical conductive feature pattern is replaced with a revised vertical conductive feature pattern having a rectangular shape. The photo masks are then formed. The semiconductor structure can be formed using the photo masks. | 2015-06-25 |
20150179551 | SEMICONDUCTOR DEVICE - A semiconductor device including a semiconductor chip, a first electrode pad and second electrode pad included on one surface of the semiconductor chip, a first conductive post joined by a joining material to the first electrode pad, a plurality of second conductive posts joined by a joining material to the second electrode pad, and a printed substrate, disposed opposing the one surface of the semiconductor chip, on which is formed an electrical circuit to which the first conductive post and second conductive posts are connected. The second conductive posts on the side near the first conductive post are arrayed avoiding a short-circuit prevention region at a distance such that the joining material of the first conductive post and the joining material of the second conductive posts do not link. | 2015-06-25 |
20150179552 | SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF - A semiconductor package according to an exemplary embodiment in the present disclosure may include: a substrate having at least one indented portion formed as a groove therein; at least one electronic device mounted on one surface of the substrate; a lead frame bonded to the substrate and electrically connected to the electronic device; and a molded portion sealing the lead frame and the electronic device and including at least one through hole extending the indented portion. | 2015-06-25 |
20150179553 | PRE-MOLDED INTEGRATED CIRCUIT PACKAGES - A leadframe with pre-molded cavities includes an outer frame and a plurality of units. Each unit includes a die pad and a plurality of leads. For each unit, a molding compound extends over a first portion of an upper surface of each of the leads that is located farthest from the die pad. The molding compound may also extend over an upper surface of the die pad. A second portion of the upper surface of each of the plurality of leads that is located nearest the die pad remains exposed outside the molding compound. A thickness of the molding compound covering the first portion of the upper surface of each of the leads is greater than a thickness of the molding compound covering the upper surface of the die pad. | 2015-06-25 |
20150179554 | SEMICONDUCTOR DEVICE - A semiconductor device is disclosed. The semiconductor device has a semiconductor chip, an island having an upper surface to which the semiconductor chip is bonded, a lead disposed around the island, a bonding wire extended between the surface of the semiconductor chip and the upper surface of the lead, and a resin package sealing the semiconductor chip, the island, the lead, and the bonding wire, while the lower surface of the island and the lower surface of the lead are exposed on the rear surface of the resin package, and the lead is provided with a recess concaved from the lower surface side and opened on a side surface thereof. | 2015-06-25 |
20150179555 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH VIALESS SUBSTRATE AND METHOD OF MANUFACTURE THEREOF - A system and method of manufacture of an integrated circuit packaging system includes: a trace layer; a stud directly on a portion of the trace layer for forming a metal-to-metal connection with the trace layer; a dielectric layer directly on the trace layer and the stud for forming a vialess substrate exposing the trace layer and the dielectric layer; an active device on the trace layer, the trace layer exposed from the vialess substrate; a die interconnect coupled between the active device to the trace layer for providing electrical connectivity; and an external interconnect connected to the stud for electrically coupling the active device, the trace layer, the studs, and the external interconnect. | 2015-06-25 |
20150179556 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - There are provided a semiconductor package and a method of manufacturing the same. The semiconductor package according to an exemplary embodiment of the present disclosure includes: a substrate having a first device mounted thereon; a first lead frame formed on the substrate; a second lead frame formed to be spaced apart from the substrate; a post formed on the substrate and formed between the first lead frame and the second lead frame; and a molding part formed to surround the substrate and formed to protrude portions of the first and second lead frames, wherein the post includes a body part bonded to the substrate and a protruding part protruded to an exterior of the molding part. | 2015-06-25 |
20150179557 | SEMICONDUCTOR CHIPS HAVING HEAT CONDUCTIVE LAYER WITH VIAS - A heat conductive layer is deposited on a first surface of a wafer of semiconductor chips. The heat conductive layer is etched to form vias that expose through-electrodes on the first surface of each semiconductor chip. Conductive bumps are deposited on the through-electrodes on a second surface of each semiconductor chip. The semiconductor chips are stacked, wherein the conductive bumps of a second one of the semiconductor chips electrically contact the through-electrodes of a first one of the semiconductor chips through the vias of the first semiconductor chip and the conductive bumps of a third one of the semiconductor chips electrically contact the through-electrodes of the second semiconductor chip through the vias of the second semiconductor chip. | 2015-06-25 |
