28th week of 2016 patent applcation highlights part 54 |
Patent application number | Title | Published |
20160203940 | Anti-Contamination Trap, and Vacuum Application Device | 2016-07-14 |
20160203941 | Diaphragm Mounting Member and Charged Particle Beam Device | 2016-07-14 |
20160203942 | GRAPHENE MODIFICATION | 2016-07-14 |
20160203943 | Electron Microscope | 2016-07-14 |
20160203944 | Charged Particle Beam Apparatus and Sample Image Acquiring Method | 2016-07-14 |
20160203945 | METHOD FOR CALIBRATION OF A CD-SEM CHARACTERISATION TECHNIQUE | 2016-07-14 |
20160203946 | Inspection Equipment | 2016-07-14 |
20160203947 | Charged Particle Beam Device and Charged Particle Beam Device Control Method | 2016-07-14 |
20160203948 | CHARGED PARTICLE BEAM SYSTEM AND METHODS | 2016-07-14 |
20160203949 | CHARGED PARTICLE BEAM DRAWING APPARATUS | 2016-07-14 |
20160203950 | METHOD AND ION IMPLANTER FOR LOW TEMPERATURE IMPLANTATION | 2016-07-14 |
20160203951 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | 2016-07-14 |
20160203952 | CERAMIC GAS DISTRIBUTION PLATE WITH EMBEDDED ELECTRODE | 2016-07-14 |
20160203953 | CONTOURED SHOWERHEAD FOR IMPROVED PLASMA SHAPING AND CONTROL | 2016-07-14 |
20160203954 | VAPOR DEPOSITION APPARATUS, DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS BY USING THE SAME | 2016-07-14 |
20160203955 | COOLING STRUCTURE AND PARALLEL PLATE ETCHING APPARATUS | 2016-07-14 |
20160203956 | ETCHING SOURCE INSTALLABLE IN A STORAGE MEDIUM PROCESSING TOOL | 2016-07-14 |
20160203957 | DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS | 2016-07-14 |
20160203958 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | 2016-07-14 |
20160203959 | CYLINDRICAL SPUTTERING TARGET MATERIAL | 2016-07-14 |
20160203960 | SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS | 2016-07-14 |
20160203961 | MAGNETRON SPUTTERING APPARATUS | 2016-07-14 |
20160203962 | HIGH DUTY CYCLE ION SPECTROMETER | 2016-07-14 |
20160203963 | Mass Correction | 2016-07-14 |
20160203964 | Mass Spectrometer | 2016-07-14 |
20160203965 | Surface Extraction Interface | 2016-07-14 |
20160203966 | REMOTE LASER ABLATION ELECTROSPRAY IONIZATION MASS SPECTROMETRY | 2016-07-14 |
20160203967 | ION MODIFICATION | 2016-07-14 |
20160203968 | PROBE DISPLACEMENT MEASURING APPARATUS, IONIZATION APPARATUS INCLUDING THE SAME, AND MASS SPECTROMETRY APPARATUS | 2016-07-14 |
20160203969 | Ion Separation and Storage System | 2016-07-14 |
20160203970 | HALOGEN LAMP | 2016-07-14 |
20160203971 | GATE STACK MATERIALS FOR SEMICONDUCTOR APPLICATIONS FOR LITHOGRAPHIC OVERLAY IMPROVEMENT | 2016-07-14 |
20160203972 | METHOD AND APPARATUS FOR FORMING DEVICE QUALITY GALLIUM NITRIDE LAYERS ON SILICON SUBSTRATES | 2016-07-14 |
20160203973 | METHOD FOR THE SURFACE TREATMENT OF A SEMICONDUCTOR SUBSTRATE | 2016-07-14 |
20160203974 | SULFUR-CONTAINING THIN FILMS | 2016-07-14 |
20160203975 | METHODS FOR DEPOSITING FILMS WITH ORGANOAMINODISILANE PRECURSORS | 2016-07-14 |
20160203976 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | 2016-07-14 |
20160203977 | Semiconductor Arrangement Including Buried Anodic Oxide and Manufacturing Method | 2016-07-14 |
20160203978 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | 2016-07-14 |
20160203979 | Metal Deposition on Substrates | 2016-07-14 |
20160203980 | Device Isolation for III-V Substrates | 2016-07-14 |
20160203981 | SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS | 2016-07-14 |
20160203982 | METHOD OF FORMING TRENCHES | 2016-07-14 |
20160203983 | METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES | 2016-07-14 |
20160203984 | METHOD FOR FORMING SEMICONDUCTOR DEVICE INCLUDING SPACERS HAVING DIFFERENT DIMENSIONS | 2016-07-14 |
20160203985 | ASYMMETRIC HIGH-K DIELECTRIC FOR REDUCING GATE INDUCED DRAIN LEAKAGE | 2016-07-14 |
20160203986 | ASYMMETRIC HIGH-K DIELECTRIC FOR REDUCING GATE INDUCED DRAIN LEAKAGE | 2016-07-14 |
20160203987 | ASYMMETRIC HIGH-K DIELECTRIC FOR REDUCING GATE INDUCED DRAIN LEAKAGE | 2016-07-14 |
20160203988 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF | 2016-07-14 |
20160203989 | LOCAL DRY ETCHING APPARATUS AND LOCAL DRY ETCHING FABRICATION METHOD | 2016-07-14 |
