Patent application number | Description | Published |
20120125368 | LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM STORING PROGRAM FOR PERFORMING LIQUID PROCESSING METHOD - There are provided a liquid processing method and a liquid processing apparatus capable of removing a resist film without removing an underlying film when removing the resist film from a substrate on which the underlying film and the resist film are formed in sequence from the bottom and into which ions have been previously implanted. In the liquid processing method capable of processing a substrate by a processing solution, the method includes removing the resist film from the substrate by supplying the processing solution at a temperature of about 120° C. or higher to the substrate. The processing solution includes a sulfuric acid and a nitric acid at a preset ratio, and the substrate has thereon the underlying film and the resist film formed on the underlying film, and ions have been previously implanted into the substrate. | 05-24-2012 |
20140041685 | SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND MEMORY MEDIUM - An apparatus for cleaning a substrate includes a cleaning chamber which accommodates a substrate inside the cleaning chamber, a treatment solution supply device which supplies a treatment solution having a volatile component and capable of solidifying or being cured to form a treatment film through vaporization of the volatile component, and a removal solution supply device which supplies a removal solution capable of removing the treatment film formed on a surface of the substrate. The treatment solution supply device supplies the treatment solution on the surface of the substrate set inside the cleaning chamber, and the removal solution supply device supplies the removal solution onto the treatment film formed on the surface of the substrate. | 02-13-2014 |
20140144464 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING SYSTEM - A method for cleaning a substrate includes supplying a treatment solution which includes a volatile component onto the front surface of a substrate, solidifying or curing the treatment solution through vaporization of the volatile component of the treatment solution such that a treatment film is formed on the entire portion of the front surface of the substrate, treating a different surface of the substrate while the entire portion of the front surface of the substrate is covered with the treatment film, and supplying to the substrate a removal solution which removes the treatment film in the amount sufficient such that the treatment film covering the entire portion of the front surface of the substrate is removed substantially in entirety after the treating of the different surface of the substrate is finished. | 05-29-2014 |
20140144465 | SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND MEMORY MEDIUM - A substrate cleaning system has a first processing apparatus including a first holding device for holding a substrate, and a treatment solution supply device for supplying onto the entire portion of the front surface of the substrate a treatment solution which includes a volatile component and solidifies or is cured to form a treatment film, and a second processing apparatus including a second holding device for holding the substrate, and a removal-solution supply device for supplying onto the substrate a removal solution which removes the treatment film formed on the front surface of the substrate after the treatment solution supplied by the treatment solution supply device solidifies or is cured. | 05-29-2014 |
20150064910 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND MEMORY MEDIUM - A substrate processing method includes supplying onto a substrate a processing liquid which contains a volatile component and forms a film, vaporizing the volatile component in the processing liquid such that the processing liquid solidifies or cures on the substrate and forms a film on the substrate, and supplying onto the film formed on the substrate a removing liquid which removes the processing liquid. The processing liquid is supplied onto the substrate after dry etching or ashing is applied to the substrate. | 03-05-2015 |
20150064911 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM - Productivity can be improved. A substrate processing method includes a processing liquid supplying process of supplying a processing liquid, which contains a volatile component and forms a film on a substrate, onto the substrate on which a pre-treatment, which requires atmosphere management or time management after the pre-treatment, is performed; and an accommodating process of accommodating, in a transfer container, the substrate on which the processing liquid is solidified or cured by volatilization of the volatile component. | 03-05-2015 |
20150128994 | SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY MEDIUM - A method for cleaning a substrate includes supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the substrate, supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate, and supplying to the processing film formed on the substrate a dissolving-processing liquid which dissolves the processing film after the supplying of the strip-processing liquid. | 05-14-2015 |
20150128995 | SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY MEDIUM - A method for cleaning a substrate, includes supplying to a substrate having a hydrophilic surface a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the hydrophilic surface of the substrate, and supplying to the substrate having the processing film a strip-processing liquid for stripping the processing film from the substrate. | 05-14-2015 |
Patent application number | Description | Published |
20120021570 | METHOD FOR FORMING MICROCRYSTALLINE SEMICONDUCTOR FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A seed crystal including mixed phase grains having high crystallinity with a low grain density is formed under a first condition, and a microcrystalline semiconductor film is formed over the seed crystal under a second condition which allows the mixed phase grains in the seed crystal to grow to fill a space between the mixed phase grains. In the first condition, the flow rate of hydrogen is 50 times or greater and 1000 times or less that of a deposition gas containing silicon or germanium, and the pressure in a process chamber is greater than 1333 Pa and 13332 Pa or less. In the second condition, the flow rate of hydrogen is 100 times or greater and 2000 times or less that of a deposition gas containing silicon or germanium, and the pressure in the process chamber is 1333 Pa or greater and 13332 Pa or less. | 01-26-2012 |