20150179558 | SEMICONDUCTOR DEVICES HAVING THROUGH-SUBSTRATE VIA PLUGS AND SEMICONDUCTOR PACKAGES INCLUDING THE SAME - Provided is a semiconductor package including a package substrate having lands, a first semiconductor device mounted on the package substrate and having a bottom surface on which first lines are disposed, and solder balls respectively electrically connected to the lands of the package substrate with the first lines of the first semiconductor device. The first semiconductor device includes a first substrate, and through-substrate via (TSV) plugs that vertically pass through the first substrate. The TSV plugs are respectively vertically aligned with the first lines, overlap first regions corresponding to 70% or less of diameters of the solder balls from central axes of the solder balls, and do not overlap second regions corresponding to the remaining 30% or more of diameters of the solder balls from the central axes of the solder balls. Adjacent ones of the TSV plugs are arranged at irregular intervals with respect to each other. | 2015-06-25 |
20150179559 | FORMING FUNCTIONALIZED CARRIER STRUCTURES WITH CORELESS PACKAGES - Methods of forming a microelectronic packaging structure and associated structures formed thereby are described. Those methods may include attaching a die to a carrier material, wherein the carrier material comprises a top layer and a bottom layer separated by an etch stop layer; forming a dielectric material adjacent the die, forming a coreless substrate by building up layers on the dielectric material, and then removing the top layer carrier material and etch stop layer from the bottom layer carrier material. | 2015-06-25 |
20150179560 | Wiring Substrate and Semiconductor Device - A wiring substrate includes first and second wiring structures. The first wiring structure includes a core substrate, first and second insulation layers each formed from a thermosetting insulative resin including a reinforcement material, and a via wire formed in the first insulation layer. The second wiring structure includes a wiring layer formed on upper surfaces of the first insulation layer and the via wire, an insulation layer formed on the upper surface of the first insulation layer, and an uppermost wiring layer including a pad used to electrically connect a semiconductor chip and the wiring layer. An outermost insulation layer stacked on a lower surface of the second insulation layer exposes a portion of a lowermost wiring layer stacked on the lower surface of the second insulation layer as an external connection pad. The second wiring structure has a higher wiring density than the first wiring structure. | 2015-06-25 |
20150179561 | Methods and Apparatus for Package with Interposers - Methods and apparatus for an interposer with dams used in packaging dies are disclosed. An interposer may comprise a metal layer above a substrate. A plurality of dams may be formed above the metal layer around each corner of the metal layer. Dams may be formed on both sides of the interposer substrate. A dam surrounds an area where connectors such as solder balls may be located to connect to other packages. A non-conductive dam may be formed above the dam. An underfill may be formed under the package connected to the connector, above the metal layer, and contained within the area surrounded by the dams at the corner, so that the connectors are well protected by the underfill. Such dams may be further formed on a printed circuit board as well. | 2015-06-25 |
20150179562 | THICKENED STRESS RELIEF AND POWER DISTRIBUTION LAYER - An embodiment includes a semiconductor structure comprising: a frontend portion including a device layer; a backend portion including a bottom metal layer, a top metal layer, and intermediate metal layers between the bottom and top metal layers; wherein (a) the top metal layer includes a first thickness that is orthogonal to the horizontal plane in which the top metal layer lies, the bottom metal layer includes a second thickness; and the intermediate metal layers includes a third thickness; and (b) the first thickness is greater than or equal to a sum of the second and third thicknesses. Other embodiments are described herein. | 2015-06-25 |
20150179563 | SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor device includes a first conductive line and a second conductive line including a first extension region in which the first conductive line and the second conductive line extend in a first direction, and a bend region in which the first conductive line and the second conductive line bend with respect to the first direction, a first dummy pattern and a second dummy pattern arranged on extension regions beyond the bend region of the first conductive line and the second conductive line, respectively, in the first direction, a first contact pad and a second contact pad formed beyond the bend region in the first direction, and connected to the first conductive line and the second conductive line, respectively. | 2015-06-25 |
