Patent application number | Description | Published |
20080267037 | METHOD OF READING OPTICAL INFORMATION IN SUPER-RESOLUTION - The invention relates to the reading of digital optical recordings at very high density (CD, DVD, etc.). Reading is done by a PRML (“Partial Response Maximum Likelihood”) technique which uses a model of analog response to the recording of an isolated information bit. Customarily, the response model is represented by four or five signal samples having standardized levels 1 or 2. To take account of particular phenomena of super-resolution reading, the invention proposes the use of a model having 6 to 10 samples that can take 4 or 5 standardized levels. This model can result from the superposition of two simpler models having only two possible levels of samples taken from 1, 2 and 3. | 10-30-2008 |
20080274323 | Process for Producing an Optical Recording Medium with Several Stages and Medium Obtained Thereby - The recording medium comprises at least a first (L | 11-06-2008 |
20080292785 | Formation of deep pit areas and use thereof in fabrication of an optic recording medium - A pit is formed from a stack comprising at least one first layer formed by a material able to change physical state and a second layer made of the same material as that forming the first layer, but in a different physical state. An area of the first layer is treated to make said area go from its initial physical state to the physical state corresponding to that of the second layer. A selective etching step is then performed to eliminate said area of the first layer and the area of the second layer initially covered by the treated area of the first layer. Advantageously, said material is a phase transition material. | 11-27-2008 |
20100059477 | Formation of Deep Hollow Areas and use Thereof in the Production of an Optical Recording Medium - At least one hollow zone is formed in a stack of at least one upper layer and one lower layer. The upper layer is patterned to form at least a first hollow region passing through said upper layer. The first hollow region is extended by a second hollow region formed in the lower layer by etching through an etching mask formed on the patterned upper layer. The etching mask is formed by a resin layer, positively photosensitive to an optic radiation of a predetermined wavelength, exposed to the said optic radiation through the stack and developed. The lower and upper layers of the stack are respectively transparent and opaque to said predetermined wavelength so that the patterned upper layer acts as exposure mask for the resin layer. | 03-11-2010 |