Patent application number | Description | Published |
20140311412 | METHOD AND SYSTEM FOR MANAGING A GROUP OF DAIRY ANIMALS - A method and system for managing a group of dairy animals in which a subgroup of dairy animals to be separated from the group of dairy animals is determined. A planned collection time is determined, at which time it is planned that the dairy animals in the subgroup of dairy animals to be separated are separated from the group of dairy animals. An individual separation period, which is determined by the length of time from a start time, preceding the planned collection time, to the planned collection time, is selected separately, for each individual dairy animal in the subgroup of dairy animals to be separated, in dependence of a property of said individual dairy animal. Each individual dairy animal in the subgroup of dairy animals to be separated is separated from the group of dairy animals during the individual separation period selected for said dairy animal. | 10-23-2014 |
20140338603 | METHOD OF AND ARRANGEMENT FOR MANAGING A GROUP OF DAIRY ANIMALS - Method of managing dairy animals in a free housing including a voluntary automatic milking system, and including determining TLM as the time since the last milking of an animal, determining AVMF as an average daily voluntary milking frequency for the animal, setting a desired milking interval DMI for the animal, marking the animal for manual collection if TLM and/or DMI fulfill a collecting criterion, making a list of marked animals, collecting and milking the marked animals, wherein the collecting criterion is fulfilled if TLM is above a first interval threshold, or if TLM is at least equal to the value of a mathematical function applied to the DMI, or if AVMF is below a frequency threshold, and TLM is above a second, shorter interval threshold MRI. Also a milking arrangement is disclosed with a milking robot having a control device arranged to perform the method. | 11-20-2014 |
Patent application number | Description | Published |
20130263507 | Methods of Growing Plants - This invention includes a coherent growth substrate product formed of mineral wool, the product having two opposed top and bottom surfaces and a seed hole extending from the top surface towards the bottom surface, the base of the seed hole defining a seed bed, wherein the volume of the growth substrate product is not more than 150 cm | 10-10-2013 |
20130263508 | Growth Substrate Product, Methods of Growing Plants and Processes of Making Growth Substrate - This invention includes a coherent growth substrate product formed of mineral wool, the product having two opposed top and bottom surfaces and a channel which is open at the bottom surface and extends from the bottom surface at least 50% of the height of the growth substrate product and wherein the volume of the growth substrate product is not more than 150 cm | 10-10-2013 |
20130283688 | Method of Growing Plants - The invention provides a method of growing plants in a mineral wool growth substrate, the method comprising:
| 10-31-2013 |
20140182199 | GROWTH SUBSTRATE PRODUCTS AND THEIR USE - The invention provides a multiple density growth substrate product (1) formed of a coherent matrix of man-made vitreous fibres (MMVF) bonded with binder, having an upper surface (2) provided with a recess (3) adapted to receive a seed or seedling and an opposite lower surface (4) on which the product rests when in use, the product being formed of at least two layers including an upper layer (5) positioned at the upper surface and having a first density and a lower layer (6) positioned at the opposite lower surface and having a second density, wherein the first density is less than the second density by at least 5 kg/m | 07-03-2014 |
Patent application number | Description | Published |
20080259299 | Lithographic apparatus and device manufacturing method - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a shield device arranged between a source of air flows and/or pressure waves and an element sensitive for the air flows and/or pressure waves. | 10-23-2008 |
20080309911 | Stage system and lithographic apparatus comprising such a stage system - A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators. | 12-18-2008 |
20090195760 | Lithographic Apparatus, Method and Device Manufacturing Method - In an embodiment, a lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a passive noise damper configured to dampen gas borne noise caused by movement of a movable part of the lithographic apparatus. | 08-06-2009 |
20090195763 | LITHOGRAPHIC APPARATUS - A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration. | 08-06-2009 |
20090231567 | LITHOGRAPHIC APPARATUS HAVING A CHUCK WITH A VISCO-ELASTIC DAMPING LAYER - A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer. | 09-17-2009 |