Dodson
Christopher Dodson, Thatcham GB
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20130104450 | TORREFACTION PROCESS | 05-02-2013 |
20130220790 | TOROIDAL BED REACTOR - The present invention provides an apparatus for the processing of a particulate material, the apparatus comprising: | 08-29-2013 |
Christopher E. Dodson, Reading GB
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20100040508 | Apparatus for producing amorphous silica ash - The invention provides apparatus and a method for exothermic treatment of feed material to provide an ash. The apparatus includes a housing extending about a central axis and having first and second ends, and a central mixing zone adjacent the first end. A material intake carries the feed material into the housing and gas enters through a first gas inlet at the first end through guides to create an inner vortex extending axially about said axis and the gas then follows an outer vortex which also extends axially but in the opposite direction from that of the inner vortex. However the inner and outer vortices rotate in the same direction. A gas outlet is positioned to receive spent gas from the housing and an ash outlet is positioned remotely from the mixing zone to receive the ash. If preferred, the position of the ash outlet may be incorporated into the gas outlet. A control system is provided to limit the temperature in the feed material in the housing. As a result, in operation, gases can be fed into the first and second gas inlets carrying sufficient oxygen for exothermic combustion of the feed material and having a flow rate to create said inner and outer vortices. The outer vortex meets the inner vortex in the mixing zone to mix both with the inner vortex and with the feed material which will be subjected to exothermic combustion as the feed material is entrained in the inner and outer vortices. The material will pass through the mixing zone repeatedly until the feed material is converted to the desired ash having escape criteria needed to reach and exit through the ash outlet. | 02-18-2010 |
Christopher Edward Dodson, Berkshire GB
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20080286164 | Particle Treatment in an Expanded Toroidal Bed Reactor - A method of processing a fluid and/or a particulate material, the method comprising the steps of: (a) introducing the particulate material into a chamber; (b) providing a flow of fluid into said chamber for entraining the particulate material; and (c) removing processed fluid and/or particulate material from the chamber; wherein the chamber comprises a processing zone having a substantially circular transverse cross-section, the fluid flow being introduced into the processing zone at an angle of between 10° and 75° with respect to a tangent of the substantially circular transverse cross-section of the processing zone to establish a fluid flow following a substantially helical path in the processing chamber. | 11-20-2008 |
Helen Dodson, Galway IE
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20110020841 | CENTROSOME AMPLIFICATION AS A BIOSENSOR FOR DNA DAMAGE - The present invention provides an assay kit for identifying and/or monitoring genotoxic modulating agents comprising eukaryotic cells, characterised in that the cells stably express at least one labelled centrosome marker. | 01-27-2011 |
Henry Dodson, Midlothian GB
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20120285150 | POWER GENERATING APPARATUS OF RENEWABLE ENERGY TYPE - A power generating apparatus is provided with a hub rotated by the renewable energy received via a blade, a rotating shaft connected to the hub, a hydraulic pump mounted on the rotating shaft and driven by rotation of the rotating shaft, a hydraulic motor driven by pressurized oil from the hydraulic pump, a generator coupled to the hydraulic motor, a support providing reaction torque on the hydraulic pump from the rotating shaft while allowing a displacement of the hydraulic pump in a direction perpendicular to an axis of the rotating shaft, the hydraulic pump being supported by a nacelle through the support, and a pressurized-oil piping which is at least partially constituted of a flexible tube and which connects an outlet port of the hydraulic pump to an inlet port of the hydraulic motor to supply the pressurized oil from the hydraulic pump to the hydraulic motor. | 11-15-2012 |
Henry Dodson, Lothian GB
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20130216403 | METHOD OF MAINTAINING HYDRAULIC PUMP IN A RENEWABLE ENERGY TURBINE GENERATOR - A hydraulic pump comprises ( | 08-22-2013 |
Jenifer Ruth Dodson, Berkshire GB
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20110030585 | BIOREFINERY PRODUCTS IN STRUCTURAL MATERIALS - There is described a structural material comprising a substrate and a binder characterised in that the binder comprises a bio-silicate and a process for the manufacture thereof. | 02-10-2011 |
Joseph Michael Dodson, Winkfield GB
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20110176563 | CVD SINGLE CRYSTAL DIAMOND MATERIAL - Single crystal diamond material produced using chemical vapour deposition (CVD), and particularly diamond material having properties suitable for use in optical applications such as lasers, is disclosed. In particular, a CVD single crystal diamond material having preferred characteristics of longest linear internal dimension, birefringence and absorption coefficient, when measured at room temperature, is disclosed. Uses of the diamond material, including in a Raman laser, and methods of producing the diamond are also disclosed. | 07-21-2011 |
Joseph Michael Dodson, Berkshire GB
