Patent application number | Description | Published |
20080298066 | Lamp Unit - The present invention relates to a lamp unit, especially to a UHP lamp unit, comprising a housing, a lamp positioned within said housing, a reflector assigned to said lamp for reflecting light emitted by said lamp through a transmission window, and at least one thermal bridge and/or heat sink unit being assigned to the reflector and/or to the lamp and/or to the housing. The or each thermal bridge and/or heat sink unit is preferably made from a material having a good thermal conductivity, e.g. the or each thermal bridge and/or heat sink is made from metal or ceramics. | 12-04-2008 |
20090207397 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 08-20-2009 |
20090296068 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which an opening is provided for the provision of immersion fluid onto a top surface of the table. In an embodiment, there are two such openings. The first of the openings surrounds a substrate support of the table and the second of the openings extends around an outer edge of the table. | 12-03-2009 |
20100039887 | DEVICE FOR MIXING A LIQUID MEDIUM - The invention provides a device for mixing a liquid medium, an apparatus for mixing a liquid medium, a system comprising a device and an apparatus and a method for mixing a liquid medium. The device comprises a flexible membrane ( | 02-18-2010 |
20100214543 | LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD - A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate. | 08-26-2010 |
20100233824 | MICROFLUIDIC METHODS AND SYSTEMS FOR USE IN DETECTING ANALYTES - A microfluidic reactor arrangement ( | 09-16-2010 |
20100277709 | SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap. | 11-04-2010 |
20100321653 | LITHOGRAPHIC APPARATUS - A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate. | 12-23-2010 |
20110025994 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried. | 02-03-2011 |
20110188012 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field. | 08-04-2011 |
20110228238 | LITHOGRAPHIC APPARATUS, COVER FOR USE IN A LITHOGRAPHIC APPARATUS AND METHOD FOR DESIGNING A COVER FOR USE IN A LITHOGRAPHIC APPARATUS - A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure. | 09-22-2011 |
20110235008 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate. | 09-29-2011 |
20110242512 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. | 10-06-2011 |
20110273677 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 11-10-2011 |
20110273678 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. | 11-10-2011 |
20110285976 | LITHOGRAPHIC APPARATUS, FLUID HANDLING STRUCTURE FOR USE IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure. | 11-24-2011 |
20110292357 | FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system. | 12-01-2011 |
20140098357 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 04-10-2014 |
20140233004 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 08-21-2014 |