Rani S.
Rani S. Abou Ghaida, Mount Kisco, NY US
Patent application number | Description | Published |
---|---|---|
20130007674 | RESOLVING DOUBLE PATTERNING CONFLICTS - A mechanism is provided for resolving patterning conflicts. The mechanism performs decomposition with stitches at all candidate locations to find the solution with the minimum number of conflicts. The mechanism then defines interactions between a layout of a first mask and a layout of a second mask through design rules, as well as interactions of mask | 01-03-2013 |
20130061183 | Multiple Patterning Layout Decomposition for Ease of Conflict Removal - A mechanism is provided for multiple patterning lithography with conflict removal aware coloring. The mechanism makes multiple patterning coloring aware of the conflict removal overhead. The coloring solution explicitly considers ease of conflict removal as one of the coloring objectives. The mechanism pre-computes how much shapes can move in each direction, The mechanism generates a conflict graph where nodes represent shapes in the layout and edges represent conflicts between shapes. The mechanism assigns weights to edges based on available spatial slack between conflicting features, The mechanism then uses the weights to guide multiple patterning coloring. The mechanism prioritizes conflicting features with higher weights to be assigned different colors. | 03-07-2013 |
20130061185 | MASK ASSIGNMENT FOR MULTIPLE PATTERNING LITHOGRAPHY - A mechanism is provided for mask assignment for triple patterning lithography. The mechanism identifies tip-to-tip (TT), tip-to-side (TS), and side-to-side (SS) conflicting parts by design rule dependent projection. The mechanism finds stitch location for TT, TS, and SS conflicts separately. The mechanism colors TT, TS, and SS conflicting parts with mask0/mask1, mask0/mask2, mask1/mask2 coloring cycle with each type colored separately. The mechanism uses existing infrastructure of two-way coloring. As a first objective, the mechanism attempts to minimize conflicts. As a second objective, the mechanism attempts to minimize the number of stitches by assigning the two sides of stitches to the same mask. Once coloring of all conflicting parts is done, the mechanism colors non-conflicting parts to maximize minimum overlap of exposures and to use both colors if two sides are different colors and one color if both sides are the same color. | 03-07-2013 |
Rani S. Beena, Noida IN
Patent application number | Description | Published |
---|---|---|
20110046396 | POLYMORPHIC FORMS OF FLUVASTATIN SODIUM AND PROCESS FOR PREPARING THE SAME - Disclosed herein are novel polymorphic forms of Fluvastatin sodium, wherein said polymorphic forms are designated as J | 02-24-2011 |
Rani S. Beena, Uttar Pradesh IN
Patent application number | Description | Published |
---|---|---|
20080207919 | Novel Polymorphic Forms Of Fluvastatin Sodium And Process For Preparing The Same - Disclosed herein are novel polymorphic forms of Fluvastatin sodium, wherein said polymorphic forms are designated as J | 08-28-2008 |