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20130270991 | DIAMOND OPTICAL ELEMENT - A method of manufacturing an optical element, the method comprising: growing a first layer of single crystal diamond material via a chemical vapour deposition technique using a gas phase having a first nitrogen concentration; growing a second layer of single crystal diamond material over said first layer via a chemical vapour deposition technique using a gas phase having a second nitrogen concentration, wherein the second nitrogen concentration is lower than the first nitrogen concentration; forming an optical element from at least a portion of the second layer of single crystal diamond material; and forming an out-coupling structure at a surface of the optical element for increasing out-coupling of light. | 10-17-2013 |
20140342122 | LARGE AREA OPTICAL QUALITY SYNTHETIC POLYCRYSTALLINE DIAMOND WINDOW - A polycrystalline chemical vapour deposited (CVD) diamond wafer comprising: a largest linear dimension equal to or greater than 125 mm; a thickness equal to or greater than 200 μm; and one or both of the following characteristics measured at room temperature (nominally 298 K) over at least a central area of the polycrystalline CVD diamond wafer, said central area being circular, centred on a central point of the polycrystalline CVD diamond wafer, and having a diameter of at least 70% of the largest linear dimension of the polycrystalline CVD diamond wafer: an absorption coefficient≦0.2 cm | 11-20-2014 |
20140349068 | LARGE AREA OPTICAL QUALITY SYNTHETIC POLYCRYSTALLINE DIAOND WINDOW - A polycrystalline chemical vapour deposited (CVD) diamond wafer comprising: a largest linear dimension equal to or greater than 70 mm; a thickness equal to or greater than 1.3 mm; and one or both of the following characteristics measured at room temperature (nominally 298 K) over at least a central area of the polycrystalline CVD diamond wafer, said central area being circular, centred on a central point of the polycrystalline CVD diamond wafer, and having a diameter of at least 70% of the largest linear dimension of the polycrystalline CVD diamond wafer: an absorption coefficient ≦0.2 cm | 11-27-2014 |
Joseph Michael Dodson, Ascot GB
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20140048016 | MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL - A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: | 02-20-2014 |
20140230729 | MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL - A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode, wherein the resonance cavity has a central rotational axis of symmetry extending from the base to the top plate, and wherein the top plate is mounted across said central rotational axis of symmetry; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; wherein the resonance cavity is configured to have a height, as measured from the base to the top plate of the plasma chamber, which supports a TM | 08-21-2014 |
20140234556 | MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE - A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode between the base and the top plate; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate; and a substrate disposed on the supporting surface, the substrate having a growth surface on which the synthetic diamond material is to be deposited in use, wherein the substrate dimensions and location within the resonance cavity are selected to generate a localized axisymmetric E | 08-21-2014 |
20140308461 | MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL - A microwave plasma reactor for manufacturing a synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber ( | 10-16-2014 |
20150061191 | MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE - The present disclosure relates to substrates for use in microwave plasma reactors. Certain substrates include a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface. The cylindrical disc may have a diameter of 80 mm or more. The growth surface may have a flatness variation no more than 100 mm The supporting surface may have a flatness variation no more than 100 mm. | 03-05-2015 |
Stephen Dodson, London GB
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20110145400 | APPARATUS AND METHOD FOR ANALYSING A COMPUTER INFRASTRUCTURE - A system and method for analysing a computer infrastructure. The system and method analyses messages sent and received within the computer infrastructure to determine a system model and exception data. | 06-16-2011 |
20150082437 | METHOD AND APPARATUS FOR DETECTING IRREGULARITIES ON A DEVICE - A system and method for the detection of irregularities, such as fraud or malware ( | 03-19-2015 |
Stephen Dodson, Middlesex GB
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20130262347 | System and Method for Visualisation of Behaviour within Computer Infrastructure - The field of the disclosure relates generally to a method and system for analysing behaviour of a computer infrastructure and the displaying the behaviour of the computer infrastructure in a graphical manner. The system comprises an analytical engine connected to agents running on devices in the computer infrastructure and analysing continuous data and asynchronous data. | 10-03-2013 |
Valentina Dodson, Coventry GB
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20140329060 | Construction Panel and Manufacture Thereof - A panel for use in building construction comprises a substrate board having two opposed faces. A lamina is secured to a first one of the faces of the substrate board by means of one or more regions of bonding between the lamina and the board. The one or more regions of bonding cover a total area that is less than 20% of the total interfacial area between the lamina and the board. | 11-06-2014 |