Patent application number | Description | Published |
20090104719 | Plasma Doping System with In-Situ Chamber Condition Monitoring - A method of in-situ monitoring of a plasma doping process includes generating a plasma comprising dopant ions in a chamber proximate to a platen supporting a substrate. A platen is biased with a bias voltage waveform having a negative potential that attracts ions in the plasma to the substrate for plasma doping. A dose of ions attracted to the substrate is measured. At least one sensor measurement is performed to determine the condition of the plasma chamber. In addition, at least one plasma process parameter is modified in response to the measured dose and in response to the at least one sensor measurement. | 04-23-2009 |
20090104761 | Plasma Doping System With Charge Control - A method of plasma doping includes generating a plasma comprising dopant ions proximate to a platen supporting a substrate in a plasma chamber. The platen is biased with a bias voltage waveform having a negative potential that attracts ions in the plasma to the substrate for plasma doping. At least one sensor measuring data related to charging conditions favorable for forming an electrical discharge is monitored. At least one plasma process parameter is modified in response to the measured data, thereby reducing a probability of forming an electrical discharge. | 04-23-2009 |
20090200461 | Closed Loop Control And Process Optimization In Plasma Doping Processes Using A Time of Flight Ion Detector - A method of controlling a plasma doping process using a time-of-flight ion detector includes generating a plasma comprising dopant ions in a plasma chamber proximate to a platen supporting a substrate. The platen is biased with a bias voltage waveform having a negative potential that attracts ions in the plasma to the substrate for plasma doping. A spectrum of ions present in the plasma is measured as a function of ion mass with a time-of-flight ion detector. The total number ions impacting the substrate is measured with a Faraday dosimetry system. An implant profile is determined from the measured spectrum of ions. An integrated dose is determined from the measured total number of ions and the calculated implant profile. At least one plasma doping parameter is modified in response to the calculated integrated dose. | 08-13-2009 |
20100252531 | Enhanced Etch and Deposition Profile Control Using Plasma Sheath Engineering - A plasma processing tool is used to deposit material on a workpiece. For example, a method for conformal deposition of material is disclosed. In this embodiment, the plasma sheath shape is modified to allow material to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of different features can be deposited onto. In another embodiment, a plasma processing tool is used to etch a workpiece. In this embodiment, the plasma sheath shape is altered to allow ions to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of differently shaped features can be created. | 10-07-2010 |
20120000421 | CONTROL APPARATUS FOR PLASMA IMMERSION ION IMPLANTATION OF A DIELECTRIC SUBSTRATE - A control apparatus for plasma immersion ion implantation of a dielectric substrate which includes an electrode disposed above a generated plasma in a plasma chamber. The electrode is biased with negative voltage pulses at a potential that is higher than a potential of a substrate or cathode configured to receive ion implantation. The electrode is more negative to give the electrons generated as secondary electrons from the electrode sufficient energy to overcome the negative voltage of the high voltage sheath around the substrate thereby reaching the substrate. These electrons are accelerated toward the substrate to neutralize charge build-up on the substrate. | 01-05-2012 |
20120111834 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a process chamber, a platen for supporting a workpiece, a source configured to generate a plasma in the process chamber, and an insulating modifier. The insulating modifier has a gap, and a gap plane, where the gap plane is defined by portions of the insulating modifier closest to the sheath and proximate the gap. A gap angle is defined as the angle between the gap plane and a plane defined by the front surface of the workpiece. Additionally, a method of having ions strike a workpiece is disclosed, where the range of incident angles of the ions striking the workpiece includes a center angle and an angular distribution, and where the use of the insulating modifier creates a center angle that is not perpendicular to the workpiece. | 05-10-2012 |
20140021373 | BEAMLINE ELECTRODE VOLTAGE MODULATION FOR ION BEAM GLITCH RECOVERY - An ion implantation system and method are disclosed in which glitches in voltage are minimized by use of a modulated power supply system in the implanter. The modulated power supply system includes a traditional power supply and a control unit associated with each power supply, where the control unit is used to isolate the power supply from an electrode if a glitch or arc is detected. The control unit then restores connectivity after the glitch condition has been rectified. | 01-23-2014 |
20140034611 | ENHANCED ETCH AND DEPOSITION PROFILE CONTROL USING PLASMA SHEATH ENGINEERING - A plasma processing tool is used to deposit material on a workpiece. For example, a method for conformal deposition of material is disclosed. In this embodiment, the plasma sheath shape is modified to allow material to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of different features can be deposited onto. In another embodiment, a plasma processing tool is used to etch a workpiece. In this embodiment, the plasma sheath shape is altered to allow ions to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of differently shaped features can be created. | 02-06-2014 |
