Patent application number | Description | Published |
20090035700 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION - (1) A polymer compound for photoresist compositions which is high in storage stability and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided; and (3) a photoresist composition with improved LWR containing the subject polymer compound are further provided. In detail, [1] a tertiary alcohol derivative represented by the following general formula (1) is provided. | 02-05-2009 |
20100331508 | (METH)ACRYLATE DERIVATIVE, INTERMEDIATE THEREOF, AND POLYMER COMPOUND - Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: | 12-30-2010 |
20110009643 | METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF - Provided are 1) a production process for an acrylic ester derivative capable of being a raw material of a polymer for obtaining a photoresist composition capable of forming a photoresist film which is excellent in a reactivity to acid and a heat stability and is less swollen in developing and which has a refractive index of preferably 1.72 or more in 193 nm and can be patterned, 2) an acrylic ester derivative obtained by the above production process and 3) alcohol and ester which are synthetic intermediates for the above acrylic ester derivative. | 01-13-2011 |
20110060112 | ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS - Provided are 1) a polymer which is excellent in a reactivity to acid and a heat stability and which is less swollen in developing, 2) a compound shown below which is a raw material for the above polymer and 3) a photoresist composition which contains the above polymer and which is improved in LWR and excellent in a heat resistance. | 03-10-2011 |
20110117497 | ACRYLATE DERIVATIVE, HALOESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION - An acrylate derivative represented by the following general formula (1): | 05-19-2011 |
20110160465 | PRODUCTION METHOD FOR SULTONE DERIVATIVES - There is provided a means to produce industrially a highly pure 2-hydroxy-4-oxa-5-thiatricyclo[4.2.1.0 | 06-30-2011 |
20120316349 | ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS - A cyclic alcohol of formula (II-1): | 12-13-2012 |
20130164675 | ACRYLIC ESTER DERIVATIVE, HIGH-MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION - The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1): | 06-27-2013 |
20130316286 | ACRYLIC ACID ESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION - Provided is a photoresist composition containing a polymer that contains, as a constituent unit, a specific methacrylic acid ester derivative. The photoresist composition can form a photoresist pattern with improved LWR and high resolution. More specifically, provided is an acrylic acid ester derivative represented by the following general formula (1): | 11-28-2013 |