40th week of 2016 patent applcation highlights part 48 |
Patent application number | Title | Published |
20160291422 | REFRACTIVE-INDEX DISTRIBUTION TYPE LIQUID CRYSTAL OPTICAL DEVICE, IMAGE DISPLAY APPARATUS, AND LIQUID CRYSTAL OPTICAL ELEMENT - A refractive-index distribution type liquid crystal optical device includes an optical element and a controller. The optical element includes a first and a second substrate, a liquid crystal layer, a first electrodes and second electrodes provided between the first substrate and the liquid crystal layer, third electrodes and fourth electrodes provided between the second substrate and the liquid crystal layer. Each of the second electrodes is between a pair of the first electrodes. Each of the plurality of second electrodes has a pair of end portions and a center portion being between the pair of end portions. A pair of the third electrodes are provided between a pairs of the fourth electrodes. The third electrode overlaps with the end portions the second, electrode and the third electrodes are projected onto the surface of the first substrate. The controller applies voltages to each of the electrodes. | 2016-10-06 |
20160291423 | PIXEL STRUCTURE AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME - A pixel structure is provided and disposed in a pixel region divided up by a dummy line. The pixel structure includes a pixel electrode. The pixel electrode includes first branches and second branches located at opposite sides and disposed symmetrically with respect to the dummy line. One first branch has an extending portion and an end portion. A direction is directing from a front end toward a terminal end of the extension portion, and the terminal end of the extension portion is connected to a front end of the end portion. A bending direction is directing from the front end to a terminal end of the end portion. The direction is toward the dummy line and the bending direction is parallel to or away from the dummy line, or the direction is away from the dummy line and the bending direction is parallel to or toward the dummy line. | 2016-10-06 |
20160291424 | TOUCH DISPLAY PANEL AND DISPLAY APPARATUS - A touch display panel and a display apparatus are provided. The touch display panel includes: a first substrate, a second substrate, a common electrode layer, a touch electrode layer and a touch electrode wire layer. The common electrode layer is an entire piece of electrode; thus, respective display units may be ensured to have the same common voltage during a display driving, thereby solving the conventional problem of image flicker and non-uniform display of the display panel due to different common voltages in the respective display units caused by different resistances of the block-shaped electrodes in the common electrode layer. Moreover, the touch electrodes in the touch electrode layer are metal grid electrodes. Hence, the resistances of the touch electrodes are reduced and a touch sensitivity of the touch display panel is improved, while a high light transmittance of the touch display panel is ensured. | 2016-10-06 |
20160291425 | BLUE PHASE LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A blue phase liquid crystal display device and a manufacturing method thereof are provided. The blue phase liquid crystal display device includes a plurality of pixel units arranged in a matrix, the blue phase liquid crystal display device including: a first substrate and a second substrate arranged opposite to each other, and a blue phase liquid crystal layer arranged between the first substrate and the second substrate. Each of the pixel units includes: first protrusions located on the first substrate; pixel electrodes covering the first protrusions; second protrusions located on the second substrate; and common electrodes covering the second protrusions. | 2016-10-06 |
20160291426 | DISPLAY PANEL - A display panel includes a TFT substrate, an opposite substrate, a liquid crystal layer, a first display area, and a second display area. The opposite substrate is opposite to the TFT substrate. The liquid crystal layer is sandwiched between the TFT substrate and the opposite substrate. The liquid crystal layer includes a plurality of liquid crystal molecules. A horizontal electric field is formed in a portion of the liquid crystal layer corresponding to the first display area. A vertical electric field is formed in the other portion of the liquid crystal layer corresponding to the second display area. When the display panel is powered on, a portion of the liquid crystal molecules in one of the horizontal electric field and the vertical electric field are rotated, and the other portion of liquid crystal molecules in the other one of the horizontal electric field and the vertical electric field are rotated. | 2016-10-06 |
20160291427 | DISPLAY DEVICE HAVING FEWER ELECTRODES - A display device includes: a gate transmission wiring; a gate insulating layer disposed on the gate transmission wiring; and a pixel electrode and a data transmission wiring that are disposed on the gate insulating layer. When a gate signal voltage is applied to the gate transmission wiring, the gate transmission wiring may serve as a gate electrode that activates a semiconductor layer. In addition, when such a gate signal voltage is not applied thereto, the gate transmission wiring may form an electric field by a voltage difference between the gate transmission wiring and the pixel electrode, to thereby control a liquid crystal layer. | 2016-10-06 |
20160291428 | LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - In a wall electrode liquid crystal display device, planar distribution of the wall structure and the electrode is optimized to improve a yield. A liquid crystal display device includes a plurality of pixels arranged in a matrix, each of the pixels having an insulator wall structure formed at a border of pixels, a wall electrode formed at a side surface of the wall structure of the border of the pixels, a source electrode which is continuous with the wall electrode and formed of a planar electrode extending in a planar direction, a first common electrode provided between source electrodes at both sides of the pixel to form a retentive capacitance, and a second common electrode provided between wall electrodes on both sides of the pixel. A slit which becomes a border of the wall electrodes of two adjacent pixels is disposed only on a top of the wall structure. | 2016-10-06 |
20160291429 | LIQUID CRYSTAL DISPLAY PANEL STRUCTURE - A liquid crystal display panel includes a first substrate, a second substrate parallel to the first substrate, a liquid crystal layer located between the first substrate and the second substrate and parallel to the first substrate and the second substrate, a common electrode layer and a pixel electrode located between the first substrate and the second substrate, and an electrical conducting layer located on a side of the second substrate opposite from the first substrate. The electrical conducting layer is electrically coupled to a common electrode wiring located on an outer peripheral portion of the first substrate. The pixel electrode and the common electrode layer are configured to cooperatively induce an electric field to drive liquid crystals of the liquid crystal layer to rotate. | 2016-10-06 |
20160291430 | ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE - An array substrate is provided, which includes: a substrate including a display region and a lead region around the display region; periphery leads disposed on a surface of the substrate in the lead region; an insulating protection layer disposed on the periphery leads; and an electrostatic protection layer disposed on the insulating protection layer. For the provided array substrate, there is no need to connect a capacitor between both ends of the ground lead to decrease static electricity, and thus saving space and effectively avoiding a breakdown of the device due to static electricity. | 2016-10-06 |
20160291431 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY PANEL AND DISPLAY DEVICE - The present invention provides an array substrate and a manufacturing method thereof, a display panel and a display device. The manufacturing method of an array substrate in the present invention comprises: forming light-shielding layers on the base substrate through a patterning process by using a light-shielding layer-doping multiplexing mask plate; and performing doping of CMOS transistors by using the light-shielding layer-doping multiplexing mask plate. In the invention, two mask plates used in manufacturing the light-shielding layer and the doping process in the prior art are replaced with one light-shielding layer-doping multiplexing mask plate, therefore the number of the mask plates during manufacturing is reduced and the cost is decreased. Meanwhile, providing of the light-shielding layer below the N type transistors in the driving region of the array substrate may prevent light-induced leakage current from being generated in the conductive region. | 2016-10-06 |
