Patent application number | Description | Published |
20090262324 | ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS - A microlithographic projection exposure apparatus ( | 10-22-2009 |
20100039629 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument. | 02-18-2010 |
20100265482 | ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS - An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane. | 10-21-2010 |
20100283984 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%. | 11-11-2010 |
20100283985 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%. | 11-11-2010 |
20110194090 | OPTICAL RASTER ELEMENT, OPTICAL INTEGRATOR AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical raster element for an illumination system of a microlithographic projection exposure apparatus includes an array of refractive optical elements extending on a planar or curved surface. At least two of the optical elements are arranged side by side along a reference direction with a pitch of less than 2 mm. They have a height perpendicular to the surface of less than 50 μm and a surface profile along the reference direction which includes a central section, two transition sections adjacent the central section and two end sections adjacent the transition sections. The curvatures in the two transition sections are greater than the curvatures in the central section and the end sections. The optical raster element is intended for being used as a first channel plate in an optical integrator (honeycomb condenser) and can reduce the maximum light intensities occurring in or behind the second channel plate. | 08-11-2011 |
20110304837 | PROJECTION EXPOSURE METHOD, PROJECTION EXPOSURE APPARATUS, LASER RADIATION SOURCE AND BANDWIDTH NARROWING MODULE FOR A LASER RADIATION SOURCE - In a projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, laser radiation having a spectral intensity distribution I(ω) dependent on the angular frequency ω is used. The laser radiation is characterized by an aberration parameter α in accordance with: | 12-15-2011 |
20120002185 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit. | 01-05-2012 |
20120099093 | POLARIZATION ACTUATOR - The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams ( | 04-26-2012 |
20120105865 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND RELATED METHOD - A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface. | 05-03-2012 |
20120293784 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation. | 11-22-2012 |
20130057844 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings. | 03-07-2013 |
20130077076 | MICROLITHOGRAPHY ILLUMINATION OPTICAL SYSTEM AND MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS INCLUDING SAME - A microlithography illumination optical system is used to guide illumination light from a primary light source to an object field. A mirror array of the illumination optical system has a plurality of individual mirrors, which can be tilted independently of one another by actuators and are connected to associated tilting actuators. A controller is used to activate the actuators. A raster module of the illumination optical system has a plurality of raster elements to produce a spatially distributed arrangement of secondary light sources. | 03-28-2013 |
20130114060 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes an optical integrator that includes an array of optical raster elements. A condenser superimposes the light beams associated with the optical raster elements in a common field plane. A modulator modifies a field dependency of an angular irradiance distribution in an illuminated field. Units of the modulator are associated with one of the light beams and are arranged at a position in front of the condenser such that only the associated light beam impinges on a single modulator unit. The units are configured to variably redistribute, without blocking any light, a spatial and/or an angular irradiance distribution of the associated light beams. A control device controls the modulator units if it receives an input command that the field dependency of the angular irradiance distribution in the mask plane shall be modified. | 05-09-2013 |
20130194559 | METHOD FOR SETTING AN ILLUMINATION GEOMETRY FOR AN ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY - A method for setting an illumination geometry for an illumination optical unit for EUV projection lithography is disclosed. The method includes defining a desired illumination geometry, followed by varying tilting angles of individual mirrors of the a facet mirror within one and the same individual-mirror group. In a first tilting position, the individual mirrors are assigned via a first group-mirror illumination channel to a first facet of a second facet mirror. In at least one further tilting position, the individual mirrors are assigned either via a further illumination channel to a further facet of the second facet mirror or to a switch-off illumination channel. The tilting angle variation is carried out until an actual illumination geometry corresponds to the desired illumination geometry within predefined tolerances. | 08-01-2013 |
20130250264 | ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS - An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane. | 09-26-2013 |
20130308115 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus comprises a light source which is configured to produce projection light (PL), a pupil plane and a diffractive optical element that is arranged between the light source and the pupil plane such that an irradiance distribution of projection light (PL) in the pupil plane depends on the position of a field that is illuminated by the projection light (PL) on the diffractive optical element. The illumination system further comprises an optical imaging system-that is arranged between the light source and the diffractive optical element. The optical imaging system ensures that changes of the direction and divergence of the projection light (PL) emitted by the light source have no substantial effect on the position and size of the field which is illuminated on the diffractive optical element by the projection light (PL). | 11-21-2013 |
20140211188 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner σ or an outer σ. | 07-31-2014 |
20140233006 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation. | 08-21-2014 |
20140362361 | ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY - An illumination optical unit for EUV projection lithography serves for guiding illumination light towards an illumination field, in which a lithography mask can be arranged. The illumination optical unit has a first facet mirror having a plurality of individual mirrors. The latter predefine illumination channels for guiding illumination light partial beams towards the illumination field. A second facet mirror of the illumination optical unit is disposed downstream of the first facet mirror and has a plurality of facets. The latter respectively contribute to the imaging of a group of the individual mirrors of the first facet mirror into the object field via a group-mirror illumination channel. The latter comprises the individual-mirror illumination channels of the individual-mirror group. Images of the different individual-mirror groups are superimposed on one another in the object field via the assigned group-mirror illumination channels. | 12-11-2014 |
