Patent application number | Description | Published |
20090214962 | EXPOSURE APPARATUS - An exposure apparatus includes a plurality modules and a controller, each module exposes a pattern of an original onto a substrate by using light from a light source, wherein each module includes a position detector configured to detect a position of the original or the substrate that has an alignment mark used for an alignment between the original and each shot on the substrate, wherein the controller has information relating to an alignment error of a detection result by the position detector which is set to each module, and wherein the exposure apparatus further includes a reducing unit configured to reduce a difference of the alignment error among modules. | 08-27-2009 |
20090263735 | EXPOSURE APPARATUS - An exposure apparatus includes a plurality of module each of which is configured to expose a pattern of an original onto the substrate using light from a light source, each module including a projection optical system configured to project the pattern of the original onto the substrate and designed to have an identical structure, and a controller configured to control exposures of the plurality of modules using a correction value that is set for each module and configured to correct a scatter of an imaging characteristic of the pattern of the original to be exposure onto the substrate, the controller obtaining the correction value from an inspection result obtained by sequentially mounting an inspection original onto each module. | 10-22-2009 |
20090310106 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus which transfers a pattern of a reticle onto a substrate via a projection optical system comprises a controller configured to correct an image of the pattern, formed on the substrate, in accordance with a shape of the reticle in a standby state until an exposure operation starts. | 12-17-2009 |
20110033790 | DETECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides a detection apparatus which detects an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of a substrate, the apparatus including an optical system configured to form an image of the lower-surface mark on a light-receiving surface of a photoelectric conversion device using a first light, with a wavelength which is transmitted through the substrate, which is emitted by a light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of the photoelectric conversion device using a second light, with a wavelength which is not transmitted through the substrate, which is emitted by the light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark. | 02-10-2011 |
20120292801 | IMPRINT APPARATUS, IMPRINT METHOD, AND DEVICE MANUFACTURING METHOD - An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element. | 11-22-2012 |
20120328725 | POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND POSITION DETECTION METHOD - A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof. | 12-27-2012 |
20130100459 | DETECTOR, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A detector for detecting interfering light of diffracted light components diffracted by marks formed on first and second objects includes: an illumination optical system configured to form an intensity distribution including first and second poles which illuminate a first mark arranged on the first object and a second mark arranged on the second object; and a detection optical system configured to detect interfering light of light components diffracted by the first and second marks illuminated by the illumination optical system. The detection optical system detects interfering light of diffracted light components generated when light of the first pole is radiated on and diffracted by the first and second marks. The detection optical system does not detect diffracted light components generated when light of the second pole is radiated on and diffracted by the first and second marks. | 04-25-2013 |
20130161868 | IMPRINT LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD THEREFOR - An imprint lithography apparatus uses a mold having a pattern formed thereon and transfers the pattern to an imprint material fed to a substrate. The apparatus includes a light-receiving element; a detection system that irradiates a mark formed on the substrate and a mark formed on the mold with light which is reflected therefrom, and guides the light reflected from the mark formed on the substrate and from the mark formed on the mold to the light-receiving element; a relay optical system that causes the light reflected to focus between the mold and the detection system; an illumination system that emits illumination light for curing the imprint material; an optical element having a surface that transmits one of the illumination light and the light from the detection system and reflects the other; and a plate-shaped optical member that corrects aberration of the relay optical system. | 06-27-2013 |
20130221556 | DETECTOR, IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - A detector, which detects a relative position between a first object and a second object in a first direction, includes: an illumination optical system configured to obliquely illuminate a first mark arranged on the first object, and a second mark arranged on the second object; and a detection optical system configured to detect interfering light generated by light beams diffracted by the first mark and the second mark, respectively, illuminated by the illumination optical system. The illumination optical system forms a light intensity distribution including at least one pole on a pupil plane thereof. The detection optical system includes a stop provided with an aperture on a pupil plane thereof. A shape of the aperture includes a side parallel to the first direction. | 08-29-2013 |
20140346694 | POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND POSITION DETECTION METHOD - A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof. | 11-27-2014 |
20150049317 | LITHOGRAPHY APPARATUS, ALIGNMENT METHOD, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a lithography apparatus for transferring a pattern formed on an original to each of a plurality of shot regions on a substrate, comprising a detection unit configured to detect a mark provided in the shot region and a mark provided on the original, and a control unit configured to control alignment between a target shot region and the pattern of the original such that the mark in the target region detected by the detection unit and the mark on the original are shifted by a positional shift amount which is generated between each mark in the shot region and each mark on the original when an overlay error between the shot region and the pattern of the original falls within an allowable range. | 02-19-2015 |
20150062553 | DETECTION APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a detection apparatus for detecting a position of a detection target, including an illumination optical system configured to perform dark-field illumination on a reference mark, and a detection optical system including a sensor configured to detect light from the reference mark and an optical system configured to guide the light from the reference mark to the sensor, and configured to detect a position of the reference mark in a first direction, wherein the reference mark includes one mark element in the first direction, and a width of the mark element in the first direction is set such that two edges of the mark element in the first direction are detected as one peak when the sensor detects the light from the reference mark. | 03-05-2015 |