20160291432 | ARRAY SUBSTRATE, DISPLAY PANEL, DISPLAY DEVICE AND METHOD OF REPAIRING DISPLAY PANEL - An array substrate, a display panel, a display device and a method of repairing a display panel are provided. The array substrate includes a functional layer and a photochromic layer disposed on the functional layer, and upon the array substrate suffering from light leakage, the photochromic layer in a light leakage area is irradiated by light to form a light blocking part in the light leakage area, thereby repairing light leakage of the array substrate. | 2016-10-06 |
20160291433 | LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING THE SAME - A liquid crystal display includes: a substrate; a reference electrode disposed on the substrate; a reference electrode passivation layer disposed on the reference electrode; a thin film transistor disposed on the reference electrode passivation layer; a pixel electrode connected to the thin film transistor; a pixel electrode passivation layer disposed on a portion of the pixel electrode; a light blocking member disposed on the pixel electrode passivation layer; a color filter disposed so as to face the pixel electrode; a micro cavity disposed between the pixel electrode and the color filter; and a liquid crystal material disposed in the micro cavity. | 2016-10-06 |
20160291434 | ELECTRO-OPTICAL APPARATUS AND ELECTRONIC APPARATUS - An electro-optical apparatus includes a semiconductor layer which is provided on a first substrate, a gate electrode which is provided on the semiconductor layer, a first light-shielding member which is provided between the semiconductor layer and the first substrate, a second light-shielding member which is provided in an extension direction of the first substrate in the semiconductor layer, and a third light-shielding member which is provided on an opposite side to the first substrate in the semiconductor layer, in which the second light-shielding member is embedded within a groove which is formed between the first light-shielding member and the third light-shielding member, and the third light-shielding member is electrically connected to the gate electrode and the first light-shielding member via the second light-shielding member. | 2016-10-06 |
20160291435 | THIN FILM TRANSISTOR ARRAY SUBSTRATE, LIQUID CRYSTAL DISPLAY PANEL AND REPAIR METHOD OF LIQUID CRYSTAL DISPLAY PANEL - A TFT array substrate includes parallel data lines parallel extend along a first direction, parallel scan lines crossing the data lines and extending along a second direction perpendicular to the second direction, pixels defined by the data lines and the scan lines, and a common electrode having a main line and growth lines. The main line is parallel to the scan lines. The growth lines extend from the main line. Each pixel includes a pixel electrode, a TFT, partial of the main line, and two growth lines. The TFT is electrically connected to the pixel electrode, a corresponding data line, and a corresponding scan line. The projections of the two growth lines in the pixel overlap with the pixel electrode. Each pixel includes common areas. The common areas overlapping with the two growth lines. | 2016-10-06 |
20160291436 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE - An array substrate and a manufacturing method thereof, and a display device are provided. The array substrate includes a base substrate ( | 2016-10-06 |
20160291437 | DISPLAY DEVICE - There is provided a display device having an electrochromic element placed in the display device. The electrochromic element has: a light transmittance of 70% or more and a light reflectance of 20% or less at a central wavelength of a visible spectrum when in a transparent state; and a light reflectance of 65% or more at the central wavelength of the visible spectrum when in a mirror state. By this, the display device is not only highly effective in terms of light-shielding, heat blocking, screening, etc., but is also switchable between a transmissive type and a reflective type. | 2016-10-06 |
20160291438 | DISPLAY PANEL - A display panel includes a flexible substrate, a first conductive layer, an insulating layer, a second conductive layer and a display layer. The flexible substrate includes a central area and at least one peripheral area. The first conductive layer is disposed on the flexible substrate. The insulating layer is disposed on the first conductive layer. The insulating layer includes a central insulating portion and at least one peripheral insulating portion. The peripheral insulating portion is located above the peripheral area. The central insulating portion is located above the central area. The peripheral insulating portion is more flexible than the central insulating portion. The second conductive layer is disposed on the insulating layer, and the insulating layer separates the first conductive layer from the second conductive layer. The display layer is disposed on the second conductive layer. | 2016-10-06 |
20160291439 | REGISTERED REFLECTIVE ELEMENT FOR A BRIGHTNESS ENHANCED TIR DISPLAY - The brightness of a TIR-based display is enhanced with a registered reflective element by recycling and reflecting light that passes through the dark pupil region of each hemi-spherical protrusion in the hemi-spherical surface back to the viewer. A method to fabricate a brightness enhanced TIR display comprising an apertured membrane with a thin conductive reflective metal layer facing and registered with the pupils of the hemi-spherical surface. | 2016-10-06 |
20160291440 | CONTROLLABLE LIGHT-TRANSMISSIVE ELEMENT - The present invention relates to a light-transmissive element ( | 2016-10-06 |
20160291441 | ELECTROPHORETIC DISPLAY DEVICE AND ELECTRONIC APPARATUS - Provided is an electrophoretic display device in which a partitioning wall is provided between a first substrate and a second substrate, a dispersion liquid is disposed in a region that is partitioned by the partitioning wall, the dispersion liquid includes a dispersion medium and electrophoretic particles, and surfaces of partitioning wall on side of the region include inclined section, which is inclined with respect to a normal direction of the first substrate, and does not have a configuration in which the surfaces of the partitioning wall on the side of the region of portions that respectively correspond to all of a plurality of edges that intersecting lines between the surface of the partitioning wall on the side of the region and a surface of a first substrate side thereof, form, include inclined section with the same inclination direction and the same inclination angle. | 2016-10-06 |
20160291442 | QUANTUM WAVE-CONVERTER - A plug-and-play fiber-coupled nonlinear optical quantum wave-converter, optimized for quantum communications, comprises a commercial periodically-poled, waveguide-based, nonlinear optical chip, coupled with a pair of substrate-guided holographic (SGH) wavelength division multiplexers (WDM) and a pair of SGH filters; it offers bidirectional difference frequency conversion (DFG) and sum frequency conversion (SFG) simultaneously in a single packaged device. | 2016-10-06 |
20160291443 | CASCADED OPTICAL HARMONIC GENERATION - A cascaded harmonic generator, for cascaded optical harmonic generation from an optical beam provided by a laser source, may include a second harmonic generator to generate a second harmonic optical beam based on a residual beam associated with the optical beam. The cascaded harmonic generator may include a third harmonic generator to generate a third harmonic optical beam based on the second harmonic optical beam and the optical beam. The third harmonic generator may be positioned in an optical path upstream from the second harmonic generator. A harmonic generator delay time, associated with the optical path, may be approximately equal to, or may be an approximate integer multiple of, a laser source round-trip time. | 2016-10-06 |