20150179564 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a stacked structure having first conductive layers stacked stepwise and first insulating layers interposed between the first conductive layers, wherein undercuts are formed under the first conductive layers and each of the first conductive layers includes a first region covered by the first conductive layer and a second region extending from the first region, contact pads coupled to the second regions of the respective first conductive layers, and a liner layer formed on the contact pads and filling the undercuts. | 2015-06-25 |
20150179565 | SEMICONDUCTOR DEVICE WITH ADVANCED PAD STRUCTURE RESISTANT TO PLASMA DAMAGE AND METHOD FOR FORMING THE SAME - A connective structure for bonding semiconductor devices and methods for forming the same are provided. The bonding structure includes an alpad structure, i.e., a thick aluminum-containing connective pad, and a substructure beneath the aluminum-containing pad that includes at least a pre-metal layer and a barrier layer. The pre-metal layer is a dense material layer and includes a density greater than the barrier layer and is a low surface roughness film. The high density pre-metal layer prevents plasma damage from producing charges in underlying dielectric materials or destroying subjacent semiconductor devices. | 2015-06-25 |
20150179566 | SEMICONDUCTOR DEVICES WITH INNER VIA - A semiconductor device includes a semiconductor substrate having an inactive area and a pair of active areas separated by the inactive area, a control terminal supported by the semiconductor substrate and extending across the pair of active areas and the inactive area to define a conduction path during operation between a first conduction region in each active area and a second conduction region in each active area, a conduction terminal supported by the semiconductor substrate and extending across the pair of active areas and the inactive area for electrical connection to each first conduction region, and a via extending through the semiconductor substrate, electrically connected to the conduction terminal, and positioned in the inactive area. | 2015-06-25 |
20150179567 | USING MATERIALS WITH DIFFERENT ETCH RATES TO FILL TRENCHES IN SEMICONDUCTOR DEVICES - An embodiment includes a metal interconnect structure, comprising: a dielectric layer on a substrate; an opening in the dielectric layer, wherein the opening has opening sidewalls and exposes a conductive region of at least one of the substrate and an additional interconnect structure; a first atomic layer deposition (ALD) layer on the conductive region and the opening sidewalls; a second ALD layer on a portion of the first ALD layer, and a third ALD layer within the opening and on the first ALD layer. Other embodiments are described herein. | 2015-06-25 |
20150179568 | Method and Apparatus of a Three Dimensional Integrated Circuit - An apparatus includes a first tier and a second tier. The second tier is above the first tier. The first tier includes a first cell. The second tier includes a second cell and a third cell. The third cell includes a first ILV to couple the first cell in the first tier to the second cell in the second tier. The third cell further includes a second ILV, the first ILV and the second ILV are extended along a first direction. The first tier further includes a fourth cell. The second tier further includes a fifth cell. The second ILV of the third cell is arranged to connect the fourth cell of the first tier with the fifth cell of the second tier. In some embodiments, the second tier further includes a spare cell including a spare ILV for ECO purpose. | 2015-06-25 |
20150179569 | METHOD OF CONTROLLING CONTACT HOLE PROFILE FOR METAL FILL-IN - A method of eliminating overhang in a contact hole formed in a contact film stack is described. A liner layer is overlaid on the contact film stack, the liner also coating the contact hole. A portion of the liner is removed to expose the overhang, and the exposed overhang is removed. The liner is also used to fill-in a bowing profile of the contact hole, thereby rendering sidewalls of the contact hole smooth and straight suitable for metal fill-in while suppressing piping defects. | 2015-06-25 |
20150179570 | Semiconductor Device and Method of Forming Fine Pitch RDL Over Semiconductor Die in Fan-Out Package - A semiconductor device has a first conductive layer including a plurality of conductive traces. The first conductive layer is formed over a substrate. The conductive traces are formed with a narrow pitch. A first semiconductor die and second semiconductor die are disposed over the first conductive layer. A first encapsulant is deposited over the first and second semiconductor die. The substrate is removed. A second encapsulant is deposited over the first encapsulant. A build-up interconnect structure is formed over the first conductive layer and second encapsulant. The build-up interconnect structure includes a second conductive layer. A first passive device is disposed in the first encapsulant. A second passive device is disposed in the second encapsulant. A vertical interconnect unit is disposed in the second encapsulant. A third conductive layer is formed over second encapsulant and electrically connected to the build-up interconnect structure via the vertical interconnect unit. | 2015-06-25 |
