Patent application number | Description | Published |
20090015906 | EXTRINSIC GAIN LASER AND OPTICAL AMPLIFICATION DEVICE - An optical amplifier on a silicon platform includes a first doped device layer and a second doped device layer. A gain medium is positioned between the first and second doped device layers. The gain medium comprises extrinsic gain materials so as to substantially confine in the gain medium a light signal and allow the optical amplifier to be electrically or optically pumped. | 01-15-2009 |
20100012973 | DARK CURRENT REDUCTION FOR LARGE AREA PHOTODIODES - A method of fabricating a large area photodiode is provided. The method includes providing a substrate having a first contact layer formed thereon. Also, the method includes forming a dielectric layer on the first contact layer and patterning selective areas of the dielectric layer to form a plurality of dielectric windows. Each of the dielectric windows has an open region exposing the first contact layer. Furthermore, the method includes epitaxially growing photodiode material(s) in the dielectric windows, wherein each of the dielectric windows are individualized photodiode structures. | 01-21-2010 |
20100091358 | EXTRINSIC GAIN LASER AND OPTICAL AMPLIFICATION DEVICE - An optical amplifier on a silicon platform includes a first doped device layer and a second doped device layer. A gain medium is positioned between the first and second doped device layers. The gain medium comprises extrinsic gain materials so as to substantially confine in the gain medium a light signal and allow the optical amplifier to be electrically or optically pumped. | 04-15-2010 |
20100307579 | Pseudo-Periodic Structure for Use in Thin Film Solar Cells - A method of manufacturing a photovoltaic cell includes providing an active absorption layer, forming a pseudo-periodic grating adjacent to the active absorption layer, and forming a reflector adjacent to the pseudo-periodic grating. A photovoltaic cell includes an active absorption layer, a pseudo-periodic grating adjacent to the active absorption layer, and a reflector adjacent to the pseudo-periodic grating. | 12-09-2010 |
20110316018 | ENGINEERING EMISSION WAVELENGTHS IN LASER AND LIGHT EMITTING DEVICES - A light emitting device is provided that includes at least one first semiconductor material layers and at least one second semiconductor material layers. At least one near-direct band gap material layers are positioned between the at least one first semiconductor layers and the at least one second semiconductor material layers. The at least one first semiconductor layers and the at least one second material layers have a larger band gap than the at least one near-direct band gap material layers. The at least one near-direct band gap material layers have an energy difference between the direct and indirect band gaps of less than 0.5 eV. | 12-29-2011 |
20120025195 | Confined Lateral Growth of Crystalline Material - In a structure for crystalline material growth, there is provided a lower growth confinement layer and an upper growth confinement layer that is disposed above and vertically separated from the lower growth confinement layer. A lateral growth channel is provided between the upper and lower growth confinement layers, and is characterized by a height that is defined by the vertical separation between the upper and lower growth confinement layers. A growth seed is disposed at a site in the lateral growth channel for initiating crystalline material growth in the channel. A growth channel outlet is included for providing formed crystalline material from the growth channel. With this growth confinement structure, crystalline material can be grown from the growth seed to the lateral growth channel outlet. | 02-02-2012 |
20130243383 | Athermal Photonic Waveguide With Refractive Index Tuning - In a photonic waveguide, there is provided an undercladding layer and a waveguide core, having a cross-sectional height and width, that is disposed on the undercladding layer. The waveguide core comprises a waveguide core material having a thermo-optic coefficient. A refractive index tuning cladding layer is disposed on top of the waveguide core. The refractive index tuning cladding layer comprises a refractive index tuning cladding material having an adjustable refractive index and an absorption length at a refractive index tuning radiation wavelength. A thermo-optic coefficient compensation cladding layer is disposed on top of the refractive index tuning cladding layer. The thermo-optic coefficient compensation cladding layer comprises a thermo-optic coefficient compensation material having a thermo-optic coefficient that is of opposite sign to the thermo-optic coefficient of the waveguide core material. The thermo-optic coefficient compensation cladding layer provides at least partial compensation for the waveguide core thermo-optic coefficient. | 09-19-2013 |
20140090686 | METHODS AND APPARATUS FOR CONCENTRATING PHOTOVOLTAICS - Provided in one embodiment is an article, comprising: a substrate comprising silicon; and a plurality of solar cells disposed over the substrate, wherein at least one of the plurality of the solar cells comprises one of: (i) a first semiconductor layer disposed over the substrate, the first layer comprising at least one semiconductor material; and (ii) a first Ge-containing layer disposed over the substrate, the first layer comprising a Ge-containing material, and a second layer disposed over the first layer, the second layer comprising at least one semiconductor material. At least some of the solar cells may comprise semiconductor materials of different bandgap values. | 04-03-2014 |
20140254620 | High-Concentration Active Doping in Semiconductors and Semiconductor Devices Produced by Such Doping - In a method of forming a photonic device, a first silicon electrode is formed, and then a germanium active layer is formed on the first silicon electrode while including n-type dopant atoms in the germanium layer, during formation of the layer, to produce a background electrical dopant concentration that is greater than an intrinsic dopant concentration of germanium. A second silicon electrode is then formed on a surface of the germanium active layer. The formed germanium active layer is doped with additional dopant for supporting an electrically-pumped guided mode as a laser gain medium with an electrically-activated n-type electrical dopant concentration that is greater than the background dopant concentration to overcome electrical losses of the photonic device. | 09-11-2014 |