Patent application number | Description | Published |
20090203284 | METHOD OF MANUFACTURING IMAGE DISPLAY APPARATUS - The method of manufacturing an image display apparatus of the present invention includes the steps of forming the leading wires C on the rear plate, and forming the thin film insulating layer on the leading wires C by the CVD process or the sputter process. Furthermore, the method also includes the step of seal-bonding the conductive supporting frame on the thin film insulating layer with the seal-bonding material. | 08-13-2009 |
20100062674 | CONDUCTIVE MEMBER MANUFACTURING METHOD, AND ELECTRON SOURCE MANUFACTURING METHOD USING THE SAME - A constitution that conductive members respectively having micropatterns are arranged in high density is manufactured in high accuracy. A conductive film is formed on a substrate, a negative photosensitive resin is applied, the applied resin is exposed by using a first mask having plural fine-width apertures extending in Y direction, and the resin is then exposed and developed by using a second mask having plural apertures extending in X direction perpendicular to Y direction, thereby forming a first resist. After the conductive film is etched by using the first resist as a mask, a negative photosensitive resin is again applied, and exposure and development are performed as shifting the second mask in Y direction, thereby forming a second resist. The conductive film is etched by using the second resist as a mask to eliminate unnecessary areas, thereby forming the conductive film having minute-lines extending in Y direction. | 03-11-2010 |
20120219914 | DRAWING APPARATUS, DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus for drawing on a substrate by a plurality of charged particle beams includes: an aperture array, a blanker array, a scanning mechanism, and a controller. The aperture array specifies the dimension of each of the plurality of charged particle beams on the substrate. The blanker array carries out blanking of the plurality of charged particle beams independently. The scanning mechanism performs a relative scanning between the plurality of charged particle beams and the substrate in each of the first direction and a second direction which cross each other. The controller controls the blanker array at a predetermined pitch on the substrate. The dimension and the pitch are smaller in one of the first direction and the second direction than in the other. | 08-30-2012 |
20120241641 | DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing on a substrate with charged particle beams. The drawing apparatus includes an irradiation optical system including a collimator lens; an aperture array configured to split the charged particle beam into a plurality of charged particle beams; a converging lens array configured to form a plurality of crossovers of the plurality of charged particle beams; and a projection optical system including an element in which a plurality of apertures corresponding to the plurality of crossovers are formed, and a plurality of projection lenses corresponding to the apertures. The converging lens array includes converging lenses disposed such that each of the plurality of crossovers, which are formed by the converging lenses from the charged particle beam incident on the aperture array at incidence angles associated with aberration of the irradiation optical system, is aligned with corresponding one of the apertures in the element. | 09-27-2012 |
20130196517 | DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE - A charged particle beam drawing apparatus draws a plurality of cut patterns on a plurality of first linear patterns arranged to extend in a first direction and align themselves at a predetermined pitch P in a second direction perpendicular to the first direction. The plurality of cut patterns are drawn so that an interval Ai in the second direction between the centers of each pair of cut patterns adjacent to each other in the second direction (i is a number which specifies the pair) satisfies a relation: | 08-01-2013 |
20130216954 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus, which draws a pattern on a substrate with a plurality of charged particle beams, includes: a charged particle optical system configured to emit the plurality of charged particle beams onto the substrate; and a controller configured to control an operation of the charged particle optical system. The controller is configured to control the operation so as to compensate for a distortion of the pattern that is determined based on first data of an undulation of a surface of the substrate and second data of an inclination of each of the plurality of charged particle beams with respect to an axis of the charged particle optical system. | 08-22-2013 |
20130264497 | DRAWING APPARATUS, DRAWING METHOD, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing overlaid with a shot formed on a substrate with a plurality of charged particle beams based on a plurality of drawing stripe data that constitute drawing data. The apparatus includes a charged particle optical system configured to generate the plurality of charged particle beams; and a controller configured to generate a plurality of intermediate stripe data as data of a plurality of intermediate stripes, adjacent ones of the plurality of intermediate stripes overlapping with each other, to obtain information on distortion of the shot, and to transform the plurality of intermediate stripe data based on the information on the distortion to generate the plurality of drawing stripe data. | 10-10-2013 |