Patent application number | Description | Published |
20080197195 | Multi-Mode Ring Scannner - A multi-mode ring scanner (MMRS) has a ring unit for wearing on a finger. The MMRS optionally has a wrist unit coupled to the ring unit, such as via a cable. The MMRS optionally communicates wirelessly with a computing device. The ring unit has one or more scanners (such as an optical scanner or an RFID tag reader). The ring unit optionally has two paddle switches for activation by inward pressure from fingers adjacent to the finger. The two switches enable specifying operation of the MMRS in a plurality of modes and/or to communicate a plurality of information codes to the computing device. The computing device is optionally enabled to assign a function to each combination of activation of the two switches. A scanning system including the MMRS optionally provides feedback to a user based on feedback from a host processor. | 08-21-2008 |
20090266898 | Accuracy-Enhanced Scanner - An accuracy-enhanced scanner provides (in response to a first user input) illumination of potential scan targets and scans (in response to a second user input) a selected scan target. The user uses the illumination to aim the scanner at the selected scan target in between providing the first and the second user inputs. The scanner has switches to communicate the user inputs, to specify an operating mode for the scanner, and/or to communicate information codes to a computing device. The scanner has one or more scan engines (such as a barcode reader or an RFID tag reader), and optionally communicates wirelessly with the computing device. A scanning system including the scanner optionally provides feedback to the user based on feedback from a host processor. The scanner is any of a Multi-Mode Ring Scanner (MMRS), a cordless hand scanner, or a Personal Digital Assistant (PDA) with an add-on scanner. | 10-29-2009 |
20120118957 | Multi-Mode Ring Scannner - A multi-mode ring scanner (MMRS) has a ring unit for wearing on a finger. The MMRS optionally has a wrist unit coupled to the ring unit, such as via a cable. The MMRS optionally communicates wirelessly with a computing device. The ring unit has one or more scanners (such as an optical scanner or an RFID tag reader). The ring unit optionally has two paddle switches for activation by inward pressure from fingers adjacent to the finger. The two switches enable specifying operation of the MMRS in a plurality of modes and/or to communicate a plurality of information codes to the computing device. The computing device is optionally enabled to assign a function to each combination of activation of the two switches. A scanning system including the MMRS optionally provides feedback to a user based on feedback from a host processor. | 05-17-2012 |
20120298756 | Accuracy-Enhanced Scanner - An accuracy-enhanced scanner provides (in response to a first user input) illumination of potential scan targets and scans (in response to a second user input) a selected scan target. The user uses the illumination to aim the scanner at the selected scan target in between providing the first and the second user inputs. The scanner has switches to communicate the user inputs, to specify an operating mode for the scanner, and/or to communicate information codes to a computing device. The scanner has one or more scan engines (such as a barcode reader or an RFID tag reader), and optionally communicates wirelessly with the computing device. A scanning system including the scanner optionally provides feedback to the user based on feedback from a host processor. The scanner is any of a Multi-Mode Ring Scanner (MMRS), a cordless hand scanner, or a Personal Digital Assistant (PDA) with an add-on scanner. | 11-29-2012 |
20130292476 | Host Feedback of Scan Status for Scanners Wielded by Hand - A multi-mode ring scanner (MMRS) has a ring unit for wearing on a finger. The MMRS optionally has a wrist unit coupled to the ring unit, such as via a cable. The MMRS optionally communicates wirelessly with a computing device. The ring unit has one or more scanners (such as an optical scanner or an RFID tag reader). The ring unit optionally has two paddle switches for activation by inward pressure from fingers adjacent to the finger. The two switches enable specifying operation of the MMRS in a plurality of modes and/or to communicate a plurality of information codes to the computing device. The computing device is optionally enabled to assign a function to each combination of activation of the two switches. A scanning system including the MMRS optionally provides feedback to a user based on feedback from a host processor. | 11-07-2013 |
20150069129 | Accuracy-Enhanced Scanner - An accuracy-enhanced scanner provides (in response to a first user input) illumination of potential scan targets and scans (in response to a second user input) a selected scan target. The user uses the illumination to aim the scanner at the selected scan target in between providing the first and the second user inputs. The scanner has switches to communicate the user inputs, to specify an operating mode for the scanner, and/or to communicate information codes to a computing device. The scanner has one or more scan engines (such as a barcode reader or an RFID tag reader), and optionally communicates wirelessly with the computing device. A scanning system including the scanner optionally provides feedback to the user based on feedback from a host processor. The scanner is any of a Multi-Mode Ring Scanner (MMRS), a cordless hand scanner, or a Personal Digital Assistant (PDA) with an add-on scanner. | 03-12-2015 |
Patent application number | Description | Published |