20160291444 | ENCLOSURE DEVICE - In one embodiment of an enclosure device, a camera casing and light source casing are secured to a plate frame, and the enclosure device is configured to be mounted to an arm, such as a robotic welding arm. A shutter mounting arm may also be secured to the plate frame. A flap may be pivotally mounted to the distal end of the shutter mounting arm, such that the flap may be actuated between a first and second position by an actuator cooperatively engaged with the flap. The first position may be defined as to protect a camera lens positioned in the camera casing and a light source lens positioned in the light source casing. The second position may be defined as to not obscure a line-of-sight from either the light source and/or the camera to the work piece on the arm. A light source casing may be sandwiched between two side plates that are generally configured as mirror images of one another. The light source casing housing a light source may be configured as a laser designed to measure distances, | 2016-10-06 |
20160291445 | MINIATURE STABILIZED UNMANNED AERIAL VEHICLE GIMBAL - Embodiments discussed herein provide improved control of an unmanned aerial vehicle camera gimbal. In some embodiments, a linear control circuit is described that uses an operational amplifier that allows the system to retain its passive isolation of high frequency disturbances. | 2016-10-06 |
20160291446 | TURNTABLE WITH LIGHT TRANSMISSION ROUND PLATTER AND LIGHT COLLECTION SPINDLE - A turntable with a light transmission round platter and at least one light collection spindle is provided. The light transmission round platter connects to the light collection spindle, and the light collection spindle is driven by a motor to rotate the light transmission round platter. A portion of surface of the light collection spindle is frosted. The incident light from a bottom or a lateral side is collected in a light collection area of the spindle and then transmitted toward a conjunctive area of the light transmission round platter via a transparent and smooth light guiding area, so as to lighten the originally dark conjunctive area and reduce the darkness thereof. Accordingly, the time spent in background removal of the dark conjunctive area can be reduced since the conjunctive area is lighted when the light transmission round platter is rotated for photographing an object to be photographed thereon. | 2016-10-06 |
20160291447 | Light Containment and Control Device - A light control device comprising a grid formed from a plurality of non-overlapping fabric ribbons positioned perpendicular to the plane defined by the grid; wherein the fabric ribbons define a plurality of one or more geometric cells within the grid for passage therethrough of light from a light source, the geometric cells preferably offset rows of rectangles when the device is unstressed, and hexagons when the device is undertension stretched evenly in line with the fabric ribbons of the grid. | 2016-10-06 |
20160291448 | PROJECTOR WITH ADJUSTABLE SUPPORT - A projector includes a power source accommodation section and a projection section body. The power source accommodation section is supported by a duct and accommodates a power source circuit that converts electric power supplied from the duct. The projection section body accommodates a projection section that projects an image, and the projection section body is so supported by the power source accommodation section that a direction in which the image is projected is adjustable. | 2016-10-06 |
20160291449 | COOLING STRUCTURE, LIGHTING OPTICAL SYSTEM, PROJECTION-TYPE DISPLAY APPARATUS, AND COOLING METHOD - A cooling structure includes a phosphor unit, air-blowing systems that cause cooling air to flow, and a duct structure. The phosphor unit includes a substrate and a phosphor that is formed on the substrate and that emits fluorescent light when irradiated with excitation light. The duct structure guides the cooling air blown from the air-blowing systems to the phosphor unit. | 2016-10-06 |
20160291450 | Mounted lenticular grating with parallax ghosting mitigation for many-frame animation - Parallax ghosting is mitigated in a mounted lenticular grating with for many-frame animation by having lenticules at an offset angle α relative to the viewing vertical and incorporating ghosting in the base images. Where Ω is an angular range orthogonal to the longitudinal axes of the lenticules over which m picture slices in the base graphic are viewable, V is the distance between the viewer's eyes, and L is the distance of the viewer from the lenticular grating, the number N of picture slices viewed due to the parallax effect given by | 2016-10-06 |
20160291451 | PHASE SHIFT BLANKMASK AND PHOTOMASK - Disclosed is a phase-shift blankmask for manufacturing a photomask, which can achieve a fine pattern of not greater than 32 nm, preferably not greater than 14 nm, and more preferably not greater than 10 nm. | 2016-10-06 |
20160291452 | HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK - A halftone phase shift mask blank is provided comprising a transparent substrate and a halftone phase shift film which is composed of a silicon base material having a Si+N+O content of at least 90 at %, a Si content of 30-70 at %, a N+O content of 30-60 at %, and an O content of up to 30 at %, and has a thickness of up to 70 nm. The halftone phase shift film is thin enough for mask pattern processing, undergoes minimal pattern size variation degradation upon exposure to sub-200 nm radiation, and maintains a necessary phase shift and transmittance. | 2016-10-06 |
20160291453 | PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND BLANK PREPARING METHOD - In a phase shift mask blank comprising a transparent substrate and a phase shift film deposited thereon and having a phase shift of 150-200° with respect to sub-200 nm light, the phase shift film is composed of a silicon base material consisting of silicon, nitrogen and optionally oxygen, has a thickness of up to 70 nm, and provides a warpage change of up to 0.2 μm in a central region of a surface of the substrate before and after the deposition of the phase shift film on the substrate. | 2016-10-06 |
20160291454 | METHOD FOR PREPARING HALFTONE PHASE SHIFT PHOTOMASK BLANK - A halftone phase shift film containing Si and N and/or O is deposited on a transparent substrate by reactive sputtering of a Si-containing target with a reactive gas containing N and/or O. One layer is sputter deposited while the reactive gas flow rate is set equal to or lower than the lower limit of the reactive gas flow rate in the hysteresis region, and another layer is sputter deposited while the reactive gas flow rate is set inside the lower and upper limits of the reactive gas flow rate in the hysteresis region. The phase shift film exhibits satisfactory in-plane uniformity of optical properties. | 2016-10-06 |
20160291455 | METHOD FOR PREPARING HALFTONE PHASE SHIFT PHOTOMASK BLANK - A halftone phase shift film containing Si and N and/or O is deposited on a transparent substrate by reactive sputtering using a silicon-containing target with a reactive gas. Different powers are applied across a plurality of targets so that two different sputtering modes selected from metal, transition and reaction modes associated with a hysteresis curve are applied to the targets. The phase shift film exhibits satisfactory in-plane uniformity of optical properties. | 2016-10-06 |
20160291456 | HALFTONE PHASE SHIFT MASK BLANK, HALFTONE PHASE SHIFT MASK, AND PATTERN EXPOSURE METHOD - In a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon, the halftone phase shift film is composed of a silicon base material consisting of silicon, nitrogen and 0-6 at % of oxygen, has a refractive index n of at least 2.4, an extinction coefficient k of 0.4-0.7, and a thickness of 40-67 nm. The halftone phase shift film is thin enough to be advantageous for photomask pattern formation, has chemical resistance against chemical cleaning, and maintains a necessary phase shift for phase shift function and a necessary transmittance for halftone function. | 2016-10-06 |
20160291457 | RETICLE, SYSTEM COMPRISING A PLURALITY OF RETICLES AND METHOD FOR THE FORMATION THEREOF - A method includes providing a pre-optical proximity correction (OPC) layout of at least a portion of at least one reticle. The pre-OPC layout defines a test cell including a first test cell area having a plurality of first target features having a first pitch and a second test cell area having a plurality of second target features having a second pitch. A post-OPC layout of the portion of the reticle is formed on the basis of the pre-OPC layout. The formation of the post-OPC layout includes performing a rule-based OPC process, wherein a plurality of first reticle features for the first test cell area are provided on the basis of the plurality of first target features, and performing a model-based OPC process, wherein a plurality of second reticle features for the second test cell area are provided on the basis of the plurality of second target features. | 2016-10-06 |