20130273478 | CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface. | 10-17-2013 |
20130335503 | DRAWING APPARATUS, DATA PROCESSING METHOD, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing on a first partial region and a second partial region. The first and second partial regions having an overlap region in which the first and second partial regions overlap each other. The apparatus includes a transformation device configured to transform first pattern data for the first partial region into first quantized pattern data in accordance with a first transformation rule, and to transform second pattern data for the second partial region into second quantized pattern data in accordance with a second transformation rule different from the first transformation rule, and a controller configured to control the drawing on the first partial region based on the first quantized pattern data, and to control the drawing on the second partial region based on the second quantized pattern data. | 12-19-2013 |
20140106279 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus for performing drawing on a substrate with a plurality of charged particle beams, comprising a blanker array including first and second groups, each of which includes at least one blanker, a deflector configured to deflect the plurality of charged particle beams to scan the plurality of charged particle beams on the substrate, and a controller configured to respectively supply first and second control signals to the first and second groups at first and second timings, wherein the first and second groups are respectively arranged at such relative positions that a positional difference between respective drawing regions thereof, due to a difference between the first and second timings, in a scanning direction of the deflector is compensated for. | 04-17-2014 |
20140319367 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a controller configured to perform control of the drawing performed by movement of a stage and a blanking function of each of a plurality of charged particle optical systems, wherein the controller is configured to perform, with respect to a first charged particle optical system, of the plurality of charged particle optical systems, from a plurality of charged particle beams reach a first region and a second region, formed on the substrate and adjacent to each other, the control such that the drawing is performed only in one of the first and second regions with a first portion of charged particle beams of the plurality of charged particle beams with the stage moved in a second direction. | 10-30-2014 |
20140320841 | HOLDING APPARATUS, PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a holding apparatus for holding a substrate by an electrostatic force, the apparatus including a base including an electrode for generating the electrostatic force, a plurality of pins provided on the base, and a seal provided on the base and configured to seal a first space surrounding the plurality of pins, wherein a cavity and a first hole connecting the cavity and the first space is formed in the base, wherein a gas is sealed in the first space, the first hole and the cavity in a vacuum by holding the substrate on the pins and the seal by the electrostatic force. | 10-30-2014 |
20140322653 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, including a stage configured to hold the substrate and be moved, a charged particle optical system configured to irradiate a plurality of charged particle beams arrayed along a first axis, and a controller configured to control the drawing so as to perform multiple irradiation of a target portion on the substrate with the plurality of charged particle beams, wherein the controller configured to control the drawing such that the stage is moved in one direction along the first axis with respect to a plurality of regions formed on the substrate along the first axis, and a deflection of charged particle beam for a displacement of charged particle beam along the first axis is performed with respect to drawing on each of the plurality of regions. | 10-30-2014 |
20140322833 | IRRADIATION APPARATUS FOR IRRADIATING CHARGED PARTICLE BEAM, METHOD FOR IRRADIATION OF CHARGED PARTICLE BEAM, AND METHOD FOR MANUFACTURING ARTICLE - An apparatus includes an optical system configured to irradiate a substrate with a charged particle beam, a control unit configured to control an irradiation position of the charged particle beam, and a first measurement unit and a second measurement unit each configured to measure a surface position of the substrate. The first measurement unit and the second measurement unit have different characteristics in terms of charging. The control unit controls the irradiation position of the charged particle beam based on values measured by the first measurement unit and the second measurement unit. | 10-30-2014 |
20150044614 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus comprising a blanker array including a plurality of blankers and configured to individually blank the plurality of charged particle beams, a plurality of deflectors configured to individually deflect a plurality of charged particle beam groups constituting the plurality of charged particle beams, and a controller configured to individually control positions of the plurality of charged particle beam groups by the plurality of deflectors, and individually control blanking of the plurality of charged particle beams by the blanker array, based on information of a region on the substrate where a shot region exists. | 02-12-2015 |