20150179571 | METAL INTERCONNECT STRUCTURES AND FABRICATION METHOD THEREOF - A method is provided for fabricating a metal interconnection structure. The method includes providing a semiconductor substrate having an active region and an isolation structure surrounding the active region; and forming a metal layer on a surface of the semiconductor substrate. The method also includes forming a metal silicide layer on the active region by a reaction of the metal layer and material of the active regions; and forming an inter metal connection layer electrically connecting with the active regions on the isolation structure. Further, the method includes forming a dielectric layer covering the metal silicide layer, the isolation structure and the inter metal connection layer on the semiconductor substrate; and forming a metal contact via electrically connecting with the active region through the inter metal connection layer in the dielectric layer. | 2015-06-25 |
20150179572 | SEMICONDUCTOR DEVICE FOR TRANSMITTING ELECTRICAL SIGNALS BETWEEN TWO CIRCUITS - A semiconductor device sends and receives electrical signals. The semiconductor device includes a first substrate provided with a first circuit region containing a first circuit; a multi-level interconnect structure provided on the first substrate; a first inductor provided in the multi-level interconnect structure so as to include the first circuit region; and a second inductor provided in the multi-level interconnect structure so as to include the first circuit region, wherein one of the first inductor and the second inductor is connected to the first circuit and the other of the first inductor and the second inductor is connected to a second circuit. | 2015-06-25 |
20150179573 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method for manufacturing semiconductor device is provided. The method includes the following operations: providing a first conductive portion, a second conductive portion and a third conductive portion over a substrate; forming a dielectric layer over the first conductive portion, the second conductive portion, and the third conductive portion; forming a high-resistance layer over the first conductive portion; forming an oxide layer over the high-resistance layer and the dielectric layer; patterning the dielectric layer and the oxide layer by using the high-resistance layer as a blocking layer to form a first recess to expose the second conductive portion and the third conductive portion and to prevent the first conductive portion from exposure; and forming a plug layer in the first recess to connect the second conductive portion and the third conductive portion. | 2015-06-25 |
20150179574 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - According to a method of fabricating a semiconductor device, a first mask pattern is used to etch first device isolation layers and active lines or form grooves, in which word lines will be provided. Thereafter, the active lines are etched in a self-alignment manner by using the first mask pattern as an etch mask. As a result, it is possible to suppress mask misalignment from occurring. | 2015-06-25 |
20150179575 | 3-D IC Device with Enhanced Contact Area - A device includes a substrate with a recess, having a bottom and sides, extending into the substrate from the substrate's upper surface. The sides include first and second sides oriented transversely to one another. A stack of alternating active and insulating layers overlie the substrate's surface and the recess. At least some of the active layers have an upper and lower portions extending along upper and lower planes over and generally parallel to the upper surface and to the bottom, respectively. The active layers have first and second upward extensions positioned along the first and second sides to extend from the lower portions of their respective active layers. Conductive strips adjoin the second upward extensions of the said active layers. The conductive strips can comprise sidewall spacers on the sides of the second upward extensions, the conductive strips connected to overlying conductors by interlayer conductors. | 2015-06-25 |
20150179576 | LOCALLY RAISED EPITAXY FOR IMPROVED CONTACT BY LOCAL SILICON CAPPING DURING TRENCH SILICIDE PROCESSINGS - A low resistance contact to a finFET source/drain can be achieved by forming a defect free surface on which to form such contact. The fins of a finFET can be exposed to epitaxial growth conditions to increase the bulk of semiconductive material in the source/drain. Facing growth fronts can merge or can form unmerged facets. A dielectric material can fill voids within the source drain region. A trench spaced from the finFET gate can expose the top portion of faceted epitaxial growth on fins within said trench, such top portions separated by a smooth dielectric surface. A silicon layer selectively formed on the top portions exposed within the trench can be converted to a semiconductor-metal layer, connecting such contact with individual fins in the source drain region. | 2015-06-25 |
