Patent application number | Description | Published |
20090025885 | EVAPORATION APPARATUS WITH INCLINED CRUCIBLE - The invention relates to an evaporation apparatus for depositing material on a vertically oriented substrate ( | 01-29-2009 |
20090110809 | HOVER CUSHION TRANSPORT FOR WEBS IN A WEB COATING PROCESS - The invention relates to devices and apparatus for web guiding and cooling of webs during thin-film forming. A guiding device for contact-free guiding a web is provided with the device having a surface for facing the web and a multitude of gas outlets disposed in the surface and adapted for providing a hover cushion for the web. Further, an apparatus for coating a web and a method for contact-free guiding a web is provided that comprises moving the web over a surface and emitting a multitude of gas streams from the surface, thereby generating a hover cushion between the surface and the web. Further, a method for producing a thin-film solar cell is provided that comprises a method for contact-free guiding a web according to embodiments described herein. The method for producing a thin-film solar cell further comprises depositing a back contact on the web and depositing a transparent and conductive oxide layer. | 04-30-2009 |
20110120862 | ANODE ROD FOR A SPUTTERING SYSTEM - The present disclosure relates to an anode rod for a sputtering system comprising a target, a lateral surface area of the anode rod is at least 2 times greater than the lateral surface area of the a circular cylinder having the same volume. Further, the present disclosure relates to a sputtering system comprising at least one anode rod, wherein the anode rod having a lateral surface area that is at least 2 times greater than the lateral surface area of the a circular cylinder having the same volume, and at least one sputtering cathode assembly comprising a backing device selected of the group consisting of a backing plate for a planar target, and a target backing tube for a rotatable cylindrical target. | 05-26-2011 |
20110220489 | ROTATABLE TARGET, BACKING TUBE, SPUTTERING INSTALLATION AND METHOD FOR PRODUCING A ROTATABLE TARGET - A rotatable target for a sputtering installation and a method for producing a rotatable target are provided. The target includes a backing tube to which a target tube is shrink-fitted. The method includes setting a positive temperature difference between a target tube and a backing tube. The method further includes pulling the target tube over the backing tube while the temperature difference remains positive. Furthermore, a backing tube having a middle part with an outer lateral area and a notch extending in a longitudinal direction on the outer lateral area is provided. | 09-15-2011 |
20120097093 | LOAD LOCK CHAMBER, SUBSTRATE PROCESSING SYSTEM AND METHOD FOR VENTING - A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided. | 04-26-2012 |
20130171757 | ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS - The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers. | 07-04-2013 |
20130199891 | DYNAMIC LOAD LOCK WITH CELLULAR STRUCTURE FOR DISCRETE SUBSTRATES - A dynamic load lock chamber that includes a plurality of actuators positioned along its length to achieve a desired pressure gradient from an atmospheric pressure side to a processing pressure side of the chamber is provided. The chamber includes a transport belt continuously running through the chamber to transport substrates from the atmospheric pressure side to the processing pressure side of the chamber, if situated on an inlet side of a production line, and from the processing pressure side to the atmospheric pressure side of the chamber, if positioned on an outlet side of the production line. Separation mechanisms may be attached to the belt to separate discrete regions within the chamber into a plurality of discrete volumes. Substrates may be disposed between the separation mechanisms, such that separation between adjacent pressure regions within the chamber is maintained as the substrates are transported through the chamber. | 08-08-2013 |
20140208565 | GAS SEPARATION BY ADJUSTABLE SEPARATION WALL - An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit. | 07-31-2014 |
20140212599 | DEPOSITION SOURCE WITH ADJUSTABLE ELECTRODE - An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate through a vacuum processing region, a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode, and an actuator configured for adjusting the distance between the electrode and the outer surface. | 07-31-2014 |
20140212600 | COMMON DEPOSITION PLATFORM, PROCESSING STATION, AND METHOD OF OPERATION THEREOF - An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode. | 07-31-2014 |