Patent application number | Description | Published |
20090081862 | AIR GAP STRUCTURE DESIGN FOR ADVANCED INTEGRATED CIRCUIT TECHNOLOGY - A method for forming air gaps between interconnect structures in semiconductor devices provides a sacrificial layer formed over a dielectric and within openings formed therein. The sacrificial layer is a blanket layer that is converted to a material that is consumable in an etchant composition that the dielectric material and a subsequently formed interconnect material are resistant to. After the interconnect material is deposited a planarized surface including portions of the dielectric material, vertical sections of the converted material and portions of the interconnect material is produced. The etchant composition then removes the converted material thereby forming voids. A capping layer is formed over the structure resulting in air gaps. A sidewall protection layer may be optionally formed between the interconnect structure and the sacrificial material. In some embodiments an ARC layer may be formed over the dielectric and form part of the planar surface. | 03-26-2009 |
20090140393 | WAFER SCRIBE LINE STRUCTURE FOR IMPROVING IC RELIABILITY - A semiconductor wafer having a multi-layer wiring structure is disclosed. The wafer comprises a plurality of chip die areas arranged on the wafer in an array and scribe line areas between the chip die areas. The scribe lines of a semiconductor wafer having USG top-level wiring layers above ELK wiring layers have at least one metal film structures substantially covering corner regions where two scribe lines intersect to inhibit delamination at the USG/ELK interface during wafer dicing operation. | 06-04-2009 |
20090194889 | BOND PAD STRUCTURE - A bonding pad structure is provided that includes two conductive layers and a connective layer interposing the two conductive layers. The connective layer includes a contiguous, conductive structure. In an embodiment, the contiguous conductive structure is a solid layer of conductive material. In other embodiments, the contiguous conductive structure is a conductive network including, for example, a matrix configuration or a plurality of conductive stripes. At least one dielectric spacer may interpose the conductive network. In an embodiment, the conductive density of the connective layer is between approximately 20% and 100%. | 08-06-2009 |
20090298256 | SEMICONDUCTOR INTERCONNECT AIR GAP FORMATION PROCESS - A semiconductor package including an interconnect air gap and method for making the same. The semiconductor package includes a dielectric layer, a metallic interconnect, an air gap disposed between the dielectric layer and interconnect, and a spacer interspersed between the metallic interconnect and air gap. The metallic interconnect is laterally supported by and isolated from the air gap by the spacer. A method for making the same is also provided. | 12-03-2009 |
20100025824 | Structure for Reducing Integrated Circuit Corner Peeling - A crack prevention structure that reduces integrated circuit corner peeling and reduces cracking is disclosed. The crack prevention structure comprises a semiconductor substrate; a first plurality of dielectric layers of a first material disposed over the semiconductor substrate; a second plurality of dielectric layers of a second material different than the first material, disposed on the first plurality of dielectric layers, wherein the first plurality of dielectric layers and the second plurality of dielectric layers meet at an interface; and a plurality of metal structures and a plurality of via structures formed through the interface of the first plurality of dielectric layers and the second plurality of dielectric layers. | 02-04-2010 |
20100052065 | NEW METHOD FOR MECHANICAL STRESS ENHANCEMENT IN SEMICONDUCTOR DEVICES - The present disclosure provides an integrated circuit. The integrated circuit includes a semiconductor substrate having an active region; at least one operational device on the active region, wherein the operational device include a strained channel; and at least one first dummy gate disposed at a side of the operational device and on the active region. | 03-04-2010 |
20100117080 | SEMICONDUCTOR TEST PAD STRUCTURES - A semiconductor test pad interconnect structure with integrated die-separation protective barriers. The interconnect structure includes a plurality of stacked metal layers each having an electrically conductive test pad separated from other test pads by a dielectric material layer. In one embodiment, at least one metallic via bar is embedded into the interconnect structure and electrically interconnects each of the test pads in the metal layers together. The via bar extends substantially along an entire first side defined by each test pad in some embodiments. In other embodiments, a pair of opposing via bars may be provided that are arranged on opposite sides of a die singulation saw cut line defined in a scribe band on a semiconductor wafer. | 05-13-2010 |