20150179577 | MULTILEVEL CONTACT TO A 3D MEMORY ARRAY AND METHOD OF MAKING THEREOF - A multi-level device includes at least one device region and at least one contact region. The contact region has a stack of alternating plurality of electrically conductive layers and plurality of electrically insulating layers located over a substrate. The plurality of electrically conductive layers form a stepped pattern in the contact region, where each respective electrically insulating layer includes a sidewall and a respective underlying electrically conductive layer in the stack extends laterally beyond the sidewall. Optionally, a plurality of electrically conductive via connections can be formed, which have top surfaces within a same horizontal plane, have bottom surfaces contacting a respective electrically conductive layer located at different levels, and are isolated from one another by at least one trench isolation structure. | 2015-06-25 |
20150179578 | TECHNIQUES FOR FORMING INTERCONNECTS IN POROUS DIELECTRIC MATERIALS - Techniques are disclosed for forming interconnects in porous dielectric materials. In accordance with some embodiments, the porosity of a host dielectric layer may be reduced temporarily by stuffing its pores with a sacrificial pore-stuffing material, such as titanium nitride (TiN), titanium dioxide (TiO | 2015-06-25 |
20150179579 | COBALT BASED INTERCONNECTS AND METHODS OF FABRICATION THEREOF - An embodiment includes a metal interconnect structure, comprising: a dielectric layer disposed on a substrate; an opening in the dielectric layer, wherein the opening has sidewalls and exposes a conductive region of at least one of the substrate and an interconnect line; an adhesive layer, comprising manganese, disposed over the conductive region and on the sidewalls; and a fill material, comprising cobalt, within the opening and on a surface of the adhesion layer. Other embodiments are described herein. | 2015-06-25 |
20150179580 | HYBRID INTERCONNECT STRUCTURE AND METHOD FOR FABRICATING THE SAME - A method for fabricating hybrid interconnect structure is disclosed. The method includes the steps of: providing a material layer; forming a through-silicon hole in the material layer; forming a patterned resist on the material layer, wherein the patterned resist comprises at least an opening for exposing the through-silicon hole; and forming a conductive layer to fill the through-silicon hole and the opening in the patterned resist. | 2015-06-25 |
20150179581 | METAL-CONTAINING FILMS AS DIELECTRIC CAPPING BARRIER FOR ADVANCED INTERCONNECTS - A method is provided for forming an interconnect structure for use in semiconductor devices. The method starts with forming a low-k bulk dielectric layer on a substrate and then forming a trench in the low-k bulk dielectric layer. A liner layer is formed on the low-k bulk dielectric layer being deposited conformally to the trench. A copper layer is formed on the liner layer filling the trench. Portions of the copper layer and liner layer are removed to form an upper surface of the low-k bulk dielectric layer, the liner layer, and the copper layer. A metal containing dielectric layer is formed on the upper surface of the low-k bulk dielectric layer, the liner layer, and the copper layer. | 2015-06-25 |
20150179582 | WIRING STRUCTURES AND METHODS OF FORMING THE SAME - A wiring structure includes a first insulation layer, a plurality of wiring patterns, a protection layer pattern and a second insulation layer. The first insulation layer may be formed on a substrate. A plurality of wiring patterns may be formed on the first insulation layer, and each of the wiring patterns may include a metal layer pattern and a barrier layer pattern covering a sidewall and a bottom surface of the metal layer pattern. The protection layer pattern may cover a top surface of each of the wiring patterns and including a material having a high reactivity with respect to oxygen. The protection layer pattern may cover a top surface of each of the wiring patterns and including a material having a high reactivity with respect to oxygen. | 2015-06-25 |
20150179583 | SEMICONDUCTOR DEVICES COMPRISING EDGE DOPED GRAPHENE AND METHODS OF MAKING THE SAME - A method of forming an edge-doped graphene channel is described. The method involves selectively removing graphene from a graphene layer on a substrate in the presence of a dopant to form graphene channels. The dopant forms bonds with carbon atoms on the edge of the graphene such that the graphene channels are edge doped. An article of manufacture is also provided which includes a substrate layer, one or more edge-doped graphene channels on the substrate layer and a layer of an etch mask material on and coextensive with the one or more graphene channels. An article of manufacture is also provided which includes a substrate layer and one or more edge-doped graphene channels on the substrate layer, wherein each of the one or more the graphene channels has a width less than 100 nm and a carrier density greater than 5×10 | 2015-06-25 |
20150179584 | ALIGNMENT MARK ARRANGEMENT, SEMICONDUCTOR WORKPIECE, AND METHOD FOR ALIGNING A WAFER - In various embodiments, an alignment mark arrangement may include a plurality of alignment marks disposed next to each other in a row, wherein at least one of the following holds true: a first alignment mark of the plurality of alignment marks has a first width and a second alignment mark of the plurality of alignment marks has a second width that is different from the first width; a first pair of neighboring alignment marks of the plurality of alignment marks is arranged at a first pitch and a second pair of neighboring alignment marks of the plurality of alignment marks is arranged at a second pitch that is different from the first pitch. | 2015-06-25 |