20160291458 | METHOD INTEGRATING TARGET OPTIMIZATION AND OPTICAL PROXIMITY CORRECTION - A method integrating target optimization and optical proximity correction including: fragmenting sides of a target pattern in the metal layer to form a plurality of fragments; simulating the target pattern and calculating image log slope of each fragment; calculating a target pattern optimal parameter for each fragment which is a product of three parameters including the image log slope, overlap ratio of the target pattern and a via pattern in a via layer, and critical dimension; optimizing the target pattern based on the target pattern optimal parameter; preforming optical proximity correction to the optimized target pattern; determining whether the corrected target pattern meets requirements; if yes, ending the target optimization and optical proximity correction; otherwise, using the corrected target pattern as a current target pattern and iterate from the step of simulating the target pattern and calculating image log slope of each fragment. | 2016-10-06 |
20160291459 | PHOTOMASK INCLUDING TRANSFER PATTERNS FOR REDUCING A THERMAL STRESS - A photomask includes a light transmission substrate, and a transfer pattern disposed over the light transmission substrate, a shape of the transfer pattern being transferred onto a wafer by an exposure process. The transfer pattern comprises a first transfer pattern having a closed loop shape and having a first thickness, and a plurality of second transfer patterns disposed in an opening surrounded by the first transfer pattern, the plurality of second transfer patterns being arrayed in a first direction such that adjacent second transfer patterns are spaced apart from each other by a first distance, the second transfer patterns having a second thickness which is less than the first thickness of the first transfer pattern. | 2016-10-06 |
20160291460 | PELLICLE - There is provided a pellicle wherein the pellicle frame is formed with a protrusion which extends either inward or outward from the pellicle frame so that an air passage (vent hole) can extend in it to turn upward or downward to open in the atmosphere or in the pellicle closed space (the space interior to the pellicle frame) so that it is possible to secure a wider opening area for filtration to enable prompt air ventilation whereby the pellicle membrane does not undergo extreme inflation or deflation and thus the pellicle membrane is protected from damages. | 2016-10-06 |
20160291461 | PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD - There are provided a pattern forming method in which, in self-organization lithography using a graphoepitaxy method, high miniaturization of patterns can be achieved with high quality and high efficiency by a pattern forming method including (i) a step of forming a block copolymer layer containing a specific first block copolymer or a specific second block copolymer on a specific substrate, (ii) a step of phase-separating the block copolymer layer, and (iii) a step of selectively removing at least one phase of a plurality of phases of the block copolymer layer, an electronic device manufacturing method using the pattern forming method and the electronic device, and a block copolymer used in the pattern forming method and the production method thereof. | 2016-10-06 |
20160291462 | PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT - A pattern-forming method comprises forming a prepattern that is insoluble or hardly soluble in an organic solvent. A first composition is applied on at least lateral faces of the prepattern to form a resin layer. Adjacent regions to the prepattern of the resin layer are insolubilized or desolubilized in the organic solvent without being accompanied by an increase in a molecular weight by heating the prepattern and the resin layer. Regions other than the adjacent regions insolubilized or desolubilized of the resin layer are removed with the organic solvent. The first composition comprises a first polymer having a solubility in the organic solvent to be decreased by an action of an acid. At least one selected from the following features (i) and (ii) is satisfied: (i) the first polymer comprises a basic group; and (ii) the first composition further comprises a basic compound. | 2016-10-06 |
20160291463 | LIGHT-CURABLE IMPRINTING-RESIN COMPOSITION AND ANTI-REFLECTIVE FILM - An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern transferred to a structure. According to the present invention, an imprinting photo curable resin composition is provided that at least includes a photopolymerizable (meth)acrylic monomer (A) and a photo initiator (B), wherein the (meth)acrylic monomer (A) is composed at ratios of: (a-1) from 60 to 97 mass % of a trifunctional (meth)acrylate compound; (a-2) from 3 to 40 mass % of a tetrafunctional or higher functional (meth)acrylate compound; and (a-3) from 0 to 37 mass % of a bifunctional or lower functional (meth)acrylate compound (where a sum from (a-1) to (a-3) is 100 mass %). | 2016-10-06 |
20160291464 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains: a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D) as well as a method for producing a resist pattern includes steps (1) to (4); (1) applying the resist composition according to the above onto a substrate; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; and (4) developing the exposed composition layer. | 2016-10-06 |
20160291465 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: | 2016-10-06 |
20160291466 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains: a resin having an acid-labile group, an acid generator, a compound having two or more phenolic-hydroxy groups and being other than a resin, and a solvent. The resist composition of the disclosure can provide a resist pattern showing excellent shape and detachability, therefore, the present resist composition can be used for semiconductor microfabrication with resist patterns showing excellent shape. | 2016-10-06 |
20160291467 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; | 2016-10-06 |
20160291468 | PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD - A photosensitive transfer material including a support and a photosensitive resin composition layer, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B), and the photosensitive resin composition layer does not have an ethylenic crosslinking structure is a positive-type material, is excellent in terms of heat-resistant rectangular properties, etchant resistance, and resist peeling properties, and generates only a small amount of dust during processes; a pattern formation method, and an etching method. | 2016-10-06 |
20160291469 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION - A photosensitive resin composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The photosensitive resin composition may be used to form a plated article on a metal surface of a substrate The composition includes an acid generator that, when irradiated with an active ray or radiation, generates an acid, a resin that, under an action of an acid, undergoes an increase in solubility thereof in alkali, and a fluorene compound represented by the formula (1). | 2016-10-06 |
20160291470 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM - A photosensitive polysiloxane composition having good adhesion during development, a protective film, and an element having the protective film are provided. The photosensitive polysiloxane composition includes a polysiloxane (A), an o-naphthoquinonediazidesulfonate (B), and a solvent (C). The polysiloxane (A) is obtained via the polycondensation of a monomer component, wherein the monomer component includes a titanium-containing compound (a-1) and a silane monomer (a-2) represented by formula (2). The titanium-containing compound (a-1) is selected from the group consisting of a compound represented by formula (1-1) and a hydrolyzable titanium dimer. | 2016-10-06 |
20160291471 | LAMINATED STRUCTURE - A laminated structure for use as a thy film photoresist, which includes a supporting layer, a photosensitive resin layer and a protective layer. The protective layer is a polyester film that has a maximum surface roughness between 1,500 nm and 2,500 nm, and a sheet resistance between 1×10 | 2016-10-06 |
20160291472 | HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION - A hardmask composition may include graphene nanoparticles having a size in a range of about 5 nm to about 100 nm and a solvent. | 2016-10-06 |