20100197114 | Methods of die sawing - A structure includes a substrate having a plurality of scribe line areas surrounding a plurality of die areas. Each of the die areas includes at least one first conductive structure formed over the substrate. Each of the scribe line areas includes at least one active region and at least one non-active region. The active region includes a second conductive structure formed therein. The structure further includes at least one first passivation layer formed over the first conductive structure and second conductive structure, wherein at least a portion of the first passivation layer within the non-active region is removed, whereby die-sawing damage is reduced. | 08-05-2010 |
20100252916 | STRUCTURE FOR IMPROVING DIE SAW QUALITY - A semiconductor device is provided that includes a semiconductor substrate, a plurality of dies formed on the semiconductor substrate, the plurality of dies being separated from one another by a first region extending along a first direction and a second region extending along a second direction different from the first direction, a dummy metal structure formed within a third region that includes a region defined by an intersection of the first region and the second region, a plurality of metal interconnection layers formed over the substrate, and a plurality of dielectric layers formed over the substrate. Each of the metal interconnection layers is disposed within each of the dielectric layers and a dielectric constant of at least one of the dielectric layers is less than about 2.6. | 10-07-2010 |
20110018128 | PACKAGE STRUCTURE AND METHOD FOR REDUCING DIELECTRIC LAYER DELAMINATION - A semiconductor package structure is provided. The structure includes a semiconductor chip having a plurality of interconnect layers formed thereover. A first passivation layer is formed over the plurality of interconnect layers. A stress buffer layer is formed over the first passivation layer. A bonding pad is formed over the stress buffer layer. A second passivation layer is formed over a portion of the bonding pad, the second passivation having at least one opening therein exposing a portion of the bonding pad. | 01-27-2011 |
20110287627 | SEMICONDUCTOR TEST PAD STRUCTURES - A semiconductor test pad interconnect structure with integrated die-separation protective barriers. The interconnect structure includes a plurality of stacked metal layers each having an electrically conductive test pad separated from other test pads by a dielectric material layer. In one embodiment, at least one metallic via bar is embedded into the interconnect structure and electrically interconnects each of the test pads in the metal layers together. The via bar extends substantially along an entire first side defined by each test pad in some embodiments. In other embodiments, a pair of opposing via bars may be provided that are arranged on opposite sides of a die singulation saw cut line defined in a scribe band on a semiconductor wafer. | 11-24-2011 |
20120091455 | PAD STRUCTURE HAVING CONTACT BARS EXTENDING INTO SUBSTRATE AND WAFER HAVING THE PAD STRUCTURE - A pad structure in a semiconductor wafer for wafer testing is described. The pad structure includes at least two metal pads connected there-between by a plurality of conductive vias in one or more insulation layers. A plurality of contact bars in contact with the bottom-most metal pad extends substantially vertically from the bottom-most metal pad into the substrate. An isolation structure substantially surrounds the plurality of contact bars to isolate the pad structure. | 04-19-2012 |
20120092033 | MEASUREMENT OF ELECTRICAL AND MECHANICAL CHARACTERISTICS OF LOW-K DIELECTRIC IN A SEMICONDUCTOR DEVICE - Provided is a test structure for testing an unpackaged semiconductor wafer. The test structure includes a force-application component that is coupled to an interconnect structure of the semiconductor wafer. The force-application component is operable to exert a force to the semiconductor wafer. The test structure also includes first and second test portions that are coupled to the interconnect structure. The first and second test portions are operable to measure an electrical performance associated with a predetermined region of the interconnect structure. The first and second test portions are operable to measure the electrical performance while the force is exerted to the semiconductor wafer. | 04-19-2012 |
