Patent application number | Description | Published |
20140065744 | METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE - A liquid photocurable resin composition not containing a thermal polymerization initiator is applied to a surface of a light-transmitting cover member having a light-shielding layer or a surface of an image display member, irradiated with ultraviolet rays under an atmosphere where the oxygen concentration is significantly decreased and cured, to form a light-transmitting cured resin layer. Subsequently, the image display member and the light-transmitting cover member are stacked through the light-transmitting cured resin layer to manufacture an image display device of the present invention. | 03-06-2014 |
20140069581 | METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE - According to a method of manufacturing an image display device of the present invention, a photo-curable resin composition in a liquid state is applied to a surface of a light-transmitting cover member including a light-shielding layer or a surface of the image display member to a thickness greater than that of the light-shielding layer. Then, in this state, the photo-curable resin composition is irradiated with a UV ray to be pre-cured, thereby forming a pre-cured resin layer. Next, the image display member and the light-transmitting cover member are stacked via the pre-cured resin layer and thereafter, the pre-cured resin layer is irradiated with a UV ray to be completely cured, thereby forming a light-transmitting cured resin layer. | 03-13-2014 |
20140209237 | METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE - An image display device is manufactured by: applying a liquid photo-curable resin composition having a total value of cure shrinkage ratios based on pre-curing and complete curing of 3% or more to a surface of the light-transmitting cover member or a surface of the image display member with a thickness greater than that of the light-shielding layer to cancel the step between the light-shielding layer and the light-shielding layer forming surface of the light-transmitting cover member; pre-curing the photo-curable resin composition with the irradiation of ultraviolet rays to form a pre-cured resin layer; bonding the light-transmitting cover member to the image display member such that the pre-cured resin layer is placed inside; and subjecting the pre-cured resin layer to the irradiation of ultraviolet rays to achieve the complete curing thereof. The pre-curing is conducted to obtain a cure shrinkage ratio less than 3% in the complete curing thereof. | 07-31-2014 |
20140305582 | METHOD OF MANUFACTURING IMAGE DISPLAY APPARATUS - In the method of manufacturing an image display apparatus according to the present invention, a liquid photocurable resin composition that does not contain a thermal polymerization initiator is coated on the surface of a light-transmissive cover member including a light shielding layer or the surface of an image display member in a thickness thicker than that of the light shielding layer, and thereafter UV rays are irradiated in that state for curing to form a light-transmissive cured resin layer. Then, the image display member and the light-transmissive cover member are laminated to each other via the light-transmissive cured resin layer to obtain an image display apparatus. | 10-16-2014 |
Patent application number | Description | Published |
20130017476 | MEASURING APPARATUS, DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHODAANM OGAWA; ShigekiAACI Utsunomiya-shiAACO JPAAGP OGAWA; Shigeki Utsunomiya-shi JP - The beam measuring apparatus of the present invention includes a detection device including a shield member that has an edge, and a detector configured to detect the beam of which at least a part is not shielded by the shield member; a relative movement mechanism configured to cause a relative movement between the shield member and the beam; and a controller configured to control the detection device and the relative movement mechanism so as to cause one of the edge and the beam to traverse the other with respect to each of a plurality of points on the edge, to sum a plurality of signals, respectively obtained by the detection device with respect to the plurality of points and with respect to relative positions of the relative movement corresponding to one another, so as to obtain a signal sequence, and to obtain the characteristic based on the signal sequence. | 01-17-2013 |
20130148091 | LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING ARTICLE - A lithography apparatus which positions a substrate based on measurement of a position of an alignment mark on the substrate to form a pattern on the substrate. The apparatus includes an acquisition unit configured to acquire a first required alignment precision in a first direction, and a second required alignment precision in a second direction different from the first direction, and a controller configured to determine, based on the first required alignment precision, a first condition for a first measurement process of measuring a position of an alignment mark in the first direction, to determine, based on the second required alignment precision, a second condition for a second measurement process of measuring a position of an alignment mark in the second direction. | 06-13-2013 |
20130148122 | METHOD OF MANUFACTURING DEVICE, AND SUBSTRATE - A method includes a first step of forming a circuit pattern and an alignment mark on a substrate and a second step of measuring a position of the alignment mark and positioning the substrate. The alignment mark includes a first linear pattern arranged on one side of a first straight line, a second linear pattern arranged on the other side of the first straight line, a third linear pattern arranged on one side of a second straight line, and a fourth linear pattern arranged on the other side of the second straight line. The first step includes determining total number of the third and fourth linear patterns to be formed and total number of the first and second linear patterns to be formed based on required precisions in directions along the first and second straight lines. | 06-13-2013 |
20130188165 | LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - A lithography apparatus includes: a rotation mechanism configured to rotate a substrate; a first measurement device configured to measure a position of an alignment mark formed on the substrate in a first direction with a first precision; a second measurement device configured to measure a position of an alignment mark formed on the substrate in a second direction with a second precision higher than the first precision; and a controller configured to control the rotation mechanism so that a direction, in which the substrate requires an overlay precision higher than another direction, is aligned with the second direction. | 07-25-2013 |