20160291473 | PORTABLE IMAGE-FORMING DEVICE - A portable image-forming device includes a housing, an exposure member for exposing an instant film disposed inside of the housing by means of a light radiating from the screen of a portable display device, a shading member linked in movement with the exposure member so as to shade the instant film, a traction member connected to the exposure member so as to move the exposure member to a pre-exposure position, and a developing-agent-spreading member for spreading a developing agent, which is provided on the instant film, over the entire instant film. The traction member and the developing-agent-spreading member are manually operated by a user. | 2016-10-06 |
20160291474 | EXPOSURE DOSE HOMOGENIZATION THROUGH ROTATION, TRANSLATION, AND VARIABLE PROCESSING CONDITIONS - A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile. | 2016-10-06 |
20160291475 | PHOTOSENSITIVE RESIN COMPOSITION FOR DRY ETCHING, AND METHOD FOR PRODUCING RESIST PATTERN FOR DRY ETCHING - A photosensitive resin composition for dry etching including a water-soluble resin, a photopolymerizable monomer, and a photopolymerization initiator, and a method for producing a resist pattern for dry etching. The method includes forming a resin layer with the photosensitive resin composition on a substrate; exposing the resin layer with positional selectivity; and developing the exposed resin layer with water at a temperature less than 50° C., so as to form a resist pattern. | 2016-10-06 |
20160291476 | FIELD GUIDED POST EXPOSURE BAKE APPLICATION FOR PHOTORESIST MICROBRIDGE DEFECTS - Embodiments described herein generally relate to methods for mitigating patterning defects. More specifically, embodiments described herein relate to utilizing field guided post exposure bake processes to mitigate microbridge photoresist defects. An electric field may be applied to a substrate being processed during a post exposure bake process. Photoacid generated as a result of the exposure may be moved along a direction defined by the electric field. The movement of the photoacid may contact microbridge defects and facilitate the removal of the microbridge defects from the surface of a substrate. | 2016-10-06 |
20160291477 | SURFACE TREATMENT PROCESS AND SURFACE TREATMENT LIQUID - A surface treatment liquid that can effectively prevent pattern collapse of, in particular, a silicon pattern and a surface treatment process using the surface treatment liquid. The surface treatment liquid contains a water repellent agent and an acid imide. The surface treatment process includes exposing a surface of a substrate to the surface treatment liquid to thereby hydrophobize the substrate surface. | 2016-10-06 |
20160291478 | CATALYTIC PHOTORESIST FOR PHOTOLITHOGRAPHIC METAL MESH TOUCH SENSOR FABRICATION - A catalytic photoresist composition includes a negative photoresist component and a catalyst component that includes catalytic nanoparticles. The negative photoresist component content is in a range between 30 percent and 95 percent of the composition by weight. The catalyst component content is in a range between 5 percent and 70 percent of the composition by weight. | 2016-10-06 |
20160291479 | Inspection Apparatus for Measuring Properties of a Target Structure, Methods of Operating an Optical System, Method of Manufacturing Devices - An inspection apparatus (for example a scatterometer) comprises: a substrate support for supporting a substrate and an optical system. An illumination system illuminates a target (T) with radiation. A positioning system ( | 2016-10-06 |
20160291480 | Method for Regulating a Light Source of a Photolithography Exposure System and Exposure Assembly for a Photolithography Device - The invention relates to a method for regulating a light source of a photolithography exposure system which comprises a plurality of LEDs, by means of the following steps: the light output of the individual LEDs in specific wavelength ranges is detected, and the detected light output is compared with a desired light output distribution over the entire spectrum. The LEDs are operated such that the desired spectral light output distribution is achieved in the most precise manner possible. The invention also relates to an exposure assembly for a photolithography device, having a light source which comprises a plurality of LEDs, a control means which controls the electrical power supplied to the individual LEDs, and a sensor which can detect the light output of the LEDs in the respective ranges of the wavelengths. | 2016-10-06 |
20160291481 | Method, Apparatus and Substrates for Lithographic Metrology - A substrate has three or more overlay gratings formed thereon by a lithographic process. Each overlay grating has a known overlay bias. The values of overlay bias include for example two values in a region centered on zero and two values in a region centered on P/2, where P is the pitch of the gratings. Overlay is calculated from asymmetry measurements for the gratings using knowledge of the different overlay bias values and an assumed non-linear relationship between overlay and target asymmetry, thereby to correct for feature asymmetry. The periodic relationship in the region of zero bias and P/2 has gradients of opposite sign. The calculation allows said gradients to have different magnitudes as well as opposite sign. The calculation also provides information on feature asymmetry and other processing effects. This information is used to improve subsequent performance of the measurement process, and/or the lithographic process. | 2016-10-06 |
20160291482 | EUV focus monitoring systems and methods - Systems and methods for monitoring the focus of an EUV lithography system are disclosed. Another aspect includes a method having operations of measuring a first shift value for a first patterned set of sub-structures of a focus test structure on a wafer and measuring a second shift value for a second patterned set of sub-structures of the test structure on the wafer. The test structure may be formed on the wafer using asymmetric illumination, with the first patterned set of sub-structures having a first pitch and the second patterned set of sub-structures having a second pitch that is different from the first pitch. The method may further include determining a focus shift compensation for an illumination system based on a difference between the first shift value and the second shift value. | 2016-10-06 |
20160291483 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion-type exposure apparatus includes a measurement area for measuring a substrate, an exposure area, which differs from the measurement area, for exposing the substrate via a projection optical system, plural stages configured to hold the substrate and to be movable between the exposure area and the measurement area, and a controller configured to control the driving of the plural stages, wherein in a case that one stage of the plural stage is positioned in the exposure area, and immersion liquid that is supplied onto the one stage is retained in exposure area and delivered to another stage, the controller is configured to determine a delivery position of the immersion liquid for the other stage based on at least a first processing position of the other stage. | 2016-10-06 |
20160291484 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage by irradiating a measurement beam using four heads installed on the wafer stage on a scale plate which covers the movement range of the wafer stage except for the area right under a projection optical system. Placement distances of the heads here are each set to be larger than width of the opening of the scale plates, respectively. This allows the positional information of the wafer stage to be measured, by switching and using the three heads facing the scale plate out of the four heads according to the position of the wafer stage. | 2016-10-06 |
20160291485 | IMPRINTING APPARATUS, IMPRINTING METHOD, AND ARTICLE MANUFACTURING METHOD - Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus includes a moving unit configured to move along a horizontal plane while carrying the substrate, and an adjusting unit configured to adjust an inclination of the mold with respect to the substrate. The adjusting unit adjusts the inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate and information related to an order of pattern formation. The information related to the state of the imprint material on the substrate is variable with the movement of the moving unit. | 2016-10-06 |