20120098120 | CENTRIPETAL LAYOUT FOR LOW STRESS CHIP PACKAGE - A low-stress chip package is disclosed. The package includes two substrates. The first substrate includes an array of first conductive structures in the corner area of the chip, and an array of second conductive structures in the peripheral edge area of the chip. The first and second conductive structures each has a conductive pillar having elongated cross section in the plane parallel to the first substrate and a solder bump over the pillar. The package also includes a second substrate having an array of metal traces. The elongated pillars each form a coaxial bump-on-trace interconnect with a metal trace respectively. The long axis of the elongated cross section of a pillar in the corner area of the chip points to chip's center area, and the long axis of the elongated cross section of a pillar in chip's peripheral edge area aligns perpendicular to the edge. | 04-26-2012 |
20120211902 | BOND PAD STRUCTURE - A bonding pad structure is provided that includes two conductive layers and a connective layer interposing the two conductive layers. The connective layer includes a contiguous, conductive structure. In an embodiment, the contiguous conductive structure is a solid layer of conductive material. In other embodiments, the contiguous conductive structure is a conductive network including, for example, a matrix configuration or a plurality of conductive stripes. At least one dielectric spacer may interpose the conductive network. Conductive plugs may interconnect a bond pad and one of the conductive layers. | 08-23-2012 |
20120267799 | PACKAGE STRUCTURES - A package structure includes a substrate, a first die and at least one second die. The substrate includes a first pair of parallel edges and a second pair of parallel edges. The first die is mounted over the substrate. The first die includes a third pair of parallel edges and a fourth pair of parallel edges, wherein the third pair of parallel edges and the fourth pair of parallel edges are not parallel to the first pair of parallel edges and the second pair of parallel edges, respectively. The at least one second die is mounted over the first die. | 10-25-2012 |
20130119449 | SEMICONDUCTOR DEVICE WITH SEAL RING WITH EMBEDDED DECOUPLING CAPACITOR - A seal ring for semiconductor devices is provided with embedded decoupling capacitors. The seal ring peripherally surrounds an integrated circuit chip in a seal ring area. The at least one embedded decoupling capacitor may include MOS capacitors, varactors, MOM capacitors and interdigitized capacitors with multiple capacitor plates coupled together. The opposed capacitor plates are coupled to different potentials and may advantageously be coupled to V | 05-16-2013 |
20130147018 | Structure for Reducing Integrated Circuit Corner Peeling - A crack prevention structure that reduces integrated circuit corner peeling and reduces cracking is disclosed. The crack prevention structure comprises a semiconductor substrate; a first plurality of dielectric layers of a first material disposed over the semiconductor substrate; a second plurality of dielectric layers of a second material different than the first material, disposed on the first plurality of dielectric layers, wherein the first plurality of dielectric layers and the second plurality of dielectric layers meet at an interface; and a plurality of metal structures and a plurality of via structures formed through the interface of the first plurality of dielectric layers and the second plurality of dielectric layers. | 06-13-2013 |
20130147033 | POST-PASSIVATION INTERCONNECT STRUCTURE - A semiconductor device includes a passivation layer overlying a semiconductor substrate, and an interconnect structure overlying the passivation layer. The interconnect structure includes a landing pad region and a dummy region electrically separated from each other. A protective layer overlies the interconnect structure and includes a first opening exposing a portion of the landing pad region and a second opening exposing a portion of the dummy region. A metal layer is formed on the exposed portion of landing pad region and the exposed portion of the dummy region. A bump is formed on the metal layer overlying the landing pad region. | 06-13-2013 |
20150061116 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a carrier, an under bump metallurgy (UBM) pad on the carrier, and a post on a surface of the UBM pad. In some embodiments, a height of the post to a longest length of the UBM pad is between about 0.25 and about 0.7. A method of manufacturing a semiconductor device includes providing a carrier, disposing a UBM pad on the carrier and forming a post on the UBM pad. | 03-05-2015 |