Patent application number | Description | Published |
20100264114 | MICROPROCESSING OF SYNTHETIC QUARTZ GLASS SUBSTRATE - In a process for microprocessing a synthetic quartz glass substrate by wet etching, an organic coating layer of silane or silazane is formed on the substrate, and a photoresist film is formed on the organic coating layer, prior to the wet etching. | 10-21-2010 |
20110318995 | METHOD FOR MANUFACTURING ELECTRONIC GRADE SYNTHETIC QUARTZ GLASS SUBSTRATE - An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures. | 12-29-2011 |
20110318996 | METHOD FOR MANUFACTURING ELECTRONIC GRADE SYNTHETIC QUARTZ GLASS SUBSTRATE - An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining. | 12-29-2011 |
20120263816 | NANOIMPRINT-MOLD RELEASE AGENT, SURFACE TREATMENT METHOD, AND NANOIMPRINT MOLD - A nanoimprint-mold release agent including an alkoxysilane compound represented by general formula (1) is provided | 10-18-2012 |
20120264962 | SILAZANE COMPOUNDS HAVING FLUOROALKYL GROUP AND METHOD OF PREPARING THE SAME - Disclosed are silazane compounds having two fluoroalkyl groups, represented by the following general formula (1): | 10-18-2012 |
20120264964 | ALKOXYSILANE COMPOUNDS HAVING FLUOROALKYL GROUP AND METHOD OF PREPARING THE SAME - Alkoxysilane compounds having two fluoroalkyl groups and represented by the formula (1): | 10-18-2012 |
20130101790 | ELECTRONIC GRADE GLASS SUBSTRATE AND MAKING METHOD - An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished. | 04-25-2013 |
20140120198 | RECTANGULAR MOLD-FORMING SUBSTRATE - A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible. | 05-01-2014 |