Patent application number | Description | Published |
20090132492 | MENU DISTRIBUTION SYSTEM, MENU SERVER, READ/WRITE DEVICE, METHOD, AND COMPUTER READABLE RECORDING MEDIUM - Disclosed is a menu distribution system that provides a menu, which is viewable in a conventional manner and is customized for each customer. A customer allows a read/write device to read a customer ID information storage medium storing customer ID information. The read/write device transmits the customer ID information to a menu server. The menu server has a customer information storage unit that stores, for each customer, attribute information such as food preferences. The menu server selects a menu item most suitable for the customer identified by the transmitted customer ID information, by comparing customer attribute information and menu items stored in a menu item information storage unit. Menu image data is generated based on the selected menu item and is transmitted to the read/write device. The read/write device writes the received menu image data to a memory of a paper like display. | 05-21-2009 |
20140267565 | MANAGEMENT DEVICE, COMMUNICATION SYSTEM, AND STORAGE MEDIUM - A management device includes a status management part managing connection statuses of terminals; a group management part managing a group associated with the terminals, and which manages a group status of the group depending on the connection statuses of the terminals associated with the group, the group management part setting the group status so that the group status represents that the group is ready to connect; a transmission part transmitting to a first terminal which is not in the group the group status representing that the group is ready to connect; and responding to a request to connect to the group from the first terminal, an establishment part, establishing a session to connect the first terminal to a second terminal which is in the group, wherein the connection status of the second terminal represents that the second terminal is ready to connect to other terminals. | 09-18-2014 |
Patent application number | Description | Published |
20120252217 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING PATTERN - A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, | 10-04-2012 |
20120270157 | RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING PATTERN - A resist underlayer film-forming composition includes a polymer including a structural unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of from 3000 to 10000, and a solvent. Each of R | 10-25-2012 |
20120285929 | PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid. | 11-15-2012 |
20130084705 | METHOD FOR FORMING PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A method for forming a pattern includes providing a resist underlayer film on a substrate using a first composition for forming a resist underlayer film. The first composition includes a polymer having a structural unit represented by a following formula (1). In the formula (1), Ar | 04-04-2013 |
20130310514 | RESIST UNDERLAYER FILM-FORMING COMPOSITION - A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R | 11-21-2013 |
20140220783 | PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION - A pattern-forming method includes providing a resist underlayer film on a substrate using a resist underlayer film-forming composition. The resist underlayer film-forming composition includes a first polymer having a glass transition temperature of 0 to 180° C. A silicon-based oxide film is provided on a surface of the resist underlayer film. A resist pattern is provided on a surface of the silicon-based oxide film using a resist composition. The silicon-based oxide film and the resist underlayer film are sequentially dry-etched using the resist pattern as a mask. The substrate is dry-etched using the dry-etched resist underlayer film as a mask. | 08-07-2014 |
20140371466 | PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid. | 12-18-2014 |
Patent application number | Description | Published |
20120129353 | METHOD FOR PATTERN FORMATION, METHOD AND COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND RESIST UNDERLAYER FILM - Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask. | 05-24-2012 |
20120181251 | PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION - A pattern-forming method includes forming a resist underlayer film on a substrate using a resist underlayer film-forming composition. The resist underlayer film-forming composition includes a base component, and a crosslinking agent. The crosslinking agent has a partial structure represented by a following general formula (i). X represents an oxygen atom, a sulfur atom, or —NR—. R represents a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, or an aryl group having 6 to 30 carbon atoms. n | 07-19-2012 |
20130153535 | RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD - A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NR | 06-20-2013 |
20130273476 | PATTERN-FORMING METHOD, RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A pattern-forming method includes: (1) a resist underlayer film-forming step of providing a resist underlayer film on an upper face side of a substrate by coating a resist underlayer film-forming composition containing a resin having a phenolic hydroxyl group; (2) a resist pattern-forming step of forming a resist pattern on an upper face side of the resist underlayer film; (3) a pattern-forming step of dry etching at least the resist underlayer film and the substrate, with the aid of the resist pattern as a mask to form a pattern on the substrate; and (4) a resist underlayer film-removing step of removing the resist underlayer film on the substrate with a basic solution, in the order of (1) to (4). | 10-17-2013 |
20130341304 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM - A resist underlayer film-forming composition includes a polymer having a glass transition temperature (Tg) of 0 to 180° C. The resist underlayer film-forming composition is used for a multilayer resist process. The multilayer resist process includes forming a silicon-based oxide film on a surface of a resist underlayer film, and subjecting the silicon-based oxide film to wet etching. | 12-26-2013 |
20140014620 | RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD - A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NR | 01-16-2014 |
20140048512 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. R | 02-20-2014 |
20140272722 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar | 09-18-2014 |