Patent application number | Description | Published |
20090212010 | PLASMA ETCHING CARBONACEOUS LAYERS WITH SULFUR-BASED ETCHANTS - Etching of carbonaceous layers with an etchant gas mixture including molecular oxygen (O | 08-27-2009 |
20100297850 | SELECTIVE SELF-ALIGNED DOUBLE PATTERNING OF REGIONS IN AN INTEGRATED CIRCUIT DEVICE - A selective self-aligned dual patterning method. The method includes performing a single lithography operation to form a patterned mask having a narrow feature in a region of a substrate that is to a have pitch-reduced feature and a wide feature in a region of the substrate that is to have a non-pitch-reduced feature. Using the patterned mask, a template mask is formed with a first etch and the patterned mask is then removed from the narrow feature while being retained over the wide feature. The template mask is then thinned with a second etch to introduce a thickness delta in the template mask between the narrow and wide features. A spacer mask is then formed and the thinned narrow template mask is removed to leave a pitch double spacer mask while the thick wide template mask feature is retained to leave a non-pitch reduced mask. | 11-25-2010 |
20140212994 | SELF ALIGNED DUAL PATTERNING TECHNIQUE ENHANCEMENT WITH MAGNETIC SHIELDING - Embodiments of the present disclosure generally provide apparatus and method for improving processing uniformity by reducing external magnetic noises. One embodiment of the present disclosure provides an apparatus for processing semiconductor substrates. The apparatus includes a chamber body defining a vacuum volume for processing one or more substrate therein, and a shield assembly for shielding magnetic flux from the chamber body disposed outside the chamber body, wherein the shield assembly comprises a bottom plate disposed between the chamber body and the ground to shield magnetic flux from the earth. | 07-31-2014 |
20150064880 | POST ETCH TREATMENT TECHNOLOGY FOR ENHANCING PLASMA-ETCHED SILICON SURFACE STABILITY IN AMBIENT - Methods for performing post etch treatments on silicon surfaces etched using halogen chemistry are provided. The methods may be performed in-situ a chamber in which the silicon surfaces where etch, ex-situ the chamber, or in a hybrid process that combines both in-situ and ex-situ post etch treatment processes. In one embodiment the post etch treatment process includes exposing a substrate having a silicon surface etched using halogen chemistry to a gas mixture comprising C | 03-05-2015 |
20150064914 | METHOD OF ETCHING A BORON DOPED CARBON HARDMASK - In one embodiment, a method is proposed for etching a boron dope hardmask layer. The method includes flowing a process gas comprising at least CH | 03-05-2015 |
20150099345 | METHOD FOR FORMING FEATURES IN A SILICON CONTAINING LAYER - Embodiments of methods for forming features in a silicon containing layer of a substrate disposed on a substrate support are provided herein. In some embodiments, a method for forming features in a silicon containing layer of a substrate disposed on a substrate support in a processing volume of a process chamber includes: exposing the substrate to a first plasma formed from a first process gas while providing a bias power to the substrate support, wherein the first process gas comprises one or more of a chlorine-containing gas or a bromine containing gas; and exposing the substrate to a second plasma formed from a second process gas while no bias power is provided to the substrate support, wherein the second process gas comprises one or more of an oxygen-containing gas or nitrogen gas, and wherein a source power provided to form the first plasma and the second plasma is continuously provided. | 04-09-2015 |
20150371889 | METHODS FOR SHALLOW TRENCH ISOLATION FORMATION IN A SILICON GERMANIUM LAYER - Methods for processing a substrate include (a) providing a substrate comprising a silicon germanium layer and a patterned mask layer atop the silicon germanium layer to define a feature in the silicon germanium layer; (b) exposing the substrate to a first plasma formed from a first process gas to etch a feature into the silicon germanium layer; (c) subsequently exposing the substrate to a second plasma formed from a second process gas to form an oxide layer on a sidewall and a bottom of the feature; (d) exposing the substrate to a third plasma formed from a third process gas to etch the oxide layer from the bottom of the feature; and (e) repeating (b)-(d) to form the feature in the first layer to a desired depth, wherein the first process gas, the second process gas and the third process gas are not the same. | 12-24-2015 |
20160027654 | SIMPLIFIED LITHO-ETCH-LITHO-ETCH PROCESS - Methods of patterning a blanket layer (a target etch layer) on a substrate are described. The methods involve multiple patterning steps of a mask layer several layers above the target etch layer. The compound pattern, made from multiple patterning steps, is later transferred in one set of operations through the stack to save process steps. | 01-28-2016 |
Patent application number | Description | Published |
20120219827 | Stack Including a Magnetic Zero Layer - A stack including a crystallographic orientation interlayer, a magnetic zero layer disposed on the interlayer, and a magnetic recording layer disposed on the magnetic zero layer is disclosed. The magnetic zero layer is non-magnetic or has a saturation magnetic flux density (B | 08-30-2012 |