20120080183 | REMOTELY CONTROLLED APPARATUS FOR DOWNHOLE APPLICATIONS, COMPONENTS FOR SUCH APPARATUS, REMOTE STATUS INDICATION DEVICES FOR SUCH APPARATUS, AND RELATED METHODS - An expandable apparatus may comprise a tubular body, a valve piston and a push sleeve. The tubular body may comprise a fluid passageway extending therethrough, and the valve piston may be disposed within the tubular body, the valve piston configured to move axially downward within the tubular body responsive to a pressure of drilling fluid passing through a drilling fluid flow path and configured to selectively control a flow of fluid into an annular chamber. The push sleeve may be disposed within the tubular body and coupled to at least one expandable feature, the push sleeve configured to move axially responsive to the flow of fluid into the annular chamber extending the at least one expandable feature. Additionally, the expandable apparatus may be configured to generate a signal indicating the extension of the at least one expandable feature. | 04-05-2012 |
20130256035 | EXPANDABLE REAMERS AND METHODS OF USING EXPANDABLE REAMERS - Expandable reamers comprise a housing and at least one blade supported by the housing. The at least one blade is movable between an extended position and a retracted position. The at least one blade is in the retracted position when a travel sleeve is in a first sleeve position and a trigger sleeve is in an unobstructed position. The at least one blade is movable to the extended position when the travel sleeve is in a second sleeve position and the trigger sleeve is in the unobstructed position. The at least one blade is in the retracted position when the travel sleeve is in the second sleeve position and the trigger sleeve is in an obstructed position. | 10-03-2013 |
20140246236 | EXPANDABLE REAMER ASSEMBLIES, BOTTOM HOLE ASSEMBLIES, AND RELATED METHODS - Expandable reamer assemblies include an expandable reamer module and an activation module. An outer tubular body of the activation module is rigidly coupled to a tubular body of the expandable reamer module, and an activation member of the activation module is coupled to a sleeve of the expandable reamer module, the sleeve coupled to at least one blade and configured to move the at least one blade into an extended position. The sleeve moves axially responsive to axial movement of the activation member. Bottom-hole assemblies include an expandable reamer module and an activation module. The activation module is coupled to the expandable reamer module and configured to provide a motive force to the sleeve to move the sleeve opposite a direction of flow of drilling fluid. Methods of using expandable reamer modules include pairing two substantially identical expandable reamer modules and two respective different activation modules. | 09-04-2014 |
Patent application number | Description | Published |
20130195554 | MOLDBOARD LOCK - A milling machine including a chamber, a milling rotor, a rear door and a moldboard. The chamber has a front portion and a rear portion. The milling rotor is rotatably mounted transversely on the chamber. The rear door is mounted mounted adjacent to the milling rotor, in a substantially vertical position. The moldboard is coupled with the rear door. The moldboard is vertically movable with respect to the rear door between a retracted position and an extended position. A bulkhead is mounted on the chamber, adjacent to the milling rotor, in a substantially vertical position. The bulkhead includes a guide bar. A guide pin is coupled with the moldboard and configured to move within the guide bar. The guide pin is used to lock the moldboard in the extended position and to unlock the moldboard in the retracted position with respect to the bulkhead. | 08-01-2013 |
20130234495 | Cold Planar Anti-Stabbing Mechanism - A cold planer includes a frame and a cutting mechanism having a rotatable cutter configured to cut material of a substrate. An anti-slabbing mechanism is coupled to the frame and includes an upwardly oriented base plate, and a plurality of skids. The skids are arranged in a first subset and a second subset positioned upon opposite outboard sides of a forwardly projecting plow, and downwardly depend from a base plate of the anti-slabbing mechanism, for applying a slabbing opposition force to uncut material of the substrate. | 09-12-2013 |
20140167486 | Sensor Mounting System For Road Milling Machine - A road milling machine includes a sensor mounting system having a first mounting member, which is attached to a first machine component and supports a portion of a position sensor, and a second mounting member attached to a second machine component having a pivotable attachment to a machine frame. An extension member has a first end attached to the second mounting member and a second end including an attachment flange. A unitary ski member has a first end attached to another portion of the position sensor and a second end pivotably attached to the attachment flange. The unitary ski member includes a ground engaging surface that is positioned inboard relative to first and second side plates, which flank a rotor, and has a pivot movement compensation curve. A controller is configured for determining a milling depth of the rotor from measurements obtained by the position sensor. | 06-19-2014 |
20140361600 | Cold Planer Anti-Slabbing Mechanism - A cold planer includes a frame and a cutting mechanism having a rotatable cutter configured to cut material of a substrate. An anti-slabbing mechanism is coupled to the frame and includes an upwardly oriented base plate, and a plurality of skids. The skids are arranged in a first subset and a second subset positioned upon opposite outboard sides of a forwardly projecting plow, and downwardly depend from a base plate of the anti-slabbing mechanism, for applying a slabbing opposition force to uncut material of the substrate. | 12-11-2014 |