Patent application number | Description | Published |
20100167555 | METHOD IN DEPOSITING METAL OXIDE MATERIALS - The present invention relates to a method for enhancing uniformity of metal oxide coatings formed by Atomic Layer Deposition (ALD) or ALD-type processes. Layers are formed using alternating pulses of metal halide and oxygen-containing precursors, preferably water, and purging when necessary. An introduction of modificator pulses following the pulses of the oxygen-containing precursor affects positively on layer uniformity, which commonly exhibits gradients, particularly in applications with closely arranged substrates. In particular, improvement in layer thickness uniformity is obtained. According to the invention, alcohols having one to three carbon atoms can be used as the modificator. | 07-01-2010 |
20110265720 | GAS DEPOSITION REACTOR - A reactor is provided for a gas deposition method, in which method the surface of a substrate is subjected to alternate starting material surface reactions. The reactor includes a first chamber, a second chamber mounted inside the first chamber, and heating means for heating the first chamber. The reactor also includes one or more heat transfer elements for equalising temperature differences inside the first chamber. | 11-03-2011 |
20120015106 | METHOD AND APPARATUS FOR COATING - The invention relates to a method and an apparatus for coating one or more objects ( | 01-19-2012 |
20120055407 | ARRANGEMENT FOR PROCESSING SUBSTRATE AND SUBSTRATE CARRIER - The invention relates to an arrangement for processing a substrate in a reaction chamber of a gas deposition apparatus by exposing the substrate to alternate, saturated surface reactions of starting materials, the arrangement comprising loading means for loading the substrate into the reaction chamber on a substrate support. In accordance with the invention, the substrate is arranged for being attached in a detachable manner with an adhesive to the substrate carrier. | 03-08-2012 |
20120120514 | STRUCTURE COMPRISING AT LEAST ONE REFLECTING THIN-FILM ON A SURFACE OF A MACROSCOPIC OBJECT, METHOD FOR FABRICATING A STRUCTURE, AND USES FOR THE SAME - A structure comprising at least one reflecting thin-film on a surface of a macroscopic object is disclosed. The surface of the macroscopic object, without the at least one thin-film, reflects less than 50% of incident light in the visible wavelength band and is opaque, and reflection of visible light from the surface of the macroscopic object, with the at least one thin-film on the surface of the macroscopic object, is essentially spectrally uniform and flat over available viewing angles. The at least one thin-film is dielectric and essentially transparent to visible light, and the at least one thin-film is fabricated by exposing the surface of the macroscopic object to alternately repeating, essentially self-limiting, surface reactions of two or more precursors, for increasing the reflectance of specularly reflected visible light in the visible wavelength band from the surface. | 05-17-2012 |
20120177903 | MULTILAYER COATING, METHOD FOR FABRICATING A MULTILAYER COATING, AND USES FOR THE SAME - A multilayer coating and a method for fabricating a multilayer coating on a substrate ( | 07-12-2012 |
20120217454 | METHOD FOR FORMING AN ELECTRICALLY CONDUCTIVE OXIDE FILM, AN ELECTRICALLY CONDUCTIVE OXIDE FILM, AND USES FOR THE SAME - A method for forming an electrically conductive oxide film ( | 08-30-2012 |
20120218638 | METHOD FOR FORMING A DECORATIVE COATING, A COATING, AND USES OF THE SAME - A decorative coating and a method for forming a decorative coating on a substrate ( | 08-30-2012 |
20130130044 | METHOD FOR FORMING A DECORATIVE COATING ON A GEMSTONE, A DECORATIVE COATING ON A GEMSTONE, AND USES OF THE SAME - A decorative coating and a method for forming a decorative coating on a gemstone to change the natural visual appearance of the gemstone. The decorative coating comprises an optically absorbing film. Depositing the absorbing film on the substrate comprises the alternating steps of introducing a first precursor to the reaction space such that at least a portion of the first precursor gets adsorbed onto the surface of the substrate, and subsequently purging the reaction space, and introducing a second precursor to the reaction space such that at least a portion of the second precursor reacts with the portion of the first precursor adsorbed onto the surface of the substrate to form a conformal absorbing film on the substrate comprising the gemstone, and subsequently purging the reaction space. The material of the absorbing film is selected from the group of oxides, carbides, noble metals or a mixture thereof. | 05-23-2013 |
20130269608 | APPARATUS, METHOD AND REACTION CHAMBER - The present invention relates to an apparatus, method, a reaction chamber and a use of a reaction chamber for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus includes a vacuum chamber; a detachable reaction chamber arranged to be installed inside the vacuum chamber, and inside which the substrate is positioned during processing and a precursor system for supplying the at least first and second precursors into the action chamber and for discharging the at least first and second precursors from the reaction chamber. According to the present invention the reaction chamber is provided as a gastight vessel. | 10-17-2013 |