20140044993 | PERPENDICULAR RECORDING MEDIUM WITH OXIDE GRADIENT LAYER - Apparatus for recording data and method for making the same. In accordance with some embodiments, a recording layer is supported by a substrate. The recording layer has a granular magnetic recording layer with a first oxide content, a continuous magnetic recording layer with nominally no oxide content, and an oxide gradient layer disposed between the respective granular magnetic recording layer and the continuous magnetic recording layer. The oxide gradient layer has a second oxide content less than the first oxide content of the granular layer. | 02-13-2014 |
20150179202 | Exchange Decoupled Data Storage Medium - A magnetic data storage medium capable of storing data bits may be configured at least with a magnetic underlayer structure and a recording structure. The recording structure can have at least a first magnetic layer and a second magnetic layer with the first magnetic layer decoupled by being constructed of an alloy of cobalt, platinum, and a platinum group metal element. | 06-25-2015 |
20150332721 | Stack Including a Magnetic Zero Layer - A stack including a crystallographic orientation interlayer, a magnetic zero layer disposed on the interlayer, and a magnetic recording layer disposed on the magnetic zero layer is disclosed. The magnetic zero layer is non-magnetic or has a saturation magnetic flux density (B | 11-19-2015 |
Patent application number | Description | Published |
20090064934 | SOURCE GAS FLOW PATH CONTROL IN PECVD SYSTEM TO CONTROL A BY-PRODUCT FILM DEPOSITION ON INSIDE CHAMBER - The present invention generally comprises a method and an apparatus for guiding the flow of processing gases away from chamber walls and slit valve opening. By controlling the flow path of the process gases within a processing chamber, undesirable deposition upon chamber walls and within slit valve openings may be reduced. By reducing deposition in slit valve openings, flaking may be reduced. By reducing deposition on chamber walls, the time between chamber cleaning may be increased. Thus, guiding the flow of processing gases within the processing chamber may increase substrate throughput. | 03-12-2009 |
20110185972 | BALANCING RF BRIDGE ASSEMBLY - Embodiments disclosed herein generally relate to a PECVD apparatus. When the RF power source is coupled to the electrode at multiple locations, the current and voltage may be different at the multiple locations. In order to ensure that both the current and voltage are substantially identical at the multiple locations, an RF bridge assembly may be coupled between the multiple locations at a location just before connection to the electrode. The RF bridge assembly substantially equalizes the voltage distribution and current distribution between multiple locations. Therefore, a substantially identical current and voltage is applied to the electrode at the multiple locations. | 08-04-2011 |
20120009347 | PRECISE TEMPERATURE CONTROL FOR TEOS APPLICATION BY HEAT TRANSFER FLUID - Embodiments of the invention generally provide a mixing block for mixing precursors and/or cleaning agent which has the advantage of maintaining the temperature and improving the mixing effect of the precursors, cleaning agent or the mixture thereof to eliminate the substrate-to-substrate variation, thereby providing improved process uniformity. | 01-12-2012 |
20120149194 | Substrate Support with Gas Introduction Openings - Embodiments disclosed herein generally relate to an apparatus and a method for placing a substrate substantially flush against a substrate support in a processing chamber. When a large area substrate is placed onto a substrate support, the substrate may not be perfectly flush against the substrate support due to gas pockets that may be present between the substrate and the substrate support. The gas pockets can lead to uneven deposition on the substrate. Therefore, pulling the gas from between the substrate and the support may pull the substrate substantially flush against the support. During deposition, an electrostatic charge can build up and cause the substrate to stick to the substrate support. By introducing a gas between the substrate and the substrate support, the electrostatic forces may be overcome so that the substrate can be separated from the susceptor with less or no plasma support which takes extra time and gas. | 06-14-2012 |
20130071581 | PLASMA MONITORING AND MINIMIZING STRAY CAPACITANCE - The present invention generally relates to a capacitively coupled plasma (CCP) processing chamber, a manner to reduce or prevent stray capacitance, and a manner to measure plasma conditions within the processing chamber. As CCP processing chambers increase in size, there is a tendency for stray capacitance to negatively impact the process. Additionally, RF ground straps may break. By increasing the spacing between the chamber backing plate and the chamber wall, stray capacitance may be minimized. Additionally, the plasma may be monitored by measuring the conditions of the plasma at the backing plate rather than at the match network. In so measuring, the plasma harmonic data may be analyzed to reveal plasma processing conditions within the chamber. | 03-21-2013 |
