Patent application number | Description | Published |
20100173558 | Bubble rocket apparatus - The present invention provides a bubble rocket apparatus comprising a rocket body, a launch device, a bubble rings assembly coupled to said rocket body, and a base, wherein bubble solution used for said bubble rings assembly is contained in said base, and said launch device is adapted for launching said rocket body. After said launch device launches said rocket body, bubble film formed on the bubble rings departs therefrom due to the effect of air during the flight of said bubble rings assembly, resulting in the formation of bubbles. The structure of the present invention is simple and novel in design, and various sizes of bubbles can be produced at different levels and locations in space. In addition, said rocket body and said bubble rings assembly can be used repeatedly. | 07-08-2010 |
20150133021 | BUBBLE GENERATING APPARATUS - A bubble generating apparatus includes an air flow generator, a liquid tray defined by a floor and sidewalls and having one or more bubble forming ports therein, and a pivot arm coupled to a motor for pivoting the pivot arm about an axis so that during pivoting a bubble generating member of the pivot arm passes over one of the bubble forming ports, the air flow generator positioned to direct an air stream through the one or more bubble forming ports, and a gravity feed liquid reservoir, wherein the liquid tray is configured to generate bubbles from the liquid when the air flow generator directs the air stream through the one or more bubble forming ports while the pivot arm pivots about the axis. | 05-14-2015 |
Patent application number | Description | Published |
20080196833 | RETAINING RING WITH SHAPED SURFACE - A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions. | 08-21-2008 |
20080239308 | HIGH THROUGHPUT MEASUREMENT SYSTEM - A substrate processing system includes a processing module to process a substrate, a factory interface module configured to accommodate at least one cassette for holding the substrate, a spectrographic monitoring system positioned in or adjoining the factory interface module, and a substrate handler to transfer the substrate between the at least one cassette, the spectrographic monitoring system and the processing module. | 10-02-2008 |
20080243433 | METHODS AND APPARATUS FOR GENERATING A LIBRARY OF SPECTRA - A method of generating a library from a reference substrate for use in processing product wafers is described. The method includes measuring substrate characteristics at a plurality of well-defined points of a reference substrate, measuring spectra at plurality of measurement points of the reference substrate, there being more measurement points than well-defined points, and associating measured spectra with measured substrate characteristics. | 10-02-2008 |
20110046918 | METHODS AND APPARATUS FOR GENERATING A LIBRARY OF SPECTRA - A method of generating a library from a reference substrate for use in processing product wafers is described. The method includes measuring substrate characteristics at a plurality of well-defined points of a reference substrate, measuring spectra at plurality of measurement points of the reference substrate, there being more measurement points than well-defined points, and associating measured spectra with measured substrate characteristics. | 02-24-2011 |
20110195639 | RETAINING RING WITH SHAPED SURFACE - A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions. | 08-11-2011 |
20120071067 | RETAINING RING WITH SHAPED SURFACE - A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions. | 03-22-2012 |
20130139851 | POST CMP SCRUBBING OF SUBSTRATES - A cleaning method is provided for brush cleaning a surface of a substrate. The method comprises scrubbing a first surface of the substrate with a brush having a first surface geometry; and then scrubbing the first surface of the substrate with a brush having a second surface geometry, wherein the first and the second surface geometries are different. Numerous other aspects are provided. | 06-06-2013 |
20140053981 | Retaining Ring With Shaped Surface - A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions. | 02-27-2014 |
20140196749 | CRYOGENIC LIQUID CLEANING APPARATUS AND METHODS - A cryogenic cleaning apparatus is disclosed. The cryogenic cleaning apparatus has a source of cryogen, a nozzle coupled to the source of cryogen, the nozzle including a main passage adapted to receive the cryogen, one or more auxiliary gas inlets adapted to supply an auxiliary gas to mix with the cryogen either within the nozzle or at a nozzle exit of the nozzle to produce cryogen droplets, and a heated holder adapted to receive a substrate to be cleaned. Cryogenic cleaning methods adapted to clean substrates are provided, as are numerous other aspects. | 07-17-2014 |