20140368803 | ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY, AND OPTICAL SYSTEM COMPRISING SUCH AN ILLUMINATION OPTICAL UNIT - An illumination optical unit for EUV projection lithography guides illumination light to an illumination field, in which a lithography mask can be arranged. A facet mirror with a plurality of facets guides the illumination light to the illumination field. Respectively one illumination channel which guides an illumination light partial beam is predetermined by one of the facets. Exactly one illumination channel is guided over respectively one of the facets. The illumination optical unit is configured so that, at any time and at any point in the illumination field when the illumination optical unit is in operation, any pairs of illumination light partial beams guided over different illumination channels are incident on this illumination field point at times of incidence, the time difference of which is greater than a coherence duration of the illumination light. | 12-18-2014 |
20140377692 | MASK FOR MICROLITHOGRAPHY AND SCANNING PROJECTION EXPOSURE METHOD UTILIZING THE MASK - A mask for microlithography comprises a substrate; a first pattern area on the substrate, the first pattern area comprising a first pattern extending over a first length in a mask scanning direction and a first width in a direction perpendicular to the mask scan direction; and a second pattern area on the substrate adjacent to the first pattern area in the mask scanning direction, the second pattern area comprising a second pattern extending over a second length in the mask scanning direction and a second width identical to the first width in the direction perpendicular to the mask scan direction. | 12-25-2014 |
20150015862 | ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY - An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light. | 01-15-2015 |
20150029477 | OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical system for a microlithographic projection exposure apparatus has an optical axis, at least one mirror arrangement having a plurality of mirror elements that are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and a deflection device which includes, relative to the optical beam path downstream of the mirror arrangement, at least one deflection surface at which a deflection of the optical axis occurs. The at least one deflection surface has refractive power. | 01-29-2015 |
20150036115 | ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY - Illumination optical unit for EUV projection lithography guides illumination light to an object field. The illumination optical unit has a first facet mirror, which comprises a multiplicity of individual mirrors which can be switched between at least two tilt positions. A second facet mirror of the illumination optical unit is arranged downstream of the first facet mirror in the beam path of the illumination light. The second facet mirror has a plurality of facets, which respectively contribute to imaging a group of the individual mirrors of the first facet mirror into the object field via a group mirror illumination channel. The images of the groups are superposed on one another in the object field. At least some of the individual mirrors belong to at least two different groups of the individual mirror groups, which are respectively associated with a dedicated second facet via a dedicated group mirror illumination channel. | 02-05-2015 |
20150062549 | ASSEMBLY FOR A PROJECTION EXPOSURE APPARATUS FOR EUV PROJECTION LITHOGRAPHY - An assembly for a projection exposure apparatus for EUV projection lithography has an illumination optical unit for guiding illumination light to an illumination field, in which a lithography mask can be arranged. The illumination optical unit comprises a first facet mirror, which comprises a plurality of mirror arrays with respectively a plurality of individual mirrors. The individual mirrors provide individual mirror illumination channels for guiding illumination light partial beams to the illumination field. The mirror arrays of the first facet mirror are arranged in an array superstructure. Gaps extend along at least one main direction (HRα) between neighboring ones of the mirror arrays. Furthermore, the illumination optical unit comprises a second facet mirror, which comprises a plurality of facets, which respectively contribute to imaging a group of the individual mirrors of the field facet mirror into the illumination field via a group mirror illumination channel. | 03-05-2015 |
20150070671 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus comprises a spatial light modulator which is arranged between a light source and a pupil plane. The spatial light modulator includes an array of micromirrors or other light deflecting elements each being capable of individually deflecting impinging projection into various directions. An irradiance distribution on the mirror array or its envelope has, along a direction X an increasing slope and a decreasing slope. The control unit controls the mirrors in such a way that a first mirror, which is located at the increasing slope, and a second mirror, which is located at the decreasing slope, deflect impinging projection light so that it at least partly overlaps in the pupil plane. This ensures that the angular irradiance distribution at mask level is substantially independent from beam pointing fluctuations. | 03-12-2015 |
20150085271 | PROJECTION EXPOSURE APPARATUS AND METHOD FOR CONTROLLING A PROJECTION EXPOSURE APPARATUS - A method is provided for controlling a projection exposure apparatus for microlithography, embodied as a scanner, in the exposure operation, in which a reticle is moved along a scanning axis with respect to a frame of the projection exposure apparatus such that the reticle is scanned by an illumination field radiated thereon, and the radiation of the illumination field is guided onto a wafer after interaction with the reticle in order to generate a desired dose distribution on the wafer. The method comprises the following steps: measuring positional changes of the illumination field in the direction of the scanning axis with respect to the frame of the projection exposure apparatus, and correcting the influence of a measured positional change of the illumination field on the dose distribution on the wafer by modifying at least one operational parameter of the projection exposure apparatus. | 03-26-2015 |