Patent application number | Description | Published |
20120209060 | Devices, Systems, and Methods for Containing Internal Body Parts During Insertion Into the Body - Devices for containing exposed internal body parts during insertion into the body of a human or veterinary patient are provided. The devices include a surgical pouch for containing the exposed internal body parts. The devices also include one or more sealing elements disposed on the surgical pouch between the proximal end and the distal end of the surgical pouch such that a section of the pouch is closed off when each sealing element is sealed. Also provided are methods for containing exposed internal body parts of a human or veterinary patient during insertion into the body of the patient. | 08-16-2012 |
20120253113 | Devices, Systems, and Methods for Removing Empyema from a Pleural Cavity - Pleural empyema removal devices are provided and enable the removal of empyema from the pleural cavity of a human or veterinary patient. The pleural empyema removal devices may be coupled with one or more additional devices, such as suction source, gas source, light source and/or camera source, and monitor. The devices and systems including the devices facilitate the removal of empyema from the pleural cavity of a patient while providing protections from damage to untargeted tissues. The devices, systems, and methods can be used in the treatment process to treat pleural empyema resulting from pleural effusions and infections stemming from various illnesses and disorders, such as pneumonia. | 10-04-2012 |
20140336543 | NON-SURGICAL TORSO DEFORMITY CORRECTION DEVICES AND METHODS RELATED THERETO - Aspects of the invention include devices and methods for correcting a torso deformity of a patient. The devices include a suction chamber for placement around the torso deformity and to provide negative pressure to the torso deformity; and a measurement component coupled to the suction chamber. The measurement component is adapted to indicate a relative distance between the torso deformity and a distal surface of the suction chamber. The methods include positioning a torso deformity correcting device around a torso deformity on a torso of a patient. The methods further include withdrawing air from the suction chamber to apply negative pressure within the suction chamber to displace the torso deformity, and setting a negative pressure level by measuring the relative distance of the torso deformity and the distal surface of the suction chamber that is indicated by the measurement component. | 11-13-2014 |
20140350336 | Devices, Systems, and Methods for Removing Empyema from a Pleural Cavity - Pleural empyema removal devices are provided and enable the removal of empyema from the pleural cavity of a human or veterinary patient. The pleural empyema removal devices may be coupled with one or more additional devices, such as suction source, gas source, light source and/or camera source, and monitor. The devices and systems including the devices facilitate the removal of empyema from the pleural cavity of a patient while providing protections from damage to untargeted tissues. The devices, systems, and methods can be used in the treatment process to treat pleural empyema resulting from pleural effusions and infections stemming from various illnesses and disorders, such as pneumonia. | 11-27-2014 |
20150018652 | DEVICES, SYSTEMS AND METHODS FOR INSERTING A GASTROINTESTINAL BODY PART INTO A PATIENTS BODY WHILE MEASURING OXYGEN SATURATION - Devices for containing exposed internal body parts during their insertion into the body of a patient are provided. The devices include a surgical pouch that comprises a measurement feature adapted to facilitate a measurement of the oxygen saturation of the exposed internal body parts. In some embodiments, the subject devices comprise an inner pouch for containing the exposed internal body parts, as well as an outer pouch that can be pressurized to exert positive pressure on the inner pouch to facilitate insertion of the internal body parts into the body of the patient. Also provided are methods for containing the exposed internal body parts of a patient and inserting the body parts into the patient, optionally using positive pressure, while monitoring the oxygen saturation of the exposed internal body parts via the measurement feature. | 01-15-2015 |
20150328035 | Variable Pressure Upper Torso Braces and Methods Related Thereto - Upper torso braces to correct deformities in the upper torso of a patient are provided. The upper torso braces include a brace structure adapted to be maintained around an upper torso of an individual and to restrict outward expansion, and a variable force applicator coupled to the brace structure and positioned to contact and apply varying pressure to a target location on the upper torso. The brace structure is configured to restrict outward expansion and to provide a counteracting force for the variable force applicator during application of the variable pressure to the target location. In some instances, the upper torso braces may include a control element to adjust an amount of pressure provided by the variable force applicator to the target location. Methods of correcting a deformity on an upper torso with the upper torso braces are also provided. | 11-19-2015 |