Patent application number | Description | Published |
20080237037 | MASK AND METHOD OF MANUFACTURING THE SAME - A mask includes a transparent substrate, a light-blocking layer and a halftone layer. The light-blocking layer includes a source electrode pattern portion including a first electrode portion, a second electrode portion and a third electrode portion, and a drain electrode pattern portion disposed between the second electrode portion and the third electrode portion. The halftone layer includes a halftone portion corresponding to a spaced-apart portion between the source electrode pattern portion and the drain electrode pattern portion, and a dummy halftone portion more protrusive than ends of the second electrode portion and the third electrode portion. Thus, a photoresist pattern corresponding to a channel portion of a thin film transistor (TFT) may be formed with a uniform thickness, to thereby prevent an excessive etching of the channel portion. | 10-02-2008 |
20090135347 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a display device, wherein the manufacturing method for an embodiment includes: forming color filters in a plurality of pixel regions; forming a conductive layer on the color filters; and separating the conductive layer in each of the pixel regions through a photolithography process and forming a pixel electrode; wherein a groove is formed between the adjacent color filters having different colors at boundaries between the pixel regions; and wherein the photolithography process uses a negative photoresist material. | 05-28-2009 |
20090159888 | DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A display panel and a manufacturing method thereof which includes forming a color filter on an insulating substrate, forming a plurality of trenches in the color filter, forming a first metal layer in the trenches, forming a second metal layer on the first metal layer to form gate lines, forming a gate insulating layer on the color filter and the gate lines, forming a semiconductor on the gate insulating layer, forming data lines including source electrodes and drain electrodes, and forming pixel electrodes connected to the drain electrodes. | 06-25-2009 |
20090176325 | HALFTONE MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME - A halftone mask includes a transparent substrate, a light-blocking layer, a first semi-transparent layer and a second semi-transparent layer. The transparent substrate includes a light-blocking area, a light-transmitting area, a first halftone area transmitting first light, and a second halftone area transmitting second light that is less than the first light. The light-blocking layer is formed in the light-blocking area to fully block light from being transmitted. The first and second semi-transparent layers are formed on the transparent substrate. At least one of the first and second semi-transparent layers is formed in the first halftone area, and the first and second semi-transparent layers are overlapped with each other on the second halftone area. | 07-09-2009 |
20100055851 | PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME - The present invention relates to a photoresist composition that comprises a resin that is represented by Formula 1, a method for forming a thin film pattern, and a method for manufacturing a thin film transistor array panel by using the same. | 03-04-2010 |
20100167476 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE - The present invention relates to a photoresist composition for digital exposure and a method of fabricating a thin film transistor substrate. The photoresist composition for digital exposure includes a binder resin including a novolak resin and a compound represented by the chemical formula (1), a photosensitizer including a diazide-based compound, and a solvent: | 07-01-2010 |
20110051059 | ORGANIC LAYER COMPOSITION AND LIQUID CRYSTAL DISPLAY USING THE SAME - An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group. | 03-03-2011 |
20110199620 | METHOD OF DETERMINING AN OVERLAP DISTANCE OF AN OPTICAL HEAD AND DIGITAL EXPOSURE DEVICE USING THE METHOD - An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount. | 08-18-2011 |
20110205508 | Digital Exposure Method and Digital Exposure Device for Performing the Method - A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs. | 08-25-2011 |
20110230019 | METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - An approach for patterning and etching without a mask is provided in a manufacturing a thin-film transistor, a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer and source metal layer of a substrate. A first photoresist pattern including a first photo pattern and a second photo pattern is formed using a digital exposure device by generating a plurality of spot beams, the first photo pattern is formed to a first region of the base substrate and has a first thickness, and the second photo pattern is formed to a second region adjacent to the first region, and has a second thickness and a width in a range of about 50% to about 60% of a diameter of the spot beam. The source metal layer is patterned to form a source electrode and a drain electrode, and the source electrode and the drain electrode are spaced apart from each other in the first region of an active pattern. | 09-22-2011 |
20110236825 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME - In a photoresist composition suitable for forming a photoresist pattern having a high profile angle, and a method of forming a photoresist pattern using the same, the photoresist composition includes an alkali-soluble resin, a quinone diazide containing compound, a compound represented by Formula 1, and a solvent: | 09-29-2011 |
20110287360 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME - A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. | 11-24-2011 |