Tokimitsu
Ryoichi Tokimitsu, Kashiwa-Shi JP
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20140004450 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | 01-02-2014 |
20140295058 | METHOD FOR TESTING CHARGE GENERATION LAYER AND PROCESS FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTORS ON LARGE SCALE - A method is provided for testing a charge generation layer disposed directly on an undercoat layer disposed directly on an aluminum-based cylindrical support member formed by extrusion and drawing having a periphery not subjected to cutting work. The method includes testing the charge generation layer for a defect or a suspected defect by irradiating the charge generation layer with light, and receiving reflected light from the charge generation layer with a light receiving device. The light emitted to the charge generation layer has a wavelength within the range of the absorption wavelengths of the charge generation layer, and whose transmittance to the undercoat layer is 0.3% or less. | 10-02-2014 |
20140295344 | METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER - A composition that contains a compound represented by the formula (1) is dissolved in an organic compound, and the composition is purified by using a basic adsorbent that contains at least 15% by mass magnesium and has a volume average particle diameter of 10 μm to 500 μm, both inclusive. An undercoat-layer-forming coating liquid is prepared by removing the basic adsorbent and dispersing metal oxide particles in the obtained solution containing the purified form of the composition. An undercoat layer is formed by forming a coat of the undercoat-layer-forming coating liquid and drying the coat. | 10-02-2014 |
20140342276 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF PRODUCING THE SAME, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - An electrophotographic photosensitive member includes an undercoat layer containing a silane coupling agent having a divalent group represented by —NH— and an urethane resin. The modulus of elastic deformation (we/wt) of a surface of the undercoat layer satisfies formula (X), where the modulus of elastic deformation is measured by a universal hardness test. | 11-20-2014 |
Ryoichi Tokimitsu, Mishima-Shi JP
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20150346620 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - An electrophotographic photosensitive member includes an undercoat layer that includes metal oxide particles and a compound represented by formula (1). | 12-03-2015 |
Takumi Tokimitsu, Utsunomiya-Shi JP
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20090041934 | METHOD FOR MANUFACTURING PROJECTION OPTICS - A method for manufacturing a projection optics that includes a plurality of optical elements composed of an amorphous material is provided. The method includes preparing a plurality of optical-thin-film candidates having various transmission characteristics, measuring transmission characteristics of the plurality of optical elements, calculating a transmission characteristic of the projection optics supposing that a certain optical-thin-film candidate of the plurality of optical-thin-film candidates is formed on a surface of each of the optical elements, selecting an optical thin film to be formed on the surface of each of the optical elements from the plurality of optical-thin-film candidates based on the calculated transmission characteristic, and forming the selected optical thin film on the surface of each of the optical elements. | 02-12-2009 |
20130070256 | MEASURING APPARATUS - A measuring apparatus includes a light source unit configured to continuously scan wavelengths of a plurality of types of beams at different speeds in a plurality of discrete wavelength scanning ranges, a beam synthesizer, an interferometer unit configured to detect as an interference signal an interference fringe formed by a reference beam reflected on a reference surface and a target beam reflected on a target surface, and a processor configured to determine the absolute distance based upon the interference signal detected by the interferometer unit. The interferometer unit includes a single optical detector. The processor obtains the absolute distance for each of the plurality of types of beams through a frequency analysis of a synthesized interference signal, and outputs one absolute distance by operating a plurality of absolute distances that have been obtained. | 03-21-2013 |
20130194582 | MULTIWAVELENGTH INTERFEROMETER - A multiwavelength interferometer ( | 08-01-2013 |
Takumi Tokimitsu, Moka-Shi JP
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20110109908 | DETECTION APPARATUS - A detection apparatus which illuminates a sample and detects light reflected by the sample, comprises a light source, a columnar reflecting member having a columnar reflecting surface which reflects light having entered a first end of the columnar reflecting member by a plurality of number of times, and emits the light from a second end of the columnar reflecting member, a mirror which reflects light radiated by the light source so as to guide to the first end and a detector, wherein the sample is illuminated with the light emitted from the second end, and the detector is configured to detect the light which has been reflected by the sample and has passed through the columnar reflecting member, and a reflecting surface of the mirror is a concave surface, and a shape of a reflecting surface of the mirror on a section perpendicular to an axis of the columnar reflecting member is concave. | 05-12-2011 |
20120113434 | MEASUREMENT APPARATUS - A measurement apparatus which measures a distance between a reference surface and a test surface, comprises a light source unit including a plurality of light sources each corresponding to one of a plurality of wavelength scanning ranges and each continuously scans a wavelength of generated light in the corresponding wavelength scanning range, an interferometer unit which splits light emitted by each of the plurality of light sources into reference light and test light, and detects, as an interference signal, an interference fringe formed by the reference light and the test light, and a processor which determines a slope of a phase of the interference signal with respect to wave number of the light based on the interference signal detected by the interferometer unit for each of the plurality of wavelength scanning ranges, and determines the distance from the slope of the phase. | 05-10-2012 |
Toru Tokimitsu, Yokohama-Shi JP
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20140117397 | MOLD HAVING AN UNEVEN SURFACE STRUCTURE, OPTICAL ARTICLE, MANUFACTURING METHOD THEREFOR, TRANSPARENT SUBSTRATE FOR SURFACE LIGHT EMITTER AND SURFACE LIGHT EMITTER - The invention relates to a mold having an irregularly uneven surface structure in which an average inclination angle is from 20 to 80 degrees; an optical article having an irregularly uneven surface structure in which an average inclination angle is from 20 to 80 degrees; a method for manufacturing an optical article having an irregularly uneven surface structure by transferring an uneven structure of a mold; a transparent substrate for a surface light emitter which uses an optical article having an irregularly uneven surface structure; and a surface light emitter having a transparent substrate for a surface light emitter. | 05-01-2014 |
Yoshiharu Tokimitsu, Toyama-Shi JP
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20090130384 | Chip Provided with film Having Hole Pattern with the Use of Thermoresponsive Polymer and Method of Producing the Same - [Problems] To provide a novel chip useful for treating cells and the like which has a mechanism and a structure wherein the size of a hole pattern is arbitrarily changed so that cells can easily move in and get out from the hole in scattering or collecting cells but can hardly get out from the hole during washing or antigen-stimulation. | 05-21-2009 |
20110195496 | MICROWELL ARRAY CHIP AND METHOD OF MANUFACTURING SAME - The present invention is directed to a microwell array chip made of silicon and having multiple microwells. Each microwell is used to store a single specimen organic cell. Each microwell is of a size and shape holding just one organic cell, and the interior surface of the microwells are coated with a fluorocarbon film. | 08-11-2011 |
20120301942 | CHIP PROVIDED WITH FILM HAVING HOLE PATTERN WITH THE USE OF THERMORESPONSIVE POLYMER AND METHOD OF PRODUCING THE SAME - A chip useful for treating cells and the like which has a mechanism and a structure wherein the size of a hole pattern is arbitrarily changed so that cells can easily move in and get out from the hole in scattering or collecting cells but can hardly get out from the hole during washing or antigen-stimulation. The chip comprises a crosslinked product of a temperature-responsive polymer as a constituting member and being provided with a film having a hole pattern on the surface of a baseboard. A method of producing the chip comprises applying a composition containing a crosslinkable temperature-responsive polymer on the surface of a baseboard to thereby form a coating film, crosslinking the coating film to thereby form the crosslinked product as described above and then forming a hole pattern on the coating film of the crosslinked product. | 11-29-2012 |