Patent application number | Description | Published |
20130169946 | LITHOGRAPHY MACHINE AND SCANNING AND EXPOSING METHOD THEREOF - The present disclosure provides a lithography machine and a scanning and exposing method thereof. According to the scanning and exposing method, the scanning and exposing process for a whole wafer includes two alternately circulated motions: a scanning and exposing motion and a stepping motion; and the scanning and exposing motion is a sinusoidal motion rather than a rapid-acceleration uniform-speed rapid-deceleration scanning and exposing motion in the conventional techniques. During the scanning of a single exposure shot, it may begin to scan the exposure shot once a wafer stage and a reticle stage begin to accelerate from zero speed. And the scanning and exposing may not end until the speeds of the wafer stage and the reticle decrease to zero. Therefore, the effective time of the scanning and exposing in the scanning and exposing motion is greatly increased and the production efficiency of the wafer is improved. | 07-04-2013 |
20140063480 | EXPOSURE DEVICE AND EXPOSURE METHOD - An exposure method and an exposure device are provided. An exemplary exposure device includes a stage, a first clamp holder, a second clamp holder, an optical projection unit, a first alignment detection unit, and/or a second alignment detection unit. The stage includes a first region and a second region. The first clamp holder is located in the first region and adapted for holding a first substrate, and the second clamp holder is located in the second region and adapted for holding a second substrate. The optical projection unit is located above the stage and adapted for exposure of the first substrate or the second substrate. The first alignment detection unit is adapted for detecting alignment marks of the first substrate. The second alignment detection unit is adapted for detecting alignment marks of the second substrate. The exposure device can accurately position the stage and improve production yield. | 03-06-2014 |
20140068086 | METHOD AND SYSTEM FOR CONNECTING USERS BASED ON A MEASURE OF CORRELATION - One embodiment of the present invention sets forth a technique for connecting users based on a measure of correlation. The method involves receiving a first activity data element associated with a first user, where the first activity data element includes activity information related to a first software application, receiving a second activity data element associated with a second user, where the second activity data element includes activity information related to the first software application, and determining, via a processing unit, a measure of correlation between the first and second activity data elements. The method further involves determining, based on the measure of correlation between the first and second activity data elements, that a connection between the first user and the second user should be facilitated, and facilitating a connection between the first user and the second user. | 03-06-2014 |
20140077755 | EMERGENCY POWER SUPPLY STARTING SYSTEM FOR A LITHIUM BATTERY WITH AUTOMATIC PREHEATING FUNCTION - An emergency power supply starting system a lithium battery with automatic preheating function, including a lithium battery pack, an output control module, an output module, a working power supply control module, a CPU master control module, an operation panel display function module, a heater control module, a heater module, an information sampling module and a charging module is disclosed. The CPU master control module, monitoring the real-time temperature, residual capacity and user operation status of the lithium battery pack, cuts off all output functions and charges the lithium battery (power supply is resumed only after charging) if the battery voltage is too low; if the voltage is normal but battery temperature is too low, the heater control module will start the heater module to initiate the heating process driven with the low current from the lithium battery and the latter is ready for use after the lithium battery temperature returns to normal. The invention arranges a heating source for heating the lithium battery the invention to realize automatic heating for the lithium battery and therefore, normal usage is possible in low temperature condition. | 03-20-2014 |
20140168626 | LITHOGRAPHY SYSTEM AND LITHOGRAPHY METHOD - A lithography system may include a wafer stage. The wafer stage may include a wafer mounting part configured to carry a wafer and configured to oscillate along a plane that is parallel to a top surface of the wafer in a wafer exposure process. The wafer stage may further include a driving device configured to affect an oscillatory movement of the wafer mounting part in the wafer exposure process. | 06-19-2014 |
20140253893 | CYLINDRICAL RETICLE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD - An exposure apparatus is provided for performing a unidirectional scan-exposure. The exposure apparatus includes a base and a plurality of wafer stages on the base for loading/unloading wafers and successively moving from a first position to a second position of the base cyclically. The exposure apparatus also includes alignment detection units above the first position of the base for detecting alignment marks on the wafer and aligning the wafers and a cylindrical reticle system above the second position of the base. Further, the exposure apparatus includes an optical projection unit between the cylindrical reticle system and the base for projecting light onto the wafers for an exposure. Further, the exposure apparatus also includes an illuminator box and a main control unit. | 09-11-2014 |
20140253895 | CYLINDRICAL RETICLE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD - A cylindrical reticle system is provided for performing a unidirectional scan-exposure. The cylindrical reticle system includes a base and a center shaft fixed a one side of the base. The cylindrical reticle system also includes a first bearing fixed at the end of the center shaft near to the base and a second bearing fixed at the other end of the center shaft far from the base. Further, the cylindrical reticle system includes a cylindrical reticle having an imaging region and two non-imaging regions at both end of the imaging region. | 09-11-2014 |
20140253896 | EXPOSURE APPARATUS AND EXPOSURE METHOD THEREOF - An exposure apparatus is provided for performing an unidirectional scan-exposure. The exposure apparatus includes a base and a wafer stage group having a plurality of wafer stages on the base for holding wafers and successively moving from a first position to a second position of the base cyclically. The exposure apparatus also includes an alignment detection unit above the first position for detecting wafer stage fiducials at the first position and alignment marks on a wafer on the wafer stage to align the wafer. Further, the exposure apparatus includes a reticle stage on the second position for loading a cylindrical reticle and causing the cylindrical reticle to rotate around the center axis of the reticle stage and an optical projection unit between the reticle stage and the base for projecting light passing through the cylindrical reticle onto exposure regions on a wafer on the wafer stage. | 09-11-2014 |
20140253897 | EXPOSURE APPARATUS AND EXPOSURE METHOD THEREOF - A wafer alignment system is provided for performing a unidirectional scan-exposure. The wafer alignment system includes a plurality of wafer stages successively moving from a first position to a second position of a base cyclically. The wafer alignment method also includes an encoder plate having a first opening and a second opening. Further, the wafer alignment system includes a plurality of encoder plate readers and a plurality of wafer stage fiducials on the wafer stages. Further, the wafer alignment system also includes an alignment detection unit above the first opening of the encoder plate. | 09-11-2014 |
20140360539 | EDGE BEAD REMOVAL APPARATUS AND METHODS - An edge bead removal apparatus is provided. The edge bead removal apparatus includes a clamping unit configured to clamp a cylindrical reticle and cause the cylindrical reticle to incline with a pre-determined angle and to rotate around a central axis. The edge bead removal apparatus also includes an edge bead removal solvent nozzle configured to spray an edge bead removal solvent to remove edge beads on both edges of the cylindrical reticle. | 12-11-2014 |
20140363565 | PHOTORESIST COATING APPARATUS AND METHODS - A photoresist coating apparatus is provided. The photoresist coating apparatus includes a base; and a position platform moving back and forth along a scanning direction on the base. The photoresist coating apparatus also includes an imprinter having a trench configured to hold photoresist and fixed on the position platform; and a photoresist spray nozzle disposed above the imprinter and configured to spray the photoresist into the trench. Further, the photoresist coating apparatus includes a reticle frame configured to install a cylindrical reticle and enable the cylindrical reticle to rotate around a center axis and contact with the imprinter so as to coat the photoresist in the trench on a surface of the cylindrical reticle. | 12-11-2014 |