20130060033 | LIGHT-EMITTING ELEMENT, LIGHT-EMITTING DEVICE, ELECTRONIC DEVICE, LIGHTING DEVICE, AND HETEROCYCLIC COMPOUND - Provided is a novel heterocyclic compound which has excellent heat resistance and can be used as a host material for a light-emitting substance (a substance emitting fluorescence or a substance emitting phosphorescence). A light-emitting element includes a heterocyclic compound which includes one dibenzo[f,h]quinoxaline ring, one ring having a hole-transport skeleton, and two to eight benzene rings. Note that in the above structure, the molecular weight of the heterocyclic compound is greater than or equal to 564 and less than or equal to 1000. | 03-07-2013 |
20130082591 | HETEROCYCLIC COMPOUND, LIGHT-EMITTING ELEMENT, LIGHT-EMITTING DEVICE, ELECTRONIC DEVICE, AND LIGHTING DEVICE - To provide a novel heterocyclic compound that can be used as a host material in which a light-emitting substance of a light-emitting layer is dispersed. A heterocyclic compound comprising a dibenzo[f,h]quinoxaline ring and two hole-transport skeletons, where the dibenzo[f,h]quinoxaline ring and the two hole-transport skeletons are bonded to an aromatic hydrocarbon group. A heterocyclic compound represented by the following general formula (G1) is provided. | 04-04-2013 |
20140034931 | Light-Emitting Element, Light-Emitting Device, Electronic Device, Lighting Device, and Heterocyclic Compound - A light-emitting element with high heat resistance and high emission efficiency is provided. A novel heterocyclic compound that can be used in such a light-emitting element is provided. One embodiment of the present invention is a light-emitting element which includes, between a pair of electrodes, a layer containing a first organic compound, a second organic compound, and a light-emitting substance; the first organic compound includes one pyrimidine ring and one ring with a hole-transport skeleton; the second organic compound is an aromatic amine; and the light-emitting substance converts triplet excitation energy into light. A combination of the first organic compound, which includes the one pyrimidine ring and the one ring with the hole-transport skeleton, and the second organic compound, which is the aromatic amine, forms an exciplex. | 02-06-2014 |
20150060818 | Organic Compound, Light-Emitting Element, Light-Emitting Device, Electronic Device, and Lighting Device - Provided is a novel organic compound that can be used as a host material of a light-emitting layer in which a light-emitting substance is dispersed. The organic compound is represented by General Formula (G1-1). In the formula, A represents a substituted or unsubstituted dibenzo[f,h]quinoxalin-yl group, Ar | 03-05-2015 |
Patent application number | Description | Published |
20100327281 | THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME - An object is to provide a thin film transistor with small off current, large on current, and high field-effect mobility. A silicon nitride layer and a silicon oxide layer which is formed by oxidizing the silicon nitride layer are stacked as a gate insulating layer, and crystals grow from an interface of the silicon oxide layer of the gate insulating layer to form a microcrystalline semiconductor layer; thus, an inverted staggered thin film transistor is manufactured. Since crystals grow from the gate insulating layer, the thin film transistor can have a high crystallinity, large on current, and high field-effect mobility. In addition, a buffer layer is provided to reduce off current. | 12-30-2010 |
20130095617 | THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME - An object is to provide a thin film transistor with small off current, large on current, and high field-effect mobility, A silicon nitride layer and a silicon oxide layer which is formed by oxidizing the silicon nitride layer are stacked as a gate insulating layer, and crystals grow from an interface of the silicon oxide layer of the gate insulating layer to form a microcrystalline semiconductor layer; thus, an inverted staggered thin film transistor is manufactured. Since crystals grow from the gate insulating layer, the thin film transistor can have a high crystallinity, large on current, and high field-effect mobility. In addition, a buffer layer is provided to reduce off current. | 04-18-2013 |
Patent application number | Description | Published |
20140171593 | FLUORINATED BLOCK COPOLYMER AND PROCESS FOR ITS PRODUCTION, AND SURFACE TREATMENT AGENT - A fluorinated block copolymer having R | 06-19-2014 |
20140287200 | COMPOUND, POLYMER, CURABLE COMPOSITION, COATING COMPOSITION, ARTICLE HAVING CURED FILM, ARTICLE HAVING PATTERN OF LIQUID-PHILIC REGION AND LIQUID REPELLENT REGION, AND PROCESS FOR PRODUCING IT - To provide a curable composition which has favorable insulating property and liquid repellency, and from which a cured film having liquid repellency capable of being sufficiently converted to be liquid-philic even by irradiation with ultraviolet light having a wavelength of at least 300 nm, can be formed; an article having a cured film obtained by curing the curable composition and its production process. | 09-25-2014 |
20140343206 | FLUORINATED COPOLYMER AND PROCESS FOR ITS PRODUCTION, AND WATER/OIL REPELLENT COMPOSITION - To provide a fluorinated copolymer and a water/oil repellent composition, whereby adequate water/oil repellency and excellent dynamic water repellency are obtainable and environmental impact is low. A fluorinated copolymer comprising units (A1) derived from a macromonomer wherein the average polymerization degree of e.g. 2-perfluorohexylethyl acrylate is from 20 to 30, and units (B) derived from a monomer (b) which has no fluoroalkyl group and no cross-linkable functional group and of which the glass transition temperature, when formed into a homopolymer, is from 50 to 150° C., wherein the average polymerization degree of the macromonomer per one molecule of the fluorinated copolymer is at least 1, and a water/oil repellent composition containing such a fluorinated copolymer. | 11-20-2014 |
20140343207 | FLUORINATED COPOLYMER AND PROCESS FOR ITS PRODUCTION, AND WATER/OIL REPELLENT COMPOSITION - To provide a fluorinated copolymer and a water/oil repellent composition having adequate water/oil repellency, excellent washing durability and low environmental impact. A fluorinated copolymer comprising units (A) derived from a macromonomer (a) which has, on average, at least two units (X) derived from 2-perfluorohexylethyl (meta)acrylate or the like, units (B) derived from a monomer (b) which has no fluoroalkyl group and no cross-linkable functional group and of which the glass transition temperature, when formed into a homopolymer, is from 50 to 150° C., and units (C) derived from a monomer (c) which has a cross-linkable functional group and no fluoroalkyl group, and a water/oil repellent composition containing such a fluorinated copolymer. | 11-20-2014 |