20160291486 | IMPRINTING APPARATUS, METHOD OF CREATING DATA ON MATERIAL DISTRIBUTION, IMPRINTING METHOD, AND ARTICLE MANUFACTURING METHOD - Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus includes a moving unit configured to be movable along a horizontal plane while carrying the substrate on which the imprint material is provided, and an applying unit configured to apply the imprint material onto the substrate based on information related to a state of the imprint material and information related to an order of pattern formation, the information related to the state of the imprint material varying with the movement of the moving unit. | 2016-10-06 |
20160291487 | ELECTROPHOTOGRAPHIC MEMBER, METHOD FOR PRODUCING SAME, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS - The electrophotographic member includes an electro-conductive substrate and an electro-conductive resin layer as the surface layer on the substrate. The electro-conductive resin layer contains a binder and a bowl-shaped resin particle; the surface of electrophotographic member has a concavity derived from the opening of the bowl-shaped resin particle, a protrusion derived from the edge portion of the opening and the electro-conductive resin layer; and when the surface of the member is observed using a scanning electron microscope at an accelerating voltage (1 kV) and a magnification (×2000) while applying a DC voltage (50 to 100 V) between an electrode disposed opposite to the electrophotographic member and the substrate, the brightness of the protrusion, K1, the brightness of the bottom of the concavity, K2, and the brightness of the exposed surface of the electro-conductive resin layer, K3, satisfy K22016-10-06 | |
20160291488 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS - The present invention provides an electrophotographic photosensitive member including a support, and a photosensitive layer on the support. The photosensitive layer has a charge generating layer containing a charge generating material and a charge transporting layer containing a charge transporting material, in this order. The charge transporting layer contains (α) a specific polycarbonate resin or a specific polyester resin, (β) the charge transporting material, (γ) a methoxybenzene, and (δ) a methoxybenzene, a methoxycyclohexane or a methylhexanol having a substituent. The content Wδ of the (δ) is 0.001% by mass or more and 1% by mass or less based on the total mass of the charge transporting layer. | 2016-10-06 |
20160291489 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - Provided is an electrophotographic photosensitive member including a support, an undercoat layer, and a photosensitive layer in this order, in which: the undercoat layer does not contain a metal oxide, or contains the metal oxide but the content of the metal oxide in the undercoat layer is 10 mass % or less; and the undercoat layer contains a polymerized product of a composition containing at least one kind of anthraquinone derivative selected from the group consisting of a compound represented by the formula (1) and a compound represented by the formula (2). | 2016-10-06 |
20160291490 | FLUORINE-CONTAINING RESIN PARTICLE DISPERSION, METHOD FOR PREPARING FLUORINE-CONTAINING RESIN PARTICLE DISPERSION, COATING LIQUID WHICH CONTAINS FLUORINE-CONTAINING RESIN PARTICLES, METHOD FOR PREPARING COATING FILM WHICH CONTAINS FLUORINE-CONTAINING RESIN PARTICLES, COATING FILM WHICH CONTAINS FLUORINE-CONTAINING RESIN PARTICLES, MOLDED BODY, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, METHOD FOR PREPARING ELECTROPHOTOGRAPHIC PHOTORECEPTOR, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE - Provided is a fluorine-containing resin particle dispersion including: fluorine-containing resin particles, a resin which is not dissolved in at least one solvent in a group of hydroxyl group-containing solvents including an alcohol-based solvent having 1 to 10 carbon atoms, containing no aromatic ring in the molecule structure, and a water-based medium, and which is adhered on the surface of the fluorine-containing resin particles, and at least one solvent, in which the resin is not dissolved, in the group of hydroxyl group-containing solvents, in which the fluorine-containing resin particles having the resin adhered on the surface thereof are dispersed. | 2016-10-06 |
20160291491 | MAGNETIC TONER - A magnetic toner includes toner particles. The toner particles contain a binder resin and a magnetic powder. The binder resin includes a crystalline polyester resin. The magnetic powder has a coating of a melamine resin. Preferably, the crystalline polyester resin has a solubility parameter (SP | 2016-10-06 |
20160291492 | ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER AND MANUFACTURING METHOD OF THE SAME - Provided is a means that can improve performance such as high-speed fixability and fixable temperature range while securing low temperature fixability, in an electrostatic charge image developing toner concurrently using a crystalline resin and an amorphous resin as binder resins constituting toner base particles. | 2016-10-06 |
20160291493 | ELECTROSTATIC LATENT IMAGE DEVELOPING TONER - An electrostatic latent image developing toner includes a plurality of toner particles each containing a binder resin. The toner particles each contain as the binder resin, a crystalline polyester resin and a non-crystalline polyester resin. An FT-IR spectrum of the electrostatic latent image developing toner obtained through FT-IR analysis based on an ATR method has an absorbency peak of at least 0.0100 and no greater than 0.0250 in a wave number range of 701 cm | 2016-10-06 |
20160291494 | METHOD OF PRODUCING TONER AND METHOD OF PRODUCING RESIN PARTICLE - A method of producing a toner containing a toner particle having a core-shell structure that has a core containing a resin and has a shell phase on a surface of the core, the shell phase being derived from a resin fine particle containing a resin A, and the resin A being a resin containing a segment derived from a crystalline polymer D, the method including steps (i), (ii) and (iii). | 2016-10-06 |
20160291495 | NEGATIVELY-CHARGEABLE TONER AND METHOD FOR MANUFACTURING SAME - Provided are a method for producing a negatively-chargeable toner that has a narrow particle diameter distribution even when produced by a polymerization method, and a negatively-chargeable toner that is excellent in balance between low-temperature fixability and heat-resistant shelf stability, has fine thin-line reproducibility, and generates little fog, even in high-speed printing. The negatively-chargeable toner includes colored resin particles which contain at least a binder resin, a colorant, a charge control agent and a softening agent, wherein the charge control agent is a copolymer which is obtained by copolymerizing a vinyl aromatic hydrocarbon, a (meth)acrylate and a sulfonic acid group-containing (meth)acrylamide and in which a copolymerization ratio of the sulfonic acid group-containing (meth)acrylamide is 0.8 to 4.0% by mass, and wherein the softening agent is at least one of a monoester compound and a polyglycerol ester compound. | 2016-10-06 |
20160291496 | Digital Printing Apparatus and Digital Printing Process - A digital printing apparatus using liquid toner comprising carrier liquid, a dispersing agent and imaging particles, the apparatus comprising: an imaging member adapted to sustain a pattern of electric charge forming a latent image on its surface; a development member arranged to receive a quantity of liquid toner; and to develop said latent image by transferring a portion of said quantity of liquid toner onto said imaging member in accordance with said pattern; a melting unit arranged downstream of the imaging member and configured to melt imaging particles of a transferred part of the portion of liquid toner, said part being transferred from the imaging member, wherein there is provided a dispersing capacity modification unit downstream of the imaging member, said dispersing capacity modification unit being configured for reducing the dispersing capacity of the dispersing agent in the transferred part of the portion of liquid toner. | 2016-10-06 |
20160291497 | ROLLER FOR ELECTROPHOTOGRAPHY, PROCESS CARTRIDGE, AND IMAGE-FORMING APPARATUS - A roller for electrophotography including a mandrel and an elastic layer on the mandrel is provided. The elastic layer contains a hollow particle in a region from the surface of the elastic layer to a depth of 100 μm. A cross-section of the hollow particle intersected by a first plane and a cross-section of the hollow particle intersected by a second plane each have a ratio of the length of the long axis to the length of the short axis of 1.2 or more and 1.9 or less. | 2016-10-06 |