20160203990 | INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION | 2016-07-14 |
20160203991 | Mechanisms for Forming Patterns Using Multiple Lithography Processes | 2016-07-14 |
20160203992 | METHODS OF FORMING SEMICONDUCTOR DEVICES USING AUXILIARY LAYERS FOR TRIMMING MARGIN | 2016-07-14 |
20160203993 | Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same | 2016-07-14 |
20160203994 | POLISHING COMPOSITION | 2016-07-14 |
20160203995 | INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) AND ALE (ATOMIC LAYER ETCH) | 2016-07-14 |
20160203996 | SUBSTRATE MANUFACTURING METHOD AND SUBSTRATE MANUFACTURING APPARATUS | 2016-07-14 |
20160203997 | SUBSTRATE PROCESSING METHOD | 2016-07-14 |
20160203998 | ETCHING METHOD | 2016-07-14 |
20160203999 | SACRIFICIAL MATERIAL FOR STRIPPING MASKING LAYERS | 2016-07-14 |
20160204000 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 2016-07-14 |
20160204001 | METAL ETCHANT COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | 2016-07-14 |
20160204002 | Self-Aligned Via and Plug Patterning for Back End of Line (BEOL) Interconnects | 2016-07-14 |
20160204003 | METHOD OF FORMING ASPER-SILVER ON A LEAD FRAME | 2016-07-14 |
20160204004 | WAFER-SCALE PACKAGE INCLUDING POWER SOURCE | 2016-07-14 |
20160204005 | SUPPORT ASSEMBLY FOR SUBSTRATE BACKSIDE DISCOLORATION CONTROL | 2016-07-14 |
20160204006 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE | 2016-07-14 |
20160204007 | System, Method and Apparatus for Generating Pressure Pulses in Small Volume Confined Process Reactor | 2016-07-14 |
20160204008 | SUBSTRATE TREATMENT DEVICE | 2016-07-14 |
20160204009 | METHODS AND SYSTEMS TO IMPROVE PEDESTAL TEMPERATURE CONTROL | 2016-07-14 |
20160204010 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | 2016-07-14 |
20160204011 | SUBSTRATE STORING CONTAINER | 2016-07-14 |
20160204012 | SUBSTRATE CONTAINMENT WITH ENHANCED SOLID GETTER | 2016-07-14 |
20160204013 | ADAPTABLE CASETTE HOLDER | 2016-07-14 |
20160204014 | BONDING METHOD INCLUDING ADJUSTING SURFACE CONTOURS OF A BONDING SYSTEM | 2016-07-14 |
20160204015 | LOW TEMPERATURE ADHESIVE RESINS FOR WAFER BONDING | 2016-07-14 |
20160204016 | WAFER PROCESSING METHOD | 2016-07-14 |
20160204017 | Embrittlement device, pick-up system and method of picking up chips | 2016-07-14 |
20160204018 | CONVEYING APPARATUS | 2016-07-14 |
20160204019 | SUBSTRATE TRANSFER MECHANISMS | 2016-07-14 |
20160204020 | Bond Chuck, Methods of Bonding, and Tool Including Bond Chuck | 2016-07-14 |
20160204021 | SUPPORT STAGE FOR VACUUM APPARATUS | 2016-07-14 |
20160204022 | SEMICONDUCTOR DEVICE STRUCTURES WITH IMPROVED PLANARIZATION UNIFORMITY, AND RELATED METHODS | 2016-07-14 |
20160204023 | MANUFACTURING METHOD FOR SEMICONDUCTOR SUBSTRATE | 2016-07-14 |
20160204024 | METHOD FOR MANUFACTURING BONDED WAFER | 2016-07-14 |
20160204025 | TRANSISTOR, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | 2016-07-14 |
20160204026 | Contact Etch Stop Layers of a Field Effect Transistor | 2016-07-14 |
20160204027 | DIRECT DEPOSITION OF NICKEL SILICIDE NANOWIRE | 2016-07-14 |
20160204028 | SUBSTRATE INCLUDING SELECTIVELY FORMED BARRIER LAYER | 2016-07-14 |
20160204029 | LAMINATE AND CORE SHELL FORMATION OF SILICIDE NANOWIRE | 2016-07-14 |
20160204030 | METHODS OF FORMING SEMICONDUCTOR DEVICE | 2016-07-14 |
20160204031 | SHIELDED COPLANAR LINE | 2016-07-14 |
20160204032 | METHOD FOR DIVIDING A COMPOSITE INTO SEMICONDUCTOR CHIPS, AND SEMICONDUCTOR CHIP | 2016-07-14 |
20160204033 | METHOD FOR SEPARATING SUBSTRATES AND SEMICONDUCTOR CHIP | 2016-07-14 |
20160204034 | METHOD OF FORMING A SEMICONDUCTOR STRUCTURE INCLUDING A PLURALITY OF FINS AND AN ALIGNMENT/OVERLAY MARK | 2016-07-14 |
20160204035 | BACKSIDE PROCESSED SEMICONDUCTOR DEVICE | 2016-07-14 |
20160204036 | MAKING A DEFECT FREE FIN BASED DEVICE IN LATERAL EPITAXY OVERGROWTH REGION | 2016-07-14 |
20160204037 | INTEGRATING VLSI-COMPATIBLE FIN STRUCTURES WITH SELECTIVE EPITAXIAL GROWTH AND FABRICATING DEVICES THEREON | 2016-07-14 |
20160204038 | METHODS FOR FABRICATING INTEGRATED CIRCUITS WITH IMPROVED IMPLANTATION PROCESSES | 2016-07-14 |
20160204039 | TEMPERATURE-CONTROLLED IMPLANTING OF A DIFFUSION-SUPPRESSING DOPANT IN A SEMICONDUCTOR STRUCTURE | 2016-07-14 |