20150179585 | SUBSTRATE AND METHOD FOR LABELING SIGNAL LINES THEREOF - A substrate is disclosed. The substrate includes a transparent underlayer, a plurality of signal lines on the transparent underlayer, and a plurality of labels on the transparent underlayer. The plurality of labels respectively correspond to the plurality of signal lines in a one-to-one relationship and are configured to identify the corresponding signal lines, and one of at least two adjacent labels is a forward pattern label, and another one of the at least two adjacent labels is a reverse pattern label. | 2015-06-25 |
20150179586 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - Disclosed is a method for forming a display device. The method includes forming an alignment mark on a front surface of a substrate having a display region and a non-display region surrounding the display region, forming an alignment protection pattern on a rear surface of the substrate such that the alignment protection pattern overlaps the alignment mark, and forming a light-shielding member in the non-display region on the rear surface of the substrate such that the light-shielding member forms a boundary with the alignment protection pattern. | 2015-06-25 |
20150179587 | Semiconductor Device and Method of Forming Stress Relief Layer Between Die and Interconnect Structure - A semiconductor device is made by forming a first conductive layer over a sacrificial carrier. A conductive pillar is formed over the first conductive layer. An active surface of a semiconductor die is mounted to the carrier. An encapsulant is deposited over the semiconductor die and around the conductive pillar. The carrier and adhesive layer are removed. A stress relief insulating layer is formed over the active surface of the semiconductor die and a first surface of the encapsulant. The stress relief insulating layer has a first thickness over the semiconductor die and a second thickness less than the first thickness over the encapsulant. A first interconnect structure is formed over the stress relief insulating layer. A second interconnect structure is formed over a second surface of encapsulant opposite the first interconnect structure. The first and second interconnect structures are electrically connected through the conductive pillar. | 2015-06-25 |
20150179588 | SEMICONDUCTOR PACKAGES HAVING EMI SHIELDING LAYERS, METHODS OF FABRICATING THE SAME, ELECTRONIC SYSTEMS INCLUDING THE SAME, AND MEMORY CARDS INCLUDING THE SAME - Semiconductor packages are provided. In some embodiments, the semiconductor package includes a substrate, a first ground line including a first internal ground line disposed along edges of the substrate and a plurality of first extended ground lines between the first internal ground line and sidewalls of the substrate, a chip on the substrate, a molding member disposed on the substrate to cover the chip, and an electromagnetic interference (EMI) shielding layer covering the molding member, the EMI shielding layer extending along the sidewalls of the substrate and contacting the end portions of the plurality of first extended ground lines. The plurality of first extended ground lines include end portions that are exposed at the sidewalls of the substrate. | 2015-06-25 |
20150179589 | SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR MODULE - According to one embodiment, a semiconductor package includes: a first metal body on which a part of a waveguide structure is formed; a second metal body including a mounting area for a semiconductor device and disposed on the first metal body; a line substrate on which a signal transmission line configured to communicate a waveguide with the semiconductor device mounted on the mounting area is formed; and a lid body disposed at a position facing the first metal body, interposing the second metal body and the line substrate. The lid body is made of resin, on which a structure corresponding to another waveguide structure on an extension of the waveguide structure in the first metal body is formed. The structure includes a metal-coated inner wall surface. | 2015-06-25 |
20150179590 | SUBSTRATE COMPRISING IMPROVED VIA PAD PLACEMENT IN BUMP AREA - Some novel features pertain to an integrated device that includes a substrate, a first via, and a first bump pad. The first via traverses the substrate. The first via has a first via dimension. The first bump pad is on a surface of the substrate. The first bump pad is coupled to the first via. The first bump pad has a first pad dimension that is equal or less then the first via dimension. In some implementations, the integrated device includes a second via and a second bump pad. The second via traverses the substrate. The second via has a second via dimension. The second bump pad is on the surface of the substrate. The second bump pad is coupled to the second via. The second bump pad has a second pad dimension that is equal or less then the second via dimension. | 2015-06-25 |