20160291498 | SEMICONDUCTIVE ROLLER - A semiconductive roller ( | 2016-10-06 |
20160291499 | IMAGE FORMING APPARATUS - In an image forming apparatus including a plurality of image forming stations, on the basis of a density of a toner image formed in an upstream image forming station, an operation of a pre-exposure device in a downstream image forming station is controlled. | 2016-10-06 |
20160291500 | OPTICAL SCANNING APPARATUS - Provided is an optical scanning apparatus, including: a deflection unit; and an imaging optical element (IOE) guiding a light flux deflected by deflection unit onto a scanned surface, in which, an fθ coefficient of IOE, a focal length of IOE, and when an intersection between deflection unit and an optical axis of IOE is set as an origin, a coordinate in an optical axis direction (OAD) of an intersection between a principal ray of an outermost off-axis light flux and an incident surface of IOE, a coordinate in OAD of an intersection between principal ray of outermost off-axis light flux and an exit surface of IOE, a coordinate in OAD of an intersection between a principal ray of an on-axis light flux and the incident surface, and a coordinate in OAD of an intersection between principal ray of on-axis light flux and the exit surface are appropriately set. | 2016-10-06 |
20160291501 | IMAGE FORMING APPARATUS - In a case of changing a first light quantity to a second light quantity which is smaller than the first light quantity, a light quantity changing unit changes a light quantity to a third light quantity, which is smaller than the first light quantity and larger than the second light quantity, before changing the light quantity to the second light quantity, and a third light quantity is a light quantity with which the signal is able to be output in a state where a first threshold is set. | 2016-10-06 |
20160291502 | METHOD FOR ADJUSTING POSITION OF LIGHT BEAM SENSOR - A method for adjusting a position of a light beam sensor includes preparing a jig at a position coinciding with where the target surface is to be placed, the jig including a sensor mounting section at a reference position where a first beam is to enter, the first beam and a second beam being split from the light beam such that the first beam passes through one or more scan lenses and the second beam enters the light beam sensor, and mounting a reference sensor to the sensor mounting section, the reference sensor being configured to detect the first beam. The method further includes adjusting the position of the light beam sensor so as to synchronize detection timing of the second beam by the light beam sensor with detection timing of the first beam by the reference sensor. | 2016-10-06 |
20160291503 | ELECTROPHOTOGRAPHIC IMAGE FORMING METHOD - An electrophotographic image forming method includes: performing a reversal development process using an electrophotographic photoreceptor including a conductive support, and an undercoat layer, a photosensitive layer, and a surface protective layer, which are at least provided on the conductive support, wherein the surface protective layer includes at least a cured resin and a component capable of influencing frequency dependence of impedance, and the undercoat layer includes at least a metal oxide and has a thickness in the range of 1 to 30 μm; and performing an electrostatic discharge step including applying an AC voltage at 2 kHz or more, wherein the frequency of the AC voltage is increased depending on use history. | 2016-10-06 |
20160291504 | IMAGE FORMING APPARATUS, CONTROL METHOD, AND NON-TRANSITORY STORAGE MEDIUM ENCODED WITH COMPUTER READABLE PROGRAM - An image forming apparatus includes: an image carrier; an image forming unit configured to form, on the image carrier, an electrostatic latent image; a developing unit including a toner carrier configured to develop, on the image carrier, a toner image corresponding to the electrostatic latent image; an application unit configured to apply a lubricant onto the image carrier; a calculation unit configured to calculate an image portion ratio representing a ratio of a toner sticking region to the electrostatic latent image or the toner image; and a control unit configured to cause the lubricant mixed into the developing unit to stick to the toner carrier, and change, depending on the image portion ratio, an amount of the lubricant caused to stick to a non-image-formation region which is a region on the image carrier and in which the electrostatic latent image or the toner image is not formed. | 2016-10-06 |
20160291505 | SEMICONDUCTIVE ROLLER - A semiconductive roller ( | 2016-10-06 |
20160291506 | DEVELOPING DEVICE INCLUDING CASING HAVING SUPPLY OPENING AND DISCHARGE OPENING, AND IMAGE FORMING APPARATUS PROVIDED WITH THE SAME - A developing device includes: a casing having a partitioning wall, a toner chamber, and a developing chamber positioned above the toner chamber; a photosensitive drum; a developing roller; a supply roller; first and second conveying members. The developing roller, the supply roller, and the second conveying member are accommodated in the developing chamber. The first conveying member is accommodated in the toner chamber. The partitioning wall has a supply opening and a discharge opening for providing communication between the toner chamber and the developing chamber. The supply and discharge openings are positioned outward of the supply roller in an axial direction of the photosensitive drum. The first conveying member conveys the toner accommodated in the toner chamber into the developing chamber through the supply opening. The second conveying member conveys the toner supplied by the first conveying member from the supply opening to the discharge opening in the axial direction. | 2016-10-06 |
20160291507 | IMAGE FORMING APPARATUS - An image forming apparatus includes an image bearer, an image forming device, a toner concentration detector, a toner supply device, an image density detector, and a controller including a memory device. At a predetermined timing before image formation is started, the controller adjusts a developing potential to adjust an image density of a detection toner image on the image bearer and drives the toner supply device or the developing device to adjust a toner concentration in the developing device. After the image formation is started, the controller drives the toner supply device to adjust the toner concentration, and, in a predetermined sheet interval, adjusts the target concentration based on the image density of the detection toner image formed in a non-image area of the image bearer. When the toner concentration is higher than the target concentration plus a threshold, the controller suspends image formation and readjusts the developing potential. | 2016-10-06 |
20160291508 | SENSOR DEVICE, TONER CONCENTRATION DETECTION METHOD AND IMAGE FORMING APPARATUS - The detection sensitivity of a variation in resonant frequency is increased, and thus a toner concentration is accurately detected. In a sensor device that includes an LC resonant circuit which outputs a pulse signal having a frequency corresponding to the toner concentration, a multiplier portion which multiplies the pulse signal output from the LC resonant circuit and a concentration detection portion which detects the toner concentration based on the pulse signal multiplied by the multiplier portion, the LC resonant circuit includes a detection coil and a capacitor and outputs a pulse signal having a frequency corresponding to the toner concentration. The multiplier portion multiplies the frequency of the pulse signal output from the LC resonant circuit. The concentration detection portion subtracts a predetermined offset pulse number from the pulse signal multiplied by the multiplier portion and detects the toner concentration based on the subtracted pulse number. | 2016-10-06 |
20160291509 | IMAGE FORMING APPARATUS - An image forming apparatus includes a transfer unit that transfers a toner image on an image bearer onto a transfer medium. The image forming apparatus includes a control unit that controls a transfer voltage to be output to the transfer unit in accordance with a certain condition. The control unit applies currents having at least two different values while paper is not being fed. The two current values are lower than a current value during paper feeding. The control unit estimates an output voltage on a basis of a voltage detected through the application of the currents. When the estimated output voltage falls below a certain limiter voltage, the control unit controls to bring the output voltage to a value calculated through the certain condition. When the estimated output voltage exceeds the certain limiter voltage, the control unit controls to bring the output voltage to the limiter voltage. | 2016-10-06 |
20160291510 | IMAGE FORMING APPARATUS - In an image forming apparatus including a plurality of image forming stations, a pre-exposure device is at least not provided in a most upstream image forming apparatus at which a toner image formed by the image forming station cannot arrive, and the pre-exposure device is at least provided in a most downstream image forming apparatus at which the toner image formed by the image forming station can arrive. | 2016-10-06 |
20160291511 | IMAGE FORMING APPARATUS - An image forming apparatus includes a fixing portion for fixing a toner image formed on a recording material thereon, the fixing portion including a heating member having a heat source, a pressing member cooperating with the heating member to form a nip while pressing against the heating member, and a frame containing the heating member and the pressing member; a first opening, provided in the frame, for permitting air to flow out of said frame; a second opening, provided in the frame, for permitting air to flow into the frame; and a external duct provided, outside the fixing portion, for guiding the air discharged through the first opening to the second opening. At least a part of an inner wall of the external duct is made of a metal plate, and the air introduced through the second opening is guided to the pressing member. | 2016-10-06 |
20160291512 | FIXING DEVICE AND FIXING TEMPERATURE CONTROL METHOD OF FIXING DEVICE - According to one embodiment, a fixing device includes determination means for determining the size of an image forming area of a medium, heating means for including an endless rotating body, plural heat-generating members which are formed in a perpendicular direction to a transporting direction, inclined by a predetermined angle, and divided by a predetermined length, and are disposed so as to come into contact with an inner side of the rotating body, and a switching unit which switches individual conduction, and heats the medium, pressing means for forming a nip by performing pressing and contact at a position of the plural heat-generating members, and nipping and carrying the medium in the transporting direction along with the heating means, and heating control means for controlling the switching unit to select and conduct heat-generating members and controlling the heating means to heat the medium. | 2016-10-06 |
20160291513 | Fixing Device - A fixing device includes a heating unit including an endless belt and a heating plate, a fixing roller to form a nip portion, a frame including a first sidewall and a second sidewall, a first shaft that the fixing roller has, a second shaft disposed upstream of the nip portion, and a third shaft disposed downstream of the nip portion. One end portion of the first shaft, one end portion of the second shaft and one end portion of the third shaft are supported by the first sidewall. The other end portion of the first shaft, the other end portion of the second shaft and the other end portion of the third shaft are supported by the second sidewall. When viewed from the longitudinal direction, the nip portion is positioned in a triangle defined by imaginary lines connecting the first, second and third shafts to each other. | 2016-10-06 |
20160291514 | FIXING DEVICE AND IMAGE FORMING APPARATUS - When a roller faces a concave portion of an eccentric cam, a pressure roller is brought into press contact with a fixing roller at the spring pressure of a lower compression spring via a lever and an arm member. When the roller faces a maximum radius part, the pressure roller moves in a direction separating from the fixing roller via the lever and the arm member against the spring pressure of the lower compression spring. | 2016-10-06 |
20160291515 | IMAGE FORMING APPARATUS - An image forming apparatus includes: a fixing portion for fixing an image formed on a recording material; and a guide member for guiding the recording material. The guide member is provided at an entrance to the fixing portion and at an end portion with respect to a direction perpendicular to a feeding direction of the recording material The guide member is moved when the guide member is pushed by the recording material. | 2016-10-06 |
20160291516 | IMAGE FORMING APPARATUS - A positional relationship between a photosensitive drum and an intermediate transfer belt during a period from the start of the driving of the photosensitive drum to the start of image formation, or during a period of the end of the image formation to the stop of the driving of the photosensitive drum enters a separating state in a case where the image formation is executed when the process speed is a first speed, and enters a contacting state in a case where the image formation is executed when the process speed is a second speed. | 2016-10-06 |
20160291517 | IMAGE FORMING APPARATUS, IMAGE FORMING SYSTEM, AND IMAGE FORMING METHOD - An image forming apparatus that performs printing on continuous paper includes: an image forming unit that forms a toner image on an image carrier; a transfer unit that transfers the toner image on the image carrier to the continuous paper; a cleaning unit that removes toner on a surface of the image carrier downstream of a transfer position; and a control unit that performs toner consumption control to form the toner image on the image carrier, wherein the control unit can perform first control to form a first toner image on the image carrier and transfer the toner image to the continuous paper and second control to form a second toner image on the image carrier and remove toner by the cleaning unit without transferring the toner image to the continuous paper, and can select which of the first control and the second control is operated. | 2016-10-06 |
20160291518 | IMAGE FORMING APPARATUS - An image forming apparatus includes a casing, a conveyance unit, an intermediate roller unit, and a guide section. The intermediate roller unit includes an intermediate roller at a facing surface thereof that faces a sheet conveyance path. The conveyance unit includes a conveyance roller at a facing surface thereof that faces the sheet conveyance path. The guide section guides movement of the intermediate roller unit relative to the casing such that the conveyance roller pushes the intermediate roller in association with closing movement of the conveyance unit relative to the casing to close the intermediate roller unit relative to the casing. | 2016-10-06 |
20160291519 | Image-Forming Apparatus Having Sheet-Supplying Device To Which Additional Sheet-Supplying Device Is Attachable - An image-forming apparatus includes: a casing; a first sheet tray provided in a bottom portion of the casing; an image-forming unit configured to form an image on a sheet supplied from a sheet accommodation portion of the first sheet tray; a sheet supplying path; a first conveying path; and a shutter. The sheet supplying path is configured to provide communication between the sheet accommodation portion and the image-forming unit. The first conveying path is provided in one of the casing and the first sheet tray, and has one end formed with an opening and another end configured to communicate with the sheet supplying path, the opening being open downward. The shutter is movable between a closing position closing the first conveying path and an opening position opening the first conveying path. | 2016-10-06 |
20160291520 | IMAGE FORMING APPARATUS AND SHEET SUPPORT TRAY - An image forming apparatus includes a removable sheet support tray. The sheet support tray includes a sheet support surface providing a sheet support area above the sheet support surface. The support tray also includes a stopper portion movable between a restraining position and a non-restraining position that is a different position from the restraining position. In a state where the stopper portion is located at the restraining position, the stopper portion includes a surface disposed adjacent to and downstream of the sheet support area in a first direction, the first direction extending along at least a portion of the sheet support surface. | 2016-10-06 |
20160291521 | CARTRIDGE AND IMAGE FORMING APPARATUS - A cartridge capable of preventing careless damage or the like of a memory unit and an image forming apparatus including the cartridge are provided. A toner cartridge ( | 2016-10-06 |