20150179591 | Backside Redistribution Layer (RDL) Structure - An embodiment package on package (PoP) device includes a molding compound having a metal via embedded therein, a passivation layer disposed over the molding compound, the passivation layer including a passivation layer recess vertically aligned with the metal via, and a redistribution layer bond pad capping the metal via, a portion of the redistribution layer bond pad within the passivation layer recess projecting above a top surface of the molding compound. | 2015-06-25 |
20150179592 | SELF-ALIGNED UNDER BUMP METAL - An integrated circuit including a self-aligned under bump metal pad formed on a top metal interconnect level in a connection opening in a dielectric layer, with a solder ball formed on the self-aligned under bump metal pad. Processes of forming integrated circuits including a self-aligned under bump metal pad formed on a top metal interconnect level in a connection opening in a dielectric layer, by a process of forming one or more metal layers on the interconnect level and the dielectric layer, selectively removing the metal from over the dielectric layer, and subsequently forming a solder ball on the self-aligned under bump metal pad. Some examples include additional metal layers formed after the selective removal process, and may include an additional selective removal process on the additional metal layers. | 2015-06-25 |
20150179593 | LOW Z-HEIGHT PACKAGE ASSEMBLY - In embodiments, a package assembly may include a die coupled with one or more conductive pads. A barrier layer may be directly coupled with and between the die and one or more of the conductive pads. The package assembly may further include a solder resist layer coupled with the die and the conductive pads, and one or more interconnects positioned at least partially within the solder resist layer and directly coupled with one or more of the conductive pads. | 2015-06-25 |
20150179594 | PACKAGE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A package substrate and a method for manufacturing the same are disclosed. The method for manufacturing a package substrate in accordance with an aspect of the present invention includes: forming a first open hole corresponding to a shape of a bonding pad in a first photo resist; laminating a second photo resist on the first photo resist and forming a second open hole corresponding to shapes of a soldering pad, a circuit pattern layer and the bonding pad in the second photo resist; and forming a pattern plating layer up to a predetermined height in the first open hole and the second open hole. | 2015-06-25 |
20150179595 | SOLDER-ON-DIE USING WATER-SOLUBLE RESIST SYSTEM AND METHOD - This disclosure relates generally to generating a solder-on-die using a water-soluble resist, system, and method. Heat may be applied to solder as applied to a hole formed in a water-soluble resist coating, the water-soluble resist coating being on a surface of an initial assembly. The initial assembly may include an electronic component. The surface may be formed, at least in part, by an electrical terminal of the electronic component, the hole being aligned, at least in part, with the electrical terminal. The solder may be reflowed, wherein the solder couples, at least in part, with the electrical terminal. | 2015-06-25 |
20150179596 | SEMICONDUCTOR PACKAGE - Disclosed herein is a semiconductor package capable of stably implementing an interlayer bonding of a stacked board, the semiconductor package includes: a lower package having a chip module mounted thereon so as to be connected to a circuit pattern; an upper package stacked on the lower package and having an electrical device mounted thereon; and a bump receiving a tip of a solder ball electrically connecting the lower package and the upper package and coupled to the solder ball. | 2015-06-25 |
20150179597 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package is provided, which includes: a first electronic element; a plurality of conductive elements formed on the first electronic element; a second electronic element having a plurality of conductive bumps and disposed on the first electronic element through the conductive bumps, wherein the conductive bumps are correspondingly electrically connected to the conductive elements; and an underfill formed between the second electronic element and the first electronic element for encapsulating the conductive bumps and the conductive elements, wherein the underfill contains a plurality of conductive particles having a particle size between 0.1 and 1 um, a plurality of insulating particles having a particle size between 1 and 10 um and a polymer. The invention overcomes the conventional drawback of poor electrical connection between the second electronic element and the first electronic element through the conductive particles so as to enhance the electrical performance of the semiconductor package. | 2015-06-25 |
20150179598 | FLIP-CHIP PACKAGING STRUCTURE - A flip-chip packaging structure is provided, which includes: a packaging substrate having a substrate body and a circuit layer formed on the substrate body, wherein the circuit layer has a plurality of conductive pads embedded in the substrate body and exposed from a surface of the substrate body; and a chip disposed on and electrically connected to the packaging substrate through a plurality of conductive elements, wherein the conductive elements and the exposed portions of the conductive pads have a width ratio in a range of 0.7 to 1.3, thereby improving the product yield and reliability. | 2015-06-25 |